JPH04101406A - Chip type solid tantalum electrolytic capacitor - Google Patents

Chip type solid tantalum electrolytic capacitor

Info

Publication number
JPH04101406A
JPH04101406A JP21880590A JP21880590A JPH04101406A JP H04101406 A JPH04101406 A JP H04101406A JP 21880590 A JP21880590 A JP 21880590A JP 21880590 A JP21880590 A JP 21880590A JP H04101406 A JPH04101406 A JP H04101406A
Authority
JP
Japan
Prior art keywords
tantalum
layer
type solid
chip
capacitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21880590A
Other languages
Japanese (ja)
Inventor
Jinko Hori
堀 仁孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP21880590A priority Critical patent/JPH04101406A/en
Publication of JPH04101406A publication Critical patent/JPH04101406A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To achieve a relatively large surface area, thin tantalum sintered layer that is difficult to break or chip by compression molding a tantalum powder on one side of a tantalum sheet, sintering this, and then forming an oxide film, semiconductor layer, and conduction layer to create a tantalum capacitor element. CONSTITUTION:The embossed sections 4a are formed on the tantalum sheet 3a and a tantalum powder is compression molded on the protruding side of the embossed sections 4a. Next, vacuum sintering is performed and a tantalum sintered body 5a is obtained. After this, the recessed side of the embossed sections 4a on the tantalum sheet 3a is made the anode. In a hydrogen phosphate solution, the surfaces of the tantalum sintered body 5a and the protruding side of the embossed sections 4a of the tantalum sheet 3a are anodized and a cathode layer consisting of manganese dioxide, graphite, and silver paste is formed. Then the silver paste layer 7a is used to connect the cathode layer 6a and the cathode terminal 1a thereby obtaining a tantalum capacitor. Finally, two tantalum capacitor element are stacked and connected by a conductive resin layer 7b.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はチップ型固体電解タンタルコンデンサに関し、
特に薄型化に適したチップ型固体電解タンタルコンデン
サに関する。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a chip type solid electrolytic tantalum capacitor,
In particular, it relates to chip-type solid electrolytic tantalum capacitors that are suitable for thinning.

〔従来の技術〕[Conventional technology]

従来、この種のチップ型固体電解タンタルコンデンサと
しては、第6図に示すように、タンタル線1.3 aを
タンタル焼結体14に植立し、陽極酸化法にて表面を酸
化し、二酸化マンガンを使用して陰極層15を形成し、
導電性樹脂層16によって陰極端子板11に接続し、ま
たタンタル線13は溶接により陽極端子板]2に接続し
外装樹脂]7で外装し、外装樹脂より突き出た陽極端子
板]2及び陰極端子板11を外装樹脂17にそって折り
曲げるという構造を有していた。
Conventionally, for this type of chip-type solid electrolytic tantalum capacitor, as shown in FIG. forming the cathode layer 15 using manganese;
The tantalum wire 13 is connected to the cathode terminal plate 11 by a conductive resin layer 16, and the tantalum wire 13 is connected to the anode terminal plate 2 by welding, and is covered with an exterior resin 7, and the anode terminal plate 2 and the cathode terminal protrude from the exterior resin. It had a structure in which the plate 11 was bent along the exterior resin 17.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来のチップ型固体電解タンタルコンデンサは
、タンタル焼結体を保持するものが中心部に植立されて
いるタンタル線1本であることから薄く平らなタンタル
焼結体を作る場合、非常に欠けやすく割れやすい、また
タンタル線には製造工程中でのタンタル焼結体の保持の
目的もあるので、タンタル焼結体の大きさに比してあま
り細くできないなどの制約があり、薄型化しにくいとい
う問題点があった。
The conventional chip-type solid electrolytic tantalum capacitor described above has a single tantalum wire planted in the center that holds the tantalum sintered body, so it is very difficult to make a thin and flat tantalum sintered body. It is easy to chip and break, and since the purpose of tantalum wire is to hold the tantalum sintered body during the manufacturing process, there are restrictions such as not being able to make it too thin compared to the size of the tantalum sintered body, making it difficult to make it thinner. There was a problem.

また、従来のチップ型固体電解タンタルコンデンサは、
通常定格電圧が50V以下であるため、50V以上の電
圧で使用する際には2個以上のチップ型固体電解タンク
ルコンデンサを直列に接続しなければならず、また1個
のチップ型固体電解タンタルコンデンサ内で直列構造に
すると、構造が複雑になり、生産が困難であるという問
題点があった。
In addition, conventional chip-type solid electrolytic tantalum capacitors are
Normally, the rated voltage is 50V or less, so when using it at a voltage higher than 50V, two or more chip-type solid electrolytic tantalum capacitors must be connected in series, and one chip-type solid electrolytic tantalum capacitor must be connected in series. When a series structure is used in a capacitor, the structure is complicated and production is difficult.

本発明の第1の目的は、比較的大面積の薄いタンタル焼
結体でも、欠けたり、割れたりしにくく、薄型化できる
チップ型固体電解タンタルコンデンサを提供することに
ある。
A first object of the present invention is to provide a chip-type solid electrolytic tantalum capacitor that is difficult to chip or crack and can be made thin even when a thin tantalum sintered body having a relatively large area is used.

また、本発明の第2の目的は、2個以上直列に接続した
高い耐電圧のコンデンサか薄型化でき、容易に、かつ生
産性よく形成できるチップ型固体電解コンデンザを提供
することにある。
A second object of the present invention is to provide a chip-type solid electrolytic capacitor that can be formed thinly and easily and with high productivity by connecting two or more capacitors in series with a high withstand voltage.

〔課題を解決するための手段〕 本発明の第1の発明のチップ型固体電解タンタルコンデ
ンサは、タンタル箔の片面にタンタル粉末を加圧成形し
、焼結を行ない、酸化膜、半導体層、導体層を順次形成
して成るタンタルコンデンサ素子を構成素子とすること
を特徴として構成される。
[Means for Solving the Problems] The chip-type solid electrolytic tantalum capacitor of the first aspect of the present invention is produced by press-molding tantalum powder on one side of tantalum foil and sintering it to form an oxide film, a semiconductor layer, and a conductor. The structure is characterized in that its constituent element is a tantalum capacitor element formed by sequentially forming layers.

また、本発明の第2の発明のチップ型固体電解タンタル
コンデンサは、タンタル箔の片面にタンタル粉末を加圧
成形し、焼結を行ない、酸化膜。
In addition, the chip type solid electrolytic tantalum capacitor according to the second aspect of the present invention is obtained by press-molding tantalum powder on one side of a tantalum foil and sintering it to form an oxide film.

半導体層、導体層を順次形成して成るタンタルコンデン
サ素子を2個以上直列接続した構造を有することを特徴
として構成される。
The device is characterized by having a structure in which two or more tantalum capacitor elements each formed by successively forming a semiconductor layer and a conductor layer are connected in series.

以上本発明によれば薄型化したチップ型固体電解タンタ
ルコンデンサが容易に得られると共に、簡単な構造で1
つのチップ型固体電解タンタルコンデンサ内に直列接続
の構造を作ることができる。
As described above, according to the present invention, a thin chip-type solid electrolytic tantalum capacitor can be easily obtained, and also has a simple structure.
A series connection structure can be created within two chip-type solid electrolytic tantalum capacitors.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。第1図
は本発明の第1の発明の一実施例のデツプ型固体電解タ
ンタルコンデンサの断面図である。
Next, the present invention will be explained with reference to the drawings. FIG. 1 is a sectional view of a deep type solid electrolytic tantalum capacitor according to an embodiment of the first aspect of the present invention.

まず、厚さ50μmのタンタル箔3aに高さ50μmの
エンボス部4aを設はエンボス部4aの凸部側に1mg
のタンタル粉末を加圧成形し、1740°Cで60分間
真空焼結を行ない、厚さ0.2mmの巾1mm長さ1m
mタンタル焼結体5aを得た。
First, an embossed portion 4a with a height of 50 μm is provided on a tantalum foil 3a with a thickness of 50 μm.
Tantalum powder was press-molded and vacuum sintered at 1740°C for 60 minutes to form a product with a thickness of 0.2 mm, a width of 1 mm, and a length of 1 m.
A tantalum sintered body 5a was obtained.

次に、タンタル箔3aのエンボス部4a凹部側を陽極と
し、90°Cの0.1%リン酸水溶液中でタンタル焼結
体5a及びタンタル箔3aのエンボス部4a凸部側の面
を100Vまで陽極酸化し、二酸化マンカン クラファ
イト・銀ペーストを順次付着させることにより0.1m
m厚の陰極層を形成した。その後銀ペースト層7aによ
り陰極層6aを0.1mm厚の陰極端子板1aに接続し
た。
Next, using the concave side of the embossed part 4a of the tantalum foil 3a as an anode, the tantalum sintered body 5a and the surface of the convex part of the embossed part 4a of the tantalum foil 3a are heated to 100 V in a 0.1% phosphoric acid aqueous solution at 90°C. 0.1m by anodizing and sequentially applying mancan dioxide, graphite, and silver paste.
A cathode layer with a thickness of m was formed. Thereafter, the cathode layer 6a was connected to the cathode terminal plate 1a having a thickness of 0.1 mm using the silver paste layer 7a.

また、タンタル箔3aの右端を0.1mm厚の陽極端子
板2aに接続し、外装樹脂8aにて外装し、外装樹脂8
aより突き出した部分の陽極端子板2aと陰極端子板]
aを下側に折り曲げ、定格電圧35V、0.11μFで
厚さ0.8mmのチップ型固体電解タンタルコンデンサ
を作成した。
In addition, the right end of the tantalum foil 3a is connected to the anode terminal plate 2a having a thickness of 0.1 mm, and the exterior resin 8a is used to package the tantalum foil 3a.
The anode terminal plate 2a and the cathode terminal plate of the part protruding from a]
A was bent downward to produce a chip-type solid electrolytic tantalum capacitor with a rated voltage of 35 V, 0.11 μF, and a thickness of 0.8 mm.

第2図は本発明の第1の発明の実施例2の縦断面図であ
る。本実施例では、陽極端子板2al及び陰極端子板1
a1を外側に曲げており、実装する上での難しさはある
が、さらに端子板の厚さだけ薄くできることが特徴であ
る。
FIG. 2 is a longitudinal sectional view of a second embodiment of the first invention of the present invention. In this embodiment, the anode terminal plate 2al and the cathode terminal plate 1
A1 is bent outward, which makes mounting difficult, but it is also characterized by being able to be made thinner by the thickness of the terminal board.

第3図は本発明の第2の発明の一実施例の縦断面図、第
4図は第3図のタンタル素子部の拡大図である。
FIG. 3 is a longitudinal sectional view of an embodiment of the second aspect of the present invention, and FIG. 4 is an enlarged view of the tantalum element portion of FIG. 3.

まず、第4図に示すように50μ厚のタンタル箔3bに
エンボス部4bを設け、その上にlmmX2mm、1m
m厚のタンタル粉末成形体を形成し、1800°C17
5分の条件で焼結した。次に焼結後のタンタル箔3b及
びタンタル焼結体5bを90’Cのリン酸水溶液中に、
タンタル焼結体5b及びタンタル箔3bのタンタル焼結
体5bと接続された面を漬けるようにし、タンタル箔3
bのタンタル焼結体5bと接続されていない面より陽極
を取り出し、リン酸水溶液中に陰極用のステンレス板を
配置して、陽極酸化を行なった。その後タンタル焼結体
5bを硝酸マンガン中に浸漬し、300°Cにて熱分解
を行なって二酸化マンガン層を形成し、その上にグラフ
ァイト、銀ペーストを塗って、陰極層6bを形成し2μ
F、定格35Vのタンタルコンデンサ素子を得た。
First, as shown in Fig. 4, an embossed part 4b is provided on a 50μ thick tantalum foil 3b, and a 1mm x 2mm, 1m
Form a tantalum powder compact with m thickness and heat at 1800°C17
Sintering was performed for 5 minutes. Next, the sintered tantalum foil 3b and the tantalum sintered body 5b are placed in a 90'C phosphoric acid aqueous solution.
The surfaces of the tantalum sintered body 5b and the tantalum foil 3b that are connected to the tantalum sintered body 5b are soaked, and the tantalum foil 3
The anode was taken out from the side not connected to the tantalum sintered body 5b of b, and a stainless steel plate for the cathode was placed in an aqueous phosphoric acid solution to perform anodic oxidation. Thereafter, the tantalum sintered body 5b is immersed in manganese nitrate, thermally decomposed at 300°C to form a manganese dioxide layer, and graphite and silver paste are applied thereon to form a cathode layer 6b.
A tantalum capacitor element with a rating of 35V was obtained.

次に、2μF定格35Vのタンタルコンデンサ素子2個
を第3図のように、積みかさね導電性樹脂層7bにより
接続した。この時下側のタンタルコンデンサ素子のタン
タル箔3bを1mmだけ長く伸ばしておいた。
Next, two tantalum capacitor elements with a 2 μF rating of 35 V were stacked and connected by a conductive resin layer 7b as shown in FIG. At this time, the tantalum foil 3b of the lower tantalum capacitor element was extended by 1 mm.

次に、スズ箔10を上側のタンタルコンデンサ素子に導
電性樹脂層7bにより接続し、スズ箔10の左側と下側
のタンタルコンデンサ素子のタンタル箔3bの右側をそ
れぞれ陰極端子板1b及び陽極端子板2bに導電性樹脂
層7bに接続し、絶縁樹脂8bにより外装し、1μF定
格70Vのチップ型固体電解コンデンサを作成した。
Next, the tin foil 10 is connected to the upper tantalum capacitor element through the conductive resin layer 7b, and the left side of the tin foil 10 and the right side of the tantalum foil 3b of the lower tantalum capacitor element are connected to the cathode terminal plate 1b and the anode terminal plate, respectively. 2b was connected to a conductive resin layer 7b and covered with an insulating resin 8b to produce a chip type solid electrolytic capacitor with a 1 μF rating of 70V.

第5図は本発明の第2の発明の実施例2の縦断面図であ
る。本実施例では、タンタルコンデンサ素子を横方向に
配置しており陰極端子板1b及び陽極端子板2bとの接
続面が大きくとれることが特徴である。
FIG. 5 is a longitudinal sectional view of a second embodiment of the second invention of the present invention. This embodiment is characterized in that the tantalum capacitor elements are arranged in the horizontal direction, allowing a large connection surface with the cathode terminal plate 1b and the anode terminal plate 2b.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、タンタル箔の片面にタン
タル粉末を加圧成形し、焼結を行ない酸化膜・半導体膜
・導体層を順次形成して成る。タンタルコンデンサ素子
を使用することによりタンタル焼結体をタンタル箔によ
り面で保持することになり、比較的大面積の薄いタンタ
ル焼結体でも、欠けたり、割れたりしにくく、またタン
タル焼結体の大きさによらず、同し厚さのタンタル箔で
保持することが可能であるので従来より薄型化したチッ
プ型固体電解タンタルコンデンサを作成することがてき
る。
As explained above, in the present invention, tantalum powder is pressure-molded on one side of a tantalum foil, and sintered to sequentially form an oxide film, a semiconductor film, and a conductor layer. By using a tantalum capacitor element, the tantalum sintered body is held flat by the tantalum foil, making it difficult to chip or crack even when the tantalum sintered body is relatively large and thin. Since it is possible to hold the capacitor with tantalum foil of the same thickness regardless of its size, it is possible to create a chip-type solid electrolytic tantalum capacitor that is thinner than conventional capacitors.

また、従来より薄型化した構造のタンタルコンデンサ素
子を2個以上直列に接続することにより従来に比べ高い
耐電圧のコンデンサを作成できるという効果が得られる
Furthermore, by connecting two or more tantalum capacitor elements in series that have a thinner structure than the conventional one, it is possible to create a capacitor with a higher withstand voltage than the conventional one.

17・・・外装樹脂。17...Exterior resin.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の第1の発明の一実施例の縦断面図、第
2図は本発明の第1の発明の実施例2の縦断面図、第3
図は本発明の第2の発明の一実施例の縦断面図、第4図
は第3図のタンタル素子部の拡大図、第5図は本発明の
第2の発明の実施例2の縦断面図、第6図は従来のチッ
プ型固体電解タンタルコンデンサの一例の縦断面図であ
る。 la、lal、lb・・−陰極端子板、2a、2a+、
2b・・・陽極端子板、3a、3b・・・タンタル箔、
4a、4b・・・エンボス部、5a、5b・・・タンタ
ル焼結体、6a、6b・・・陰極層、7a、7b・・導
電性樹脂層(銀ペースト層)、8a、8b・・・外装樹
脂、10・・・スズ箔、11・・・陰極端子板、12・
・・陽極端子板、13・・タンタル線、14・・タンタ
ル焼結体、15・・陰極層、16・・・導電性樹脂層、
]0 第3図 第4図 第5図 第6図 5〇− t2祢夕島子扱 陽柘端子級 タシタノン箔 エンボス郭 タンタル焼結体 降掻層 スス箔 陰部端子4反 隅極端子級 タシタル線 タンタルズを殆体 r雲伎層 導電11樹l1ii層 クト扁く[イ1寸A旨
FIG. 1 is a vertical cross-sectional view of an embodiment of the first invention of the present invention, FIG. 2 is a vertical cross-sectional view of a second embodiment of the first invention of the present invention, and FIG.
The figure is a vertical cross-sectional view of an embodiment of the second invention of the present invention, FIG. 4 is an enlarged view of the tantalum element portion of FIG. 3, and FIG. The top view and FIG. 6 are longitudinal cross-sectional views of an example of a conventional chip-type solid electrolytic tantalum capacitor. la, lal, lb... - cathode terminal plate, 2a, 2a+,
2b...Anode terminal plate, 3a, 3b...Tantalum foil,
4a, 4b... Embossed part, 5a, 5b... Tantalum sintered body, 6a, 6b... Cathode layer, 7a, 7b... Conductive resin layer (silver paste layer), 8a, 8b... Exterior resin, 10... Tin foil, 11... Cathode terminal plate, 12.
... Anode terminal plate, 13... Tantalum wire, 14... Tantalum sintered body, 15... Cathode layer, 16... Conductive resin layer,
] 0 Figure 3 Figure 4 Figure 5 Figure 6 Figure 6 Tantals are almost all conductive in the 11th layer and the 11th layer is thinner.

Claims (2)

【特許請求の範囲】[Claims] 1.タンタル箔の片面にタンタル粉末を加圧成形し、焼
結を行ない、酸化膜,半導体層,導体層を順次形成して
成るタンタルコンデンサ素子を構成素子とすることを特
徴とするチップ型固体電解タンタルコンデンサ。
1. A chip-type solid electrolytic tantalum whose constituent element is a tantalum capacitor element formed by press-molding tantalum powder on one side of tantalum foil, sintering it, and sequentially forming an oxide film, a semiconductor layer, and a conductor layer. capacitor.
2.タンタル箔の片面にタンタル粉末を加圧成形し、焼
結を行ない、酸化膜,半導体層,導体層を順次形成して
成るタンタルコンデンサ素子を2個以上直列接続した構
造を有することを特徴とするチップ型固体電解タンタル
コンデンサ。
2. It is characterized by having a structure in which two or more tantalum capacitor elements are connected in series, each of which is formed by press-molding tantalum powder on one side of tantalum foil, sintering it, and sequentially forming an oxide film, a semiconductor layer, and a conductor layer. Chip type solid electrolytic tantalum capacitor.
JP21880590A 1990-08-20 1990-08-20 Chip type solid tantalum electrolytic capacitor Pending JPH04101406A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21880590A JPH04101406A (en) 1990-08-20 1990-08-20 Chip type solid tantalum electrolytic capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21880590A JPH04101406A (en) 1990-08-20 1990-08-20 Chip type solid tantalum electrolytic capacitor

Publications (1)

Publication Number Publication Date
JPH04101406A true JPH04101406A (en) 1992-04-02

Family

ID=16725629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21880590A Pending JPH04101406A (en) 1990-08-20 1990-08-20 Chip type solid tantalum electrolytic capacitor

Country Status (1)

Country Link
JP (1) JPH04101406A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1143465A3 (en) * 2000-04-07 2006-09-20 Nec Tokin Corporation Chip capacitor, a fabrication method for the same, and a metal mold

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1143465A3 (en) * 2000-04-07 2006-09-20 Nec Tokin Corporation Chip capacitor, a fabrication method for the same, and a metal mold

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