JPH0413094B2 - - Google Patents
Info
- Publication number
- JPH0413094B2 JPH0413094B2 JP58025161A JP2516183A JPH0413094B2 JP H0413094 B2 JPH0413094 B2 JP H0413094B2 JP 58025161 A JP58025161 A JP 58025161A JP 2516183 A JP2516183 A JP 2516183A JP H0413094 B2 JPH0413094 B2 JP H0413094B2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- workpiece
- rigid body
- rigid
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000853 adhesive Substances 0.000 claims description 27
- 230000001070 adhesive effect Effects 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 7
- 235000012431 wafers Nutrition 0.000 description 7
- 238000005498 polishing Methods 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
【発明の詳細な説明】
本発明は、例えば半導体装置に用いるシリコン
ウエハ、バブルメモリ装置に用いられるGGG(ガ
ドリ・ガリウム・ガーネツト)ウエハ、デイジタ
ル磁気ヘツド又はMIC(マイクロ波集積回路)素
子に用いられるフエライト基板、更にはSAW(表
面波)フイルタに用いられる圧電セラミクス基板
等のウエハ又は基板を両面研摩する際に金属治具
に効率良く接着する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention is applicable to, for example, silicon wafers used in semiconductor devices, GGG (Gadri gallium garnet) wafers used in bubble memory devices, digital magnetic heads, or MIC (microwave integrated circuit) elements. The present invention relates to a method for efficiently bonding a wafer or substrate, such as a ferrite substrate or a piezoelectric ceramic substrate used in a SAW (surface wave) filter, to a metal jig when double-sided polishing is performed.
一般に、この種のウエハ・基板のラツピング、
ポリシングの技術は、その後に加工して得られる
素子又は装置の特性・品質を左右するため重要な
ポイントである。またウエハ・基板を鏡面研摩す
る場合は面の平坦度の外に両面の平行度等も重要
である。 Generally, this kind of wafer/substrate wrapping,
The polishing technique is an important point because it influences the characteristics and quality of the element or device obtained by subsequent processing. Furthermore, when mirror polishing a wafer/substrate, in addition to the flatness of the surface, the parallelism of both surfaces is also important.
従つて、この種ワークを高品位とするためには
ウエハ・基板を切断したものを研摩し、更にダイ
ヤモンドペースト等を研削材として用いて鏡面仕
上げされる。具体的には、第1図に示す如く、ウ
エハ・基板等のワーク1を接着剤で接着した金属
製剛体2を、ワーク面を向けて研摩定盤3に載置
し、公転駆動される定盤3と自転する剛体2との
間にダイヤモンドペーストを注入して行なわれる
ことが多い。 Therefore, in order to achieve high quality workpieces of this type, the cut wafer/substrate is polished and then mirror-finished using diamond paste or the like as an abrasive. Specifically, as shown in FIG. 1, a metal rigid body 2 to which a work 1 such as a wafer or a substrate is bonded with adhesive is placed on a polishing surface plate 3 with the work surface facing, and This is often done by injecting diamond paste between the disk 3 and the rotating rigid body 2.
ところで、ワーク1の両面を研摩するには、
粗研摩上がりのワークを加熱された金属製剛体に
熱可塑性接着剤にて接着し、まず片面を研摩
し、その後剛体を加熱してワークを取外し、ワ
ークに付着した残滓を除去するため洗浄し、次
にワークの面を反対にして上記〜の過程を繰
返すことになつている。 By the way, to polish both sides of workpiece 1,
The roughly polished workpiece is bonded to a heated rigid metal body using thermoplastic adhesive, one side is first polished, the rigid body is then heated, the workpiece is removed, and the workpiece is cleaned to remove any residue that has adhered to it. Next, the process from above is repeated with the side of the workpiece reversed.
しかし、このような方法でワークの接着を行な
う場合は接着及び剥離に要する工数が多く、作業
性が極めて悪い。 However, when adhering workpieces by such a method, many man-hours are required for adhesion and peeling, and workability is extremely poor.
本発明はかかる点に鑑み、夫々軟化点の異なる
第1及び第2の接着剤を塗布した第1及び第2の
金属性剛体に被研摩ワークを合理的に接着・剥離
を行なうことにより、従来のこの種方法に要する
工数を大幅に低減するワークの接着方法を提案す
ることを主たる目的とする。 In view of the above, the present invention has been developed by rationally adhering and peeling a work to be polished to first and second rigid metal bodies coated with first and second adhesives having different softening points, respectively. The main purpose of this paper is to propose a workpiece bonding method that significantly reduces the number of man-hours required for this type of method.
以下本発明の一実施例について図面を参照しな
がら詳細に説明する。 An embodiment of the present invention will be described in detail below with reference to the drawings.
第2図は本発明方法の一例を示す工程図を示
す。5,6は第1及び第2の金属製剛体を示し、
これらはワーク付着面に夫々第1及び第2の接着
剤7,8が塗布されており、ホツトプレート等の
加熱装置9により予め加熱されている。この場
合、加熱装置9による第1及び第2の剛体5,6
の温度を第1及び第2の接着剤7,8の軟化より
高く設定することにより、第1の剛体5の第1の
接着剤7上にワーク10を載置すると、ワーク1
0が第1の剛体5と一体になる。 FIG. 2 shows a process diagram showing an example of the method of the present invention. 5 and 6 indicate first and second metal rigid bodies;
First and second adhesives 7 and 8 are applied to the surfaces to which the work is attached, respectively, and are heated in advance by a heating device 9 such as a hot plate. In this case, the first and second rigid bodies 5, 6 are heated by the heating device 9.
When the workpiece 10 is placed on the first adhesive 7 of the first rigid body 5 by setting the temperature of
0 becomes one with the first rigid body 5.
次に、同図Bに示す如く、接着ガイド11上に
第2の剛体6を載置すると共に、付着面が相対向
するように第1の剛体5を位置せしめて重ねる。
従つて、ワーク10の上面に第1の剛体5が、下
面に第2の剛体6が一体になる。 Next, as shown in Figure B, the second rigid body 6 is placed on the adhesive guide 11, and the first rigid body 5 is positioned and stacked so that the attachment surfaces face each other.
Therefore, the first rigid body 5 is integrated with the upper surface of the workpiece 10, and the second rigid body 6 is integrated with the lower surface.
次に同図Cに示す如く、第2の剛体6のみを冷
却するため、水槽13に満たした冷却水14に触
れるようにすることにより、第2の接着剤8が早
く軟化してワーク10と第2の剛体6とが強固に
一体化されると共に、未だ軟化状態にある第1の
接着剤7と共に第1の剛体5の上方に引上げるこ
とにより、ワーク10が第1の剛体5から離れる
ことになる(同図D参照)。従つて、予め片面が
研摩されたワーク10の反対面を第2の剛体6に
一体化された状態で鏡面研摩することができる。 Next, as shown in FIG. C, in order to cool only the second rigid body 6, by making it come in contact with the cooling water 14 filled in the water tank 13, the second adhesive 8 will quickly soften and bond to the workpiece 10. The workpiece 10 is separated from the first rigid body 5 by being firmly integrated with the second rigid body 6 and being pulled up above the first rigid body 5 together with the first adhesive 7 which is still in a softened state. (See figure D). Therefore, the opposite surface of the workpiece 10, which has been previously polished on one side, can be mirror-polished while being integrated with the second rigid body 6.
この場合、第1の接着剤7と第2の接着剤8と
の軟化点を異なるように設定する。すなわち第1
の接着剤7の軟化点50℃の松やにロウ(日化精工
(株)製フラツトローワツクス)を用い、第2の接着
剤8に軟化点60℃の同系樹脂(日化精工(株)製ステ
ツキワツクス)を用いることにより、加熱・冷却
の管理を容易にかつ短時間で処理することができ
る。尚、上記接着剤は一例であり、その他の熱可
塑性・熱硬化性のものを用いることを妨げない。 In this case, the softening points of the first adhesive 7 and the second adhesive 8 are set to be different. That is, the first
Adhesive 7 has a softening point of 50℃ pine resin wax (Nikka Seiko)
By using a similar resin (Stetuki Wax manufactured by Nikka Seiko Co., Ltd.) with a softening point of 60°C as the second adhesive 8, heating and cooling can be easily managed. It can be processed in a short time. Note that the above adhesive is an example, and other thermoplastic/thermosetting adhesives may be used.
尚、上述例においては第1及び第2の金属剛体
5,6の移動方向を上下に設定したが、これに代
えて前後又は左右方向に設定することも可能であ
る。 In the above example, the moving direction of the first and second metal rigid bodies 5 and 6 was set up and down, but it is also possible to set it up and down, but also in the front-back or left-right direction.
以上述べた如く本発明によれば、ワークが第1
の接着剤で接着された第1の金属製剛体と、上記
第1の接着剤の軟化点より高く設定した第2の接
着剤を接着面に塗布した第2の金属製剛体とを上
記第1及び第2の接着剤の軟化点以上にて加熱す
る過程と、上記軟化点以上の温度で上記第2の金
属製剛体の第2の接着面に上記ワークを重ねる過
程と、上記第2の金属製剛体を冷却して上記2の
金属製剛体とワークとが接着した時点で上記第1
の金属製剛体を除去するようにしたので、
従来方法を採用した場合に要する時間が約45分
であつたのに対して約8分と極めて短時間で処理
することができ、生産性の大幅な向上となる。し
かも第1の剛体から第2の剛体へワークを移替え
る際、従来は研摩製品の欠け・スクラツチ等が発
生して歩留りの悪化が多かつたが、本発明によれ
ば、このような欠点は殆ど生ぜず歩留りが向上す
る効果を有する。 As described above, according to the present invention, the workpiece is
A first rigid metal body bonded with an adhesive, and a second rigid metal body whose adhesive surface is coated with a second adhesive set higher than the softening point of the first adhesive and a step of heating the second adhesive to a temperature above the softening point, a step of stacking the work on a second adhesive surface of the second rigid metal body at a temperature above the softening point, and a step of stacking the workpiece on the second bonding surface of the second metal rigid body, and When the metal rigid body is cooled and the metal rigid body described above and the workpiece are bonded, the first
By removing the rigid metal bodies, the process can be completed in an extremely short time of approximately 8 minutes, compared to approximately 45 minutes using the conventional method, resulting in a significant increase in productivity. This is a significant improvement. Moreover, when transferring the workpiece from the first rigid body to the second rigid body, in the past, chipping and scratches of the abrasive product often occurred, resulting in a deterioration of the yield, but according to the present invention, such drawbacks can be eliminated. It has the effect of improving the yield with almost no generation.
第1図はワークの研摩方法の説明に供する図、
第2図A,B,C,Dは本発明の一例を示す工程
図である。
5……第1の金属製剛体、6……第2の金属製
剛体、7……第1の接着剤、8……第2の接着
剤、9……加熱装置、10……ワーク、14……
冷却水。
Figure 1 is a diagram used to explain the workpiece polishing method.
FIGS. 2A, B, C, and D are process charts showing an example of the present invention. 5... First metal rigid body, 6... Second metal rigid body, 7... First adhesive, 8... Second adhesive, 9... Heating device, 10... Work, 14 ……
Cooling water.
Claims (1)
属製剛体と、上記第1の接着剤の軟化点より高く
設定した第2の接着剤を接着面に塗布した第2の
金属製剛体とを上記第1及び第2の接着剤の軟化
点以上にて加熱する過程と、 上記軟化点以上の温度で上記第2の金属製剛体
の第2の接着面に上記ワークを重ねる過程と、 上記第2の金属製剛体を冷却して上記2の金属
製剛体とワークとが接着した時点で上記第1の金
属製剛体を除去するようにしたことを特徴とする
ワークの接着方法。[Claims] 1. A first rigid metal body to which a workpiece is adhered with a first adhesive, and a second adhesive set higher than the softening point of the first adhesive is applied to the adhesive surface. heating the second rigid metal body to a temperature above the softening point of the first and second adhesives; A workpiece comprising: a step of stacking the workpieces; and cooling the second rigid metal body and removing the first rigid metal body when the second rigid metal body and the workpiece are bonded to each other. Adhesion method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58025161A JPS59152060A (en) | 1983-02-16 | 1983-02-16 | Adhesion of work |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58025161A JPS59152060A (en) | 1983-02-16 | 1983-02-16 | Adhesion of work |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59152060A JPS59152060A (en) | 1984-08-30 |
JPH0413094B2 true JPH0413094B2 (en) | 1992-03-06 |
Family
ID=12158288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58025161A Granted JPS59152060A (en) | 1983-02-16 | 1983-02-16 | Adhesion of work |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59152060A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108673303B (en) * | 2018-05-08 | 2019-11-05 | 芜湖超源力工业设计有限公司 | A kind of fixed grinding device of mold |
-
1983
- 1983-02-16 JP JP58025161A patent/JPS59152060A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59152060A (en) | 1984-08-30 |
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