JPH0376454B2 - - Google Patents

Info

Publication number
JPH0376454B2
JPH0376454B2 JP57144334A JP14433482A JPH0376454B2 JP H0376454 B2 JPH0376454 B2 JP H0376454B2 JP 57144334 A JP57144334 A JP 57144334A JP 14433482 A JP14433482 A JP 14433482A JP H0376454 B2 JPH0376454 B2 JP H0376454B2
Authority
JP
Japan
Prior art keywords
ether
radiation
polymerization
crotyl
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57144334A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5934532A (ja
Inventor
Teruo Fujimoto
Yoshinobu Isono
Mitsuru Nagasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP14433482A priority Critical patent/JPS5934532A/ja
Publication of JPS5934532A publication Critical patent/JPS5934532A/ja
Publication of JPH0376454B2 publication Critical patent/JPH0376454B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP14433482A 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法 Granted JPS5934532A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14433482A JPS5934532A (ja) 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14433482A JPS5934532A (ja) 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法

Publications (2)

Publication Number Publication Date
JPS5934532A JPS5934532A (ja) 1984-02-24
JPH0376454B2 true JPH0376454B2 (cs) 1991-12-05

Family

ID=15359690

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14433482A Granted JPS5934532A (ja) 1982-08-20 1982-08-20 放射線感応性レジスト材料およびその製造方法

Country Status (1)

Country Link
JP (1) JPS5934532A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3158186B2 (ja) * 1996-04-03 2001-04-23 荒川化学工業株式会社 アルキル基含有多孔質樹脂、その製造方法及びその用途
JP3546687B2 (ja) 1998-03-26 2004-07-28 住友化学工業株式会社 フォトレジスト組成物
JP5604805B2 (ja) * 2009-04-10 2014-10-15 株式会社リコー ブロック共重合体微粒子の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165141A (en) * 1980-05-26 1981-12-18 Univ Tohoku Resist material composition for working integrated circuit

Also Published As

Publication number Publication date
JPS5934532A (ja) 1984-02-24

Similar Documents

Publication Publication Date Title
JP7119592B2 (ja) Ｅｕｖリソグラフィ用ポジ型レジスト組成物およびレジストパターン形成方法
JPH0376454B2 (cs)
JPH04350657A (ja) レジスト材
JP3659337B2 (ja) 重合体およびそれを使用したパターン形成方法
JP7168952B2 (ja) レジストパターン形成方法
JPS5868743A (ja) 放射線感応性有機高分子材料
US4758640A (en) Vinylsilyl group-containing monodisperse polymeric compound and a method for the preparation thereof
JPS62256804A (ja) レジスト材料
JPS63258909A (ja) ケイ素原子とアリル基を含むスチレン系重合体
JPS6374054A (ja) ポジ型レジストの現像方法
JP2007211049A (ja) 酸触媒を含まないハイパーブランチポリマーの製造方法
JP2020086064A (ja) レジストパターン形成方法
JPS6234908A (ja) ケイ素とビニル基を含むα−メチルスチレン系重合体とそれを含む組成物とその使用方法
JPS61143746A (ja) 新規高エネルギ−線感応性材料
JPH054665B2 (cs)
JPH0615585B2 (ja) ケイ素原子含有エチレン系重合体
JPH04156548A (ja) レジスト組成物
JPH0237580B2 (cs)
JPH0615584B2 (ja) ケイ素原子含有エチレン系重合体
JPH0466244B2 (cs)
JPH054666B2 (cs)
JPH04350658A (ja) レジスト材
WO2004003035A1 (ja) 不飽和単量体、重合体、化学増幅レジスト組成物、および、パターン形成方法
JPH0814698B2 (ja) シリコン含有ネガ型フオトレジスト組成物
JPS62177004A (ja) ケイ素原子を含むスチレン系重合体およびパタ−ン形成方法