JPH041321B2 - - Google Patents
Info
- Publication number
- JPH041321B2 JPH041321B2 JP56137998A JP13799881A JPH041321B2 JP H041321 B2 JPH041321 B2 JP H041321B2 JP 56137998 A JP56137998 A JP 56137998A JP 13799881 A JP13799881 A JP 13799881A JP H041321 B2 JPH041321 B2 JP H041321B2
- Authority
- JP
- Japan
- Prior art keywords
- color separation
- separation filter
- silanol
- image sensor
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000926 separation method Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 12
- 238000005520 cutting process Methods 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 3
- 239000007859 condensation product Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229920005573 silicon-containing polymer Polymers 0.000 description 2
- 241001050985 Disco Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052604 silicate mineral Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920006268 silicone film Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Crystal (AREA)
- Color Television Image Signal Generators (AREA)
- Optical Filters (AREA)
Description
【発明の詳細な説明】
本発明は固体撮像素子用色分解フイルタに関す
るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a color separation filter for a solid-state image sensor.
例えば、CCD（チヤージ・カツプルド・デバイ
ス）又はBBD（バケツト・ブリゲート・デバイ
ス）等の電荷転送素子では、その撮像素子の受光
面上に色分解フイルタを形成させなければカラー
画像の信号は得られない。 For example, in a charge transfer device such as a CCD (charge coupled device) or a BBD (bucket bridge device), a color image signal cannot be obtained unless a color separation filter is formed on the light receiving surface of the image sensor. .
色分解フイルタは従来からいろいろな方法で形
成されており、有機染色フイルタ、ダイクロイツ
クフイルタ等各種のフイルタ素子が、本発明では
適用でき、従来の製造法を利用して行うことが可
能である。 Color separation filters have conventionally been formed by various methods, and various filter elements such as organic dyed filters and dichroic filters can be applied to the present invention, and can be formed using conventional manufacturing methods.
さらに色分解フイルタは透明基板、例えばガラ
ス上に形成された後、撮像素子上に貼合せられる
か又は直接撮像素子上に形成されるが、本発明は
いずれの場合にも適用出来る。 Further, the color separation filter is formed on a transparent substrate such as glass and then bonded onto the image sensor or directly formed on the image sensor, but the present invention can be applied to either case.
本発明は色分解フイルタを同一基板上に多数個
配列して作成される場合に、有効な手段を提供す
るものである。 The present invention provides an effective means when a large number of color separation filters are arranged on the same substrate.
即ち、第１図に示すように、ガラス等の透明基
板１上に色分解フイルタ２が多数形成された場
合、所定寸法に切断された後、撮像素子に貼合せ
られる。又直接撮像素子上に色分解フイルタが形
成される場合は、多数個が配列した同一基板上に
形成されるので、最終的には切断される。上記切
断の場合、通常ダイシングソーが使用されるが、
その際に色分解フイルタにおいて、膜剥れやヒビ
ワレ等が発生し、不良の原因となり、さらに切断
速度を上げられない問題があつた。 That is, as shown in FIG. 1, when a large number of color separation filters 2 are formed on a transparent substrate 1 made of glass or the like, they are cut into predetermined dimensions and then bonded to an image sensor. Furthermore, when a color separation filter is formed directly on an image sensor, a large number of color separation filters are formed on the same substrate and are ultimately cut. In the case of the above cutting, a dicing saw is usually used, but
At that time, film peeling, cracking, etc. occurred in the color separation filter, causing defects, and there was also the problem that the cutting speed could not be increased.
本発明者は上記の問題を解決する為に、種々検
討を行なつた結果、色分解フイルタのトツプコー
ト層として、シリコーン系高分子硬質膜を形成す
る事により、上記の問題が解決する事を見い出し
た。 In order to solve the above problem, the present inventor conducted various studies and found that the above problem could be solved by forming a silicone-based polymer hard film as the top coat layer of the color separation filter. Ta.
即ち、第２図に示すように、例えばガラス等の
透明基板３上に所要色数を有する色分解フイルタ
４を複数個形成した後、第３図に示すように、ト
ツプコート層５としてシリコーン系高分子をエタ
ノール、イソブタノール、セロソルブアセテート
等で希釈した溶液をデイツプ、スプレー、スピン
ナー等でフイルター上に均一な膜を形成させ、
100℃〜150℃で約１時間程加熱乾燥して硬化させ
る。 That is, as shown in FIG. 2, after forming a plurality of color separation filters 4 having the required number of colors on a transparent substrate 3 made of glass or the like, as shown in FIG. A solution of molecules diluted with ethanol, isobutanol, cellosolve acetate, etc. is used to form a uniform film on the filter using a dip, spray, spinner, etc.
Heat and dry at 100°C to 150°C for about 1 hour to harden.
均一な膜を形成させるには、通常スピンナーに
よる回転塗布方法が有効である。 In order to form a uniform film, a rotary coating method using a spinner is usually effective.
シリコーン系高分子の具体例としてはシラノー
ル（Ｒ（Ｒ−Si（OH）3：Ｒは炭素原子数１〜３の
アルキル基、アリール基またはそれらの誘導基）
の縮合生成物や、該シラノールとSi（OH）4との縮
合物等をあげることができる。 A specific example of a silicone polymer is silanol (R(R-Si(OH) 3 :R is an alkyl group having 1 to 3 carbon atoms, an aryl group, or a derivative group thereof)
Examples include condensation products of the silanol and Si(OH) 4 .
トツプコート膜を硬質にして本発明に適するよ
うにするには、一般にＲ／Siの比を小さい値とす
ること、およびＲに含まれる炭素原子数は少ない
ほうが良いが、塗布組生物としての塗布適性の見
地から、適当な成分および組成を決めるべきであ
る。 In order to make the top coat film hard and suitable for the present invention, it is generally better to make the R/Si ratio a small value, and to reduce the number of carbon atoms contained in R. Appropriate components and compositions should be determined from the standpoint of
上記したような塗布組成物は塗布後加熱乾燥す
ることにより硬膜となる。 The coating composition as described above becomes a hard film by heating and drying it after coating.
シリコーンは分子構造の骨格はケイ酸塩鉱物と
同じく、シロキサン結合−Si−Ｏ−Si−Ｏ−から
できており、ケイ素原子にさらにアルキル、アリ
ールまたはそれらの誘導基が結合した側鎖をも
ち、半無機半有機的構造である。 Like silicate minerals, the molecular structure of silicone is made of siloxane bonds -Si-O-Si-O-, and has side chains in which alkyl, aryl, or their derivative groups are further bonded to the silicon atom. It has a semi-inorganic and semi-organic structure.
第３図のように、硬質のトツプコート層５を施
された固体撮像素子用色分解フイルタ４は、個々
に分割すべく透明基板３ごとに切断されて、第４
図に示すように固体撮像素子６に接着層を介して
貼り合わされる。 As shown in FIG. 3, the color separation filter 4 for a solid-state image pickup device coated with a hard top coat layer 5 is cut into individual transparent substrates 3, and a fourth
As shown in the figure, it is bonded to the solid-state image sensor 6 via an adhesive layer.
その結果、色分解フイルタ上に形成されたシリ
コーン膜はガラス基板とほゞ同等の硬さが得られ
るので、最終工程での切断において、従来トツプ
コートとしてアクリル、エポキシ、ポリウレタン
樹脂等を使用している場合に比較して、膜剥れや
ヒビワレ又キズの発生が非常に減少し、良好な色
分解フイルタを得る事が可能になつた。又切断ス
ピードを上げても良好な結果が得られた。 As a result, the silicone film formed on the color separation filter has almost the same hardness as a glass substrate, so acrylic, epoxy, polyurethane resin, etc. are conventionally used as the top coat in the final cutting process. Compared to the conventional method, the occurrence of film peeling, cracking, and scratches was greatly reduced, making it possible to obtain a good color separation filter. Good results were also obtained even when the cutting speed was increased.
さらに、撮像素子に直接色分解フイルタを形成
する場合も全く同様であつた。 Furthermore, the situation is exactly the same when a color separation filter is formed directly on an image sensor.
実施例
ガラス基板上に染色法により、最終色まで色分
解フイルタを形成させた後、東芝シリコーン(株)製
ハードコートレジン
商品名XR31−912（シリコーン高分子組成物）
をセロソルブアセテートで溶解した20％液を、ス
ピンナーで1000rpmで塗布し、25〜30℃、50±５
％RHの清浄な環境で30分程度セツテングを行な
つた後、120℃60分で加熱乾燥を行なつた。その
後、デイスコ株式会社製ダイシングソー商品名
＃150（0.05mm厚）で切断スピード50mm／secで切
断した。Example After forming a color separation filter up to the final color by a dyeing method on a glass substrate, hard coat resin (product name: XR31-912 (silicone polymer composition) manufactured by Toshiba Silicone Corporation) was dissolved in cellosolve acetate. % solution with a spinner at 1000 rpm, 25-30℃, 50±5
After setting for about 30 minutes in a clean environment of %RH, it was heated and dried at 120°C for 60 minutes. Thereafter, cutting was performed using a dicing saw #150 (0.05 mm thick) manufactured by DISCO Corporation at a cutting speed of 50 mm/sec.
その結果、剥れ、ガラスの欠けが無い良好なフ
イルタを得る事が出来た。 As a result, a good filter without peeling or chipping of the glass could be obtained.
以上、本発明により、色分解フイルタ作成上の
大きな問題であつた、切断時の問題が解決され、
さらに耐薬品性、耐摩耗性の強い色分解フイルタ
を製造する事が可能になり、取扱いが容易となり
製品歩留り率も向上するものである。 As described above, the present invention solves the problem of cutting, which was a major problem in creating color separation filters.
Furthermore, it becomes possible to manufacture color separation filters with strong chemical resistance and abrasion resistance, which facilitates handling and improves product yield.
第１図は固体撮像素子用色分解フイルタが同一
の透明基板上に多数形成された様子を示す平面図
であり、第２図から第４図までは、本発明の色分
解フイルタの製造工程の一実施例を示す説明図で
ある。
１，３……透明基板、２，４……色分解フイル
タ、５……トツプコート層、６……固体撮像素
子。
FIG. 1 is a plan view showing a state in which a large number of color separation filters for solid-state imaging devices are formed on the same transparent substrate, and FIGS. 2 to 4 show the manufacturing process of the color separation filter of the present invention. It is an explanatory diagram showing one example. 1, 3... Transparent substrate, 2, 4... Color separation filter, 5... Top coat layer, 6... Solid-state imaging device.
Claims (1)
ル（Ｒ−Si（OH）3：Ｒは炭素数１〜３のアルキル
基、アリール基、またはその誘導基）の縮合生成
物もしくは該シラノールとSi（OH）4との縮合物か
らなる硬質高分子でありガラス基板とほぼ同等の
硬度であるトツプ層とを形成し、切断する事を特
徴とする固体撮像素子用色分解フイルタの製造方
法。1 A color separation filter is placed on a glass substrate, and a condensation product of silanol (R-Si(OH) 3 : R is an alkyl group having 1 to 3 carbon atoms, an aryl group, or a derivative group thereof) or the silanol and Si(OH) 3 is prepared. ) A method for manufacturing a color separation filter for a solid-state imaging device, characterized by forming and cutting a top layer made of a hard polymer consisting of a condensate of 4 and having a hardness almost equal to that of a glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56137998A JPS5838905A (en) | 1981-09-02 | 1981-09-02 | Color separating filter for solid-state image pickup element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56137998A JPS5838905A (en) | 1981-09-02 | 1981-09-02 | Color separating filter for solid-state image pickup element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5838905A JPS5838905A (en) | 1983-03-07 |
| JPH041321B2 true JPH041321B2 (en) | 1992-01-10 |
Family
ID=15211669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56137998A Granted JPS5838905A (en) | 1981-09-02 | 1981-09-02 | Color separating filter for solid-state image pickup element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5838905A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58137940A (en) * | 1982-02-10 | 1983-08-16 | Jeol Ltd | Ion source |
| JPS62140340A (en) * | 1985-12-14 | 1987-06-23 | Denki Kagaku Kogyo Kk | Field emission type ion source |
| JPS61211937A (en) * | 1985-11-15 | 1986-09-20 | Hitachi Ltd | Electric field emission type ion source |
| JPS6329432A (en) * | 1986-07-21 | 1988-02-08 | Anelva Corp | Liquid-metal ion source |
| JPH0658982B2 (en) * | 1988-04-28 | 1994-08-03 | 株式会社トーキン | Method for manufacturing LD pumped solid-state laser device |
| JPH07117663B2 (en) * | 1988-08-19 | 1995-12-18 | セイコー電子工業株式会社 | Method for manufacturing multicolor liquid crystal display device |
| JPH0272303A (en) * | 1988-09-07 | 1990-03-12 | Konica Corp | Color filter and liquid crystal color display device |
| JP3315720B2 (en) * | 1992-06-18 | 2002-08-19 | 株式会社日立製作所 | Liquid metal ion source and heating cleaning method |
-
1981
- 1981-09-02 JP JP56137998A patent/JPS5838905A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5838905A (en) | 1983-03-07 |
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