JPH0397858A - Vacuum treating apparatus - Google Patents

Vacuum treating apparatus

Info

Publication number
JPH0397858A
JPH0397858A JP23612289A JP23612289A JPH0397858A JP H0397858 A JPH0397858 A JP H0397858A JP 23612289 A JP23612289 A JP 23612289A JP 23612289 A JP23612289 A JP 23612289A JP H0397858 A JPH0397858 A JP H0397858A
Authority
JP
Japan
Prior art keywords
substrate holder
substrate
rollers
roller
guide member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23612289A
Other languages
Japanese (ja)
Inventor
Shinichi Yamabe
真一 山辺
Shiro Takigawa
滝川 志朗
Makoto Hiramine
平峯 誠
Takeshi Kawana
川名 武
Hiroyuki Kataoka
宏之 片岡
Noriyuki Dairoku
範行 大録
Katsuo Abe
勝男 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Shinmaywa Industries Ltd
Original Assignee
Hitachi Ltd
Shin Meiva Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Shin Meiva Industry Ltd filed Critical Hitachi Ltd
Priority to JP23612289A priority Critical patent/JPH0397858A/en
Publication of JPH0397858A publication Critical patent/JPH0397858A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To smoothly convey a substrate holder and to prevent contamination and fall-down of a substrate by supporting the substrate holder, which held with fixed rollers and pushing rollers in guide member under standing posture, with plural friction rollers in driving member. CONSTITUTION:The substrate holder 4 loaded with plural treating substrates is held under the standing posture with conveying means 9 and conveyed to a treating member to apply the desired vacuum treatment to the above substrate. In the above vacuum treating apparatus, the conveying means 9 is constituted of the guide member 10 holding the standing posture while holding lower side face of the substrate holder 4 and the driving means 11 giving advancing force while receiving and supporting the substrate holder 4. Further, the above guide member 10 is composed of the fixed rollers 13 fitted to H-shaped brackets 15 and the pushing rollers 14 pushing the substrate holder 4 toward the fixed rollers 13, and the substrate holder is held from both sides. On the other hand, plural pieces of the friction rollers 25 in the driving member 11 are driven while rotating through sprockets, chain, etc. By this method, the substrate 4 is smoothly shifted, and the contamination of treating surface caused by diffusion of dust, is prevented, and the fall-down accident of treating substrate is eliminated.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、基板ホルダを立姿勢で移送して例えば成膜
などの処理を行う真空処理装置において、基板ホルダの
搬送手段を改良したものである。
[Detailed Description of the Invention] (Industrial Application Field) The present invention is an improved means for transporting a substrate holder in a vacuum processing apparatus that transports the substrate holder in an upright position to perform processing such as film formation. be.

(従来の技術) 例えば、真空処理装置では、仮面がほぼ垂直面に沿う立
姿勢で基板ホルダを支持し、これを搬送手段で移送し、
一連の処理槽を通過させて例えば成膜などの処理を行う
。こうした真空処理装置における従来の搬送手段として
は、例えば第10図に示す構造のものが公知である。
(Prior Art) For example, in a vacuum processing apparatus, a mask supports a substrate holder in an upright position along a substantially vertical plane, and this is transported by a transport means.
The material is passed through a series of processing tanks to perform processing such as film formation. As a conventional conveying means in such a vacuum processing apparatus, for example, one having a structure shown in FIG. 10 is known.

第10図において、基板ホルダ46は搬送べ一ス47に
よって立姿勢に支持されており、この搬送ベース47を
介して搬送手段で送り駆動される。
In FIG. 10, the substrate holder 46 is supported in an upright position by a transport base 47, and is driven to be fed by a transport means via the transport base 47.

搬送手段は、搬送ベース47の一側に固定されるラック
48と、このラック48を送り駆動するビニオン49と
、搬送ベース47をビニオン49の側へ押付操作する押
えローラ50,及び搬送べ−ス47の下端面を支持する
逆転ローラ51などで構成されている。52はビニオン
49を回転駆動するモータ、53は大気を遮断する隔壁
である。
The conveyance means includes a rack 48 fixed to one side of the conveyance base 47, a binion 49 that drives the rack 48, a presser roller 50 that presses the conveyance base 47 toward the binion 49, and a conveyance base. It is composed of a reversing roller 51 that supports the lower end surface of the roller 47, and the like. 52 is a motor that rotationally drives the binion 49, and 53 is a partition wall that blocks the atmosphere.

このように、真空処理装置に適用される搬送手段は、そ
の回転部や摺動部からの発塵によって処理而が汚染され
るのを極力避けるために、全ての構或部材が基板ホルダ
46の下方に集約して配置してある。
In this manner, all the structural members of the conveying means applied to the vacuum processing apparatus are connected to the substrate holder 46 in order to avoid contamination of the processing apparatus by dust generated from the rotating and sliding parts. They are arranged in a concentrated manner at the bottom.

(発明が解決しようとする課題) 上記のように、搬送ベース47の一側にラック48を固
定し、これを縦軸回りに回転するビニオン4つで送り駆
動するものでは、ラック48とピニオン49との噛み合
い位置によって、搬送べ−ス47及び基板ホルダ46が
蛇行する不利を免れない。ビニオン49の回転力によっ
て搬送ベース47に横向きのモーメントが作用し、また
、押えローラ50によって前記作用力に逆らう押付力が
加わるからである。
(Problems to be Solved by the Invention) As described above, in the case where the rack 48 is fixed to one side of the conveyance base 47 and is fed and driven by four pinions rotating around the vertical axis, the rack 48 and the pinion 49 are The transfer base 47 and the substrate holder 46 are unavoidably meandering depending on their engagement position. This is because a horizontal moment acts on the conveyance base 47 due to the rotational force of the pinion 49, and a pressing force is applied by the presser roller 50 that opposes the acting force.

基板ホルダ46及び搬送ベース47が蛇行すると、駆動
部などで発lELた塵埃が拡散されやすく、処理面を汚
損してしまう。また、基板ホルダ46に装填された処理
基板が、蛇行時の衝撃によって装填枠から脱落し、製品
不良を生じる不利もある。
When the substrate holder 46 and the transfer base 47 meander, dust generated by the drive unit and the like is likely to be diffused, contaminating the processing surface. Further, there is also the disadvantage that the processed substrate loaded in the substrate holder 46 may fall off from the loading frame due to the impact during meandering, resulting in product defects.

上記の蛇行を阻止するには、押えローラ50やビニオン
49の配置間隔を小さくし、これらの設置数を増加する
と良い。しかしこの場合は、機械運動部分の増加に伴う
発塵量の増加を避けることができず、必ずしも処理面の
汚染防止に役立つとはいえない。
In order to prevent the above-mentioned meandering, it is preferable to reduce the arrangement interval of the presser roller 50 and the pinion 49 and increase the number of these. However, in this case, it is impossible to avoid an increase in the amount of dust generated due to the increase in mechanically moving parts, and it cannot be said that this is necessarily useful for preventing contamination of the processing surface.

基板ホルダ46が移送される一連の処理槽は、各処理工
程ごとにゲートで気密状に区切られており、基板ホルダ
46が前工程から送られてくる毎にゲートの開閉を行う
。このとき、隣接する処理区画内の雰囲気が互いに他方
に入り込み、その区画内を汚染する。そのため、ゲート
の開口幅はできるだけ小さいことが望まれる。しかし、
従来の搬送装置では、ゲートの開口幅として、少なくε
も搬送ベース47とラック48の突出量を加えた幅Bが
必要であり、各処理区画において早期に雰囲気汚染を生
じやすい点でも不利があった。
A series of processing tanks to which the substrate holders 46 are transferred are airtightly separated by gates for each processing step, and the gates are opened and closed each time a substrate holder 46 is transferred from the previous step. At this time, the atmospheres in adjacent processing compartments enter into each other and contaminate the interiors of the compartments. Therefore, it is desirable that the gate opening width be as small as possible. but,
In conventional conveying equipment, the opening width of the gate is as small as ε.
Also, a width B is required which is the sum of the protrusion of the transport base 47 and the rack 48, which is disadvantageous in that the atmosphere is likely to be contaminated early in each processing section.

基板ホルダ4は一連の処理槽を通過する間に、高温に加
熱され、あるいは常温付近まで冷却されるが、このとき
、基板ホルダ4と搬送ベース4の熱容量や熱歪量に差が
衝撃的な熱変形を生じて基板ホルダ4に装填された処理
基板が落下して製品不良を生じることもあった。
The substrate holder 4 is heated to a high temperature or cooled to around room temperature while passing through a series of processing tanks, but at this time, there is a shocking difference in heat capacity and thermal strain between the substrate holder 4 and the transfer base 4. In some cases, the processed substrate loaded in the substrate holder 4 may fall due to thermal deformation, resulting in product defects.

この発明は上記に鑑み提案されたものであって、搬送手
段の駆動形態を改良することにより、基板ホルダをより
スムーズに移送できるようにし、塵埃の拡散による処理
面の汚損を防止し、同時に処理基板の落下事故を一婦す
ることを目的とする。
This invention was proposed in view of the above, and by improving the drive form of the transport means, it is possible to transport the substrate holder more smoothly, prevent the processing surface from being contaminated due to the diffusion of dust, and at the same time The purpose is to eliminate accidents caused by falling boards.

この発明の他の目的は、ゲートの開口幅を小さくできる
ようにし、隣接する処理区画間の雰囲気汚染を極力避け
ることにより、真空処理装置の運転コストを低減するこ
とにある。
Another object of the present invention is to reduce the operating cost of the vacuum processing apparatus by reducing the opening width of the gate and avoiding atmospheric contamination between adjacent processing sections as much as possible.

(課題を解決するための手段) この発明では、搬送ベースを省略して基板ホルダを搬送
手段で直接送り駆動できるようにする。
(Means for Solving the Problems) In the present invention, the transport base is omitted so that the substrate holder can be directly fed and driven by the transport means.

また、機械的強度が必ずしも十分とは言えない基板ホル
ダを確実に送り駆動し、しかも駆動力にょって蛇行する
ことを防ぐために、搬送手段を姿勢保持用のガイド部材
と、前進力を付与する駆動部材とに分けて構或し、回転
部材の摩擦力によって基板ホルダの下面を送り操作する
こととした。
In addition, in order to reliably feed and drive the substrate holder, which cannot necessarily be said to have sufficient mechanical strength, and to prevent it from meandering due to the driving force, the conveying means is equipped with a guide member to maintain its posture and a forward force is applied. The lower surface of the substrate holder is moved by the frictional force of the rotating member.

具体的には、搬送手段を、基板ホルダの下部両側面を挾
んで立姿勢を維持するガイド部材と、基板ホルダを受止
め支持して該ホルダに前進力を付与する駆動部材とで構
戊した。ガイド部材は、基板ホルダの一側に配置される
固定ローラと、基板ホルダを固定ローラに向って押付操
作する押え口−ラとで構戊し、さらに、駆動部材は、一
群の四転駆動される摩擦ローラで構成した。
Specifically, the conveying means was composed of a guide member that holds both sides of the lower part of the substrate holder to maintain the vertical position, and a drive member that receives and supports the substrate holder and applies forward force to the holder. . The guide member includes a fixed roller disposed on one side of the substrate holder and a presser which presses the substrate holder toward the fixed roller, and the drive member includes a group of four-wheel drive members. It consists of friction rollers.

好ましくは、4gの固定ローラを矩形状に配置し、その
矩形中心位置に対応して押えローラを配置する。
Preferably, the 4g fixed rollers are arranged in a rectangular shape, and the presser roller is arranged corresponding to the center position of the rectangle.

(作用) ガイド部材で基板ホルダの立姿勢を維持し、この状態で
基板ホルダを一群の摩擦ローラで送り駆動するので、基
板ホルダに横向きのモーメントが作用することを解消で
きる。これにより蛇行を生しることなくスムーズに基板
ホルダを移送でき、基板ホルダの蛇行に伴う塵埃の拡散
や成膜基板の落下を解消できる。
(Function) Since the substrate holder is maintained in an upright position by the guide member, and in this state the substrate holder is fed and driven by a group of friction rollers, it is possible to eliminate the horizontal moment acting on the substrate holder. As a result, the substrate holder can be transferred smoothly without meandering, and it is possible to eliminate dust diffusion and falling of the film-forming substrate due to the meandering of the substrate holder.

基板ホルダをガイド部材及び駆動部材で直接送り駆動す
るので、ゲートにおける通過開口幅を基板ホルダの板厚
と同程度にまで減少でき、これによりゲート開閉時にお
ける隣接する処理区画内の雰囲気汚染を十分に低減でき
る。
Since the substrate holder is directly fed and driven by the guide member and drive member, the width of the passage opening at the gate can be reduced to the same level as the board thickness of the substrate holder, thereby sufficiently preventing atmospheric contamination in the adjacent processing section when the gate is opened and closed. can be reduced to

基板ホルダを搬送手段で直接送り駆動するので、その熱
歪等をホルダ板面の全面に亘って均一化でき、加熱時あ
るいは冷却時に基板ホルダが衝撃的に熱変形することを
解消して、処理基板の落下を防止できる。
Since the substrate holder is directly fed and driven by the transport means, the thermal distortion etc. can be made uniform over the entire surface of the holder plate, eliminating the shock thermal deformation of the substrate holder during heating or cooling, and processing. Prevents the board from falling.

(実施例) 第1図ないし第6図はこの発明を、真空或膜装置の一種
である搬送或膜装置に適用した実施例を示す。
(Embodiment) FIGS. 1 to 6 show an embodiment in which the present invention is applied to a conveying or membrane device, which is a type of vacuum or membrane device.

第3図において、搬送成膜装置は、上下に長い長方形断
面状の隔壁1を直線状に配置し、その内部を各処理工程
ごとにゲート2で区分して処理槽を形成し、基板ホルダ
4が一連の処理槽を順次通過することにより、基板ホル
ダ4に装填された一群の或膜基板に、複数層の蒸着薄膜
を形成するものである。搬送成膜装置のうち、入口f6
3aと加熱槽3bとスバッタ槽3Cの一部だけを第6図
に示している。上記の各処理槽3a,3b,3cには、
処理内容に応じてヒータやスパッタリング電極7,8な
どが設けられている。また、図示していないが、各処理
槽3a,3b,3cのそれぞれには、排気設備が独立運
転可能に設けられている。
In FIG. 3, the transport film forming apparatus has vertically long rectangular cross-sectional partition walls 1 disposed in a straight line, the inside of which is divided by gates 2 for each processing step to form a processing tank, and a substrate holder 4 By sequentially passing through a series of processing tanks, a plurality of vapor-deposited thin films are formed on a group of film substrates loaded in the substrate holder 4. Inlet f6 of the transport film forming device
3a, heating tank 3b, and part of spatter tank 3C are shown in FIG. In each of the above treatment tanks 3a, 3b, 3c,
A heater, sputtering electrodes 7, 8, etc. are provided depending on the processing content. Further, although not shown, each of the processing tanks 3a, 3b, and 3c is provided with exhaust equipment that can be operated independently.

基板ホルダ4を一連の処理槽3a,3b,3cに沿って
移送するために搬送手段9が設けられている。基板ホル
ダ4は矩形状に形或されており、その板面に多数個の成
膜基板が装填されている。
Transport means 9 are provided for transporting the substrate holder 4 along the series of processing tanks 3a, 3b, 3c. The substrate holder 4 has a rectangular shape, and a large number of film forming substrates are loaded on its plate surface.

第1図及び第2図において、搬送手段9は基板ホルダ4
の搬送姿勢を規定するガイド部材10と、基板ホルダ4
を送り駆動する駆動部材11とからなり、両部材10.
11共、基板ホルダ4の移送方向の板面幅より小さな隣
接間隔で各処理槽3a,3b,3cに配置されている。
In FIGS. 1 and 2, the transport means 9 is the substrate holder 4.
a guide member 10 that defines the transport attitude of the substrate holder 4;
and a drive member 11 that feeds and drives both members 10.
11 are arranged in each processing tank 3a, 3b, 3c at an interval smaller than the width of the board surface of the substrate holder 4 in the transfer direction.

ガイド部材10は、基板ホルダ4の一側下部において矩
形状に配置される4個の固定ローラ13と、これらロー
ラ13の矩形中心位置に対応して配置され、基板ホルダ
4を固定ローラ13に向って押付操作する押えローラ1
4とからなる。各固定ローラ13はH字状のブラケット
15で垂直軸回りに回転自在に支持されており、4個の
固定ローラ13が基板ホルダ4の板而に同時に外接する
よう配置されている。ブラケット15は後述する口−ラ
枠26上に固定されている。
The guide member 10 is arranged corresponding to four fixed rollers 13 arranged in a rectangular shape at the lower part of one side of the substrate holder 4 and the center position of the rectangle of these rollers 13, and guides the substrate holder 4 toward the fixed rollers 13. Presser roller 1 that is pressed by
It consists of 4. Each of the fixed rollers 13 is supported by an H-shaped bracket 15 so as to be rotatable around a vertical axis, and the four fixed rollers 13 are arranged so as to be in circumscribed contact with the plate of the substrate holder 4 at the same time. The bracket 15 is fixed on a lip frame 26, which will be described later.

第4図において、押えローラ14は、ベアリング16及
び軸17を介して揺動アーム18で垂直軸回りに回転自
在に支持されている。また、揺動アーム18は、ボス1
9で揺動軸20を介して水平揺動可能に支持され、さら
に、揺動軸20に外嵌した捻りコイルばね21で、固定
ローラ13に接近する側に向って揺動付勢されている。
In FIG. 4, the presser roller 14 is supported by a swing arm 18 via a bearing 16 and a shaft 17 so as to be rotatable around a vertical axis. The swing arm 18 also has a boss 1.
9, it is supported so as to be horizontally swingable via a swing shaft 20, and further swing-biased toward the side approaching the fixed roller 13 by a torsion coil spring 21 fitted onto the swing shaft 20. .

押えローラ14の揺動可能な範囲を規制するために、押
えローラ14の下方にストッパ22を設け、その上端に
形成したストッパ溝23内に、前記軸17の下端部17
aを臨ませている。ストツバ溝23の満幅は軸下端部1
7aの直径より僅かに大きく設定されており、特に、押
えローラ14の固定ローラ13寄りの揺動限界を規定す
ることによって、基板ホルダ4が押えローラに接当する
ときの衝撃を小さくできるようにしてある。なお、押え
ローラ14が基板ホルダ4に外接する状態では、軸下端
部17aはストッパ溝23のほぼ中央に位置している(
第3図参照)。前述のボス1つ及びストッパ22は、そ
れぞれローラ枠26に装着された支持枠24上に固定さ
れている。
In order to restrict the swingable range of the presser roller 14, a stopper 22 is provided below the presser roller 14, and the lower end 17 of the shaft 17 is placed in a stopper groove 23 formed at the upper end of the stopper 22.
I am facing a. The full width of the stop collar groove 23 is at the lower end of the shaft 1
The diameter of the substrate holder 4 is set to be slightly larger than the diameter of the presser roller 7a, and in particular, by defining the swing limit of the presser roller 14 toward the fixed roller 13, it is possible to reduce the impact when the substrate holder 4 comes into contact with the presser roller 13. There is. Note that when the presser roller 14 is in circumscribed contact with the substrate holder 4, the shaft lower end 17a is located approximately at the center of the stopper groove 23 (
(See Figure 3). The aforementioned one boss and the stopper 22 are each fixed on a support frame 24 mounted on a roller frame 26.

駆動部材11は、基板ホルダ4の下端面を支持する複数
の摩擦ローラ25と、各ローラ25を支持するローラ枠
26と、全ての摩擦ローラ25を回転駆動する駆動機+
R2T等で構成されている。
The drive member 11 includes a plurality of friction rollers 25 that support the lower end surface of the substrate holder 4, a roller frame 26 that supports each roller 25, and a drive machine that rotationally drives all the friction rollers 25.
It is composed of R2T, etc.

第2図に示すように、ローラ枠26は隔壁1に固定され
た軸受ユニット28と固定支軸2つとでその前後端が支
持され、水平姿勢を維持している。
As shown in FIG. 2, the roller frame 26 is supported at its front and rear ends by a bearing unit 28 fixed to the partition wall 1 and two fixed support shafts, and maintains a horizontal position.

摩擦ローラ25のうち、中間の2個は、ローラ枠26に
固定されたローラ軸30にベアリング31を介して水平
回転自在に支持されており(第5図2照)、軸受ユニッ
ト28の内端に位置する摩擦ローラ25は、軸受ユニッ
ト28で支持された入力軸32に同行回転可能に固定さ
れている。また、固定支軸29側の摩擦ローラ25は、
中間の摩擦ローラ25と同様にベアリング31で回転自
在に支持されている。4個の摩擦ローラ25は、基板ホ
ルダ4の下而に同時に接当するよう、その高さ位置が揃
えられている。
Of the friction rollers 25, the two middle ones are horizontally rotatably supported via bearings 31 on a roller shaft 30 fixed to the roller frame 26 (see FIG. 5, 2), and the inner end of the bearing unit 28 The friction roller 25 located at is fixed to an input shaft 32 supported by a bearing unit 28 so as to be rotatable therewith. Furthermore, the friction roller 25 on the fixed support shaft 29 side is
Like the intermediate friction roller 25, it is rotatably supported by a bearing 31. The height positions of the four friction rollers 25 are aligned so that they simultaneously contact the lower part of the substrate holder 4.

第2図において、駆動機{&27は、軸受ユニット28
の外端に設けられるモータ34を駆動源にして、その動
力を減速機35、カップリング36を介して入力軸32
に伝動し、この入力軸32とローラ輔30、及び固定支
輔29のそれぞれに支持されたスプロケッ1・37とチ
ェーン38を介して、各摩擦ローラ25に回転動力を伝
達する。人力1ib32においては、スブロケット37
が摩擦口−ラ25と同様に人力軸32に固定されている
In FIG. 2, the drive machine {&27 is the bearing unit 28
A motor 34 provided at the outer end of
Rotational power is transmitted to each friction roller 25 via the input shaft 32, the roller support 30, and the sprockets 1 and 37 supported by the fixed support 29, respectively, and the chain 38. For human power 1ib32, subrocket 37
is fixed to the human power shaft 32 in the same way as the friction port 25.

一方、ローラ軸30及び固定支軸2つにおいては、第5
図に示すように、スブロケット37が各軸30.29に
対してベアリング3つを介して回転自在に支持してある
。そして、スブロケット37ε摩擦ローラ25とは、ビ
ン40を介して連結され、スブロケット37の回転力が
摩擦ローラ25に伝達される。41はベアリング31と
39との間に設けられたスペーサである。
On the other hand, in the roller shaft 30 and the two fixed support shafts, the fifth
As shown in the figure, a subrocket 37 is rotatably supported on each shaft 30.29 via three bearings. The subrocket 37ε is connected to the friction roller 25 via a pin 40, and the rotational force of the subrocket 37 is transmitted to the friction roller 25. 41 is a spacer provided between the bearings 31 and 39.

次に搬送手段9の動作を説明する。Next, the operation of the conveying means 9 will be explained.

第6図において、各処理槽3a,3b、3c内での処理
が終わると、入口のゲート2はそのままにして各処理槽
間のゲート2,2が開かれ、搬送手段9を起動して基板
ホルダ4が次工程へと送り込まれる。このとき、基板ホ
ルダ4は少なくとも一組のガイド部材]0に支持されて
適正な搬送姿勢に保持されている。また、基板ホルダ4
は、少なくとも3個の摩擦ローラ25で支持されて、各
ローラ25から均等な送り力を受けて前進する。
In FIG. 6, when the processing in each of the processing tanks 3a, 3b, and 3c is completed, the gates 2 and 2 between the processing tanks are opened, leaving the entrance gate 2 as it is, and the transport means 9 is activated to transfer the substrates. The holder 4 is sent to the next process. At this time, the substrate holder 4 is supported by at least one set of guide members [0] and held in an appropriate conveyance posture. In addition, the substrate holder 4
is supported by at least three friction rollers 25 and moves forward by receiving equal feeding force from each roller 25.

そして、基板ホルダ4が各ゲート2を通過し終えるのと
同時にゲート2を閉じ、さらに、基板ホルダ4が所定位
置に移動した状態で搬送手段9を停止させ、必要な処理
を行う。この後、入口のゲ−ト2を開いて未処理の基板
ホルダ4を入口槽3aに送り込み、上記の移送動作を繰
り返し行って或膜を行う。
Then, at the same time as the substrate holder 4 finishes passing through each gate 2, the gate 2 is closed, and further, the transfer means 9 is stopped with the substrate holder 4 moved to a predetermined position, and necessary processing is performed. Thereafter, the entrance gate 2 is opened, the untreated substrate holder 4 is sent into the entrance tank 3a, and the above transfer operation is repeated to perform a certain film.

移送時、基板ホルダ4は固定ローラ13及び押えローラ
14で挾まれて、その搬送姿勢が常に適正な状態に維持
されている。しかも、基板ホルダ4は3ないし4個の摩
擦ローラ25に支持されて該ローラ25から駆動力を受
ける。従って、基板ホルダ4に横向きのモーメントが作
用することはなく、蛇行を伴うことなく円滑な移送を行
える。
During transportation, the substrate holder 4 is held between a fixed roller 13 and a presser roller 14, so that its transportation posture is always maintained in an appropriate state. Furthermore, the substrate holder 4 is supported by three or four friction rollers 25 and receives driving force from the rollers 25. Therefore, no lateral moment acts on the substrate holder 4, and smooth transfer can be performed without meandering.

これにより、基板ホルダ4が蛇行することによる塵埃の
拡散を解消できるのはもちろん、蛇行時の衝撃で或膜基
板が装填枠から落下することも防止できる。
This not only eliminates the diffusion of dust caused by the meandering of the substrate holder 4, but also prevents some film substrates from falling from the loading frame due to the impact caused by the meandering.

基板ホルダ4は搬送手段9で直接送り駆動される。つま
り、移送時にゲート2を通過するのは、基板ホルダ4だ
けに限られる。従って、各ゲート2における通過開口幅
は、基板ホルダ4の板面厚より僅かに大きく設定してあ
ればよく、ゲート開閉時における隣接区画同士の雰囲気
汚染を十分に低減することができる。
The substrate holder 4 is directly fed and driven by the conveyance means 9. In other words, only the substrate holder 4 passes through the gate 2 during transfer. Therefore, the width of the passage opening in each gate 2 only needs to be set slightly larger than the plate surface thickness of the substrate holder 4, and it is possible to sufficiently reduce atmospheric contamination between adjacent sections when the gates are opened and closed.

一群の回転駆動される摩擦ローラ25で基板ホルダ4を
送り駆動するので、各処理m3a、3b,3Cに設けら
れる摩擦口−ラ25を同期駆動する必要がなく、例えば
、ビニオンーラックを駆動要素とする搬送手段に比べて
、搬送手段9の構造及び速度制御を簡素化できる点で有
利である。
Since the substrate holder 4 is fed and driven by a group of rotationally driven friction rollers 25, there is no need to synchronously drive the friction holes 25 provided in each process m3a, 3b, 3C, and for example, a binion rack can be used as a driving element. This is advantageous in that the structure and speed control of the transport means 9 can be simplified compared to the transport means.

(別実施例) 第7図〜第9図は、それぞれガイド部材10の別実施例
を示している。
(Another Embodiment) FIGS. 7 to 9 each show another embodiment of the guide member 10.

第7図に示すものでは、上下一対の固定ローラ13と、
両ローラの上下中央位置に対応して配置される押えロー
ラ14との合計3個のローラによってガイド部材10を
構或した。
In the one shown in FIG. 7, a pair of upper and lower fixed rollers 13,
The guide member 10 is constituted by a total of three rollers including a presser roller 14 disposed corresponding to the upper and lower center positions of both rollers.

また第8図に示すものでは、三角形状に配置した固定ロ
ーラ13と、これらローラの三角形中心位置に対応して
配置した押えローラ14との合計4個のローラでガイド
部材10を構成した。
In the example shown in FIG. 8, the guide member 10 is composed of a total of four rollers: a fixed roller 13 arranged in a triangular shape and a presser roller 14 arranged corresponding to the center position of the triangle.

さらに第9図に示すものでは、支軸の両端に固定ローラ
部分13a,13bを一体的に設けて単ーの固定ローラ
13を構或している。そして、この固定ローラ部分13
a  13bの中間位置に押えローラl4を配置し、単
一の固定ローラ13と単一の押えローラ14とでガイド
部材10を構成した。
Furthermore, in the one shown in FIG. 9, a single fixed roller 13 is constructed by integrally providing fixed roller portions 13a and 13b at both ends of the support shaft. And this fixed roller portion 13
A presser roller l4 was disposed at an intermediate position between a 13b, and the guide member 10 was constituted by a single fixed roller 13 and a single presser roller 14.

上記のように、ガイド部材10は、少なくとも一個の固
定ローラ13と、少なくとも一個の押えローラ14で構
戊してあればよい。
As described above, the guide member 10 only needs to be composed of at least one fixed roller 13 and at least one presser roller 14.

一群の摩擦押えローラ25は、全て回転駆動することが
好ましいが、場合によっては遊転ローラを含んで構成し
てあってもよい。
It is preferable that all of the friction pressing rollers 25 in the group are driven to rotate, but in some cases, they may be configured to include idle rollers.

この発明は、搬送或膜装置以外に種々の方式の真空成膜
装置にも適用できる。例えば、多数個の基板ホルダを成
膜室に搬送して集約的に成膜を行うようにした真空成膜
装置に適用できる。
The present invention can be applied to various types of vacuum film forming apparatuses in addition to conveyance film apparatuses. For example, the present invention can be applied to a vacuum film forming apparatus that transports a large number of substrate holders to a film forming chamber and performs film forming in a concentrated manner.

また本発明は成膜以外の処理を施すようにした種々の真
空処理装置に対して広く適用することができる。
Furthermore, the present invention can be widely applied to various vacuum processing apparatuses that perform processes other than film formation.

(発明の効果) 以上説明したように、この発明では、搬送手段を、基板
ホルダの搬送姿勢を保持するガイド部材と、基板ホルダ
を送り駆動する駆動部材とに分けて構成し、駆動部材は
基板ホルダに対してその下面側から前進力を与えるよう
にしたので、移送時に基板ホルダに横向きのモーメント
が作用して蛇行することを解消し、基板ホルダを常に適
正な搬送姿勢で円滑に移送できることとなった。これに
より、基板ホルダが蛇行して塵埃が拡散し、或膜面が汚
損されることを解消できるとともに、蛇行時の衝撃で成
膜基板が落下して製品不良を生じることも一掃できるこ
ととなった。
(Effects of the Invention) As explained above, in the present invention, the conveyance means is configured to be divided into a guide member that maintains the conveyance posture of the substrate holder and a drive member that feeds and drives the substrate holder. Since the forward force is applied to the holder from the lower surface side, it is possible to eliminate the meandering caused by a lateral moment acting on the substrate holder during transfer, and to ensure that the substrate holder is always transferred smoothly with an appropriate transfer posture. became. This eliminates the problem of the substrate holder meandering, causing dust to spread, and contaminating certain film surfaces, as well as eliminating the possibility of the film-forming substrate falling due to impact during meandering, resulting in product defects. .

また、この発明では、搬送手段を構或するガイド部材及
び駆動部材の全てを搬送路に沿って定置し、基板ホルダ
のみを移送するようにしたので、各処理槽を区分するゲ
ートにおける通過開口幅を、基板ホルダの板面厚みとほ
ぼ同程度にまで小さくすることができる。従って、ゲー
トの開閉時に、隣接する処理区画内の雰囲気が互いに汚
染されることを最大限抑止でき、真空処理装置の運転コ
ストを低減できる点で有利である。
In addition, in this invention, all of the guide members and driving members that constitute the transport means are fixed along the transport path, and only the substrate holder is transported, so that the width of the passage opening in the gate that separates each processing tank is reduced. can be made as small as approximately the thickness of the board surface of the substrate holder. Therefore, when the gates are opened and closed, mutual contamination of atmospheres in adjacent processing compartments can be suppressed to the maximum extent possible, which is advantageous in that the operating cost of the vacuum processing apparatus can be reduced.

さらに、基板ホルダのみを移送するので、その板面で生
じる熱歪を均一化でき、加熱時や冷却時に熱歪量の差で
基板ホルダが衝撃的に熱変形することを解消して、熱変
形衝撃による成膜基板の落下を防止できる。
Furthermore, since only the substrate holder is transferred, it is possible to equalize the thermal strain that occurs on the board surface, eliminating the shock thermal deformation of the substrate holder due to the difference in the amount of thermal strain during heating and cooling. It is possible to prevent the film-forming substrate from falling due to impact.

【図面の簡単な説明】[Brief explanation of drawings]

第1図ないし第6図はこの発明の実施例を示し、第1図
は第2図におけるA−A線矢視図、第2図は搬送成膜装
置要部の横断平面図、第3図は第2図におけるB−B線
断面図、第4図は第2図におけるC−C線断面図、第5
図は第1図におけるD一D線断面図、第6図は搬送成膜
装置の概要を示す横断平面図である。 第7図〜第9図は、それぞれガイド手段の別実施例を示
す要部側面図である。 第10図は、従来の搬送手段を示す説明図である。 4・・・基板ホルダ、9・・・搬送手段、10・・・ガ
イド部材、11・・・駆動部材、13・・・固定ローラ
、14・・・押えローラ、25・・・摩擦ローラ。 第3図 第4 図 第〕○ 図
1 to 6 show embodiments of the present invention, FIG. 1 is a view taken along the line A-A in FIG. 2, FIG. is a sectional view taken along the line B-B in FIG. 2, FIG. 4 is a sectional view taken along the line C-C in FIG.
The figure is a cross-sectional view taken along the line D--D in FIG. 1, and FIG. 6 is a cross-sectional plan view showing an outline of the transfer film forming apparatus. FIGS. 7 to 9 are side views of essential parts showing other embodiments of the guide means. FIG. 10 is an explanatory diagram showing a conventional conveying means. 4...Substrate holder, 9...Transportation means, 10...Guide member, 11...Driving member, 13...Fixed roller, 14...Press roller, 25...Friction roller. Figure 3 Figure 4〕Figure ○

Claims (2)

【特許請求の範囲】[Claims] (1) 複数の処理基板が装填された基板ホルダを立姿
勢に保持し、このホルダを搬送路に沿って移送する搬送
手段を備えている真空処理装置であって、 搬送手段が、基板ホルダの下部両側面を挾んで立姿勢を
維持するガイド部材と、基板ホルダを受止め支持して該
ホルダに前進力を付与する駆動部材とからなり、 ガイド部材は、基板ホルダの一側に配置される固定ロー
ラと、基板ホルダを固定ローラに向って押付操作する押
えローラとで構成されており、 駆動部材を、一群の回転駆動される摩擦ローラで構成し
た真空処理装置。
(1) A vacuum processing apparatus that is equipped with a transport means for holding a substrate holder loaded with a plurality of processing substrates in an upright position and transporting the holder along a transport path, the transport means being one of the substrate holders. It consists of a guide member that holds both sides of the lower part to maintain the vertical position, and a drive member that receives and supports the substrate holder and applies forward force to the holder, and the guide member is arranged on one side of the substrate holder. A vacuum processing device that is composed of a fixed roller and a presser roller that presses the substrate holder toward the fixed roller, and the driving member is a group of rotationally driven friction rollers.
(2) 4個の固定ローラを矩形状に配置し、その矩形
中心位置に対応して押えローラを配置した請求項(1)
項記載の真空処理装置。
(2) Claim (1) in which the four fixed rollers are arranged in a rectangular shape, and the presser roller is arranged corresponding to the center position of the rectangle.
Vacuum processing equipment described in Section 1.
JP23612289A 1989-09-11 1989-09-11 Vacuum treating apparatus Pending JPH0397858A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23612289A JPH0397858A (en) 1989-09-11 1989-09-11 Vacuum treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23612289A JPH0397858A (en) 1989-09-11 1989-09-11 Vacuum treating apparatus

Publications (1)

Publication Number Publication Date
JPH0397858A true JPH0397858A (en) 1991-04-23

Family

ID=16996077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23612289A Pending JPH0397858A (en) 1989-09-11 1989-09-11 Vacuum treating apparatus

Country Status (1)

Country Link
JP (1) JPH0397858A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010099007A (en) * 2008-10-23 2010-05-06 Fuji Kogyo Co Ltd Reel seat and tightening/fixing means used for the same
CN112606287A (en) * 2020-10-23 2021-04-06 浙江中科玖源新材料有限公司 Polyimide curtain coating membrane drying equipment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010099007A (en) * 2008-10-23 2010-05-06 Fuji Kogyo Co Ltd Reel seat and tightening/fixing means used for the same
CN112606287A (en) * 2020-10-23 2021-04-06 浙江中科玖源新材料有限公司 Polyimide curtain coating membrane drying equipment
CN112606287B (en) * 2020-10-23 2022-06-07 浙江中科玖源新材料有限公司 Polyimide curtain coating membrane drying equipment

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