JPH0385645U - - Google Patents
Info
- Publication number
- JPH0385645U JPH0385645U JP14699589U JP14699589U JPH0385645U JP H0385645 U JPH0385645 U JP H0385645U JP 14699589 U JP14699589 U JP 14699589U JP 14699589 U JP14699589 U JP 14699589U JP H0385645 U JPH0385645 U JP H0385645U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- stage
- electron
- measuring machine
- coordinate measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims 7
- 238000005259 measurement Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14699589U JPH0385645U (sl) | 1989-12-22 | 1989-12-22 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14699589U JPH0385645U (sl) | 1989-12-22 | 1989-12-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0385645U true JPH0385645U (sl) | 1991-08-29 |
Family
ID=31693529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14699589U Pending JPH0385645U (sl) | 1989-12-22 | 1989-12-22 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0385645U (sl) |
-
1989
- 1989-12-22 JP JP14699589U patent/JPH0385645U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1103813A (en) | Apparatus for electron beam lithography | |
JPS605221B2 (ja) | 加工片の自動位置合せ方法とその装置 | |
EP0131699A1 (en) | Method and apparatus for controlling alignment and brightness of an electron beam | |
US4264822A (en) | Electron beam testing method and apparatus of mask | |
JPH0385645U (sl) | ||
JP3065472B2 (ja) | 荷電粒子ビーム描画装置における矩形ビームのサイズ及び位置決め調整方法 | |
JPS57210549A (en) | Method of correction attendant on deflection | |
JP2001322053A (ja) | レーザ測長計を用いたステージ移動量測定システムにおけるレーザ軸測定方法 | |
JPH0330415A (ja) | 電子線描画装置 | |
JPH04116915A (ja) | 描画ビーム径調整方法 | |
JPH0282515A (ja) | 電子ビーム描画方法 | |
JP3242122B2 (ja) | パターン形成方法および半導体装置の製造方法 | |
JPS6136342B2 (sl) | ||
JPH03262908A (ja) | 電子線座標測定装置 | |
JPH07130597A (ja) | 電子線描画装置 | |
JPH03272129A (ja) | 荷電粒子ビーム径測定方法 | |
JPH01232300A (ja) | 電子ビーム装置における軸合わせ方法及び装置 | |
JP2813359B2 (ja) | 電子ビーム露光装置 | |
JPS5824008B2 (ja) | 電子ビ−ム露光装置 | |
JPH06196395A (ja) | 電子線露光装置 | |
JPH02250311A (ja) | 電子ビーム描画方法 | |
JPH01144629A (ja) | 電子ビーム露光装置の直交度補正方法 | |
JPS56112725A (en) | Exposure of electron beam | |
JPH01204419A (ja) | 荷電ビーム露光装置 | |
JPS5558405A (en) | Electron beam type observation apparatus |