JP3505763B2 - Chip-shaped solid electrolytic capacitor - Google Patents

Chip-shaped solid electrolytic capacitor

Info

Publication number
JP3505763B2
JP3505763B2 JP02845994A JP2845994A JP3505763B2 JP 3505763 B2 JP3505763 B2 JP 3505763B2 JP 02845994 A JP02845994 A JP 02845994A JP 2845994 A JP2845994 A JP 2845994A JP 3505763 B2 JP3505763 B2 JP 3505763B2
Authority
JP
Japan
Prior art keywords
solid electrolytic
electrolytic capacitor
conductor layer
chip
layer forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP02845994A
Other languages
Japanese (ja)
Other versions
JPH07240344A (en
Inventor
一美 内藤
正二 矢部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko KK
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP02845994A priority Critical patent/JP3505763B2/en
Publication of JPH07240344A publication Critical patent/JPH07240344A/en
Application granted granted Critical
Publication of JP3505763B2 publication Critical patent/JP3505763B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はチップ状固体電解コンデ
ンサに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chip solid electrolytic capacitor.

【0002】[0002]

【従来の技術】従来のチップ状固体電解コンデンサは、
図3及び図4に示すように表面に誘電体酸化皮膜層2を
有するアルミニウム、タンタル、ニオブ等の弁作用金属
からなる平板状の陽極基体1の表面に陽極部となる一部
を除いて半導体層3及び導電体層4を順次積層した固体
電解コンデンサ素子(以下、コンデンサ素子と称する)
5を形成し、次いでこのコンデンサ素子5をリードフレ
ーム6に接続するが、リードフレーム6の2ヶ所の凸部
6a,6bを間隔をおいて対向させ、それぞれの凸部6
a,6bに前記コンデンサ素子5の陽極部7と導電体層
形成部8を載置している。
2. Description of the Related Art A conventional chip-shaped solid electrolytic capacitor is
As shown in FIGS. 3 and 4, a semiconductor is formed on the surface of a flat plate-shaped anode substrate 1 made of a valve metal such as aluminum, tantalum, and niobium, which has a dielectric oxide film layer 2 on the surface except for a part of the anode portion. Solid electrolytic capacitor element in which layer 3 and conductor layer 4 are sequentially stacked (hereinafter referred to as capacitor element)
5, the capacitor element 5 is then connected to the lead frame 6, but the two projecting portions 6a and 6b of the lead frame 6 are opposed to each other with a space therebetween.
The anode part 7 and the conductor layer forming part 8 of the capacitor element 5 are placed on a and 6b.

【0003】そして前者は熔接9などで、後者は銀ペー
スト等の導電材10でリードフレーム6の凸部6a,6
bに電気的、かつ機械的に接続した後、外装樹脂11で
封止してチップ状固体電解コンデンサが構成されてい
る。そしてこの封口した固体電解コンデンサは、容量等
の電気性能を満たすことが要求されるが、この容量は、
前記導電体層形成部8の面積で決定される。即ち、容量
は導電体層形成部の面積が大きいほど大きくなるが、最
大値は外装樹脂の大きさまででありこれが限度となって
いる。
The former is welding 9 and the like is the latter, and the latter is a conductive material 10 such as silver paste.
After being electrically and mechanically connected to b, the chip solid electrolytic capacitor is formed by sealing with the exterior resin 11. And this sealed solid electrolytic capacitor is required to satisfy electric performance such as capacity, but this capacity is
It is determined by the area of the conductor layer forming portion 8. That is, the capacity increases as the area of the conductor layer forming portion increases, but the maximum value is up to the size of the exterior resin, which is the limit.

【0004】[0004]

【発明が解決しようとする課題】ところが外装樹脂の大
きさを一定として、導電体層形成部の大きさを可能なか
ぎり大きくしてコンデンサ素子の容量を大きく取るよう
に試みると作製した固体電解コンデンサの歩留が減少す
るという欠点があった。
However, the solid electrolytic capacitor produced by attempting to make the capacitance of the capacitor element as large as possible by keeping the size of the exterior resin constant and making the size of the conductor layer forming portion as large as possible. However, there was a drawback that the yield of the product decreased.

【0005】[0005]

【課題を解決するための手段】本発明は、前述した問題
点を解決するためになされたもので、その要旨は、陽極
部と導電体層形成部を有する板状の固体電解コンデンサ
素子の前記陽極部と導電体層形成部のそれぞれの面が、
一対の対向して配置された凸部を有するリードフレーム
の前記凸部にそれぞれ載置して接合され、さらに樹脂封
口されているチップ状固体電解コンデンサであって、前
記導電体層形成部の幅と前記リードフレームの凸部の幅
とが実質的に同一寸法であるチップ状固体電解コンデン
サにある。
The present invention has been made to solve the above-mentioned problems, and its gist is to provide a plate-shaped solid electrolytic capacitor element having an anode part and a conductor layer forming part. The respective surfaces of the anode part and the conductor layer forming part are
A chip-shaped solid electrolytic capacitor, which is mounted and bonded to each of the protrusions of a lead frame having a pair of opposingly disposed protrusions, and is further sealed with a resin, wherein the width of the conductor layer forming portion is And the width of the convex portion of the lead frame are substantially the same size.

【0006】以下、本発明について詳細に説明する。本
発明において固体電解コンデンサの陽極として用いられ
る弁作用を有する陽極基体としては、例えばアルミニウ
ム、タンタル及びこれらを基質とする合金等、弁作用を
有する金属がいずれも使用できる。そして陽極基体の形
状としては、平板状のアルミニウムの箔や板があげられ
る。陽極基体の表面に設ける誘電体酸化皮膜層は、弁作
用金属の表面部分に設けられた弁作用金属自体の酸化物
層であってもよく、或は、弁作用金属の表面部分に設け
られた弁作用金属自体の酸化物層であってもよく、或
は、弁作用金属箔の表面上に設けられた他の誘電体酸化
物の層であってもよいが、特に弁作用金属自体の酸化物
からなる層であることが望ましい。
The present invention will be described in detail below. As the anode substrate having a valve action which is used as the anode of the solid electrolytic capacitor in the present invention, any metal having a valve action such as aluminum, tantalum and an alloy having these as a substrate can be used. The shape of the anode substrate may be a flat aluminum foil or plate. The dielectric oxide film layer provided on the surface of the anode substrate may be an oxide layer of the valve action metal itself provided on the surface portion of the valve action metal, or may be provided on the surface portion of the valve action metal. It may be an oxide layer of the valve action metal itself, or a layer of another dielectric oxide provided on the surface of the valve action metal foil, but especially the oxidation of the valve action metal itself. It is desirable that the layer is made of a material.

【0007】本発明では、表面に誘電体酸化皮膜層が形
成された平板状の陽極基体の端部の一区画に陽極部が設
けられており、陽極部とした以外の残りの誘電体酸化皮
膜層上に半導体層を形成させているが、半導体層の種類
には特に制限はなく、従来公知の半導体層が使用でき
る。この中でとりわけ本願出願人の出願による二酸化鉛
と硫酸鉛からなる半導体層(特開昭62−256423
号公報、特開昭63−51621号公報)が、作製した
固体電解コンデンサの高周波性能が良好なために好まし
い。また、テトラチオテトラセンとクロラニルの錯体を
半導体層として形成させる方法(特開昭62−2912
3号公報)、複素5員環高分子化合物にドーパントをド
ープした導電性高分子化合物からなる半導体層(特開昭
60−37114号公報)もその一例である。そして、
このような半導体層上には、例えばカーボンペースト及
び/又は銀ペースト等の従来公知の導電ペースト、半田
等の溶融金属を積層して導電体層を形成して導電体層形
成部を構成している。
In the present invention, the anode part is provided in one section of the end portion of the flat plate-shaped anode substrate having the dielectric oxide film layer formed on the surface thereof, and the remaining dielectric oxide film other than the anode part is provided. Although the semiconductor layer is formed on the layer, the kind of the semiconductor layer is not particularly limited, and a conventionally known semiconductor layer can be used. Among them, among others, a semiconductor layer made of lead dioxide and lead sulfate by the applicant of the present application (Japanese Patent Laid-Open No. 62-256423).
JP-A-63-51621) is preferable because the high frequency performance of the produced solid electrolytic capacitor is good. Also, a method of forming a complex of tetrathiotetracene and chloranil as a semiconductor layer (Japanese Patent Laid-Open No. 62-2912).
3) and a semiconductor layer made of a conductive polymer compound obtained by doping a hetero five-membered ring polymer compound with a dopant (JP-A-60-37114). And
On such a semiconductor layer, a conventionally known conductive paste such as carbon paste and / or silver paste, or a molten metal such as solder is laminated to form a conductor layer to form a conductor layer forming portion. There is.

【0008】また本発明においては、前述した陽極部と
導電体層形成部との界面に絶縁性樹脂によってはち巻き
状に樹脂層部をあらかじめ形成しておくと、半導体層を
形成するときに半導体層の形成面積が一定しバラツキの
少ない容量のものが得られる。次に、このように導電体
層まで形成されたコンデンサ素子を一対の対向して配置
されたリードフレームに接続する方法を説明する。図1
は、固体電解コンデンサ素子5をリードフレーム6に接
続した状態を示す平面図である。図1において、陽極基
体1の表面に誘電体酸化皮膜層2が形成されており、そ
の上に半導体層3、さらにその上に導電体層4が形成さ
れた固体電解コンデンサ素子5の陽極部7と導電体層形
成部8とがリードフレーム6の凸部6a,6bに各々載
置接合されているが、前記導電体層形成部8の幅と前記
リードフレームの凸部6bの幅とが実質的に同一寸法に
設計することが肝要である。図2は、図1の断面図であ
る。
Further, in the present invention, when the resin layer portion is formed in advance in a spiral shape with an insulating resin at the interface between the above-mentioned anode portion and the conductor layer forming portion, the semiconductor layer is formed when the semiconductor layer is formed. It is possible to obtain a capacitor having a constant layer formation area and a small variation. Next, a method of connecting the capacitor element thus formed up to the conductor layer to the pair of lead frames arranged so as to face each other will be described. Figure 1
FIG. 4 is a plan view showing a state in which the solid electrolytic capacitor element 5 is connected to the lead frame 6. In FIG. 1, a dielectric oxide film layer 2 is formed on the surface of an anode substrate 1, a semiconductor layer 3 is formed on the dielectric oxide film layer 2, and a conductor layer 4 is formed thereon. The conductor layer forming portion 8 and the conductor layer forming portion 8 are respectively mounted and joined to the protrusions 6a and 6b of the lead frame 6, and the width of the conductor layer forming portion 8 and the width of the protrusion portion 6b of the lead frame are substantially the same. It is important to design the same size. FIG. 2 is a sectional view of FIG.

【0009】このようにしてリードフレームに載置され
たコンデンサ素子は、陽極部は熔接、導電ペースト、半
田等で接続し、一方導電体層形成部は導電ペースト、半
田等で接続した後、リードフレームの一部を残してエポ
キシ樹脂等の外装樹脂11によりトランスファー成形機
などで封止成形を行って固体電解コンデンサとしてい
る。本発明では、このような外装樹脂の封止時に溶融樹
脂が導電体層形成部に当たり、リードフレーム6の横側
部を支点として曲げ応力が働かないように導電体層形成
部8の幅とリードフレームの凸部6bの幅とを実質的に
同一寸法に設計している。
In the capacitor element thus mounted on the lead frame, the anode portion is connected by welding, conductive paste, solder or the like, while the conductor layer forming portion is connected by conductive paste, solder or the like, and then the lead is formed. Sealing molding is performed by a transfer molding machine or the like with an exterior resin 11 such as an epoxy resin, leaving a part of the frame, to obtain a solid electrolytic capacitor. In the present invention, the molten resin hits the conductor layer forming portion at the time of encapsulating the exterior resin, and the width of the conductor layer forming portion 8 and the leads are prevented so that bending stress does not work with the lateral side portion of the lead frame 6 as a fulcrum. The width of the convex portion 6b of the frame is designed to have substantially the same size.

【0010】[0010]

【作用】コンデンサ素子の導電体層形成部の幅とリード
フレームの凸部の幅とが実質的に同一寸法であるので、
樹脂封口時の劣化が緩和される。
Since the width of the conductor layer forming portion of the capacitor element and the width of the convex portion of the lead frame are substantially the same,
The deterioration at the time of sealing the resin is alleviated.

【0011】[0011]

【実施例】以下、実施例および比較例を示し、本発明を
さらに詳しく説明する。 実施例1〜3、比較例1,2 りん酸とりん酸アンモニウム水溶液中で化成処理して表
面に誘電体酸化皮膜層を形成した45μF/cm2 のア
ルミニウムエッチング箔(以下、化成箔と称する。)の
小片を表1のように取り出し、表1に併記した陽極部を
除いた残りの部分を酢酸鉛三水和物2.4モル/l水溶
液と過硫酸アンモニウム4.0モル/l水溶液の混合液
に浸漬し、60℃で20分放置し、二酸化鉛と硫酸鉛か
らなる半導体層を形成した。このような操作を3回行っ
た後、半導体層上にカーボンペースト及び銀ペーストを
順に積層して導電体層を形成し、コンデンサ素子を作製
した。コンデンサ素子の導電体層形成部の幅を表1に併
記した。一方、別に用意した表1に併記した幅の凸部を
もつリードフレーム(材質42アロイ、半田メッキ、厚
み0.1mm)の該両凸部にコンデンサ素子の陽極部と
導電体層形成部のそれぞれの面を各々載置し、前者は熔
接で、後者は銀ペーストで接続した。その後、エポキシ
樹脂を用いてトランスファー成形して外形寸法7mm×
4.3mm×2.8mmのチップ状固体電解コンデンサ
を作製した。
EXAMPLES The present invention will be described in more detail with reference to Examples and Comparative Examples. Examples 1 to 3 and Comparative Examples 1 and 45 45 μF / cm 2 aluminum etching foil (hereinafter referred to as chemical conversion foil) having chemical conversion treatment in phosphoric acid and ammonium phosphate aqueous solution to form a dielectric oxide film layer on the surface. ) Is taken out as shown in Table 1, and the remaining portion except for the anode portion shown in Table 1 is mixed with a 2.4 mol / l aqueous solution of lead acetate trihydrate and a 4.0 mol / l aqueous solution of ammonium persulfate. It was immersed in the liquid and left at 60 ° C. for 20 minutes to form a semiconductor layer composed of lead dioxide and lead sulfate. After performing such an operation three times, a carbon paste and a silver paste were sequentially laminated on the semiconductor layer to form a conductor layer, and a capacitor element was manufactured. Table 1 also shows the width of the conductor layer forming portion of the capacitor element. On the other hand, each of the anode part of the capacitor element and the conductor layer forming part is formed on both of the convex parts of the lead frame (material 42 alloy, solder plating, thickness 0.1 mm) having the convex parts of the width shown in Table 1 separately prepared. The respective surfaces were placed, and the former was connected by welding and the latter was connected by silver paste. After that, transfer molding is performed using epoxy resin, and external dimensions are 7 mm x
A 4.3 mm x 2.8 mm chip solid electrolytic capacitor was produced.

【0012】実施例4〜6、比較例3,4 実施例1〜3、比較例1,2で、半導体層を酢酸鉛三水
和物2.0モル/l水溶液に化成箔を浸漬して、別に用
意した白金陰極との間で電気化学的に形成した二酸化鉛
にした以外は、実施例1〜3、比較例1,2と同様にし
てチップ状固体電解コンデンサをそれぞれ作製した。以
上のように作製した固体電解コンデンサの歩留と電気性
能を表2に示した。なお、各実施例又は比較例は全数値
n=30点の平均値であり、歩留は漏れ電流値が0.2
μA(10V)以下の個数の割合である。なお、これま
で単層の固体電解コンデンサを例にとって本発明の内容
を具体的に説明してきたが、本発明は積層の固体電解コ
ンデンサにも適用できることはいうまでもない。
Examples 4 to 6 and Comparative Examples 3 and 4 In Examples 1 to 3 and Comparative Examples 1 and 2, the semiconductor layer was immersed in a 2.0 mol / l aqueous solution of lead acetate trihydrate to immerse the chemical conversion foil. Chip-shaped solid electrolytic capacitors were produced in the same manner as in Examples 1 to 3 and Comparative Examples 1 and 2, except that lead dioxide that was electrochemically formed between a separately prepared platinum cathode was used. Table 2 shows the yield and electrical performance of the solid electrolytic capacitors manufactured as described above. Each of the examples or comparative examples is an average value of all numerical values n = 30 points, and the yield is 0.2 for the leakage current value.
It is the ratio of the number of μA (10 V) or less. Although the content of the present invention has been specifically described so far by taking a single-layer solid electrolytic capacitor as an example, it goes without saying that the present invention can also be applied to a laminated solid electrolytic capacitor.

【0013】[0013]

【表1】 [Table 1]

【0014】[0014]

【表2】 [Table 2]

【0015】[0015]

【発明の効果】本発明のチップ状固体電解コンデンサ
は、コンデンサ素子の導電体層形成部の幅とリードフレ
ームの凸部の幅とが実質的に同一寸法で設計されている
ため、歩留が良好である。
The chip-type solid electrolytic capacitor of the present invention is designed so that the width of the conductive layer forming portion of the capacitor element and the width of the convex portion of the lead frame are designed to be substantially the same, and therefore the yield is improved. It is good.

【図面の簡単な説明】[Brief description of drawings]

【図1】固体電解コンデンサ素子をリードフレームに接
続した状態を示す平面図である。
FIG. 1 is a plan view showing a state in which a solid electrolytic capacitor element is connected to a lead frame.

【図2】固体電解コンデンサ素子をリードフレームに接
続した状態を示す断面図である。
FIG. 2 is a cross-sectional view showing a state in which a solid electrolytic capacitor element is connected to a lead frame.

【図3】従来のチップ状固体電解コンデンサをリードフ
レームに載置した状態を示す平面図である。
FIG. 3 is a plan view showing a state where a conventional chip-shaped solid electrolytic capacitor is mounted on a lead frame.

【図4】従来のチップ状固体電解コンデンサをリードフ
レームに載置した状態を示す断面図である。
FIG. 4 is a cross-sectional view showing a state where a conventional chip solid electrolytic capacitor is mounted on a lead frame.

【符号の説明】[Explanation of symbols]

1 陽極基体 2 誘電体酸化皮膜層 3 半導体層 4 導電体層 5 固体電解コンデンサ素子 6a リードフレームの凸部(陽極部が載置される側) 6b リードフレームの凸部(導電体層形成部が載置さ
れる側) 7 陽極部 8 導電体層形成部 9 熔接 10 導電材 11 外装樹脂
DESCRIPTION OF SYMBOLS 1 Anode substrate 2 Dielectric oxide film layer 3 Semiconductor layer 4 Conductor layer 5 Solid electrolytic capacitor element 6a Convex part of lead frame (side on which anode part is mounted) 6b Convex part of lead frame (conducting conductor layer forming part) Mounted side) 7 Anode part 8 Conductor layer forming part 9 Welding 10 Conductive material 11 Exterior resin

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01G 9/012 H01G 9/04 H01G 9/15 ─────────────────────────────────────────────────── ─── Continued Front Page (58) Fields surveyed (Int.Cl. 7 , DB name) H01G 9/012 H01G 9/04 H01G 9/15

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 陽極部と導電体層形成部を有する板状の
固体電解コンデンサ素子の前記陽極部と導電体層形成部
のそれぞれの面が、一対の対向して配置された凸部を有
するリードフレームの前記凸部にそれぞれ載置して接合
され、さらに樹脂封口されているチップ状固体電解コン
デンサであって、前記導電体層形成部の幅と前記リード
フレームの凸部の幅とが実質的に同一寸法であることを
特徴とするチップ状固体電解コンデンサ。
1. A plate-shaped solid electrolytic capacitor element having an anode portion and a conductor layer forming portion, each surface of the anode portion and the conductor layer forming portion having a pair of convex portions arranged to face each other. A chip-shaped solid electrolytic capacitor placed and bonded to each of the protrusions of the lead frame and further sealed with a resin, wherein the width of the conductor layer forming portion and the width of the protrusion of the lead frame are substantially equal to each other. Chip-shaped solid electrolytic capacitor having the same dimensions.
【請求項2】 導電体層形成部が、弁作用を有する陽極
基体の表面に誘電体酸化皮膜層、半導体層、導電体層を
順次積層して設けることを特徴とする請求項1に記載の
チップ状固体電解コンデンサ。
2. An anode in which a conductor layer forming portion has a valve action.
Dielectric oxide film layer, semiconductor layer, conductor layer on the surface of the substrate
The device according to claim 1, wherein the layers are sequentially laminated.
Chip solid electrolytic capacitor.
【請求項3】 半導体層が、複素5員環高分子化合物に
ドーパントをドープした導電性高分子化合物からなる半
導体層である請求項2に記載のチップ状固体電解コンデ
ンサ。
3. A semiconductor layer comprising a hetero five-membered ring polymer compound
Half made of conductive polymer compound doped with dopant
The chip-shaped solid electrolytic capacitor according to claim 2, which is a conductor layer.
Nsa.
JP02845994A 1994-02-25 1994-02-25 Chip-shaped solid electrolytic capacitor Expired - Lifetime JP3505763B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02845994A JP3505763B2 (en) 1994-02-25 1994-02-25 Chip-shaped solid electrolytic capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02845994A JP3505763B2 (en) 1994-02-25 1994-02-25 Chip-shaped solid electrolytic capacitor

Publications (2)

Publication Number Publication Date
JPH07240344A JPH07240344A (en) 1995-09-12
JP3505763B2 true JP3505763B2 (en) 2004-03-15

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP02845994A Expired - Lifetime JP3505763B2 (en) 1994-02-25 1994-02-25 Chip-shaped solid electrolytic capacitor

Country Status (1)

Country Link
JP (1) JP3505763B2 (en)

Also Published As

Publication number Publication date
JPH07240344A (en) 1995-09-12

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