JPH0393632U - - Google Patents
Info
- Publication number
- JPH0393632U JPH0393632U JP181290U JP181290U JPH0393632U JP H0393632 U JPH0393632 U JP H0393632U JP 181290 U JP181290 U JP 181290U JP 181290 U JP181290 U JP 181290U JP H0393632 U JPH0393632 U JP H0393632U
- Authority
- JP
- Japan
- Prior art keywords
- web
- brake
- shew
- shoe
- plate surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Braking Arrangements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP181290U JPH0720427Y2 (ja) | 1990-01-11 | 1990-01-11 | シュー間隙自動調節機構を備えたドラムブレーキ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP181290U JPH0720427Y2 (ja) | 1990-01-11 | 1990-01-11 | シュー間隙自動調節機構を備えたドラムブレーキ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0393632U true JPH0393632U (US07922777-20110412-C00004.png) | 1991-09-25 |
| JPH0720427Y2 JPH0720427Y2 (ja) | 1995-05-15 |
Family
ID=31505705
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP181290U Expired - Lifetime JPH0720427Y2 (ja) | 1990-01-11 | 1990-01-11 | シュー間隙自動調節機構を備えたドラムブレーキ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0720427Y2 (US07922777-20110412-C00004.png) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007279440A (ja) * | 2006-04-07 | 2007-10-25 | Toshiba Corp | ハーフトーン型位相シフトマスク及びその製造方法 |
| JP2007298631A (ja) * | 2006-04-28 | 2007-11-15 | Shin Etsu Chem Co Ltd | フォトマスクブランクの製造方法およびフォトマスクブランク |
| JP2008116583A (ja) * | 2006-11-01 | 2008-05-22 | Hoya Corp | マスクブランクの製造方法及びフォトマスクの製造方法、並びに反射型マスクの製造方法 |
| JP2008261958A (ja) * | 2007-04-10 | 2008-10-30 | Sk Electronics:Kk | 多階調フォトマスク及びその製造方法 |
| US7618753B2 (en) | 2004-09-10 | 2009-11-17 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method for producing those |
| US7691546B2 (en) | 2004-09-10 | 2010-04-06 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| US7767367B2 (en) | 2006-03-10 | 2010-08-03 | Toppan Printing Co., Ltd. | Photomask blank and photomask making method |
| US7767366B2 (en) | 2006-03-10 | 2010-08-03 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| US7771893B2 (en) | 2005-07-21 | 2010-08-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and fabrication method thereof |
| US7790339B2 (en) | 2006-04-21 | 2010-09-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
| EP2881790A2 (en) | 2013-12-06 | 2015-06-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
| EP2980645A2 (en) | 2014-07-30 | 2016-02-03 | Shin-Etsu Chemical Co., Ltd. | Designing of photomask blank and photomask blank |
| EP3125041A1 (en) | 2015-07-27 | 2017-02-01 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and method for preparing photomask |
| EP3139211A2 (en) | 2015-09-03 | 2017-03-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
-
1990
- 1990-01-11 JP JP181290U patent/JPH0720427Y2/ja not_active Expired - Lifetime
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7618753B2 (en) | 2004-09-10 | 2009-11-17 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and method for producing those |
| US7691546B2 (en) | 2004-09-10 | 2010-04-06 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| US7771893B2 (en) | 2005-07-21 | 2010-08-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank, photomask and fabrication method thereof |
| US7767367B2 (en) | 2006-03-10 | 2010-08-03 | Toppan Printing Co., Ltd. | Photomask blank and photomask making method |
| US7767366B2 (en) | 2006-03-10 | 2010-08-03 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| JP2007279440A (ja) * | 2006-04-07 | 2007-10-25 | Toshiba Corp | ハーフトーン型位相シフトマスク及びその製造方法 |
| US7790339B2 (en) | 2006-04-21 | 2010-09-07 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
| JP2007298631A (ja) * | 2006-04-28 | 2007-11-15 | Shin Etsu Chem Co Ltd | フォトマスクブランクの製造方法およびフォトマスクブランク |
| JP2008116583A (ja) * | 2006-11-01 | 2008-05-22 | Hoya Corp | マスクブランクの製造方法及びフォトマスクの製造方法、並びに反射型マスクの製造方法 |
| JP2008261958A (ja) * | 2007-04-10 | 2008-10-30 | Sk Electronics:Kk | 多階調フォトマスク及びその製造方法 |
| EP2881790A2 (en) | 2013-12-06 | 2015-06-10 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
| EP2980645A2 (en) | 2014-07-30 | 2016-02-03 | Shin-Etsu Chemical Co., Ltd. | Designing of photomask blank and photomask blank |
| EP3125041A1 (en) | 2015-07-27 | 2017-02-01 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and method for preparing photomask |
| EP3139211A2 (en) | 2015-09-03 | 2017-03-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0720427Y2 (ja) | 1995-05-15 |
