JPH0385645U - - Google Patents

Info

Publication number
JPH0385645U
JPH0385645U JP14699589U JP14699589U JPH0385645U JP H0385645 U JPH0385645 U JP H0385645U JP 14699589 U JP14699589 U JP 14699589U JP 14699589 U JP14699589 U JP 14699589U JP H0385645 U JPH0385645 U JP H0385645U
Authority
JP
Japan
Prior art keywords
electron beam
stage
electron
measuring machine
coordinate measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14699589U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14699589U priority Critical patent/JPH0385645U/ja
Publication of JPH0385645U publication Critical patent/JPH0385645U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP14699589U 1989-12-22 1989-12-22 Pending JPH0385645U (sl)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14699589U JPH0385645U (sl) 1989-12-22 1989-12-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14699589U JPH0385645U (sl) 1989-12-22 1989-12-22

Publications (1)

Publication Number Publication Date
JPH0385645U true JPH0385645U (sl) 1991-08-29

Family

ID=31693529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14699589U Pending JPH0385645U (sl) 1989-12-22 1989-12-22

Country Status (1)

Country Link
JP (1) JPH0385645U (sl)

Similar Documents

Publication Publication Date Title
CA1103813A (en) Apparatus for electron beam lithography
JPS605221B2 (ja) 加工片の自動位置合せ方法とその装置
EP0131699A1 (en) Method and apparatus for controlling alignment and brightness of an electron beam
US4264822A (en) Electron beam testing method and apparatus of mask
JPH0385645U (sl)
JP3065472B2 (ja) 荷電粒子ビーム描画装置における矩形ビームのサイズ及び位置決め調整方法
JPS57210549A (en) Method of correction attendant on deflection
JP2001322053A (ja) レーザ測長計を用いたステージ移動量測定システムにおけるレーザ軸測定方法
JPH0330415A (ja) 電子線描画装置
JPH04116915A (ja) 描画ビーム径調整方法
JPH0282515A (ja) 電子ビーム描画方法
JP3242122B2 (ja) パターン形成方法および半導体装置の製造方法
JPS6136342B2 (sl)
JPH03262908A (ja) 電子線座標測定装置
JPH07130597A (ja) 電子線描画装置
JPH03272129A (ja) 荷電粒子ビーム径測定方法
JPH01232300A (ja) 電子ビーム装置における軸合わせ方法及び装置
JP2813359B2 (ja) 電子ビーム露光装置
JPS5824008B2 (ja) 電子ビ−ム露光装置
JPH06196395A (ja) 電子線露光装置
JPH02250311A (ja) 電子ビーム描画方法
JPH01144629A (ja) 電子ビーム露光装置の直交度補正方法
JPS56112725A (en) Exposure of electron beam
JPH01204419A (ja) 荷電ビーム露光装置
JPS5558405A (en) Electron beam type observation apparatus