JPH0375854B2 - - Google Patents
Info
- Publication number
- JPH0375854B2 JPH0375854B2 JP14335986A JP14335986A JPH0375854B2 JP H0375854 B2 JPH0375854 B2 JP H0375854B2 JP 14335986 A JP14335986 A JP 14335986A JP 14335986 A JP14335986 A JP 14335986A JP H0375854 B2 JPH0375854 B2 JP H0375854B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- defect detection
- photomask
- defect
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007547 defect Effects 0.000 claims description 38
- 238000001514 detection method Methods 0.000 claims description 25
- 238000007689 inspection Methods 0.000 claims description 9
- 230000002950 deficient Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims 1
- 230000002159 abnormal effect Effects 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61143359A JPS63133A (ja) | 1986-06-19 | 1986-06-19 | フオトマスクの検査方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61143359A JPS63133A (ja) | 1986-06-19 | 1986-06-19 | フオトマスクの検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63133A JPS63133A (ja) | 1988-01-05 |
| JPH0375854B2 true JPH0375854B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-12-03 |
Family
ID=15336950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61143359A Granted JPS63133A (ja) | 1986-06-19 | 1986-06-19 | フオトマスクの検査方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63133A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
-
1986
- 1986-06-19 JP JP61143359A patent/JPS63133A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63133A (ja) | 1988-01-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |