JPH0392884A - Production of hologram - Google Patents

Production of hologram

Info

Publication number
JPH0392884A
JPH0392884A JP23062789A JP23062789A JPH0392884A JP H0392884 A JPH0392884 A JP H0392884A JP 23062789 A JP23062789 A JP 23062789A JP 23062789 A JP23062789 A JP 23062789A JP H0392884 A JPH0392884 A JP H0392884A
Authority
JP
Japan
Prior art keywords
photosensitive material
hologram
substrate
water repellent
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23062789A
Other languages
Japanese (ja)
Other versions
JP2870845B2 (en
Inventor
Masusuke Toda
戸田 益資
Hiroshi Ando
浩 安藤
Osamu Koike
理 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP23062789A priority Critical patent/JP2870845B2/en
Publication of JPH0392884A publication Critical patent/JPH0392884A/en
Application granted granted Critical
Publication of JP2870845B2 publication Critical patent/JP2870845B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To easily produce the beautiful hologram which has no photosensitive material around a substrate by applying the photosensitive material on the substrate by using a water repellent material disposed around the substrate as a mask. CONSTITUTION:The photosensitive material 13 is applied on the substrate 11 by using the water repellent material 12 disposed around the substrate 11 as the mask. Namely, the water repellent material 12 is thinly applied by spraying, etc., on the peripheral part of the hologram substrate 11. A fluoroplastic water repellent, tetrafluoroethylene, trifluoroethylene, etc., are used as the water repellent material 12. The water repellent material 12 repels the photosensitive material 13 and is not removed by a treating agent in a succeeding stage. The photosensitive material 13 is repelled by the water repellent material 12 and the part absent of the photosensitive material 13 is formed around the hologram substrate 11. The beautiful hologram having no photosensitive material around the substrate is easily produced in this way.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、ホログラムの製造方法に関するものである
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing a hologram.

[従来技術〕 従来、ホログラムは、第11図に示すように、ホログラ
ム基板1上に吸湿性結合剤を含む感光材2を配置し、さ
らに、カバーガラス3にて接着剤4を介してシールし耐
湿性や耐熱性をもたせて信頼性を確保するようにしてい
る。尚、吸涸性結合剤を含む感光材とは干渉縞を記録し
現像処理を済したものをいう。つまり、ホログラムを長
期保存するために、水分を通さないカバーガラス3と、
水分を通しにくく透明で感光材2及びカバーガラス3の
屈折率に近い接着剤4とでシールしている。
[Prior Art] Conventionally, a hologram is produced by placing a photosensitive material 2 containing a hygroscopic binder on a hologram substrate 1 and sealing it with a cover glass 3 via an adhesive 4, as shown in FIG. It is made to have moisture resistance and heat resistance to ensure reliability. Incidentally, the photosensitive material containing a water-absorbing binder refers to a material on which interference fringes have been recorded and development processing has been completed. In other words, in order to preserve the hologram for a long time, a cover glass 3 that does not allow moisture to pass through is used.
It is sealed with an adhesive 4 that is transparent and does not easily allow moisture to pass through, and has a refractive index close to that of the photosensitive material 2 and the cover glass 3.

このとき、ホログラムを作製する上でホログラム基板1
全面に感光材2を塗布してシールすると感光材2の端而
が露出して空気と接触してしまうので、第12図に示す
ように、感光材2の端をある幅(1〜101程度)、除
去しなければならない。
At this time, when producing a hologram, the hologram substrate 1
If the photosensitive material 2 is coated and sealed on the entire surface, the edges of the photosensitive material 2 will be exposed and come into contact with the air, so as shown in FIG. ), must be removed.

そのために、ホログラムの端の感光材2を削り落したり
、感光材2を塗布するときに端部にテープを貼り付けて
その部分に感光材2が塗布できないようにしている。さ
らに、特開昭59−201081号公報には、不四部分
の感光材2を化学的処理剤を用いて除去する方法が示さ
れている。
For this purpose, the photosensitive material 2 at the edge of the hologram is scraped off, or when the photosensitive material 2 is applied, a tape is attached to the edge to prevent the photosensitive material 2 from being applied to that part. Furthermore, Japanese Patent Application Laid-Open No. 59-201081 discloses a method of removing the photosensitive material 2 of Fushihabe using a chemical processing agent.

[発明が解決しようとする課題] ところが、感光材2を削り落すやり方では、その作業が
非常に面倒であるとともに、感光材2を削り落す際に刃
物で感光材2を傷付けてしまったり削り面が汚くなる。
[Problems to be Solved by the Invention] However, in the method of scraping off the photosensitive material 2, the work is very troublesome, and when scraping off the photosensitive material 2, the photosensitive material 2 may be damaged with a knife or the scraped surface may be damaged. becomes dirty.

又、テープを貼って感光材2を塗布するヤリ方では、そ
の作業が面倒であるとともに、テープ近傍の感光材2の
厚さが厚くなりテープを剥がす際に感光材2が剥がれ感
光材2の端面が汚くなる。さらに、特開昭59−201
081号公報に示されている方法では化学薬品を用いた
工程が多くなりコストアツブする問題があった。
In addition, in the method of applying the photosensitive material 2 by pasting tape, the work is troublesome, and the thickness of the photosensitive material 2 near the tape increases, causing the photosensitive material 2 to peel off when the tape is removed. The end surface becomes dirty. Furthermore, JP-A-59-201
The method disclosed in Publication No. 081 has the problem of increasing costs due to the large number of steps using chemicals.

この発明の目的は、基板の周囲に感光材のない綺麗なホ
ログラムを容易に製造することができるホログラムの製
造方法を提供することにある。
An object of the present invention is to provide a method for manufacturing a hologram that can easily manufacture a beautiful hologram without any photosensitive material around the substrate.

[課題を解決するための手段] この発明は、基板上に吸湿性結合剤を含む感光材を塗布
するとともに当該感光材をシール材にてシールしたホロ
グラムにおいて、 基板の周囲に透水性材料を配置した後に、当該撥水性材
料をマスクとして前記感光材を塗布したホログラムの製
造方法をその要旨とするものである。
[Means for Solving the Problems] The present invention provides a hologram in which a photosensitive material containing a hygroscopic binder is coated on a substrate and the photosensitive material is sealed with a sealing material, in which a water-permeable material is arranged around the substrate. The gist of the present invention is to provide a method for manufacturing a hologram in which the photosensitive material is coated using the water-repellent material as a mask.

[作用] 基板の周囲に溌水性材料が配置ざれた後に、撥水性材料
をマスクとして感光材が塗布される。この際に、感光材
は撥水性材料にてはじかれ、感光材のない部分が形成さ
れる。
[Operation] After the water-repellent material is placed around the substrate, a photosensitive material is applied using the water-repellent material as a mask. At this time, the photosensitive material is repelled by the water-repellent material, and a portion without the photosensitive material is formed.

[実施例] 以下、この発明を具体化した一実施例を図面に従って説
明する。
[Example] An example embodying the present invention will be described below with reference to the drawings.

第4図にはホログラムの製造工程を示す。まず、第1図
及び第2図に示す四角形状のホログラム基板11を洗浄
する(第1工程)aこのホログラム基板11としてはガ
ラス、又は、透明樹脂(例えば,ポリカーボネイト、ア
クリル)等の材料が使用される。
FIG. 4 shows the hologram manufacturing process. First, the rectangular hologram substrate 11 shown in FIGS. 1 and 2 is cleaned (first step) a. This hologram substrate 11 is made of a material such as glass or transparent resin (for example, polycarbonate or acrylic). be done.

次に、ホログラム基板11の周辺部にスプレー等により
透発性材料12を薄く塗布する(第2工程)。ここで、
NR性材料12としては、ふっ素樹脂系順水剤、四沸化
エチレン、三沸化エチレン等が使用される。そして、こ
の撥発性材料12は後記感光材13をはじき、かつ、後
工程での処理剤にて除去ざれないものである。即ち、シ
ール材除去(第7工程)でのエタノール、硬膜処理〈第
8工程〉での硬膜液(酸性硬膜定着液)、水洗(第9工
程)での水、渇浴(第10工程)での場、脱水処理(第
11工程)でのイソブロビルアルコールに、不溶又はf
i溶なものである。
Next, a thin layer of permeable material 12 is applied to the periphery of the hologram substrate 11 by spraying or the like (second step). here,
As the NR material 12, a fluororesin water-reducing agent, tetraboiling ethylene, triboiling ethylene, etc. are used. This repellent material 12 repels the photosensitive material 13 described below and cannot be removed by a processing agent in a subsequent process. That is, ethanol in sealant removal (7th step), hardening solution (acidic hardening fixer) in hardening treatment (8th step), water in water washing (9th step), and dry bath (10th step). Insoluble or f
It is soluble.

そして、ホログラム基板11上に、吸湿性結合剤〈ゼラ
チン〉と重クロム酸アンモニウムを含む感光材13を塗
布する(第3工程)。この感光材13には30℃〜50
℃の湯に1〜20重量%のゼラチンを溶かしたゼラチン
水溶液が含まれている。
Then, a photosensitive material 13 containing a hygroscopic binder (gelatin) and ammonium dichromate is applied onto the hologram substrate 11 (third step). This photosensitive material 13 has a temperature of 30°C to 50°C.
It contains an aqueous gelatin solution prepared by dissolving 1 to 20% by weight of gelatin in hot water at ℃.

次に、感光材13のゼラチン水溶液の水分量を減少させ
るためにホログラム基板11を乾燥させる(第4工程}
。さらに、感光材13のゼラチン水溶液中の水分量を一
定に保つためにカバーガラスでシールする(第5工程)
。このとき、カバーガラスと感光材13との間に屈折率
調整液(インデックスマッチング液)としてシリコンオ
イルを挟み込み、カバーガラスと感光材13との境界面
での屈折率の変化をなくす。尚、屈折率調整液はシリコ
ンオイルの他にも、キシレン、ベンゼン等でもよい。
Next, the hologram substrate 11 is dried to reduce the water content of the gelatin aqueous solution of the photosensitive material 13 (fourth step).
. Furthermore, in order to keep the water content in the gelatin aqueous solution of the photosensitive material 13 constant, it is sealed with a cover glass (fifth step).
. At this time, silicone oil is sandwiched between the cover glass and the photosensitive material 13 as a refractive index adjusting liquid (index matching liquid) to eliminate changes in the refractive index at the interface between the cover glass and the photosensitive material 13. Note that the refractive index adjusting liquid may be xylene, benzene, etc. in addition to silicone oil.

そして、干渉縞を記録するために露光を行なう〈第6工
程〉。さらに、第5工程で配設したカバーグラスを取除
いた後、エタノールにて屈折率調整液を除去する(第7
工程〉。尚、揮発性の屈折率調整液、例えば、キシレン
、ベンゼン等を用いた場合には常温で蒸発してしまうの
で、この第7工程は省かれる。
Then, exposure is performed to record interference fringes (sixth step). Furthermore, after removing the cover glass provided in the fifth step, the refractive index adjustment liquid is removed with ethanol (step 7).
Process>. Note that if a volatile refractive index adjusting liquid such as xylene or benzene is used, it will evaporate at room temperature, so this seventh step is omitted.

その後、酸性硬膜定着液による硬膜処理(第8工程)、
水洗処理(第9工程)、20〜40℃での湯浴(第10
工程)、イソブロビルアルコールによる脱水処理(第1
1工程)、100〜130℃の高温乾燥(第12工程)
を行なう。これらの処理を行なっても、ホログラム基板
11の周囲に塗布した撥水性材料12は除去されない。
After that, hardening treatment with acidic hardening fixer (8th step),
Water washing treatment (9th step), hot water bath at 20-40℃ (10th step)
step), dehydration treatment with isobrobyl alcohol (first
1st step), high temperature drying at 100-130°C (12th step)
Do this. Even if these treatments are performed, the water-repellent material 12 applied around the hologram substrate 11 is not removed.

そして、第3図に示すようにカバーガラス14による接
着剤15を介してのシールを行なう(弟13工程〉。そ
の結果、信頼性(耐湿性、耐熱性)の高いホログラムが
完成する。
Then, as shown in FIG. 3, the cover glass 14 is sealed with the adhesive 15 (step 13).As a result, a highly reliable (moisture resistant, heat resistant) hologram is completed.

このように本実魔例によれば、ホログラム基板11の周
囲に溌水性材料12をii!置した後に、撥水性材料1
2をマスクとして感光材13〈ゼラチンと重クロム酸ア
ンモニウムとを含む水溶液〉を塗布し、さらに、感光材
13をシール材(カバーガラス14.接着剤15)にて
シールした。この感光材13の塗布の際に、感光材13
が撥水性材料12にてはじかれて、ホログラム基板11
の周囲に感光材13のない部分が形成ざれる。その結果
、従来方式での感光材2の削り落しやテープの貼付けに
よらずにホログラム基板の周囲に感光材のないホログラ
ムを製造することができる。よって、感光材を削り落す
やり方では感光材を傷付けたり削り面が汚くなったり、
又、テープを貼って感光材を塗布するヤリ方では感光材
の端面が汚くなってしまったが、本実施例ではそのよう
なことが回避される。又、特開昭59−201081号
公報に示されているような感光材の不要部分を除去する
ために化学薬品を用いる工程が無くなりコストアップを
招くことはない。
In this way, according to this example, the water-repellent material 12 is placed around the hologram substrate 11! After placing the water repellent material 1
A photosensitive material 13 (aqueous solution containing gelatin and ammonium dichromate) was applied using mask 2 as a mask, and the photosensitive material 13 was further sealed with a sealing material (cover glass 14, adhesive 15). When applying this photosensitive material 13,
is repelled by the water-repellent material 12 and the hologram substrate 11
A portion without the photosensitive material 13 is formed around the area. As a result, a hologram without a photosensitive material around the hologram substrate can be manufactured without scraping off the photosensitive material 2 or pasting tape in the conventional method. Therefore, the method of scraping off the photosensitive material may damage the photosensitive material or make the scraped surface dirty.
Furthermore, in the method of applying the photosensitive material by pasting tape, the end surface of the photosensitive material becomes dirty, but this embodiment avoids such a problem. Furthermore, the process of using chemicals to remove unnecessary portions of the photosensitive material, as shown in Japanese Patent Application Laid-open No. 59-201081, is not required, so there is no increase in costs.

このように、ホログラム基板11の周囲に感光材13の
ない綺麗なホログラムを容易に製造することができるこ
ととなる。
In this way, a clean hologram without the photosensitive material 13 around the hologram substrate 11 can be easily manufactured.

尚、この発明は上記実施例に限定されるものではなく、
例えば、溌水性材料として、撥水性材料塗布後の感光I
l113の配置後に除去されるものを使用してもよい。
Note that this invention is not limited to the above embodiments,
For example, as a water-repellent material, photosensitive I
One that is removed after placement of l113 may be used.

即ち、シール材除去(第7工程〉でのエタノールや脱水
処理(第11工程)でのイソブロビルアルコールに可溶
なもの、例えば、シリコンオイル等を用いてもよい。
That is, a material soluble in ethanol in the sealing material removal (seventh step) or isobrobyl alcohol in the dehydration treatment (eleventh step), such as silicone oil, may be used.

又、第5図に示すように、撥水性材料として、ふっ素系
、シリコン系のOリング16を用いてもよい。即ち、ス
トツノ517によりOリング16をホログラム基板11
に押しつけてOリング16とホログラム基板11の間に
隙間ができないようにする。そして、この状態で、感光
材13を塗布する。その後、感光材13がゲル化若しく
は乾燥してから0リング16とストツバ17を外せばよ
い。
Further, as shown in FIG. 5, a fluorine-based or silicon-based O-ring 16 may be used as the water-repellent material. That is, the O-ring 16 is connected to the hologram substrate 11 by the stopper 517.
to prevent a gap from forming between the O-ring 16 and the hologram substrate 11. Then, in this state, the photosensitive material 13 is applied. Thereafter, the O-ring 16 and stopper 17 may be removed after the photosensitive material 13 has gelled or dried.

この場合、Oリング16の代りにシリコンラバーを用い
てもよい。
In this case, silicon rubber may be used instead of the O-ring 16.

さらに、撥水性材料としてシリコンラバーを使用した他
の例としては、第6図に示すように実施してもよい。即
ち、ホログラム基板11上にシリコンラバー18を載置
する。この時、感光材13がホログラム基板11とシリ
コンラバー18との隙間に入らないように第4図におけ
るカバーガラスシール工程(第5工程〉でシール材とし
て使用するものと同じシリコンオイル19でこの隙間を
埋める。尚、この時、シリコンラバー18をシリコンオ
イルの中に浸した後、ホログラム基板11上に戟置する
と、隙間を埋める作業がしやすい。
Furthermore, another example using silicone rubber as the water-repellent material may be implemented as shown in FIG. That is, the silicon rubber 18 is placed on the hologram substrate 11. At this time, in order to prevent the photosensitive material 13 from entering the gap between the hologram substrate 11 and the silicone rubber 18, fill the gap with the same silicone oil 19 used as the sealant in the cover glass sealing step (step 5) shown in FIG. At this time, if the silicone rubber 18 is soaked in silicone oil and then placed on the hologram substrate 11, it will be easier to fill in the gaps.

その後、感光材13を塗布する。After that, a photosensitive material 13 is applied.

この実施例の場合、第7図に示すように、シリコンラパ
ー18とシリコンオイル19の合計の厚さが感光材13
の厚さ(乾燥前の厚さ)より薄い場合はゲル化後にシリ
コンラバー18を除去して乾燥する。しかし、第8図に
示すように、シリコンラバー18とシリコンオイル19
の合計の厚さが感光材13の厚さよりも厚い場合は、第
9図に示すように感光材13のエッチが尖ってしまうの
で、第10図に示すように、一度ゲル化した後、ゼラチ
ンの融点以上に(ゲルからゾルに変る温度に)暖めてゼ
ラチンをゾル化して先端を丸くし、その後、再びゲル化
させて乾燥するようにすればよい。
In this embodiment, as shown in FIG. 7, the total thickness of the silicone wrapper 18 and the silicone oil 19 is
(thickness before drying), the silicone rubber 18 is removed after gelation and dried. However, as shown in FIG. 8, silicone rubber 18 and silicone oil 19
If the total thickness of the photosensitive material 13 is thicker than the thickness of the photosensitive material 13, the etch of the photosensitive material 13 will become sharp as shown in FIG. The gelatin can be heated above its melting point (to a temperature at which it changes from a gel to a sol) to form a sol and have a rounded tip, and then gelatinized again and dried.

[発明の効果] 以上詳述したようにこの発明によれば、基板の周囲に感
光材のないIIIなホログラムを容易に製造することが
できる優れた効果を発揮する。
[Effects of the Invention] As detailed above, according to the present invention, an excellent effect is achieved in that a III-level hologram without a photosensitive material around the substrate can be easily manufactured.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は実施例のホログラムの製造工程を説明するため
の斜視図、第2図はホログラムの製造工程を説明するた
めの断面図、第3図は完成したホログラムの断面図、第
4図はホログラムの製造工程図、第5図は別例のホログ
ラムの製造工程を説明するための断面図、第6図は他の
別例のホログラムの製造工程を説明するための断面図、
第7図は他の別例のホログラムの製造工程を説明するた
めの断面図、第8図は他の別例のホログラムの製造工程
を説明するための断面図、第9図は他の別例のホログラ
ムの製造工程を説明するための断面図、第10図は他の
別例のホログラムの製造工程を説明するための断面図、
第11図は従来技術を説明するための断面図、第12図
は従来技術を説明するための断面図である。 11はホログラム基板、12は撥水性材料、13は感光
材、14はシール材としてのカバーガラス、15はシー
ル材としての接肴剤。
Figure 1 is a perspective view for explaining the manufacturing process of the hologram of the example, Figure 2 is a cross-sectional view for explaining the manufacturing process of the hologram, Figure 3 is a cross-sectional view of the completed hologram, and Figure 4 is 5 is a cross-sectional view for explaining the manufacturing process of another example of the hologram; FIG. 6 is a cross-sectional view for explaining the manufacturing process of another example of the hologram;
FIG. 7 is a cross-sectional view for explaining the manufacturing process of another example of the hologram, FIG. 8 is a cross-sectional view for explaining the manufacturing process of another example of the hologram, and FIG. 9 is another example of the hologram. 10 is a cross-sectional view for explaining the manufacturing process of a hologram of another example,
FIG. 11 is a cross-sectional view for explaining the prior art, and FIG. 12 is a cross-sectional view for explaining the prior art. 11 is a hologram substrate, 12 is a water-repellent material, 13 is a photosensitive material, 14 is a cover glass as a sealing material, and 15 is an adhesive as a sealing material.

Claims (1)

【特許請求の範囲】 1、基板上に吸湿性結合剤を含む感光材を塗布するとと
もに当該感光材をシール材にてシールしたホログラムに
おいて、 基板の周囲に撥水性材料を配置した後に、当該撥水性材
料をマスクとして前記感光材を塗布したことを特徴とす
るホログラムの製造方法。
[Claims] 1. In a hologram in which a photosensitive material containing a hygroscopic binder is coated on a substrate and the photosensitive material is sealed with a sealant, after a water-repellent material is placed around the substrate, the water-repellent material is A method for producing a hologram, characterized in that the photosensitive material is applied using an aqueous material as a mask.
JP23062789A 1989-09-06 1989-09-06 Hologram manufacturing method Expired - Fee Related JP2870845B2 (en)

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JP23062789A JP2870845B2 (en) 1989-09-06 1989-09-06 Hologram manufacturing method

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Application Number Priority Date Filing Date Title
JP23062789A JP2870845B2 (en) 1989-09-06 1989-09-06 Hologram manufacturing method

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JPH0392884A true JPH0392884A (en) 1991-04-18
JP2870845B2 JP2870845B2 (en) 1999-03-17

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Cited By (5)

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JP2006170830A (en) * 2004-12-16 2006-06-29 Nikon Corp Imaging element inspection device
JP2007045852A (en) * 2005-08-05 2007-02-22 Nippon Steel Corp Method and apparatus for purifying gasified gas and method for using gasified gas
JP2008089416A (en) * 2006-10-02 2008-04-17 Nikon Corp Lighting system for inspection, and imaging element inspection apparatus
JP2009063703A (en) * 2007-09-05 2009-03-26 Toppan Printing Co Ltd Forgery prevention laminated body, forgery prevention transfer foil, forgery prevention seal, forgery prevention medium, and manufacturing method of them
KR20150094482A (en) * 2014-02-11 2015-08-19 이순호 Heating apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006170830A (en) * 2004-12-16 2006-06-29 Nikon Corp Imaging element inspection device
JP2007045852A (en) * 2005-08-05 2007-02-22 Nippon Steel Corp Method and apparatus for purifying gasified gas and method for using gasified gas
JP2008089416A (en) * 2006-10-02 2008-04-17 Nikon Corp Lighting system for inspection, and imaging element inspection apparatus
JP2009063703A (en) * 2007-09-05 2009-03-26 Toppan Printing Co Ltd Forgery prevention laminated body, forgery prevention transfer foil, forgery prevention seal, forgery prevention medium, and manufacturing method of them
KR20150094482A (en) * 2014-02-11 2015-08-19 이순호 Heating apparatus

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