JPH05217811A - Chip-shaped solid electrolytic capacitor and its manufacture - Google Patents

Chip-shaped solid electrolytic capacitor and its manufacture

Info

Publication number
JPH05217811A
JPH05217811A JP1531892A JP1531892A JPH05217811A JP H05217811 A JPH05217811 A JP H05217811A JP 1531892 A JP1531892 A JP 1531892A JP 1531892 A JP1531892 A JP 1531892A JP H05217811 A JPH05217811 A JP H05217811A
Authority
JP
Japan
Prior art keywords
anode
solid electrolytic
electrolytic capacitor
holes
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1531892A
Other languages
Japanese (ja)
Inventor
Kazumi Naito
一美 内藤
Shoji Yabe
正二 矢部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP1531892A priority Critical patent/JPH05217811A/en
Publication of JPH05217811A publication Critical patent/JPH05217811A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/008Terminals
    • H01G9/012Terminals specially adapted for solid capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • H01G9/048Electrodes or formation of dielectric layers thereon characterised by their structure

Abstract

PURPOSE:To make the leakage current value of the title capacitor good by a method wherein metal sheets are used as spacers between anode parts for anode base bodies, through holes are made in the anode parts and the metal bodies and the anode bodies and the metal bodies are bonded by using a conductive material via the through holes. CONSTITUTION:Individual capacitor elements are mounted and arranged in such a way that holes 7 in anode parts 3 for the capacitor elements 2 coincide at least partly with holes 7 in metal sheets 8; after that, a conductive material 6 is injected so as to bury the holes 7; in addition, the conductive material is dried and hardened; the capacitor elements are united and laminated. Then, the bottom part of a conductor- layer formation part 4 for the laminated capacitor elements 2 and the metal sheets 8 are mounted and arranged on protrusion parts 1b, 1a at individual lead frames; they are connected electrically and mechanically by using a conductive paste or the like. Then, the solid electrolytic capacitor elements connected to the lead frames are sealed and molded by using an outer-package resin 5; after that, the protrusion parts at the lead frames are cut near the capacitor elements. Thereby, it is possible to obtain a chip-shaped solid electrolytic capacitor whose leakage current is good.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はチップ状の固体電解コン
デンサおよびその製法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chip-shaped solid electrolytic capacitor and its manufacturing method.

【0002】[0002]

【従来の技術】電子機器の軽薄短小化に伴い、それに使
用する電子部品の1種である固体電解コンデンサにおい
ても小型化が要求されているが、一般には図3で示した
ような積層型のチップ形状によって小型化の要求に対応
している。
2. Description of the Related Art As electronic devices become lighter, thinner, shorter, and smaller, miniaturization is also required for solid electrolytic capacitors, which is one type of electronic component used for the electronic devices. Generally, a laminated type as shown in FIG. 3 is used. The chip shape meets the demand for miniaturization.

【0003】同図は従来のチップ形状の固体電解コンデ
ンサを示す斜視図であるが、外装樹脂5の内部にある固
体電解コンデンサ素子2が複数枚方向を揃えて配置され
ており、コンデンサ素子2の陽極部3と素子の表面に形
成された導電体層形成部4の底面とをそれぞれ一対の対
向して配置されたリードフレームの陽極リード引出し部
である凸部1aと陰極リード引出し部である凸部1bに
載置して接合された状態を示しており、別に用意したエ
ポキシ樹脂等の外装樹脂5によって封口されている。
FIG. 1 is a perspective view showing a conventional solid electrolytic capacitor having a chip shape. A plurality of solid electrolytic capacitor elements 2 inside an exterior resin 5 are arranged in the same direction, and The anode part 3 and the bottom surface of the conductor layer forming part 4 formed on the surface of the element are paired so as to face each other. It shows a state in which it is placed on the portion 1b and joined to it, and is sealed by a separately prepared exterior resin 5 such as an epoxy resin.

【0004】[0004]

【発明が解決しようとする課題】前述したコンデンサ素
子の導電体層形成部は、アルミニウム箔等の陽極基体の
表面に半導体層および導電体層が積層されているため、
陽極部よりも厚みが厚くなっている。従ってこの厚みの
差は、このコンデンサ素子を複数枚、例えば導電体層形
成部同志を重ねた場合により顕著になり、極端な時に
は、陽極部間に隙間が生じる。
In the conductor layer forming portion of the capacitor element described above, since the semiconductor layer and the conductor layer are laminated on the surface of the anode substrate such as aluminum foil,
It is thicker than the anode part. Therefore, this difference in thickness becomes more remarkable when a plurality of capacitor elements, for example, the conductor layer forming portions are stacked, and in extreme cases, a gap is generated between the anode portions.

【0005】このような隙間の存在を防ぐために隙間と
同程度の厚みのスペーサーを入れることが考えられる
が、スペーサーと陽極部とを充分に接続することが困難
なため、外装樹脂で封止成形を行うとスペーサーと陽極
部の隙間に外装樹脂が入り込み、その結果、作製した固
体電解コンデンサの漏れ電流を上昇させるという問題点
があった。
In order to prevent the existence of such a gap, it is conceivable to insert a spacer having a thickness similar to that of the gap, but it is difficult to sufficiently connect the spacer and the anode part, and therefore, sealing molding is performed with an exterior resin. However, there is a problem that the exterior resin enters the gap between the spacer and the anode portion, and as a result, the leakage current of the produced solid electrolytic capacitor is increased.

【0006】[0006]

【課題を解決するための手段】本発明者等は前述した問
題点を解決するために鋭意研究した結果、各コンデンサ
素子の陽極部の間に金属板を設け、陽極部と金属板とを
積層して連通した貫通孔に導電材を充填して積層、接続
した固体電解コンデンサは漏れ電流値が良好であること
を見い出し本発明を完成させるに至った。
The inventors of the present invention have conducted extensive studies to solve the above-mentioned problems, and as a result, provided a metal plate between the anode parts of each capacitor element and laminated the anode part and the metal plate. Then, it was found that the solid electrolytic capacitor in which the through holes communicating with each other were filled with a conductive material and laminated and connected had a good leakage current value, and the present invention was completed.

【0007】即ち、本発明の要旨は表面に誘電体酸化皮
膜層を有する平板状の弁作用金属からなる陽極基体の端
部を陽極部とし、この陽極基体の残部の前記誘電体酸化
皮膜層上に半導体層、その上に導電体層が形成された導
電体層形成部を有する複数枚の固体電解コンデンサ素子
の前記陽極部と導電体層形成部とがそれぞれ積層されて
リード端子に接続され、外装樹脂で封止成形されている
固体電解コンデンサにおいて、
That is, the gist of the present invention is to use the end of an anode substrate made of a flat valve metal having a dielectric oxide film layer on the surface as an anode part, and the remainder of the anode substrate on the dielectric oxide film layer. In the semiconductor layer, the anode portion and the conductor layer forming portion of a plurality of solid electrolytic capacitor elements having a conductor layer forming portion on which a conductor layer is formed are respectively laminated and connected to a lead terminal, In a solid electrolytic capacitor that is sealed and molded with exterior resin,

【0008】前記それぞれの固体電解コンデンサ素子の
陽極部および陽極部とリード端子との間には金属板が嵌
挿されて前記陽極部と金属板とは電気的に接続されてお
り、全ての前記陽極部と金属板とは積層した状態で互い
に連通する貫通孔を有し、この貫通孔に導電材が充填さ
れているチップ状固体電解コンデンサにあり、
A metal plate is fitted and inserted between the anode part and the anode part of each of the solid electrolytic capacitor elements and the lead terminal so that the anode part and the metal plate are electrically connected to each other. The anode part and the metal plate have through holes communicating with each other in a laminated state, and there is a chip-shaped solid electrolytic capacitor in which a conductive material is filled in the through holes,

【0009】また、積層された前記陽極部の外周部が導
電ペーストで覆われているチップ状固体電解コンデンサ
である。
Further, the chip-shaped solid electrolytic capacitor has an outer peripheral portion of the laminated anode portions covered with a conductive paste.

【0010】さらに、表面に誘電体酸化皮膜層を有する
平板状の弁作用金属からなる陽極基体の端部に、貫通孔
を有する陽極部を設け、この陽極基体の残部の前記誘電
体酸化皮膜層上に半導体層、その上に導電体層を形成し
て導電体層形成部を有する固体電解コンデンサ素子と
し、前記陽極部に重ねた状態で貫通孔が互いに連通する
貫通孔を有する金属板を接合した後、これら素子を前記
陽極部と金属板との貫通孔が全て連通するように複数枚
積層して前記貫通孔に導電材を充填し、前記陽極部の金
属板と前記導電体層形成部とにリード端子を接続して外
装樹脂で封止成形するチップ状固体電解コンデンサの製
法であり、
Further, an anode portion having a through hole is provided at an end of an anode base made of a flat valve metal having a dielectric oxide coating layer on the surface, and the remaining dielectric oxide coating layer of the anode base is provided. A solid electrolytic capacitor element having a semiconductor layer thereon and a conductor layer formed thereon to have a conductor layer forming portion is joined, and a metal plate having through-holes through which the through-holes communicate with each other in a state of being stacked on the anode portion is joined. After that, a plurality of these elements are stacked so that the through holes of the anode part and the metal plate are all in communication, and the through holes are filled with a conductive material, and the metal plate of the anode part and the conductor layer forming part are formed. It is a method of manufacturing a chip solid electrolytic capacitor in which lead terminals are connected to

【0011】前記陽極部の貫通孔が半導体層を形成した
後または導電体層を形成した後に設けてもよく、また前
記積層した固体電解コンデンサ素子の陽極部の外周部を
導電ペーストで覆った後、外装樹脂で封止するチップ状
固体電解コンデンサの製法にある。
The through hole of the anode part may be provided after forming the semiconductor layer or after forming the conductor layer, and after covering the outer peripheral part of the anode part of the laminated solid electrolytic capacitor element with a conductive paste. , A method of manufacturing a chip solid electrolytic capacitor which is sealed with an exterior resin.

【0012】以下、本発明について詳細に説明する。本
発明において固体電解コンデンサの陽極として用いられ
る弁作用を有する陽極基体としては、例えばアルミニウ
ム、タンタル、およびこれらを基質とする合金等、弁作
用を有する金属がいずれも使用できる。そして陽極基体
の形状としては平板状のアルミニウムの箔や板が挙げら
れる。
The present invention will be described in detail below. As the anode substrate having a valve action which is used as the anode of the solid electrolytic capacitor in the present invention, any metal having a valve action such as aluminum, tantalum, and an alloy having these as a substrate can be used. The shape of the anode substrate may be a flat aluminum foil or plate.

【0013】陽極基体の表面に設ける誘電体酸化皮膜層
は、弁作用金属の表面部分に設けられた弁作用金属自体
の酸化物層であってもよく、或は弁作用金属箔の表面上
に設けられた他の誘電体酸化物の層であってもよいが、
特に弁作用金属自体の酸化物からなる層であることが望
ましい。
The dielectric oxide film layer provided on the surface of the anode substrate may be an oxide layer of the valve action metal itself provided on the surface portion of the valve action metal, or on the surface of the valve action metal foil. It may be another dielectric oxide layer provided,
In particular, a layer made of an oxide of the valve metal itself is desirable.

【0014】本発明では、表面に誘電体酸化皮膜層が形
成された平板状の陽極基体の端部の一区画に陽極部を設
けており、さらにこの陽極部の所定位置に貫通孔を設け
ていることが肝要である。貫通孔は陽極基体に誘電体酸
化皮膜層を形成する前後であっても良いし、後述するよ
うな半導体層や導電体層を形成する前後または中間の過
程で設けてもよい。孔の大きさは、陽極部の大きさ、陽
極基体の積層枚数によって異なるため予備実験によって
決められる。また孔の形状は丸、四角形、楕円形等公知
のどのような形状でも差し支えない。孔の個数は複数個
でもよい。
In the present invention, the anode part is provided in one section of the end portion of the flat plate-shaped anode substrate having the dielectric oxide film layer formed on the surface thereof, and the through hole is provided at a predetermined position of the anode part. It is essential to be present. The through holes may be provided before or after the formation of the dielectric oxide film layer on the anode substrate, or may be provided before or after the formation of the semiconductor layer or the conductor layer, which will be described later, or in the intermediate process. The size of the holes depends on the size of the anode part and the number of laminated anode substrates, and is determined by preliminary experiments. The shape of the holes may be any known shape such as a circle, a quadrangle, and an ellipse. The number of holes may be plural.

【0015】次に本発明では、前記陽極部の所定位置
に、陽極部と同様に貫通孔を有する金属板をその孔の一
部に少なくとも陽極部の孔が一致するように載置して、
孔の無い部分で熔接等で機械的かつ電気的に接合されて
おり、金属板の孔は陽極部の孔より大きい方が好まし
い。陽極部と金属板を載置して接合する時期は、陽極部
に誘電体酸化皮膜層を形成する前後、または半導体層や
導電体層を形成する前後またその中間のどの時期でもよ
い。金属板の孔の形状も、丸、四角形、楕円形等公知の
どのような形状でも差し支えない。
Next, in the present invention, a metal plate having a through hole is placed at a predetermined position on the anode part so that at least the hole of the anode part is aligned with a part of the hole,
It is preferable that the holes of the metal plate are larger than the holes of the anode part because they are mechanically and electrically joined by welding or the like at the portions without holes. The time when the anode part and the metal plate are placed and bonded may be before or after the formation of the dielectric oxide film layer on the anode part, before or after the formation of the semiconductor layer or the conductor layer, or in the middle thereof. The shape of the holes of the metal plate may be any known shape such as a circle, a quadrangle, and an ellipse.

【0016】使用する金属板の材質として、鉄、ニッケ
ル、銅、またはこれらの合金等が挙げられ、その厚さは
後述する半導体層および導電体層の厚さと同程度にする
ことが好ましいため、予備実験によって決定されるが、
通常0.05mm、乃至1mmの金属箔である。金属板
の大きさは、陽極部の大きさとほぼ等しい程度であり、
コンデンサ素子の導電体層形成部と接触しないように設
計される。そして陽極部と金属板の接合は、熔接等で行
われている。
Examples of the material of the metal plate used include iron, nickel, copper, and alloys thereof, and it is preferable that the thickness thereof is approximately the same as the thickness of the semiconductor layer and the conductor layer described later. Although determined by preliminary experiments,
It is usually a metal foil of 0.05 mm to 1 mm. The size of the metal plate is about the same as the size of the anode part,
It is designed so as not to come into contact with the conductor layer forming portion of the capacitor element. The joining of the anode part and the metal plate is performed by welding or the like.

【0017】次に、陽極部とした以外の残りの誘電体酸
化皮膜層上に半導体層を形成させているが、半導体層の
種類には特に制限は無く、従来公知の半導体層が使用で
きるが、とりわけ本願出願人の出願による二酸化鉛また
は二酸化鉛と硫酸鉛からなる半導体層(特開昭62−2
56423号公報、特開昭63−51621号公報)
が、作製した固体電解コンデンサの高周波性能が良好な
ために好ましい。
Next, a semiconductor layer is formed on the remaining dielectric oxide film layer other than the anode portion, but the kind of semiconductor layer is not particularly limited, and a conventionally known semiconductor layer can be used. In particular, a semiconductor layer composed of lead dioxide or lead dioxide and lead sulfate according to the applicant's application (Japanese Patent Laid-Open No. 62-2
56423, JP-A-63-51621)
However, the high frequency performance of the produced solid electrolytic capacitor is favorable, which is preferable.

【0018】また、テトラチオテトラセンとクロラニル
の錯体を半導体層として形成させる方法(特開昭62−
29123号公報)やタリウムイオンおよび過硫酸イオ
ンを含んだ反応母液から化学的に酸化第2タリウムを半
導体層として析出させる方法(特開昭62−38715
号公報)もその一例である。
Also, a method of forming a complex of tetrathiotetracene and chloranil as a semiconductor layer (Japanese Patent Laid-Open No. 62-62-62).
29123) or a reaction mother liquor containing thallium ions and persulfate ions to chemically deposit thallium oxide as a semiconductor layer (JP-A-62-38715).
(Gazette) is one example.

【0019】そしてこのような半導体層上には、例えば
カーボンペーストおよび/または銀ペースト等の従来公
知の導電ペーストを積層して導電体層を形成して導電体
層形成部を構成している。
On such a semiconductor layer, a known conductive paste such as carbon paste and / or silver paste is laminated to form a conductive layer to form a conductive layer forming portion.

【0020】次に、このように導電体層まで形成された
コンデンサ素子を複数枚方向を揃えて積層する方法を説
明する。図2は、積層したコンデンサ素子を導電材6で
接合した状態を示す断面図である。
Next, a method of laminating a plurality of capacitor elements having conductor layers formed in this way will be described. FIG. 2 is a cross-sectional view showing a state in which the laminated capacitor elements are joined by the conductive material 6.

【0021】同図において、コンデンサ素子2の陽極部
3の孔7が金属板8の孔7の一部に少なくとも一致する
ように各コンデンサ素子を載置した後、導電材6によっ
て孔7を埋めるように注入し、さらに乾燥硬化すること
によって一体化して積層したコンデンサ素子としてい
る。積層したコンデンサ素子は、さらに各コンデンサ素
子2同志の接続を強固にするため、各コンデンサ素子の
導電体層形成部のみを、例えば銀ペースト等の導電材浴
に浸漬し、乾燥硬化することにより一体化を計っても良
い。前述した導電材6としては、銀ペースト等の公知の
導電ペースト、クリーム半田等の溶融可能金属が挙げら
れる。
In the figure, after placing each capacitor element so that the hole 7 of the anode portion 3 of the capacitor element 2 at least partially matches the hole 7 of the metal plate 8, the hole 7 is filled with the conductive material 6. In this way, the capacitor element is integrally laminated by injecting and further drying and curing. In order to further strengthen the connection between each capacitor element 2, the laminated capacitor elements are integrated by immersing only the conductor layer forming portion of each capacitor element in a conductive material bath such as silver paste and drying and hardening. You can measure it. Examples of the above-mentioned conductive material 6 include known conductive paste such as silver paste, and meltable metal such as cream solder.

【0022】また図1は、上述の積層したコンデンサ素
子をリードフレームに載置してリード端子に接続した状
態を示す斜視図である。積層したコンデンサ素子2の導
電体層形成部4の底部と金属板8とを各々リードフレー
ムの凸部1b、1aに載置し、導電ペースト等により電
気的かつ機械的に接続されている。
FIG. 1 is a perspective view showing a state in which the above-mentioned laminated capacitor elements are placed on a lead frame and connected to lead terminals. The bottom of the conductor layer forming portion 4 of the laminated capacitor element 2 and the metal plate 8 are placed on the protrusions 1b and 1a of the lead frame, respectively, and are electrically and mechanically connected by a conductive paste or the like.

【0023】このようにしてリードフレームに接続され
た固体電解コンデンサ素子はエポキシ樹脂等の外装樹脂
5により、トランスファー成形機などで封止成形を行っ
た後、リードフレームの凸部をコンデンサ素子の近辺で
切断してチップ状の固体電解コンデンサとしている。
The solid electrolytic capacitor element thus connected to the lead frame is sealed and molded by a transfer molding machine or the like with the exterior resin 5 such as an epoxy resin, and then the convex portion of the lead frame is placed near the capacitor element. It is cut by to make a chip-shaped solid electrolytic capacitor.

【0024】[0024]

【作用】コンデンサ素子の陽極部に貫通孔を設け、同様
に貫通孔を有する金属板の孔の一部に少なくとも陽極部
の孔の一部が一致するように載置した後、孔の無い部分
で接合し、次いで各コンデンサ素子を方向を揃えて重
ね、各コンデンサ素子の孔を通して導電材で接合してい
ることにより、陽極部と金属板との接合が良好になり、
陽極部と金属箔との隙間が少なくなる。
By providing a through hole in the anode part of the capacitor element and placing the same so that at least a part of the hole of the anode part is aligned with a part of the hole of the metal plate having the through hole, a part without a hole is formed. , Then each capacitor element is aligned in the same direction and stacked, and the conductive material is bonded through the holes of each capacitor element, which improves the bonding between the anode part and the metal plate.
The gap between the anode part and the metal foil is reduced.

【0025】[0025]

【実施例】以下、実施例および比較例を示して本発明を
さらに詳しく説明する。 実施例1〜3 りん酸とりん酸アンモニウム水溶液中で化成処理して表
面に誘電体酸化皮膜層を形成した45μF/cm2 のア
ルミニウムエッチング箔(以下、化成箔と称する。)の
小片5×3mmを用意した。この化成箔の端から2×3
mmの部分を陽極部とし、表1に示した位置にそれぞれ
の大きさの貫通孔を設けた。
EXAMPLES The present invention will be described in more detail with reference to Examples and Comparative Examples. Examples 1 to 3 Small pieces of 45 μF / cm 2 aluminum etching foil (hereinafter referred to as chemical conversion foil) having a dielectric oxide film layer formed on the surface by chemical conversion treatment in phosphoric acid and ammonium phosphate aqueous solution 5 × 3 mm. Prepared. 2 × 3 from the edge of this formed foil
The mm portion was used as the anode portion, and through holes of each size were provided at the positions shown in Table 1.

【0026】一方、別に用意した厚さ0.1mm、大き
さ1.5×3mm、孔の大きさを表1に示したニッケル
箔を用意し、孔の中心が重なるように、化成箔と金属箔
を重ね、孔の無い部分で化成箔の陽極部と金属箔をスポ
ット熔接で接続した。このような化成箔の陽極部を除い
た残り3×3mmの部分を酢酸鉛三水和物2.4モル/
lの水溶液と過硫酸アンモニウム4.0モル/lの水溶
液の混合液に浸漬し、60℃で20分放置し、二酸化鉛
と硫酸鉛からなる半導体層を形成した。
On the other hand, separately prepared nickel foil having a thickness of 0.1 mm, a size of 1.5 × 3 mm, and a hole size shown in Table 1 was prepared, and the chemical conversion foil and the metal were made so that the centers of the holes overlap. The foils were stacked, and the anode part of the formed foil and the metal foil were connected by spot welding at the portion without holes. The remaining 3 × 3 mm portion of the formed foil excluding the anode portion is 2.4 mol of lead acetate trihydrate /
It was immersed in a mixed solution of an aqueous solution of 1 and an aqueous solution of ammonium persulfate of 4.0 mol / l and left at 60 ° C. for 20 minutes to form a semiconductor layer composed of lead dioxide and lead sulfate.

【0027】このような操作を3回行った後、半導体層
上にカーボンペーストおよび銀ペーストを順に積層して
導電体層を形成し、コンデンサ素子を作製した。このよ
うなコンデンサ素子を4枚方向を揃えて重ね、陽極部と
金属箔の孔の部分を通して銀ペーストで接合し積層コン
デンサ素子を作製した。
After performing such an operation three times, a carbon paste and a silver paste were sequentially laminated on the semiconductor layer to form a conductor layer, and a capacitor element was manufactured. Four such capacitor elements were aligned in the same direction, and laminated with a silver paste through the anode part and the hole portion of the metal foil to produce a laminated capacitor element.

【0028】さらに積層したコンデンサ素子の導電体層
形成部を銀ペースト浴に浸漬し乾燥硬化することによっ
て、導電体層形成部も一体化した。次いで、積層コンデ
ンサ素子の導電体層形成部の底部と陽極部の最下部の金
属箔を、別に用意した一対の幅3mmの凸部を有するリ
ードフレームの各凸部に載置し、銀ペーストで電気的か
つ機械的に接続した。そして、エポキシ樹脂を用いてト
ランスファー成形してチップ状固体電解コンデンサを作
製した。
Further, the conductor layer forming portion of the laminated capacitor element was immersed in a silver paste bath and dried and hardened to integrate the conductor layer forming portion. Next, the bottom of the conductor layer forming portion of the multilayer capacitor element and the metal foil at the bottom of the anode portion are placed on the respective convex portions of a separately prepared lead frame having a convex portion with a width of 3 mm, and silver paste is used. Electrically and mechanically connected. Then, transfer molding was performed using an epoxy resin to produce a chip solid electrolytic capacitor.

【0029】実施例4〜6 実施例1〜3で、金属箔の材質を42アロイにし、さら
に半導体層を酢酸鉛三水和物2.0モル/l水溶液に化
成箔を浸漬して、別に用意した白金陰極との間で電気化
学的に形成した二酸化鉛にした以外は、実施例1〜3と
同様にしてチップ状固体電解コンデンサをそれぞれ作製
した。
Examples 4 to 6 In Examples 1 to 3, the metal foil was made of 42 alloy, and the semiconductor layer was immersed in a 2.0 mol / l aqueous solution of lead acetate trihydrate and the chemical conversion foil was separately prepared. Chip-shaped solid electrolytic capacitors were produced in the same manner as in Examples 1 to 3 except that lead dioxide was electrochemically formed between the prepared cathode and platinum.

【0030】比較例1 貫通孔のない化成箔と金属箔を用い、それぞれ4枚の化
成箔と金属箔を交互に重ね合わせて陽極部と金属箔とを
一度にスポット熔接した以外は実施例1〜3と同様にし
てチップ状固体電解コンデンサを作製した。
Comparative Example 1 Example 1 was repeated, except that a chemical conversion foil and a metal foil having no through holes were used, and four chemical conversion foils and metal foils were alternately superposed on each other and the anode part and the metal foil were spot-welded at the same time. The chip-shaped solid electrolytic capacitors were prepared in the same manner as in the above-mentioned Steps 3 to 3.

【0031】[0031]

【表1】 [Table 1]

【0032】以上のようにして作製した直後の固体電解
コンデンサの性能を表2に示した。なお、各実施例また
は比較例は全数値n=50点の平均値である。
Table 2 shows the performance of the solid electrolytic capacitor immediately after being manufactured as described above. Each example or comparative example is an average value of all numerical values n = 50 points.

【0033】[0033]

【表2】 [Table 2]

【0034】[0034]

【発明の効果】本発明のチップ状固体電解コンデンサ
は、陽極基体の陽極部間のスペーサーとして金属板を使
用し、陽極部と金属板とに貫通孔を有しており、この貫
通孔を通して導電材で接合されているため、作製した固
体電解コンデンサは漏れ電流値が良好である。
The chip-shaped solid electrolytic capacitor of the present invention uses a metal plate as a spacer between the anode parts of the anode substrate and has through holes in the anode part and the metal plate. Since they are joined by the material, the manufactured solid electrolytic capacitor has a good leakage current value.

【図面の簡単な説明】[Brief description of drawings]

【図1】積層したコンデンサ素子をリードフレームに載
置して接続した状態を示す斜視図である。
FIG. 1 is a perspective view showing a state in which laminated capacitor elements are placed on a lead frame and connected.

【図2】積層したコンデンサ素子を導電材で接合した状
態を示す断面図である。
FIG. 2 is a cross-sectional view showing a state in which laminated capacitor elements are joined with a conductive material.

【図3】従来の積層型チップ状固体電解コンデンサを示
す斜視図である。
FIG. 3 is a perspective view showing a conventional multilayer chip solid electrolytic capacitor.

【符号の説明】[Explanation of symbols]

1a リードフレームの凸部 1b リードフレームの凸部 2 コンデンサ素子 3 陽極部 4 導電体層形成部 5 外装樹脂 6 導電材 7 孔 8 金属板 1a Projection of lead frame 1b Projection of lead frame 2 Capacitor element 3 Anode part 4 Conductor layer forming part 5 Exterior resin 6 Conductive material 7 Hole 8 Metal plate

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 表面に誘電体酸化皮膜層を有する平板状
の弁作用金属からなる陽極基体の端部を陽極部とし、こ
の陽極基体の残部の前記誘電体酸化皮膜層上に半導体
層、その上に導電体層が形成された導電体層形成部を有
する複数枚の固体電解コンデンサ素子の前記陽極部と導
電体層形成部とがそれぞれ積層されてリード端子に接続
され、外装樹脂で封止成形されている固体電解コンデン
サにおいて、前記それぞれの固体電解コンデンサ素子の
陽極部および陽極部とリード端子との間には金属板が嵌
挿されて前記陽極部と金属板とは電気的に接続されてお
り、全ての前記陽極部と金属板とは積層した状態で互い
に連通する貫通孔を有し、この貫通孔に導電材が充填さ
れていることを特徴とするチップ状固体電解コンデン
サ。
1. An end portion of an anode substrate made of a flat valve metal having a dielectric oxide film layer on its surface is used as an anode portion, and a semiconductor layer is formed on the remaining dielectric oxide film layer of the anode substrate. A plurality of solid electrolytic capacitor elements having a conductor layer forming portion on which a conductor layer is formed, the anode portion and the conductor layer forming portion are respectively laminated and connected to lead terminals, and sealed with an exterior resin. In the molded solid electrolytic capacitor, a metal plate is inserted between the anode part and the anode part of each of the solid electrolytic capacitor elements and the lead terminal to electrically connect the anode part and the metal plate. The chip-shaped solid electrolytic capacitor is characterized in that all the anode parts and the metal plates have through holes communicating with each other in a laminated state, and the through holes are filled with a conductive material.
【請求項2】 積層された前記陽極部の外周部が導電ペ
ーストで覆われていることを特徴とする請求項1記載の
チップ状固体電解コンデンサ。
2. The chip-shaped solid electrolytic capacitor according to claim 1, wherein an outer peripheral portion of the laminated anode portions is covered with a conductive paste.
【請求項3】 表面に誘電体酸化皮膜層を有する平板状
の弁作用金属からなる陽極基体の端部に、貫通孔を有す
る陽極部を設け、この陽極基体の残部の前記誘電体酸化
皮膜層上に半導体層、その上に導電体層を形成して導電
体層形成部を有する固体電解コンデンサ素子とし、前記
陽極部に重ねた状態で貫通孔が互いに連通する貫通孔を
有する金属板を接合した後、これら素子を前記陽極部と
金属板との貫通孔が全て連通するように複数枚積層して
前記貫通孔に導電材を充填し、前記陽極部の金属板と前
記導電体層形成部とにリード端子を接続して外装樹脂で
封止成形することを特徴とするチップ状固体電解コンデ
ンサの製法。
3. An anode part having a through hole is provided at an end of an anode substrate made of a flat valve metal having a dielectric oxide film layer on the surface thereof, and the remaining dielectric oxide film layer of the anode substrate is provided. A solid electrolytic capacitor element having a semiconductor layer thereon and a conductor layer formed thereon to have a conductor layer forming portion is joined, and a metal plate having through-holes through which the through-holes communicate with each other in a state of being stacked on the anode portion is joined. After that, a plurality of these elements are stacked so that the through holes of the anode part and the metal plate are all in communication, and the through holes are filled with a conductive material, and the metal plate of the anode part and the conductor layer forming part are formed. A method of manufacturing a chip-shaped solid electrolytic capacitor, which comprises connecting lead terminals to and and sealing-molding with an exterior resin.
【請求項4】 前記陽極部の貫通孔が半導体層を形成し
た後または導電体層を形成した後に設けることを特徴と
する請求項3記載のチップ状固体電解コンデンサの製
法。
4. The method for producing a chip solid electrolytic capacitor according to claim 3, wherein the through hole of the anode portion is provided after the semiconductor layer is formed or after the conductor layer is formed.
【請求項5】 前記積層した固体電解コンデンサ素子の
陽極部の外周部を導電ペーストで覆った後、外装樹脂で
封止成形することを特徴とする請求項3または請求項4
記載のチップ状固体電解コンデンサの製法。
5. The method according to claim 3, wherein after covering the outer peripheral portion of the anode portion of the laminated solid electrolytic capacitor element with a conductive paste, sealing molding is performed with an exterior resin.
A method for producing the chip-shaped solid electrolytic capacitor described.
JP1531892A 1992-01-30 1992-01-30 Chip-shaped solid electrolytic capacitor and its manufacture Pending JPH05217811A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1531892A JPH05217811A (en) 1992-01-30 1992-01-30 Chip-shaped solid electrolytic capacitor and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1531892A JPH05217811A (en) 1992-01-30 1992-01-30 Chip-shaped solid electrolytic capacitor and its manufacture

Publications (1)

Publication Number Publication Date
JPH05217811A true JPH05217811A (en) 1993-08-27

Family

ID=11885429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1531892A Pending JPH05217811A (en) 1992-01-30 1992-01-30 Chip-shaped solid electrolytic capacitor and its manufacture

Country Status (1)

Country Link
JP (1) JPH05217811A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6563693B2 (en) 2001-07-02 2003-05-13 Matsushita Electric Industrial Co., Ltd. Solid electrolytic capacitor
KR20030063511A (en) * 2002-01-22 2003-07-31 주식회사 기노리텍 Manufacturing method of hybrid capacitor
EP1434242A2 (en) * 2002-12-27 2004-06-30 Matsushita Electric Industrial Co., Ltd. Capacitor and method for producing the same, and circuit board with a built-in capacitor and method for producing the same
US6970344B2 (en) * 2003-03-04 2005-11-29 Nec Tokin Corporation Stacked solid electrolytic capacitor and stacked transmission line element
US6977807B2 (en) 2003-09-02 2005-12-20 Nec Tokin Corporation Laminated solid electrolytic capacitor and laminated transmission line device increased in element laminating number without deterioration of elements
JP2008004744A (en) * 2006-06-22 2008-01-10 Nec Tokin Corp Solid-state electrolytic capacitor manufacturing method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6563693B2 (en) 2001-07-02 2003-05-13 Matsushita Electric Industrial Co., Ltd. Solid electrolytic capacitor
KR20030063511A (en) * 2002-01-22 2003-07-31 주식회사 기노리텍 Manufacturing method of hybrid capacitor
EP1434242A2 (en) * 2002-12-27 2004-06-30 Matsushita Electric Industrial Co., Ltd. Capacitor and method for producing the same, and circuit board with a built-in capacitor and method for producing the same
EP1434242A3 (en) * 2002-12-27 2008-04-30 Matsushita Electric Industrial Co., Ltd. Capacitor and method for producing the same, and circuit board with a built-in capacitor and method for producing the same
US6970344B2 (en) * 2003-03-04 2005-11-29 Nec Tokin Corporation Stacked solid electrolytic capacitor and stacked transmission line element
US6977807B2 (en) 2003-09-02 2005-12-20 Nec Tokin Corporation Laminated solid electrolytic capacitor and laminated transmission line device increased in element laminating number without deterioration of elements
JP2008004744A (en) * 2006-06-22 2008-01-10 Nec Tokin Corp Solid-state electrolytic capacitor manufacturing method
JP4662368B2 (en) * 2006-06-22 2011-03-30 Necトーキン株式会社 Manufacturing method of solid electrolytic capacitor

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