JPH0410738B2 - - Google Patents
Info
- Publication number
- JPH0410738B2 JPH0410738B2 JP58165557A JP16555783A JPH0410738B2 JP H0410738 B2 JPH0410738 B2 JP H0410738B2 JP 58165557 A JP58165557 A JP 58165557A JP 16555783 A JP16555783 A JP 16555783A JP H0410738 B2 JPH0410738 B2 JP H0410738B2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist film
- film
- forming
- electrode layer
- lift
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
Landscapes
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58165557A JPS6057632A (ja) | 1983-09-08 | 1983-09-08 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58165557A JPS6057632A (ja) | 1983-09-08 | 1983-09-08 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6057632A JPS6057632A (ja) | 1985-04-03 |
| JPH0410738B2 true JPH0410738B2 (enFirst) | 1992-02-26 |
Family
ID=15814621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58165557A Granted JPS6057632A (ja) | 1983-09-08 | 1983-09-08 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6057632A (enFirst) |
-
1983
- 1983-09-08 JP JP58165557A patent/JPS6057632A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6057632A (ja) | 1985-04-03 |
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