JPH0390431U - - Google Patents

Info

Publication number
JPH0390431U
JPH0390431U JP15201389U JP15201389U JPH0390431U JP H0390431 U JPH0390431 U JP H0390431U JP 15201389 U JP15201389 U JP 15201389U JP 15201389 U JP15201389 U JP 15201389U JP H0390431 U JPH0390431 U JP H0390431U
Authority
JP
Japan
Prior art keywords
wafer
mounting
spraying
rotation
spin coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15201389U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15201389U priority Critical patent/JPH0390431U/ja
Publication of JPH0390431U publication Critical patent/JPH0390431U/ja
Pending legal-status Critical Current

Links

JP15201389U 1989-12-28 1989-12-28 Pending JPH0390431U (da)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15201389U JPH0390431U (da) 1989-12-28 1989-12-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15201389U JPH0390431U (da) 1989-12-28 1989-12-28

Publications (1)

Publication Number Publication Date
JPH0390431U true JPH0390431U (da) 1991-09-13

Family

ID=31698293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15201389U Pending JPH0390431U (da) 1989-12-28 1989-12-28

Country Status (1)

Country Link
JP (1) JPH0390431U (da)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216172A (en) * 1975-07-30 1977-02-07 Hitachi Ltd Rotatory treatment device
JPS5364472A (en) * 1976-11-22 1978-06-08 Hitachi Ltd Processing apparatus
JPS59232417A (ja) * 1983-06-16 1984-12-27 Toshiba Corp 半導体ウエ−ハのレジスト現像装置
JPS60116133A (ja) * 1983-11-28 1985-06-22 Seiko Epson Corp 半導体製造装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216172A (en) * 1975-07-30 1977-02-07 Hitachi Ltd Rotatory treatment device
JPS5364472A (en) * 1976-11-22 1978-06-08 Hitachi Ltd Processing apparatus
JPS59232417A (ja) * 1983-06-16 1984-12-27 Toshiba Corp 半導体ウエ−ハのレジスト現像装置
JPS60116133A (ja) * 1983-11-28 1985-06-22 Seiko Epson Corp 半導体製造装置

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