JPH0379765A - Vacuum film forming device - Google Patents

Vacuum film forming device

Info

Publication number
JPH0379765A
JPH0379765A JP21577189A JP21577189A JPH0379765A JP H0379765 A JPH0379765 A JP H0379765A JP 21577189 A JP21577189 A JP 21577189A JP 21577189 A JP21577189 A JP 21577189A JP H0379765 A JPH0379765 A JP H0379765A
Authority
JP
Japan
Prior art keywords
base
transport
roller
conveyance
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21577189A
Other languages
Japanese (ja)
Inventor
Shinichi Yamabe
真一 山辺
Norio Inoguchi
猪口 法男
Yasuhiro Haji
庸宏 土師
Shiro Takigawa
滝川 志朗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinmaywa Industries Ltd
Original Assignee
Shin Meiva Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Meiva Industry Ltd filed Critical Shin Meiva Industry Ltd
Priority to JP21577189A priority Critical patent/JPH0379765A/en
Publication of JPH0379765A publication Critical patent/JPH0379765A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To smoothly transfer a substrate holder by supporting a transport base for retaining the holder in an upright position in an appropriate transport position with a guide member and driving the holder through a rack at the lower end of the transport base. CONSTITUTION:The rectangular substrate holder 4 charged with plural film forming substrates is supported in an upright position by the plate-shaped transport base 10, and transported by a transport means 9 successively to the treating tanks 3a and 3b formed by a partition wall 1 having a vertically long rectangular cross section. At this time, the transport position of the base 10 is kept by the guide member 14 consisting of three fixing rollers 22 triangularly arranged on one side of the base 10 in the partition wall 1 and a press roller 23 arranged at a position corresponding to the center of the triangle. A pinion 29 is engaged with the rack 11 set on the lower end face of the base 10 and driven by a motor to transfer the base 10 by a lower roller 17. Consequently, the holder 4 is smoothly transferred, and the contamination of the film forming surface due to the diffusion of dust is prevented.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、基板ホルダを立姿勢で移送して成膜を行う
真空成膜装置において、基板ホルダの搬送手段を改良し
たものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention is a vacuum film forming apparatus that performs film formation by transporting a substrate holder in an upright position, with an improved means for transporting a substrate holder.

(従来の技術) 例えば、搬送成膜装置では、板面がほぼ垂直面に沿う立
姿勢で基板ホルダを支持し、これを搬送手段で移送し、
一連の処理槽を通過させて成膜を行う。こうした成膜装
置における従来の搬送手段としては、例えば第10図に
示す構造のものが公知である。
(Prior art) For example, in a transporting film forming apparatus, a substrate holder is supported in an upright position with the plate surface substantially along a vertical plane, and this is transported by a transporting means.
The film is formed by passing through a series of processing tanks. As a conventional conveying means in such a film forming apparatus, one having a structure shown in FIG. 10, for example, is known.

第10図において、基板ホルダ36は搬送ベース37に
よって立姿勢に支持されており、この搬送ベース37を
介して搬送手段で送り駆動される。
In FIG. 10, the substrate holder 36 is supported in an upright position by a transport base 37, and is driven to be fed by a transport means via the transport base 37.

搬送手段は、搬送ベース37の一側に固定されるラック
38と、このラック38を送り駆動するピニオン39と
、搬送ベース37をピニオン39の側へ押付操作する押
えローラ40.及び搬送ベース37の下端面を支持する
遊転ローラ41などで構成されている。42はピニオン
3つを回転駆動するモータ、43は大気を遮断する隔壁
である。
The conveyance means includes a rack 38 fixed to one side of the conveyance base 37, a pinion 39 that feeds and drives the rack 38, and a presser roller 40 that presses the conveyance base 37 toward the pinion 39. and an idling roller 41 that supports the lower end surface of the conveyance base 37. 42 is a motor that rotates three pinions, and 43 is a partition wall that blocks the atmosphere.

このように、真空成膜装置に適用される搬送手段は、そ
の回転部や摺動部からの発塵によって成膜面が汚染され
るのを極力避けるために、全ての構成部材が基板ホルダ
36の下方に集約して配置してある。
In this way, in the conveying means applied to the vacuum film forming apparatus, all the constituent members are mounted on the substrate holder 36 in order to prevent the film forming surface from being contaminated by dust generated from the rotating and sliding parts. They are arranged in a concentrated manner below the .

(発明が解決しようとする課題) 上記のように、搬送ベース37の一側にラック38を固
定し、これを縦軸回りに回転するピニオン39で送り駆
動するものでは、ラック38とピニオン39との噛み合
い位置によって、搬送ベース37及び基板ホルダ36が
蛇行する不利を免れない。ピニオン3つの回転力によっ
て搬送ベース37に横向きのモーメントが作用し、また
、押えローラ40によって前記作用力に逆らう押付力が
加わるからである。
(Problem to be Solved by the Invention) As described above, in the case where the rack 38 is fixed to one side of the conveyance base 37 and is fed and driven by the pinion 39 rotating around the vertical axis, the rack 38 and the pinion 39 are Depending on the meshing position of the transfer base 37 and the substrate holder 36, the disadvantage is that the transfer base 37 and the substrate holder 36 meander. This is because a horizontal moment acts on the conveyance base 37 due to the rotational force of the three pinions, and a pressing force is applied by the presser roller 40 that opposes the acting force.

基板ホルダ36及び搬送ベース37が蛇行すると、駆動
部などで発生した塵埃が拡散されやすく、成膜面を汚損
してしまう。また、基板ホルダ36に装填された成膜基
板が、蛇行時の衝撃によって装埴枠から脱落し、製品不
良を生じる不利もある。
When the substrate holder 36 and the transport base 37 meander, dust generated in the drive unit and the like is likely to be diffused, contaminating the film-forming surface. Further, there is also the disadvantage that the film-forming substrate loaded in the substrate holder 36 may fall off from the loading frame due to the impact during meandering, resulting in product defects.

上記の蛇行を阻止するには、押えローラ40やピニオン
3つの配置間隔を小さくし、これらの設置数を増加する
と良い。しかしこの場合は、機械運動部分の増加に伴う
発塵の増加を避けることができず、必ずしも成膜面の汚
染防止に役立つとはいえない。
In order to prevent the above-mentioned meandering, it is preferable to reduce the spacing between the presser roller 40 and the three pinions and increase the number of these. However, in this case, an increase in dust generation due to an increase in the number of mechanically moving parts cannot be avoided, and it cannot necessarily be said to be useful in preventing contamination of the film-forming surface.

基板ホルダ36が移送される一連の処理槽は、各処理工
程ごとにゲートで気密状に区切られており、基板ホルダ
36が前工程から送られて来る毎にゲートの開閉を行う
。このとき、隣接する処理区画内の雰囲気が互いに他方
に入り込み、その区画内を汚染する。そのため、ゲート
の開口幅はできるだけ小さいことが望まれる。しかし、
従来の搬送装置では、ゲートの開口幅として、少なくと
も搬送ベース37とラック38の突出量を加えた幅Bが
必要であり、各処理区画において早期に雰囲気汚染を生
じやすい点でも不利があった。
A series of processing tanks to which the substrate holders 36 are transferred are airtightly separated by gates for each processing step, and the gates are opened and closed each time a substrate holder 36 is transferred from the previous step. At this time, the atmospheres in adjacent processing compartments enter into each other and contaminate the interiors of the compartments. Therefore, it is desirable that the gate opening width be as small as possible. but,
In the conventional transfer device, the opening width of the gate needs to be at least the width B, which is the sum of the protrusion of the transfer base 37 and the rack 38, and there is also a disadvantage in that the atmosphere is likely to be contaminated early in each processing section.

この発明は上記に鑑み提案されたものであって、搬送手
段の駆動形態を改良することに、より、基板ホルダをよ
りスムーズに移送できるようにし、塵埃の拡散による成
膜面の汚損を防止し、同時に成膜基板の落下事故を一掃
することを目的とする。
This invention was proposed in view of the above, and by improving the drive form of the transport means, it is possible to transport the substrate holder more smoothly and prevent the film forming surface from being contaminated due to the diffusion of dust. At the same time, the aim is to eliminate accidents caused by falling film-forming substrates.

この発明の他の目的は、ゲートの開口幅を小さくできる
ようにし、隣接する処理区画間の雰囲気汚染を極力避け
ることにより、真空成膜装置の運転コストを低減するこ
とにある。
Another object of the present invention is to reduce the operating cost of the vacuum film forming apparatus by reducing the opening width of the gate and avoiding atmospheric contamination between adjacent processing sections as much as possible.

(課題を解決するための手段) この発明では、搬送手段を、搬送ベースの両側面及び下
側をそれぞれ転動案内して立姿勢を維持するガイド部材
と、搬送ベースの下面側から該ベースに前進力を付与す
る駆動部材とで構成する。
(Means for Solving the Problems) In the present invention, the conveying means includes a guide member that rolls and guides both sides and the lower side of the conveying base to maintain an upright position, and a guide member that rolls and guides both sides and the lower side of the conveying base, and It consists of a drive member that applies forward force.

ガイド部材は、搬送ベースのflを支持する下部ローラ
と、搬送ベースを間に挾んで該ベースの両側に配置され
る一組のローラ対からなり、上下に配置される複数の固
定ローラと、搬送ベースを固定ローラに向って押付操作
する押えローラとで前記ローラ対を構成する。そして下
部ローラ及びローラ対を搬送路に沿って適当間隔おきに
配置した。
The guide member consists of a lower roller supporting fl of the conveyance base, a pair of rollers placed on both sides of the base with the conveyance base in between, and a plurality of fixed rollers placed above and below, The roller pair is constituted by a presser roller that presses the base toward the fixed roller. The lower roller and roller pairs were arranged at appropriate intervals along the conveyance path.

(作用) 搬送ベースは下部ローラで重量が支えられ、その両側を
挾む複数の固定ローラ及び押えローラで常に立姿勢が維
持される。そして、搬送ベースの下方に設けた駆動部材
によって送り駆動される。
(Function) The weight of the transport base is supported by the lower rollers, and the vertical position is always maintained by a plurality of fixed rollers and presser rollers sandwiching the transport base on both sides. Then, it is fed and driven by a drive member provided below the conveyance base.

つまり、上記の各ローラからなるガイド部材で搬送ベー
スの搬送姿勢を規制し、その送り駆動を搬送ベースの下
方で行うので、基板ホルダ及び搬送ベースは、蛇行を生
じることなくスムーズに移送され、蛇行に伴う塵埃の拡
散及び成膜基板の落下を解消できる。
In other words, the transport posture of the transport base is regulated by the guide member consisting of the above-mentioned rollers, and the feeding drive is performed below the transport base, so the substrate holder and transport base are transported smoothly without meandering, and This eliminates the problem of dust diffusion and falling of the film-forming substrate.

搬送ベースの姿勢保持を行うガイド部材の全てを搬送路
に沿って設け、しかも搬送ベースをその下方に設けた駆
動部材で送り駆動するようにしたので、ゲートにおける
搬送ベースの通過開口幅を、搬送さ−スの厚みに若干の
余裕を加えた幅に減少することができ、これによりゲー
ト開閉時の隣接する処理区画間の雰囲気汚染を十分に低
減できることとなった。
All of the guide members that maintain the posture of the transport base are provided along the transport path, and the transport base is driven by a drive member provided below, so the width of the passage opening of the transport base at the gate is The width can be reduced to the thickness of the space plus a slight margin, thereby making it possible to sufficiently reduce atmospheric contamination between adjacent processing sections when the gates are opened and closed.

(実施例) 第1図ないし第7図はこの発明を搬送成膜装置に適用し
た実施例を示す。
(Embodiment) FIGS. 1 to 7 show an embodiment in which the present invention is applied to a conveying film forming apparatus.

第3図において、搬送成膜装置は、上下に長い長方形断
面状の隔壁1を直線状に配置し、その内部を各処理工程
ごとにゲート2で区分して処理冶を形成し、基板ホルダ
4が一連の処理槽を順次通過することにより、基板ホル
ダ4に装填された一部の成膜基板に、複数層の蒸着薄膜
を形成するものである。搬送成膜装置のうち、入口槽3
aと加熱槽3bとスパッタ槽3cの一部だけを第3図に
示している。上記の各処理WJ3a、3b、3cには、
処理内容に応じてヒータ5,6やスパッタリング装置7
.8などが設けられている。また、図示していないが、
各処理槽3 a、  3 b*  3 cのそれぞれに
は、排気設備が独立運転可能に設けられている。
In FIG. 3, the transport film forming apparatus has vertically long rectangular cross-sectional partition walls 1 arranged linearly, the inside of which is divided by gates 2 for each processing step to form a processing chamber, and a substrate holder 4 By sequentially passing through a series of processing tanks, a plurality of layers of vapor-deposited thin films are formed on some of the film-forming substrates loaded in the substrate holder 4. Inlet tank 3 of the transport film forming equipment
Only a part of the heating tank 3b, the heating tank 3b, and the sputtering tank 3c are shown in FIG. Each of the above processing WJ3a, 3b, 3c includes:
Heaters 5, 6 and sputtering device 7 depending on the processing content
.. 8 etc. are provided. Also, although not shown,
Each of the processing tanks 3a, 3b*3c is provided with exhaust equipment that can be operated independently.

基板ホルダ4を一連の処理槽3a、  3b、  3c
に沿って移送するために搬送手段9が設けられている。
The substrate holder 4 is connected to a series of processing tanks 3a, 3b, 3c.
Conveying means 9 are provided for transporting along.

基板ホルダ4は矩形状に形成されており、その下端に搬
送ベース10が固定されている。第5図及び第6図に示
すように、搬送ベース10は前後に長い金属板状体から
なり、その下端面の長手方向全長に亘ってラック11を
形成し、ラック11の歯底面より上部の両側面に段部1
2が形成されている。
The substrate holder 4 is formed in a rectangular shape, and a transport base 10 is fixed to the lower end thereof. As shown in FIGS. 5 and 6, the conveyance base 10 is made of a metal plate-shaped body that is long in the front and back, and a rack 11 is formed over the entire length of the lower end surface in the longitudinal direction. Step 1 on both sides
2 is formed.

第4図において、搬送手段9は、搬送ベース10を介し
て基板ホルダ4の搬送姿勢を規定するガイド部材14と
、搬送ベース10を送り駆動する駆動部材15とからな
り、両部材14.15共、基板ホルダ4の移送方向の板
面幅より小さな隣接間隔で各処理槽3a、3b、3cに
配置されている。
In FIG. 4, the conveying means 9 includes a guide member 14 that defines the conveying attitude of the substrate holder 4 via the conveying base 10, and a driving member 15 that drives the conveying base 10, and both members 14 and 15 , are arranged in each processing tank 3a, 3b, 3c at an adjacent interval smaller than the width of the substrate holder 4 in the transfer direction.

ガイド部材14は、搬送ベース10を間に挾んで左右両
側に配置される4個一組のローラ対16と、搬送ベース
10の重量を支持する下部ローラ17とからなる。第6
図に示すように、下部ローラ17はブラケット18に水
平の軸19を介して遊転自在に支持さ、れており、その
ローラ周面で搬送ベース10の段部12を受止め支持し
ている。
The guide member 14 includes a set of four roller pairs 16 arranged on both left and right sides with the conveyance base 10 in between, and a lower roller 17 that supports the weight of the conveyance base 10. 6th
As shown in the figure, the lower roller 17 is freely rotatably supported by a bracket 18 via a horizontal shaft 19, and receives and supports the stepped portion 12 of the conveyance base 10 on the peripheral surface of the roller. .

この支持状態において、ラック11との接触を避けるた
めに、ローラ周面には逃げ満20が形成されている。
In this supported state, in order to avoid contact with the rack 11, a relief 20 is formed on the circumferential surface of the roller.

第5図において、ローラ対16は搬送ベース10の一側
において三角形状に配置される3個の固定ローラ22と
、これらローラ22の三角形中心位置に対応して配置さ
れ、搬送ベース10を固定ローラ22に向って押付操作
する押えローラ23とからなり、これら−群のローラに
よって搬送ベース10に立姿勢を維持する。第7図に示
すように、各固定ローラ22はローラホルダ24でそれ
ぞれ垂直軸回りに遊転自在に支持されている。また、押
えローラ23は揺動アーム25で垂直軸回りに遊転自在
に支持され、揺動アーム25をばね26で揺動付勢する
ことにより、常に搬送ベース10に圧接する。、27は
前記アーム25の揺動軸である。なお、揺動アーム25
は図外のストッパーで進出時の揺動限界位置が規制され
ており、これにより、押えローラ23と固定ローラ22
の対向間隔が、搬送ベース10の厚みより僅かに小さく
なるようにしている。
In FIG. 5, the roller pair 16 includes three fixed rollers 22 arranged in a triangular shape on one side of the conveyance base 10, and is arranged corresponding to the triangular center position of these rollers 22, and the roller pair 16 is arranged so that the conveyance base 10 is 22, and a presser roller 23 which is pressed toward the transport base 10, and these rollers maintain the vertical position of the transport base 10. As shown in FIG. 7, each fixed roller 22 is supported by a roller holder 24 so as to freely rotate around a vertical axis. Further, the presser roller 23 is supported by a swing arm 25 so as to freely rotate around a vertical axis, and is always pressed against the conveyance base 10 by swinging the swing arm 25 with a spring 26 . , 27 is a swing axis of the arm 25. Note that the swing arm 25
The rocking limit position when advancing is regulated by a stopper (not shown), and as a result, the presser roller 23 and fixed roller 22
The facing interval is made slightly smaller than the thickness of the conveyance base 10.

第7図において、駆動部材15は、搬送ベース10の下
端面に設けられたラック11と、このラック11を送り
駆動するピニオン29、及びピニオン29に回転力を出
力するモータ30などで構成されている。ピニオン29
は、隔壁1を内外に貫通する軸受ユニット31を介して
伝動軸32に支持されており、伝動軸32の外端に設け
た伝動機構33を介して、隣接するピニオン29に動力
を伝達する。伝動機構33は、例えばタイミングベルト
やチェーンなどを伝動媒体としており、各ピニオン2つ
が同期回転できるように構成されている。下部ローラ1
7を支持するブラケット18は、上記の軸受ユニット3
1上に固定されている。
In FIG. 7, the driving member 15 is composed of a rack 11 provided on the lower end surface of the conveyance base 10, a pinion 29 for feeding and driving the rack 11, a motor 30 for outputting rotational force to the pinion 29, etc. There is. pinion 29
is supported by a transmission shaft 32 via a bearing unit 31 that penetrates the partition wall 1 from inside to outside, and transmits power to the adjacent pinion 29 via a transmission mechanism 33 provided at the outer end of the transmission shaft 32. The transmission mechanism 33 uses, for example, a timing belt or a chain as a transmission medium, and is configured so that each two pinions can rotate synchronously. Lower roller 1
The bracket 18 supporting the bearing unit 7 is
It is fixed on 1.

!07図中、符号34は防塵区壁である。! In Figure 07, reference numeral 34 is a dust-proof wall.

次に搬送手段9の動作を説明する。Next, the operation of the conveying means 9 will be explained.

第3図に示すように、各処理槽3a、3b、3C内での
処理が終わると、人口のゲート2はそのままにして各処
理槽間のゲート2,2が開かれ、搬送手段9を起動して
基板ホルダ4が次工程へと送り込まれる。このとき、搬
送ベース10は第4図に示すように常に2組のガイド部
材14に支持されて適正な搬送姿勢に支持されている。
As shown in FIG. 3, when the processing in each processing tank 3a, 3b, 3C is completed, the gate 2 between each processing tank is opened, leaving the population gate 2 as it is, and the transport means 9 is started. Then, the substrate holder 4 is sent to the next process. At this time, the conveyance base 10 is always supported by two sets of guide members 14 to maintain an appropriate conveyance posture, as shown in FIG.

また、搬送ベース10は移送方向上手側のピニオン29
上を通過し終わる前に、次のピニオン2つと噛合して連
続的に定速度で送り駆動される。そして、基板ホルダ4
が各ゲート2を通過し終えるのと同時にゲート2を閉じ
、また、基板ホルダ4が所定位置に移動した状態で搬送
手段9を停止し、必要な処理を行う。この後、入口のゲ
ート2を開いて新規な基板ホルダ4を入口檜3aに送り
込み、上記の移送動作を繰り返し行って成膜が行われる
The transfer base 10 also has a pinion 29 on the upper side in the transfer direction.
Before it finishes passing over the top, it meshes with the next two pinions and is continuously driven and fed at a constant speed. Then, the substrate holder 4
At the same time as the substrate holder 4 finishes passing through each gate 2, the gate 2 is closed, and with the substrate holder 4 moved to a predetermined position, the transport means 9 is stopped and necessary processing is performed. Thereafter, the entrance gate 2 is opened, a new substrate holder 4 is sent into the entrance cypress 3a, and the above transfer operation is repeated to perform film formation.

移送時、搬送ベース10は常に2ないし3個の下部ロー
ラ17によって重量が支持されており、前後に傾動する
ことはない。また、搬送ベース10は3個の固定ローラ
22と1個の押えローラ23とからなるローラ対16の
少なくとも2組で挟み保持されて、その搬送姿勢が常に
適正な状態に維持されている。さらに、搬送ベース10
は、その下面においてピニオン29の駆動力を受けるの
で、送り駆動力によって横方向のモーメントを生じるこ
とがない。従って、搬送ベース10及び基板ホルダ4は
、各ガイド部材14間を移行する間に蛇行を生じること
はなく、常に円滑でスムーズな移動を行うことができる
。これにより、基板ホルダ4の蛇行に伴う塵埃の拡散を
解消できるのはもちろん、蛇行時の衝撃で或H基板が基
板ホルダ4から落下することも一掃できる。
During transport, the weight of the transport base 10 is always supported by two or three lower rollers 17, and the transport base 10 does not tilt back and forth. Further, the conveying base 10 is held between at least two pairs of rollers 16 consisting of three fixed rollers 22 and one presser roller 23, so that its conveying posture is always maintained in an appropriate state. Furthermore, the transport base 10
receives the driving force of the pinion 29 on its lower surface, so no lateral moment is generated by the feed driving force. Therefore, the transport base 10 and the substrate holder 4 do not meander while moving between the respective guide members 14, and can always move smoothly and smoothly. This not only eliminates the diffusion of dust caused by the meandering of the substrate holder 4, but also eliminates the possibility that some H substrates may fall from the substrate holder 4 due to impact during the meandering.

移送時に、ゲート2を通過するのは、搬送ベース10と
基板ホルダ4だけに限られる。しかも、送り駆動力を受
けるためのラック11は、搬送ベース10の下面に下向
に設けられている。従って、ゲート2における搬送ベー
ス10の通過開口幅は、搬送ベース10の板面厚みより
僅かに大きく設定してあればよく、ゲート開閉時におけ
る隣接する処理区画同士の雰囲気汚染を十分に低減する
ことができる。
During transfer, only the transfer base 10 and substrate holder 4 pass through the gate 2. Moreover, the rack 11 for receiving the feed driving force is provided on the lower surface of the conveyance base 10 facing downward. Therefore, the passage opening width of the transfer base 10 in the gate 2 only needs to be set slightly larger than the plate surface thickness of the transfer base 10, and it is sufficient to sufficiently reduce atmospheric contamination between adjacent processing sections when the gate is opened and closed. I can do it.

(別実施例) 第8図及び第9図は、それぞれローラ対16の別実施例
を示している。
(Another Embodiment) FIGS. 8 and 9 each show another embodiment of the roller pair 16.

第8図に示すものでは、上下一対の固定ローラ22と、
両ローラ22の上下中央位置に対応して配置される押え
ローラ23との合計3個のローラによってローラ対16
を構成した。
In the one shown in FIG. 8, a pair of upper and lower fixed rollers 22,
The roller pair 16 is operated by a total of three rollers, including a presser roller 23 arranged corresponding to the upper and lower center positions of both rollers 22.
was configured.

また、第9図に示すものでは、四角形状に配置した4個
の固定ローラ22と、これらローラ22の四角形中心に
対応して配置した押えローラ23との合計5個のローラ
でローラ対16を構成した。
In addition, in the roller pair 16 shown in FIG. 9, a total of five rollers, including four fixed rollers 22 arranged in a square shape and a presser roller 23 arranged corresponding to the center of the square of these rollers 22, are used. Configured.

このように、ローラ対16は上下に離して配置される複
数個の固定ローラ22と、少なくとも一個の押えローラ
23とで構成してあればよい。
In this way, the roller pair 16 only needs to be composed of a plurality of fixed rollers 22 and at least one presser roller 23 arranged vertically apart.

駆動部材15は、ピニオン−ラック機構以外の機構を適
用することもできる。例えば、搬送ベース10の下面近
傍にチェーン機構を設け、チェーンリンクに固定した駆
動爪で搬送ベース10を送り駆動することもできる。ま
た、下部ローラ17を増設し、その一部または全部を回
転駆動して、搬送ベース10を送り駆動することもでき
る。要は、搬送ベース10に横向きのモーメントが生じ
ない駆動形態であれば、その構造は特に限定しない。
A mechanism other than the pinion-rack mechanism can also be applied to the drive member 15. For example, a chain mechanism may be provided near the lower surface of the transport base 10, and the transport base 10 may be fed and driven by a drive claw fixed to the chain link. Further, it is also possible to add the lower roller 17 and rotate a part or all of the lower roller 17 to feed the conveyance base 10. In short, the structure is not particularly limited as long as the drive type does not generate a lateral moment on the transport base 10.

この発明は、搬送成膜装置以外に種々の方式の真空成膜
装置にも適用できる。
The present invention can be applied to various types of vacuum film forming apparatuses in addition to conveyance film forming apparatuses.

(発明の効果) 以上説明したように、この発明では、搬送ベースの搬送
姿勢を規定するガイド部材と、搬送ベースを送り駆動す
る駆動部材とに分けて搬送手段を構成し、駆動部材は搬
送ベースに対してその下面側から前進力を付与するよう
にした。また、搬送ベースのff1ffiを支持する下
部ローラと、搬送ベースの両側面を挾み保持するローラ
対とでガイド手段を構成し、特に、上下に配置される固
定ローラと、搬送ベースを固定ローラと、搬送ベースを
固定ローラに向って押付操作する押えローラとでローラ
対を形成し、搬送ベースの搬送姿勢を常に適正な状態に
維持できるようにした。
(Effects of the Invention) As explained above, in the present invention, the conveyance means is configured by being divided into a guide member that defines the conveyance posture of the conveyance base, and a drive member that feeds and drives the conveyance base. The forward force is applied from the bottom side of the object. Further, a guide means is constituted by a lower roller that supports ff1ffi of the transport base and a pair of rollers that sandwich and hold both sides of the transport base, and in particular, fixed rollers arranged above and below, and a fixed roller that connects the transport base to the fixed roller. , and a presser roller that presses the conveyance base toward the fixed roller form a roller pair, so that the conveyance posture of the conveyance base can always be maintained in an appropriate state.

従って、上記搬送手段によれば、移送時に搬送ベースに
横向きのモーメントが作用して蛇行することを解消し、
基板ホルダを常に一定姿勢で円滑に移送できることとな
った。これにより、基板ホルダが蛇行して塵埃が拡散し
、成膜面が汚損されることを解消できるとともに、蛇行
時の衝撃で成膜基板が基板ホルダから落下して製品不良
を生じることも一掃できることとなった。
Therefore, according to the above-mentioned conveyance means, it is possible to eliminate meandering caused by a lateral moment acting on the conveyance base during conveyance,
The substrate holder can now be transferred smoothly and always in a constant posture. This eliminates the problem of the substrate holder meandering, causing dust to spread, and contaminating the film-forming surface, as well as eliminating the possibility of the film-forming substrate falling from the substrate holder due to impact during meandering, resulting in product defects. It became.

また、この発明では、搬送ベースの搬送姿勢を保持する
ガイド部材に全てを搬送路に沿って設け、しかも搬送ベ
ースの送り駆動をベース下面側で行うようにしたので、
各ゲートを通過する部材を搬送ベースと基板ホルダだけ
に限ることができ、ゲートの通過開口幅を従来装置に比
べて十分に小さくできることとなった。これにより、ゲ
ートの開閉時に、隣接する処理区画内の雰囲気が互いに
汚染されることを極力避けることができ、真空成膜装置
の運転コストを低減することができる点で有利である。
Furthermore, in this invention, all of the guide members that maintain the transport posture of the transport base are provided along the transport path, and the transport drive of the transport base is performed on the bottom surface of the base.
The members that pass through each gate can be limited to only the transfer base and the substrate holder, and the width of the gate passage opening can be made sufficiently smaller than in conventional devices. This is advantageous in that it is possible to avoid mutual contamination of atmospheres in adjacent processing compartments as much as possible when the gates are opened and closed, and the operating cost of the vacuum film forming apparatus can be reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図ないし第7図はこの発明の実施例を示し、第1図
は搬送手段の概略構造を示す説明図、第2図は第1図に
おけるA−A線矢視図、第3図は搬送成膜装置の概略を
示す内部平面図、第4図は搬送手段の配置構造を示す平
面図、第5図は第4図におけるB−B線矢視図、第6図
は第5図におけるC−C線断面図、第7図は第5図にお
けるD−り線断面図である。 第8図及び第9図は、それぞれローラ対の別実施例を示
す要部側面図である。 第10図は従来の搬送手段を示す説明図である。 4・・・基板ホルダ、9・・・搬送手段、10・・・搬
送ベース、14・・・ガイド部材、15・・・駆動部材
、]6・・・ローラ対、17・・・下部ローラ、22・
・・固定ローラ、23・・・押えローラ。 ほか2名
1 to 7 show embodiments of the present invention, FIG. 1 is an explanatory diagram showing the schematic structure of the conveyance means, FIG. 2 is a view taken along the line A-A in FIG. 1, and FIG. 4 is a plan view showing the arrangement structure of the transport means, FIG. 5 is a view taken along line B-B in FIG. 4, and FIG. 7 is a cross-sectional view taken along line C--C, and FIG. 7 is a cross-sectional view taken along line D in FIG. FIGS. 8 and 9 are side views of essential parts showing other embodiments of the roller pair, respectively. FIG. 10 is an explanatory diagram showing a conventional conveying means. 4... Substrate holder, 9... Conveyance means, 10... Conveyance base, 14... Guide member, 15... Drive member,] 6... Roller pair, 17... Lower roller, 22・
... Fixed roller, 23... Presser roller. 2 others

Claims (2)

【特許請求の範囲】[Claims] (1)複数の成膜基板が装填された基板ホルダを板状の
搬送ベースで立姿勢に支持し、搬送ベースを搬送路に沿
って設置された搬送手段で移送する真空成膜装置であっ
て、 搬送手段は、搬送ベースの両側面及び下側をそれぞれ転
動案内して立姿勢を維持するガイド部材と、搬送ベース
の下面側から該ベースに前進力を付与する駆動部材とか
らなり、 前記ガイド部材は、搬送ベースの重量を支持する下部ロ
ーラと、搬送ベースを間に挾んで該ベースの両側に配置
される一組のローラ対からなり、 上下に配置される複数の固定ローラと、搬送ベースを固
定ローラに向って押付操作する押えローラとで前記ロー
ラ対を構成し、 下部ローラ及びローラ対を搬送路に沿って適当間隔おき
に配置した真空成膜装置。
(1) A vacuum film forming apparatus in which a substrate holder loaded with a plurality of film forming substrates is supported in an upright position by a plate-shaped transport base, and the transport base is transported by a transport means installed along a transport path. , the conveying means includes a guide member that rolls and guides both sides and the lower side of the conveying base to maintain the vertical position, and a driving member that applies forward force to the base from the lower side of the conveying base, The guide member consists of a lower roller that supports the weight of the conveyance base, a pair of rollers placed on both sides of the base with the conveyance base in between, a plurality of fixed rollers placed above and below, and a pair of rollers that support the weight of the conveyance base. A vacuum film forming apparatus, wherein the roller pair is constituted by a presser roller that presses the base toward the fixed roller, and the lower roller and the roller pair are arranged at appropriate intervals along the conveyance path.
(2)駆動部材が、搬送ベースの下端に設けられるラッ
クと、このラックを送り駆動するピニオン、及びピニオ
ンに回転力を供給するモータとで構成してある請求項(
1)記載の真空成膜装置。
(2) A claim in which the driving member is composed of a rack provided at the lower end of the conveyance base, a pinion that feeds and drives the rack, and a motor that supplies rotational force to the pinion.
1) The vacuum film forming apparatus described above.
JP21577189A 1989-08-21 1989-08-21 Vacuum film forming device Pending JPH0379765A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21577189A JPH0379765A (en) 1989-08-21 1989-08-21 Vacuum film forming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21577189A JPH0379765A (en) 1989-08-21 1989-08-21 Vacuum film forming device

Publications (1)

Publication Number Publication Date
JPH0379765A true JPH0379765A (en) 1991-04-04

Family

ID=16677954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21577189A Pending JPH0379765A (en) 1989-08-21 1989-08-21 Vacuum film forming device

Country Status (1)

Country Link
JP (1) JPH0379765A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994021839A1 (en) * 1993-03-15 1994-09-29 Kabushiki Kaisha Kobeseikosho Apparatus and system for arc ion plating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994021839A1 (en) * 1993-03-15 1994-09-29 Kabushiki Kaisha Kobeseikosho Apparatus and system for arc ion plating

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