JPH0373409A - Metal thin film type magnetic recording medium - Google Patents
Metal thin film type magnetic recording mediumInfo
- Publication number
- JPH0373409A JPH0373409A JP208590A JP208590A JPH0373409A JP H0373409 A JPH0373409 A JP H0373409A JP 208590 A JP208590 A JP 208590A JP 208590 A JP208590 A JP 208590A JP H0373409 A JPH0373409 A JP H0373409A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- metal thin
- thin film
- recording medium
- thermoplastic resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 51
- 239000010409 thin film Substances 0.000 title claims abstract description 37
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 35
- 239000002184 metal Substances 0.000 title claims abstract description 35
- 239000002245 particle Substances 0.000 claims abstract description 115
- 239000010408 film Substances 0.000 claims abstract description 82
- 229920005992 thermoplastic resin Polymers 0.000 claims abstract description 43
- 238000002425 crystallisation Methods 0.000 claims description 14
- 230000008025 crystallization Effects 0.000 claims description 14
- 238000001069 Raman spectroscopy Methods 0.000 claims description 7
- 229920000728 polyester Polymers 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 4
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 63
- 238000000034 method Methods 0.000 description 20
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 239000002344 surface layer Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 6
- 150000002500 ions Chemical group 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000005266 casting Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000004927 fusion Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005294 ferromagnetic effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 229920003169 water-soluble polymer Polymers 0.000 description 3
- LLLVZDVNHNWSDS-UHFFFAOYSA-N 4-methylidene-3,5-dioxabicyclo[5.2.2]undeca-1(9),7,10-triene-2,6-dione Chemical compound C1(C2=CC=C(C(=O)OC(=C)O1)C=C2)=O LLLVZDVNHNWSDS-UHFFFAOYSA-N 0.000 description 2
- -1 Argon ion Chemical class 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- ZGDWHDKHJKZZIQ-UHFFFAOYSA-N cobalt nickel Chemical compound [Co].[Ni].[Ni].[Ni] ZGDWHDKHJKZZIQ-UHFFFAOYSA-N 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- WOZVHXUHUFLZGK-UHFFFAOYSA-N dimethyl terephthalate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000001237 Raman spectrum Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000003869 coulometry Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000001819 mass spectrum Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】 [産業上の利用分野コ 本発明は金属薄膜型磁気記録媒体に関するものである。[Detailed description of the invention] [Industrial application fields] The present invention relates to a metal thin film magnetic recording medium.
〔従来の技術]
金属薄膜型磁気記録媒体としては、ポリエステルフィル
ムに金属薄膜型磁性層を設けてなる磁気記録媒体が知ら
れている(たとえば特開昭58−68225号公報)。[Prior Art] As a metal thin film type magnetic recording medium, a magnetic recording medium in which a metal thin film type magnetic layer is provided on a polyester film is known (for example, Japanese Patent Laid-Open No. 58-68225).
[発明が解決L2ようとする課題]
基材フィルム上に蒸着等の方法によって金属薄膜型磁性
層を設けた金属薄膜型磁気記録媒体は、その出力特性、
周波数特性のため高密度記録用磁気記録媒体として重要
視されている。しかし、上記従来の金属薄膜型磁気記録
媒体では、磁性層の耐久性(以下耐久性という)が不十
分であり、また、耐久性を向上させるため基材フィルム
に含有される粒子のサイズを大きくすると出力特性が不
良となる問題点があった。[Problems to be Solved by the Invention L2] A metal thin film magnetic recording medium in which a metal thin film magnetic layer is provided on a base film by a method such as vapor deposition has the following characteristics:
Because of its frequency characteristics, it is considered important as a magnetic recording medium for high-density recording. However, in the conventional metal thin film magnetic recording media mentioned above, the durability of the magnetic layer (hereinafter referred to as durability) is insufficient, and in order to improve the durability, the size of the particles contained in the base film is increased. Then, there was a problem that the output characteristics were poor.
本発明はかかる問題点を改善し、本来金属薄膜型磁気記
録媒体が有する優れた出力特性を維持しつつ、磁性層の
耐久性に優れた金属薄膜型磁気記録媒体を提供すること
を目的とする。An object of the present invention is to improve such problems and provide a metal thin film magnetic recording medium that maintains the excellent output characteristics originally possessed by the metal thin film magnetic recording medium and has a magnetic layer with excellent durability. .
[課題を解決するための手段]
本発明は、(1)基材フィルムの少なくとも片面に金属
薄膜型磁性層を設けてなる金属薄模型磁気記録媒体であ
って、該基材フィルムが熱可塑性樹脂Aよりなる層(A
層)の少なくとも片面に不活性粒子を含有する熱可塑性
樹脂Bよりなる層(B層)を積層してなる二軸配向フィ
ルムであり、B層に含有される不活性粒子の平均粒径d
Bが5〜200nm、該粒子のB層における含有量が1
.5〜40重量%、B層の厚さtBと平均粒径daの比
t s 、、/ d eが0.1〜3の範囲であること
を特徴とする金属薄膜型磁気記録媒体、■基材フィルム
が、熱可塑性樹脂Aよりなる層(A層)の一方の面に不
活性粒子を含有する熱可塑性樹脂Bよりなる層(B層)
を、他面に不活性粒子を含有する熱可塑性樹脂Cよりな
る層(C層)を積層してなる二軸配向フィルムであって
、該基材フィルムのB層側にのみ金属薄膜型磁性層が設
けられており、該B層に含有される不活性粒子の平均粒
径dBが5〜80nrrx、該粒子のB層における含有
量が1−45〜40重量%、B層の厚さtIlと平均粒
径d6の比ts / d sが0. 1〜3、該0層に
含有される不活性粒子の平均粒径dcが40〜200n
m、該粒子の0層における含有量が1.5〜40重量%
、0層の厚さtCと平均粒径dcの比tc、、/dBが
0. 1〜3であることを特徴とする金属薄膜型磁気記
録媒体をその骨子とするものである。[Means for Solving the Problems] The present invention provides (1) a metal thin model magnetic recording medium comprising a metal thin film type magnetic layer provided on at least one side of a base film, the base film being made of thermoplastic resin. A layer consisting of A (A
It is a biaxially oriented film formed by laminating a layer (B layer) made of thermoplastic resin B containing inert particles on at least one side of the layer), and the average particle diameter d of the inert particles contained in the B layer.
B is 5 to 200 nm, and the content of the particles in the B layer is 1
.. 5 to 40% by weight, and a metal thin film magnetic recording medium characterized in that the ratio ts, , /de of the thickness tB of the B layer to the average grain size da is in the range of 0.1 to 3, The material film is a layer made of thermoplastic resin A (layer A) and a layer made of thermoplastic resin B containing inert particles on one side (layer B).
A biaxially oriented film formed by laminating a layer (C layer) made of thermoplastic resin C containing inert particles on the other side, and a metal thin film type magnetic layer only on the B layer side of the base film. is provided, the average particle diameter dB of the inert particles contained in the B layer is 5 to 80 nrrx, the content of the particles in the B layer is 1-45 to 40% by weight, and the thickness of the B layer is tIl. The ratio ts/ds of the average particle diameter d6 is 0. 1 to 3, the average particle diameter dc of the inert particles contained in the 0 layer is 40 to 200n
m, the content of the particles in the 0 layer is 1.5 to 40% by weight
, the ratio tc between the thickness tC of the 0 layer and the average grain size dc, , /dB is 0. The gist of the present invention is a metal thin film type magnetic recording medium characterized by the following characteristics: 1 to 3.
本発明の基材フィルムを構成する熱可塑性樹脂A、、B
、Cは同じでも、異なる種類のものでも良く、ポリエス
テル、ポリオレフィン、ポリアミド、ポリフェニレンス
ルフィドなど特に限定されることはないが、特に、ポリ
エステル、中でも、エチレンテレフタレート、エチレン
α、β−ビス(2−クロルフェノキシ)エタン−4,4
′−ジカルボキシレート、エチレン2.6−ナフタレー
ト単位から選ばれた少なくとも一種の構造単位を主要構
成成分とする場合に耐久性がより一層良好となるので望
ましい。Thermoplastic resins A, B constituting the base film of the present invention
, C may be the same or different types, and are not particularly limited to polyester, polyolefin, polyamide, polyphenylene sulfide, etc., but are particularly suitable for polyester, especially ethylene terephthalate, ethylene α, β-bis(2-chloro phenoxy)ethane-4,4
It is preferable to use at least one type of structural unit selected from '-dicarboxylate and ethylene 2,6-naphthalate units as the main constituent, since the durability will be even better.
ここで、特に本発明を構成する熱可塑性樹脂B及び/ま
たはCは結晶性である場合に耐久性がより一層良好とな
るのできわめて望ましい。ここでいう結晶性とはいわゆ
る非晶質ではないことを示すものであり、定量的には結
晶化パラメータにおける冷結晶化温度Tccが検出され
、かつ結晶化パラメータΔTegが150℃以下のもの
である。Here, it is particularly desirable that the thermoplastic resins B and/or C constituting the present invention be crystalline, since the durability will be even better. Crystallinity here indicates that it is not so-called amorphous, and quantitatively, the cold crystallization temperature Tcc in the crystallization parameter is detected, and the crystallization parameter ΔTeg is 150°C or less. .
さらに、示差走査熱量計で測定された融解熱(融解エン
タルピー変化)が7.5cal/g以上の結晶性を示す
場合に耐久性がより一層良好となるのできわめて望まし
い。また、エチレンテレフタレートを主要構成成分とす
るポリエステルの場合に耐久性がより一層良好となるの
で特に望ましい。Furthermore, it is extremely desirable to exhibit crystallinity with a heat of fusion (change in enthalpy of fusion) of 7.5 cal/g or more as measured by a differential scanning calorimeter because durability is even better. Further, polyester containing ethylene terephthalate as a main component is particularly desirable because it has even better durability.
なお、本発明を阻害しない範囲内で、熱可塑性樹脂A、
BSCから選ばれる少なくとも一種に他種の熱可塑性樹
脂を混合しても良いし共重合ポリマを用いても良い。ま
た、本発明の目的を阻害しない範囲内で、熱可塑性樹脂
A、BXCから選ばれる少なくとも一種に酸化防止剤、
熱安定剤、滑剤、紫外線吸収剤などの有機添加剤が通常
添加される程度添加されていてもよい。In addition, within the range that does not impede the present invention, thermoplastic resin A,
At least one selected from BSC may be mixed with other thermoplastic resins, or a copolymer may be used. Furthermore, within a range that does not impede the object of the present invention, at least one selected from thermoplastic resins A and BXC may contain an antioxidant,
Organic additives such as heat stabilizers, lubricants, and ultraviolet absorbers may be added to the extent that they are normally added.
本発明の金属薄膜型磁気記録媒体を構成する基材フィル
ムの8層中の不活性粒子の平均粒径daは耐久性の点か
ら5〜200nmであることが必要であり、さらに8層
上に磁性層が設けられる場合には5〜80rirri、
磁性層が設けられない場合には40〜200nrnが好
ましい。The average particle diameter da of the inert particles in the eight layers of the base film constituting the metal thin film magnetic recording medium of the present invention must be 5 to 200 nm from the viewpoint of durability, and the When a magnetic layer is provided, 5 to 80 rirri,
When a magnetic layer is not provided, 40 to 200 nrn is preferable.
また基材フィルムのC層中の不活性粒子の平均粒径dB
は、蒸着等の加工工程におけるフィルムのハンドリング
性、さらにはバックコート処理をしなくても良好な走行
性を得るために40〜200nmが好ましい。Also, the average particle diameter dB of the inert particles in the C layer of the base film
is preferably 40 to 200 nm in order to obtain good handling properties of the film in processing steps such as vapor deposition, and furthermore good runnability without back coating treatment.
さらに、基材フィルムのA層は不活性粒子を含有してい
る必要は特にないが、平均粒径が5〜200nrn、特
に10〜150nmの不活性粒子が0.001〜0.1
5重量%、特に0.005〜0.05重量%含有されて
いると、耐久性がより一層良好となるので望ましい。Furthermore, the A layer of the base film does not particularly need to contain inert particles, but the inert particles with an average particle size of 5 to 200 nm, particularly 10 to 150 nm, are 0.001 to 0.1 nm.
It is desirable that the content be 5% by weight, especially 0.005 to 0.05% by weight, since the durability will be even better.
本発明に使用する不活性粒子は、粒径比、(粒子の長径
/短径)が1.0〜1.3の粒子、特に、球形状の粒子
の場合に耐久性がより一層良好となるので望ましい。The durability of the inert particles used in the present invention is even better when the particle size ratio (major axis/minor axis) is 1.0 to 1.3, especially when the particles are spherical. Therefore, it is desirable.
本発明に使用する不活性粒子はフィルム中での単一粒子
指数が0.7以上、好まし、くは0. 9以上である場
合に耐久性がより一層良好となるので特に望ましい。The inert particles used in the present invention have a single particle index in the film of 0.7 or more, preferably 0.7 or more. A value of 9 or more is particularly desirable because the durability becomes even better.
本発明に使用する不活性粒子は粒径の相対標準偏差が0
. 6以下、好ましくは0.5以下の場合に耐久性がよ
り−e良好となるので望ましい。The inert particles used in the present invention have a relative standard deviation of particle size of 0.
.. If it is 6 or less, preferably 0.5 or less, the durability will be better, so it is desirable.
本発明に使用する不活性粒子の種類は特に限定されない
が、コロイダルシリカに起因する実質的に球形のシリカ
粒子、架橋高分子による粒子(たとえば架橋ボリスチし
・ン)などがあるが、特に10重量%減量時温度(窒素
中で熱重量分析装置島津TG−30Mを用いて測定。昇
温連窓20℃7/分)が380℃以上になるまで架橋度
を高くした架橋高分子粒子の場合に耐久性がより−i良
好となるので特に望ま1.い。なお、コロイダルシリカ
に起因する球形シリカの場合にはアルコキシド法で製造
された、ナトリウム含有量が少ない、実質的に球形のシ
リカの場合に耐久性がより一層良好となるので特に望ま
しい。しかしながら、その他の粒子、例えば炭酸カルシ
ウム、二酸化チタン、アルミ十等他の粒子でも熱可塑性
樹脂B[の厚さtBと平均粒径dBの比の適切なコント
ロールにより]・分使いこなせるものである。The type of inert particles used in the present invention is not particularly limited, but includes substantially spherical silica particles derived from colloidal silica, particles made of crosslinked polymers (for example, crosslinked polyester), and in particular, In the case of crosslinked polymer particles whose degree of crosslinking is increased until the temperature at % weight loss (measured in nitrogen using a thermogravimetric analyzer Shimadzu TG-30M, continuous heating window 20°C 7/min) is 380°C or higher. Particularly desirable 1. since the durability is better. stomach. Note that in the case of spherical silica derived from colloidal silica, substantially spherical silica with a low sodium content produced by an alkoxide method is particularly desirable because the durability is even better. However, other particles, such as calcium carbonate, titanium dioxide, aluminum, etc., can also be used in the thermoplastic resin B [by appropriately controlling the ratio of the thickness tB to the average particle diameter dB].
本発明の基材フィルム8層中の不活性粒子の含有量は1
.5〜40重量%、好ましくは2〜30重量%、さらに
好ましくは3〜20乗量%であることが必要である。含
有量が上記の範囲より少ないと耐久性が不良となり、逆
に多いと出力特性が不良となるので好ましくない。The content of inert particles in the 8 layers of the base film of the present invention is 1
.. It is necessary that the amount is 5 to 40% by weight, preferably 2 to 30% by weight, and more preferably 3 to 20% by weight. If the content is less than the above range, the durability will be poor, and if it is too much, the output characteristics will be poor, which is not preferable.
本発明の基材フィルム8層の厚さ18と該8層中に含有
する不活性粒子の平均粒径dBの比1゜/dBは0.1
−3、好ましくl;!0.2−2゜olさらに好ましく
は0.3〜1.5の範囲であることが必要である。j
8 / d Bが上記の範囲より小さいと耐久性が不良
となり、逆に大きいと出力特性が不良となるので好まし
くない。The ratio 1°/dB of the thickness 18 of the 8 layers of the base film of the present invention to the average particle diameter dB of the inert particles contained in the 8 layers is 0.1
-3, preferably l;! It needs to be in the range of 0.2-2° ol, more preferably 0.3-1.5. j
If 8/dB is smaller than the above range, the durability will be poor, whereas if it is larger than the above range, the output characteristics will be poor, which is not preferable.
さらに、0層に含有する不活性粒子の含有量を1.5〜
40重量%、好ましくは2〜15重量%としておくこ乏
は、蒸着等の加工工程におけるフィルムの良好なハンド
リング性、さらにはバックコート処理をしなくても良好
な走行性を有する磁気記録媒体を得るために必要である
。Furthermore, the content of inert particles contained in the 0 layer is 1.5~
The setting of 40% by weight, preferably 2 to 15% by weight, is necessary to obtain a magnetic recording medium that has good handling properties of the film in processing steps such as vapor deposition, and also has good running properties even without back coating treatment. necessary to obtain.
この0層の厚さt。と、含有する不活性粒子の平均粒径
dcの比tC/dCを0.1〜・3の範囲にすることは
、蒸着等の加工工程におけるフィルムのハンドリング性
をより一層向上し、さらにはバックコート処理をしない
場合の走行性をより一層良好とする上で必要である。The thickness of this zero layer is t. By setting the ratio tC/dC of the average particle diameter dc of the contained inert particles to a range of 0.1 to 3, the handling properties of the film in processing steps such as vapor deposition are further improved, and furthermore, the back This is necessary to further improve the runnability when no coating treatment is applied.
本発明を構成する基材フィルムは上記組成物からなる積
層フィル14を二軸配向せしめたフィルムであって、−
軸あるいは無配向フィルムでは巻姿が不良となるので好
ましくない。この配向の程度は特に限定されないが、高
分子の分子配向の程度の目安であるヤング率が長平方向
、幅方向ともに350 k g、、/mm2以上である
場合に出力特性、耐久性がより一層良好となるのできわ
めて望ましい。分子配向の程度の目安であるヤング率の
上限は特に限定されないが、通常、1500kg/rr
im2程度が製造上の限界である。The base film constituting the present invention is a film in which the laminated film 14 made of the above composition is biaxially oriented, and -
A shaft or non-oriented film is not preferred because the winding appearance will be poor. The degree of this orientation is not particularly limited, but if the Young's modulus, which is a measure of the degree of molecular orientation of the polymer, is 350 kg/mm2 or more in both the long and width directions, the output characteristics and durability will be improved. This is highly desirable as it gives good results. The upper limit of Young's modulus, which is a measure of the degree of molecular orientation, is not particularly limited, but is usually 1500 kg/rr.
About im2 is the manufacturing limit.
本発明を構成する基材フィルムの該B層の表面全反射ラ
マン結晶化指数は、2重cm−’以下の場合に耐久性が
より一層良好となり、ハンドリング性も良好となるので
特に望ましい。It is particularly desirable that the surface total reflection Raman crystallization index of the B layer of the base film constituting the present invention be 2 cm-' or less, since this results in even better durability and better handling properties.
また、本発明を構成する基材フィルムの該0層の表面全
反射ラマン結晶化指数は、20cm−1以下の場合に耐
久性がより一層良好となり、ハンドリング性も良好とな
るので特に望ましい。Further, it is particularly desirable that the surface total reflection Raman crystallization index of the zero layer of the base film constituting the present invention is 20 cm<-1> or less, since this results in even better durability and better handling properties.
本発明は上記の二軸配向フィルムの少なくとも片面に金
属薄膜型磁性層を設けてなる磁気記録媒体である。金属
薄膜型磁性層の種類は特に限定されないが鉄、コバルト
、ニッケル、クロムまたはそれらの合金の強磁性薄膜あ
るいは酸素雰囲気中で金属を蒸着等して得られる酸化金
属薄膜層等が好ましく用いられる。The present invention is a magnetic recording medium comprising a metal thin film type magnetic layer provided on at least one side of the above biaxially oriented film. The type of metal thin film type magnetic layer is not particularly limited, but a ferromagnetic thin film of iron, cobalt, nickel, chromium, or an alloy thereof, or a metal oxide thin film layer obtained by vapor deposition of a metal in an oxygen atmosphere is preferably used.
金属薄膜型磁性層の厚さtMは特に限定されないが、磁
性層側のB層の厚さtB (−層)との比、t n /
t Mが0.02〜150、特に0. 1〜150、
さらに好ましくは0.2−100の範囲である場合に出
力特性、耐久性がより一層良好となるので望ましい。ま
たtMの値としては水平記録の場合は0.02〜0,5
μm1垂直記録の場合は0.2〜1.5μmの範囲とし
ておくことが出力特性、耐久性がより一層良好となるの
で望ましい。The thickness tM of the metal thin film type magnetic layer is not particularly limited, but the ratio to the thickness tB (-layer) of the B layer on the magnetic layer side, t n /
tM is 0.02 to 150, especially 0. 1-150,
More preferably, it is in the range of 0.2-100 because the output characteristics and durability are even better. In addition, the value of tM is 0.02 to 0.5 in the case of horizontal recording.
In the case of perpendicular recording of 1 .mu.m, it is desirable to keep the thickness in the range of 0.2 to 1.5 .mu.m since this will further improve the output characteristics and durability.
本発明を構成する基材フィルムの該B層5の幅方向厚さ
斑は25%以下、さらに好ましくは20%以下である場
合に出力特性、耐久性がより一層良好となるので特に望
ましい。It is particularly desirable that the thickness unevenness in the width direction of the B layer 5 of the base film constituting the present invention be 25% or less, more preferably 20% or less, since the output characteristics and durability will be even better.
本発明を構成する基材フィルムの該B層の厚さは0.
005〜0. 6 μm、好ましくは0.01〜0,5
μmの場合に耐久性、出力特性がより一層良好となるの
で特に望ましい。The thickness of the B layer of the base film constituting the present invention is 0.
005~0. 6 μm, preferably 0.01-0.5
In the case of μm, durability and output characteristics are even better, so it is particularly desirable.
本発明を構成する基材フィルムのB層表面の突起高さが
25nm以上、好ましくは30nrn以上である場合に
、耐久性、出力特性がより一層良好となるので好ましい
。さらに、多重干渉法で測定した2重環以上の突起が1
00個/100ci以下が望ましい。It is preferable that the protrusion height on the surface of layer B of the base film constituting the present invention is 25 nm or more, preferably 30 nrn or more, since durability and output characteristics will be even better. Furthermore, the number of protrusions with double rings or more measured by multiple interferometry is 1.
00 pieces/100ci or less is desirable.
本発明を構成する基材フィルムの該BJii(D表面の
中心線平均粗さRaと最大高さR1の比、Rt/Raは
9.0以下、特に8.5以下の場合に84力特性、耐久
性がより一層良好となるので特に望ましい。When the BJii (ratio of the center line average roughness Ra of the D surface to the maximum height R1, Rt/Ra, of the base film constituting the present invention is 9.0 or less, particularly 8.5 or less, the 84 force characteristics, This is particularly desirable since the durability is even better.
本発明を構成する基材フィルムの該B層の表面の2次イ
オンマススペクトルによって測定される表層粒子濃度比
は特に限定されないが、表層粒子濃度比が1/10以下
、特に1150以下である場合に耐久性、出力特性がよ
り一層良好となるので特に望ましい。The surface layer particle concentration ratio measured by the secondary ion mass spectrum of the surface of the B layer of the base film constituting the present invention is not particularly limited, but when the surface layer particle concentration ratio is 1/10 or less, particularly 1150 or less This is particularly desirable since the durability and output characteristics are even better.
また、本発明を構成する基材フィルムの少なくとも片面
に水溶性高分子を塗布して微細な突起を形成してもよい
。その場合、磁性層は該水溶性高分子の塗布された例で
も、また非塗布側でもよい3、次に本発明の磁気記録媒
体の製造方法について説明する。Furthermore, fine protrusions may be formed by applying a water-soluble polymer to at least one side of the base film constituting the present invention. In that case, the magnetic layer may be coated with the water-soluble polymer or may be coated with the water-soluble polymer.3 Next, a method for manufacturing the magnetic recording medium of the present invention will be described.
まず、熱可塑性樹脂Bに不活性粒子を含Hせしめる方法
としては、不活性粒子をエチレングリコールのスラリー
とし、ベント方式の2軸混練押出機を用いて熱可塑性樹
脂に練り込む方法が、延伸破れなく、本発明範囲の厚さ
と平均粒径の関係、含有量の基材フィルムを得るのにき
わめて有効である。First, as a method for impregnating thermoplastic resin B with inert particles, there is a method in which the inert particles are made into an ethylene glycol slurry and kneaded into the thermoplastic resin using a vent type twin-screw kneading extruder. This is extremely effective for obtaining a base film having a relationship between thickness and average particle size and content within the range of the present invention.
粒子の含有量を調節する方法としては、上記方法で高濃
度マスターを作っておき、それを製膜時に不活性粒子を
実質的に含有しない熱可塑性樹脂で希釈して粒子の含有
量を調節する方法が有効である。A method for adjusting the particle content is to prepare a high-concentration master using the above method, and then dilute it with a thermoplastic resin that does not substantially contain inert particles during film formation to adjust the particle content. The method is valid.
次に、熱可塑性樹脂A1不活性粒子を所定量含有する熱
可塑性樹脂Bのペレットを必要に応じて乾燥したのち、
公知の溶融積層用押出装置に供給し、スリット状のダイ
からシート状に押出し、キャスティングロール上で冷却
固化せしめて未延伸フィルムを作る。すなわち、2また
は3台の押出シ機、2または3層のマニホールドまたは
合流ブロックを用いて、熱可塑性樹脂A、Bを積層し、
口金から2または3Rのシートを押し出し、キャスティ
ングロールで冷却して未延伸フィルムを作る。この場合
、熱可塑性樹脂Rのポリマ流路に、スタティックミキサ
ー、ギヤポンプを設置する方法は延伸破れなく、本発明
範囲の厚さと平均粒径の関係、含有量、望ましい範囲の
表層粒子濃度比のフィルムを得るのに有効である。また
、合流ブロックとして矩形のフィードブロックを用いる
のが本発明範囲の積層厚さ斑を得るのにきわめて有効で
ある。また、熱可塑性樹脂B側の押し出し機の溶融温度
を、熱可塑性樹脂A側より、10〜40℃高くすること
が、延伸破れなく、本発明範囲の厚さと平均粒径の関係
、含有量、望ましい範囲の積層厚さ斑、表層粒子濃度比
、全反射ラマン結晶化指数のフィルムを得るのに有効で
ある。上記の説明は構成として、A/B、B/A/Bに
ついて述べたが、B/A/Cの構成の場合は3台の押出
機を用いて同様に、3層のマニホールドまたは合流ブロ
ックを用いて、熱可塑性樹脂BSASCを積層し、口金
から3層のシートを押し出し、キャスティングロールで
冷却して未延伸フィルムを作る。Next, after drying the pellets of thermoplastic resin B containing a predetermined amount of inert particles of thermoplastic resin A1 as necessary,
It is supplied to a known extrusion device for melt lamination, extruded into a sheet through a slit-shaped die, and cooled and solidified on a casting roll to produce an unstretched film. That is, thermoplastic resins A and B are laminated using two or three extruders, a two or three-layer manifold or a merging block,
A 2 or 3R sheet is extruded from the die and cooled with a casting roll to form an unstretched film. In this case, the method of installing a static mixer and a gear pump in the polymer flow path of the thermoplastic resin R will prevent stretching and tearing, and the film will have a relationship between thickness and average particle size, a content within the range of the present invention, and a surface layer particle concentration ratio within the desired range. It is effective to obtain Further, it is extremely effective to use a rectangular feed block as the merging block to obtain the laminated thickness unevenness within the range of the present invention. In addition, setting the melting temperature of the extruder on the thermoplastic resin B side 10 to 40°C higher than that on the thermoplastic resin A side will prevent stretching breakage, and the relationship between the thickness and average particle size, the content, and the content within the range of the present invention. This is effective in obtaining a film with desired ranges of lamination thickness unevenness, surface layer particle concentration ratio, and total reflection Raman crystallization index. The above explanation describes the configurations A/B and B/A/B, but in the case of the B/A/C configuration, three extruders are used to create a three-layer manifold or confluence block. The three-layer sheet is extruded from a die and cooled with a casting roll to form an unstretched film.
次にこの未延伸フィルムを二軸延伸し、二軸配向せしめ
る。延伸方法としては、逐次二軸延伸法または同時二軸
延伸法を用いることができる。ただし、最初に長手方向
、次に幅方向の延伸を行なう逐次二軸延伸法を用い、長
手方向の延伸を3段階以上に分けて、総縦延伸倍率を3
.0〜6.5倍で行なう方法は、本発明範囲の厚さと平
均粒径の関係、含有量のフィルムを得るのに有効である
。Next, this unstretched film is biaxially stretched and biaxially oriented. As the stretching method, a sequential biaxial stretching method or a simultaneous biaxial stretching method can be used. However, by using a sequential biaxial stretching method that first stretches in the longitudinal direction and then in the width direction, the longitudinal stretching is divided into three or more stages, and the total longitudinal stretching ratio is 3.
.. The method carried out at a magnification of 0 to 6.5 times is effective for obtaining a film having a relationship between thickness and average particle size and content within the range of the present invention.
長手方向延伸温度は熱可塑性樹脂の種類によって異なり
一概には言えないが、通常、その1段目を50〜130
℃とし、2段目以降はそれより高くすることが本発明の
望ましい範囲の積層厚さ斑、表層粒子濃度比のフィルム
を得るのに有効である。Although the longitudinal stretching temperature varies depending on the type of thermoplastic resin and cannot be generalized, it is usually 50 to 130 ℃ in the first stage.
℃, and setting it higher in the second and subsequent stages is effective in obtaining a film with uneven lamination thickness and surface layer particle concentration ratio within the desired range of the present invention.
長手方向延伸速度は5000〜50000%/分の範囲
が好適である。幅方向の延伸方法としてはステンタを用
いる方法が一般的である。延伸倍率は、3.0〜5.0
倍の範囲が適当である。幅方向の延伸速度は、1000
〜20000%/分、温度は80〜(60℃の範囲が好
適である。次にこの延伸フィルムを熱処理する。この場
合の熱処理温度は170〜200℃、特に170〜19
0℃、時間は0.5〜60秒の範囲が好適である。The longitudinal stretching speed is preferably in the range of 5,000 to 50,000%/min. A common method for stretching in the width direction is to use a stenter. Stretching ratio is 3.0 to 5.0
A double range is appropriate. The stretching speed in the width direction is 1000
-20000%/min, temperature is preferably 80-(60°C). Next, this stretched film is heat treated. In this case, the heat treatment temperature is 170-200°C, especially 170-19
A temperature of 0° C. and a time of 0.5 to 60 seconds are preferable.
次に、このフィルム上に金属薄膜を形成する。Next, a metal thin film is formed on this film.
磁性層を蒸着する方法は公知の方法で行なうことができ
るが、例えば、鉄、コバルト、ニッケルまたはその合金
の金属薄膜を真空蒸着、イオンブレーティング、スパッ
タリング等により基材フィルム上に直接、あるいはアル
ミニウム、チタン、クロム等の下地薄膜を介して形成さ
せるのが好ましい。この場合、磁化容易軸の方向は特に
限定されないが、特に斜め蒸着による垂直磁化が耐久性
の点から好ましい。The magnetic layer can be deposited by any known method. For example, a thin metal film of iron, cobalt, nickel or an alloy thereof is deposited directly on the base film by vacuum deposition, ion blasting, sputtering, etc. It is preferable to form the layer through a base thin film of , titanium, chromium, or the like. In this case, the direction of the axis of easy magnetization is not particularly limited, but perpendicular magnetization by oblique deposition is particularly preferred from the viewpoint of durability.
[物性の測定方法ならびに効果の評価方法コ本発明の特
性値の測定方法並びに効果の評価方法は次の通りである
。[Method for Measuring Physical Properties and Evaluating Effects] The methods for measuring the characteristic values and evaluating the effects of the present invention are as follows.
(1)粒子の平均粒径
フィルムから熱可塑性樹脂をプラズマ低温灰化処理法で
除去し粒子を露出させる。処理条件は熱可塑性樹脂は灰
化されるが粒子はダメージを受けない条件を選択する。(1) Average particle size of particles The thermoplastic resin is removed from the film by plasma low-temperature ashing treatment to expose the particles. The processing conditions are selected so that the thermoplastic resin is incinerated but the particles are not damaged.
これを走査型電子顕微鏡(SEM)で観察し、粒子の画
像をイメージアナライザーで処理する。観察箇所を変え
て粒子数5000個以上で次の数値処理を行ない、それ
によって求めた数平均径りを平均粒径とする。This is observed with a scanning electron microscope (SEM), and the image of the particles is processed with an image analyzer. The following numerical processing is performed when the number of particles is 5000 or more while changing the observation location, and the number average diameter obtained thereby is taken as the average particle diameter.
D=ΣD、/N ここで、D、は粒子の円相当径、Nは粒子数である。D=ΣD, /N Here, D is the equivalent circle diameter of the particles, and N is the number of particles.
0粒径比
上記(1)の測定において、粒子の(長径の平均値)/
(短径の平均値)の比である。すなわち、下式%式%
D I I % D 2 +はそれぞれ個々の粒子の長
径(最大径)、短径(最短径)、Nは粒子数である。0 Particle Size Ratio In the measurement of (1) above, the (average value of major axis)/
(average value of short axis). That is, in the following % formula, % D I I % D 2 + is the major axis (maximum diameter) and minor axis (shortest axis) of each individual particle, and N is the number of particles.
(3)粒径の相対標準偏差
上記(1)の方法で測定された個々の粒径D11平均径
D1粒子数Nから計算される標準偏差σ[=(Σ(D+
D)’ /N) I/2 ]を平均径りで割った値
(σ/D)で表わした。(3) Relative standard deviation of particle diameter Standard deviation calculated from individual particle diameter D11 mean diameter D1 particle number N measured by the method in (1) above σ[=(Σ(D+
D)'/N)I/2] divided by the average diameter (σ/D).
(4)単一粒子指数
フィルムの断面を透過型電子顕微鏡(TEM)で写真観
察し、粒子を検知する。観察倍率を10万倍程度にすれ
ば、それ以上分けることができない1個の粒子が観察で
きる。粒子の占める全面積をA1そのうち2個以上の粒
子が凝集している凝集体の占める面積をBとした時、(
A−B)/Aをもって、単一粒子指数とする。TEM条
件は下記のとおりであり1視野面積=2μm2の測定を
場所を変えて、500視野測定する。(4) A cross section of the single particle index film is photographed and observed using a transmission electron microscope (TEM) to detect particles. If the observation magnification is set to about 100,000 times, a single particle that cannot be separated any further can be observed. When the total area occupied by particles is A1, and the area occupied by aggregates in which two or more particles are aggregated is B, (
A-B)/A is the single particle index. The TEM conditions are as follows, and 500 visual fields are measured by changing the measurement location of 1 visual field area = 2 μm 2 .
・観察倍率=10万倍
・加速電圧+100kV
・切片厚さ:約1.0OOA
(5)粒子の含有量
熱可塑性樹脂は溶解し粒子は溶解させない溶媒を選択し
、粒子を熱可塑性樹脂から遠心分離し、粒子の全体重量
に対する比率(電量%)をもって粒子含有量とする。場
合によっては赤外分光法の併用も有効である。・Observation magnification = 100,000 times ・Acceleration voltage + 100kV ・Section thickness: Approximately 1.0OOA (5) Particle content Select a solvent that dissolves the thermoplastic resin but does not dissolve the particles, and centrifuge the particles from the thermoplastic resin. The particle content is defined as the ratio (coulometric %) of the particles to the total weight. In some cases, infrared spectroscopy may also be effective.
(6)結晶化パラメータΔTag、融解熱示差走査熱量
計(D S C)を用いて測定した。(6) Crystallization parameter ΔTag, heat of fusion was measured using a differential scanning calorimeter (DSC).
DSCの測定条件は次の通りである。すなわち、試料1
0+gをDSC装置にセットし、300℃の温度で5分
間溶融した後、液体窒素中に急冷する。The DSC measurement conditions are as follows. That is, sample 1
0+g is set in a DSC device, melted at a temperature of 300° C. for 5 minutes, and then rapidly cooled in liquid nitrogen.
この急冷試料を10℃/分で昇温し、ガラス転移点Tg
を検知する。さらに昇温を続け、ガラス状態からの結晶
化発熱ピーク温度をもって冷結晶化温度Tccとした。This rapidly cooled sample was heated at a rate of 10°C/min, and the glass transition point Tg
Detect. The temperature was further increased, and the exothermic peak temperature of crystallization from the glass state was defined as the cold crystallization temperature Tcc.
さらに昇温を続け、融解ピークから融解熱を求めた。こ
こでTccとTgの差(Tcc−Tg)を結晶化パラメ
ータΔTCgと定義する。The temperature was further increased, and the heat of fusion was determined from the melting peak. Here, the difference between Tcc and Tg (Tcc-Tg) is defined as a crystallization parameter ΔTCg.
(7)ヤング率
J l5−Z−1702に規定された方法にしたがって
、インストロンタイプの引っ張り試験機を用いて、25
℃、65%RHにて測定した。(7) Young's modulus 25
Measured at 65% RH.
(8)全反射ラマン結晶化指数
全反射ラマンスペクトルを測定し、カルボニル基の伸縮
振動である1 730 crm−1の半価幅をもって表
面の全反射ラマン結晶化指数とした。測定条件は以下の
通りである。測定深きは、表面から500〜100OA
程度である。(8) Total reflection Raman crystallization index The total reflection Raman spectrum was measured, and the half width of 1 730 crm-1, which is the stretching vibration of the carbonyl group, was taken as the total reflection Raman crystallization index of the surface. The measurement conditions are as follows. Measurement depth is 500~100OA from the surface
That's about it.
■光源
アルゴンイオンレーザ−(5145A)■試料のセツテ
ィング
フィルム表面を全反射プリズムに圧着させ、レーザーの
プリズムへの入射角(フィルム厚さ方向との角度)は6
01とした。■Light source Argon ion laser (5145A) ■Setting the sample The surface of the film is pressed against a total reflection prism, and the incident angle of the laser to the prism (angle with the film thickness direction) is 6
It was set to 01.
■検出器
PM : RCA31034/Photon Coun
Nng System(tlan+amaju Cl2
30) (supply 1600V)■測定条件
5LIT 100hmL100h
100mWGATE TIME
1.0secSCAN 5PEED f2
cm−’/minSAMPLING INTERVAL
O,2cm”’REPEAT TIME
6
(9)固有粘度[η] (単位はcl/g)オルトクロ
ロフェノール中1.25℃で測定した溶液粘度から下記
式で計算される値を用いる。すなわち、
ηsr/ C= [ηコ +K [η] 2 ・ に
こで、η、P=(溶液粘度/溶媒粘度)−1、Cは溶媒
100m1あたりの溶解ポリマ重量(g/l 00m1
.通常1.2)、Kはハギンス定数(C,343とする
)。また、溶液粘度、溶媒粘度はオストワルド粘度計を
用いて測定した。■Detector PM: RCA31034/Photon Coun
Nng System (tlan+amaju Cl2
30) (supply 1600V) ■Measurement conditions 5LIT 100hmL100h
100mWGATE TIME
1.0secSCAN 5PEED f2
cm-'/minSAMPLING INTERVAL
O, 2cm"'REPEAT TIME
6 (9) Intrinsic viscosity [η] (Units: cl/g) A value calculated by the following formula from the solution viscosity measured at 1.25°C in orthochlorophenol is used. That is, ηsr/C= [η+K[η] 2 ・Nico, η, P=(solution viscosity/solvent viscosity)-1, C is the weight of dissolved polymer per 100ml of solvent (g/l 00ml
.. Usually 1.2), K is Huggins constant (C, 343). In addition, solution viscosity and solvent viscosity were measured using an Ostwald viscometer.
■表層粒子濃度比
2次イオンマススペクトル(SIMS)を用いて、フィ
ルム中の粒子に起因する元素のうち最も高濃度の元素と
熱可塑性樹脂の炭素元素の濃度比を粒子濃度とし、厚さ
方向の分析を行なう。SIMSによって測定される最表
層粒子濃度(深さOの点)における粒子濃度Aとさらに
深さ方向の分析を続けて得られる最高濃度Bの比、A/
Bを表層粒子濃度比と定義した。測定装置、条件は下記
のとおりである。■ Surface layer particle concentration ratio Using secondary ion mass spectrometry (SIMS), the particle concentration is defined as the concentration ratio of the element with the highest concentration among the elements caused by particles in the film and the carbon element of the thermoplastic resin, and We will conduct an analysis of The ratio of the particle concentration A at the outermost layer particle concentration (point at depth O) measured by SIMS to the maximum concentration B obtained by further analysis in the depth direction, A/
B was defined as the surface layer particle concentration ratio. The measuring device and conditions are as follows.
1次イオン種:02
1次イオン加速電圧:12KV
1、次イオン電流:200nA
ラスター領域:400μm口
分 析 領 域:ゲート30%
測定真空度: 6. OX 10−9TorrE −
G U N:0.5KV−3,0Aαυ表面粗さパ
ラメータRa(中心線平均粗さ)、Rt(最大高さ)
表面粗さ計を用いて測定した。条件は下記のとおりであ
り、20回の測定の平均値をもって値とした。Primary ion species: 02 Primary ion acceleration voltage: 12KV 1, Secondary ion current: 200nA Raster area: 400μm Mouth analysis area: Gate 30% Measurement vacuum degree: 6. OX 10-9 TorrE −
GUN: 0.5KV-3,0Aαυ Surface roughness parameters Ra (center line average roughness), Rt (maximum height) Measured using a surface roughness meter. The conditions were as follows, and the average value of 20 measurements was taken as the value.
・触針先端半径:0.5μm
・触針荷重:5mg
・測 定 長:1mm
・力・ソトオフ値二0.08mm
(支)耐久性
フィルムを幅1/2インチのテープ状にスリットしたも
のをテープ走行性試験機を使用して、ガイドピン(表面
粗度:Raで10100n上を走行させる(走行速度1
.000m/min、走行回数IQpais、巻き付は
角:60°、走行張力+65g)。・Stylus tip radius: 0.5μm ・Stylus load: 5mg ・Measurement length: 1mm ・Force/Soft-off value 20.08mm (Support) Durable film slit into 1/2 inch wide tape. Using a tape running tester, run on a guide pin (surface roughness: Ra, 10100n (running speed 1).
.. 000m/min, number of runs IQpais, wrapping angle: 60°, running tension +65g).
この時、フィルムに入った傷を顕微鏡で観察し、幅2.
5μm以上の傷がテープ幅あたり2本未満は優、2本以
上10本未満は良、10本以上は不良と判定した。優が
望ましいが、良でも実用的には使用可能である。At this time, the scratches in the film were observed under a microscope, and the width was 2.
If there were less than two scratches per tape width of 5 μm or more, it was determined to be excellent, if there were 2 or more and less than 10 scratches, it was determined to be good, and if there were 10 or more scratches, it was determined to be poor. Excellent is desirable, but good is still usable for practical purposes.
[実施例] 本発明を実施例に基づいて説明する。[Example] The present invention will be explained based on examples.
実施例1,2.5、比較例2.3
平均粒径の異なる架橋ポリスチレン粒子、コロイダルシ
リカに起因するシリカ粒子を含有するエチレングリコー
ルスラリーを調製し、このエチレングリコールスラリー
を190℃で1,5時間熱処理した後、テレフタル酸ジ
メチルとエステル交換反応させ、重縮合し、該粒子を1
〜10重量%含有するポリエチレンテレフタレート(以
TPETと略す)のペレットを作った。この時、重縮合
時間を調節し固有粘度を0.70とした(熱可塑性樹脂
B)。また、常法によって、固有粘度0゜62のPET
を製造し、熱可塑性樹脂Aとした。Examples 1, 2.5, Comparative Example 2.3 Ethylene glycol slurry containing crosslinked polystyrene particles with different average particle sizes and silica particles derived from colloidal silica was prepared, and this ethylene glycol slurry was heated at 190°C to 1.5 After heat treatment for a period of time, transesterification reaction with dimethyl terephthalate and polycondensation were carried out, and the particles were
Pellets of polyethylene terephthalate (hereinafter abbreviated as TPET) containing ~10% by weight were made. At this time, the polycondensation time was adjusted to give an intrinsic viscosity of 0.70 (thermoplastic resin B). In addition, PET with an intrinsic viscosity of 0°62 was prepared using a conventional method.
was produced and designated as thermoplastic resin A.
これらのポリマをそれぞれ180℃で6時間減圧乾燥(
3Torr) した後、熱可塑性樹脂Bを押出機1に供
給し310℃で溶融し、さらに、熱可塑性樹脂Aを押出
機2に供給、280℃で溶融し、これらのポリマを合流
ブロック(フィードブロック)で合流積層し、静電印加
キャスト法を用いて表面温度30℃のキャスティング・
ドラムに巻きつけて冷却固化し、積層未延伸フィルムを
作った。These polymers were each dried under reduced pressure at 180°C for 6 hours (
3 Torr), thermoplastic resin B was supplied to extruder 1 and melted at 310°C, thermoplastic resin A was further supplied to extruder 2 and melted at 280°C, and these polymers were transferred to a confluence block (feed block). ) and then casted at a surface temperature of 30°C using the electrostatic casting method.
It was wound around a drum and cooled and solidified to produce a laminated unstretched film.
この時、それぞれの押出機の吐出量を調節し総厚さ、熱
可塑性樹脂B層の厚さを調節した。At this time, the total thickness and the thickness of the thermoplastic resin B layer were adjusted by adjusting the discharge amount of each extruder.
この未延伸フィルムを温度80℃にて長手方向に4.5
倍延伸した。この延伸は2組ずつのロールの周速差で、
4段階で行なった。この−軸延伸フィルムをステンタを
用いて延伸速度2.000%/分で100℃で幅方向に
4.0倍延伸し、定長下で、190℃にて5秒間熱処理
し、総厚さ15μm1熱可塑性樹脂B層厚さ0607〜
0.9μmの二軸配向積層フィルムを得た。This unstretched film was heated to 4.5 mm in the longitudinal direction at a temperature of 80°C.
Stretched twice. This stretching is done by the difference in circumferential speed between the two sets of rolls.
It was done in 4 stages. This -axially stretched film was stretched 4.0 times in the width direction at 100°C at a stretching rate of 2.000%/min using a stenter, and then heat-treated at 190°C for 5 seconds under constant length to a total thickness of 15 μm. Thermoplastic resin B layer thickness 0607~
A biaxially oriented laminated film of 0.9 μm was obtained.
このフィルムの片面に、真空蒸着機内で微量の酸素の存
在下にコバルト・ニッケル合金(N i 20重量%)
を高周波スパッタリング法により斜め蒸着し厚さ0.
2μmの強磁性薄膜層を形成させた。続いてテープ幅に
スリットし金属薄膜型磁気記録媒体を得た。One side of this film was coated with a cobalt-nickel alloy (N i 20% by weight) in the presence of a trace amount of oxygen in a vacuum evaporator.
is obliquely deposited by high frequency sputtering method to a thickness of 0.
A ferromagnetic thin film layer of 2 μm was formed. Subsequently, slits were made to the width of the tape to obtain a metal thin film type magnetic recording medium.
実施例3,4、比較例1.4
上記の実施例と同様にして、実施例3では3台の押出機
を用いて3層積層の積層未延伸フィルムを、実施例4で
はさらにA層両筒に異なるポリマを積層した3層積層の
積層未延伸フィルムを、また比較例1は通常の単層フィ
ルムを、比較例4では3台の押出機を用いて3層積層の
積層未延伸フィルムを得た。Examples 3 and 4, Comparative Example 1.4 In the same manner as in the above examples, in Example 3, a three-layer laminated unstretched film was produced using three extruders, and in Example 4, a laminated unstretched film was produced using three extruders. A 3-layer laminated unstretched film with different polymers laminated on a tube, a normal single-layer film in Comparative Example 1, and a 3-layer unstretched laminated film in Comparative Example 4 using three extruders. Obtained.
これらの未延伸フィルムを温度80℃にて長手方向に4
.2倍延伸した。この−軸延伸フィルムをステンタを用
いて延伸速度2.000%/分で105℃で幅方向に4
.5倍延伸し、定長下で190℃にて5秒間熱処理し、
二軸配向フィルムを得た。These unstretched films were stretched 4 times in the longitudinal direction at a temperature of 80°C.
.. It was stretched 2 times. This -axially stretched film was stretched in the width direction at 105°C at a stretching rate of 2.000%/min using a stenter.
.. Stretched 5 times, heat treated at 190°C for 5 seconds under constant length,
A biaxially oriented film was obtained.
このフィルムの片面に、真空蒸着機内で微量の酸素の存
在下にコバルト・ニッケル合金(N i 20w1%)
を高周波スパッタリング法により斜め蒸着し厚さ0.1
μmの強磁性薄膜層を形成させた。Cobalt-nickel alloy (N i 20w1%) was deposited on one side of this film in the presence of a trace amount of oxygen in a vacuum evaporator.
is obliquely deposited using high frequency sputtering method to a thickness of 0.1
A ferromagnetic thin film layer of μm was formed.
続いてテープ幅にスリットし金属薄膜型磁気記録媒体を
得た。Subsequently, slits were made to the width of the tape to obtain a metal thin film type magnetic recording medium.
これらのフィルムの本発明のパラメータは第1表に示し
たとおりであり、本発明のパラメータが範囲内の場合は
、耐久性は第1表に示したとおり優または良であったが
、そうでない場合は耐久性を満足するフィルムは得られ
なかった。The parameters of the present invention for these films are as shown in Table 1, and when the parameters of the present invention were within the range, the durability was excellent or good as shown in Table 1, but when it was not. In this case, a film with satisfactory durability could not be obtained.
[発明の効果コ
本発明は、製法の工夫により、不活性粒子を含有する熱
可塑性樹脂を用いて、粒子の大きさとフィルム厚さの関
係、含有量を特定範囲としたので、耐久性に優れた磁気
記録媒体が得られたものであり、各用途でのフィルム加
工速度の増大に対応できるものである。[Effects of the invention] The present invention uses a thermoplastic resin containing inert particles by devising a manufacturing method, and the relationship between the particle size and film thickness and the content are set within a specific range, resulting in excellent durability. This results in a magnetic recording medium that can accommodate increased film processing speeds in various applications.
Claims (7)
層を設けてなる金属薄膜型磁気記録媒体であって、該基
材フィルムが熱可塑性樹脂Aよりなる層(A層)の少な
くとも片面に不活性粒子を含有する熱可塑性樹脂Bより
なる層(B層)を積層してなる二軸配向フィルムであり
、B層に含有される不活性粒子の平均粒径d_Bが5〜
200nm、該粒子のB層における含有量が1.5〜4
0重量%、B層の厚さt_Bと平均粒径d_Bの比t_
B/d_Bが0.1〜3の範囲であることを特徴とする
金属薄膜型磁気記録媒体。(1) A metal thin film type magnetic recording medium comprising a metal thin film type magnetic layer provided on at least one side of a base film, wherein the base film has a layer (A layer) made of thermoplastic resin A and a layer (A layer) that is not formed on at least one side of the base film. It is a biaxially oriented film formed by laminating a layer (B layer) made of thermoplastic resin B containing active particles, and the average particle diameter d_B of the inert particles contained in the B layer is 5 to 5.
200 nm, the content of the particles in the B layer is 1.5 to 4
0% by weight, ratio t_B of layer B thickness t_B to average particle diameter d_B
A metal thin film magnetic recording medium characterized in that B/d_B is in the range of 0.1 to 3.
膜型磁性層が設けられており、該磁性層側のB層に含有
される不活性粒子の平均粒径d_Bが5〜80nmであ
ることを特徴とする請求項(1)記載の金属薄膜型磁気
記録媒体。(2) A metal thin film type magnetic layer is provided on at least one B layer side of the base film, and the average particle diameter d_B of the inert particles contained in the B layer on the magnetic layer side is 5 to 80 nm. The metal thin film magnetic recording medium according to claim 1, characterized in that:
なる二軸配向フィルムであり、A層側にのみ金属薄膜型
磁性層が設けられており、該B層に含有される不活性粒
子の平均粒径d_Bが40〜200nmであることを特
徴とする請求項(1)記載の金属薄膜型磁気記録媒体。(3) The base film is a biaxially oriented film in which the B layer is laminated only on one side of the A layer, and a metal thin film type magnetic layer is provided only on the A layer side, and the B layer contains 2. The metal thin film magnetic recording medium according to claim 1, wherein the inert particles have an average particle diameter d_B of 40 to 200 nm.
層)の一方の面に不活性粒子を含有する熱可塑性樹脂B
よりなる層(B層)を、他面に不活性粒子を含有する熱
可塑性樹脂Cよりなる層(C層)を積層してなる二軸配
向フィルムであって、該基材フィルムのB層側にのみ金
属薄膜型磁性層が設けられており、該B層に含有される
不活性粒子の平均粒径d_Bが5〜80nm、該粒子の
B層における含有量が1.5〜40重量%、B層の厚さ
t_Bと平均粒径d_Bの比t_B/d_Bが0.1〜
3、該C層に含有される不活性粒子の平均粒径d_Cが
40〜200nm、該粒子のC層における含有量が1.
5〜40重量%、C層の厚さt_Cと平均粒径d_Cの
比t_C/d_Cが0.1〜3であることを特徴とする
金属薄膜型磁気記録媒体。(4) The base film is a layer made of thermoplastic resin A (A
thermoplastic resin B containing inert particles on one side of the layer)
A biaxially oriented film formed by laminating a layer (B layer) consisting of a thermoplastic resin C containing inert particles on the other side (C layer) on the B layer side of the base film. A metal thin film type magnetic layer is provided only in the B layer, the average particle diameter d_B of the inert particles contained in the B layer is 5 to 80 nm, the content of the particles in the B layer is 1.5 to 40% by weight, The ratio t_B/d_B of the thickness t_B of the B layer and the average grain size d_B is 0.1 to
3. The average particle diameter d_C of the inert particles contained in the C layer is 40 to 200 nm, and the content of the particles in the C layer is 1.
5 to 40% by weight, and the ratio t_C/d_C of the thickness t_C of the C layer to the average grain size d_C is 0.1 to 3.
つ、C層表面の全反射ラマン結晶化指数が20cm^−
^1以下であることを特徴とする請求項(4)に記載の
金属薄膜型磁気記録媒体。(5) Thermoplastic resin C is crystalline polyester, and the total reflection Raman crystallization index of the C layer surface is 20 cm^-
5. The metal thin film magnetic recording medium according to claim 4, wherein the magnetic recording medium is ^1 or less.
つ、B層表面の全反射ラマン結晶化指数が20cm^−
^1以下であることを特徴とする請求項(1)〜(5)
のいずれかに記載の金属薄膜型磁気記録媒体。(6) Thermoplastic resin B is crystalline polyester, and the total reflection Raman crystallization index of the B layer surface is 20 cm^-
Claims (1) to (5) characterized in that ^1 or less
The metal thin film magnetic recording medium according to any one of the above.
_Mの比、t_B/t_Mが0.02〜150の範囲で
あることを特徴とする請求項(1)〜(6)のいずれか
に記載の金属薄膜型磁気記録媒体。(7) Thickness t_B of layer B on the magnetic layer side and thickness t of the magnetic layer
7. The metal thin film magnetic recording medium according to claim 1, wherein the ratio of _M, t_B/t_M, is in the range of 0.02 to 150.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1-125081 | 1989-05-17 | ||
JP12508189 | 1989-05-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0373409A true JPH0373409A (en) | 1991-03-28 |
JP2666498B2 JP2666498B2 (en) | 1997-10-22 |
Family
ID=14901363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002085A Expired - Fee Related JP2666498B2 (en) | 1989-05-17 | 1990-01-08 | Metal thin film magnetic recording media |
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---|---|
JP (1) | JP2666498B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06187633A (en) * | 1992-12-15 | 1994-07-08 | Toray Ind Inc | Digital magnetic recording tape |
US5912063A (en) * | 1996-02-05 | 1999-06-15 | Teijin Limited | Biaxially oriented laminate films and magnetic recording media |
US5965233A (en) * | 1996-06-06 | 1999-10-12 | Teijin Limited | Laminate film and magnetic recording medium using the same |
US6124021A (en) * | 1997-05-20 | 2000-09-26 | Teijin Limited | Biaxially oriented laminate film of wholly aromatic polyamide and magnetic recording media |
US6344257B1 (en) | 1998-04-13 | 2002-02-05 | Teijin Limited | Aromatic polyamide film for high-density magnetic recording media |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63197643A (en) * | 1987-02-12 | 1988-08-16 | 帝人株式会社 | Composite polyester film |
JPS63271720A (en) * | 1987-04-30 | 1988-11-09 | Fuji Photo Film Co Ltd | Production of magnetic recording medium |
JPS63302019A (en) * | 1987-06-01 | 1988-12-08 | Toray Ind Inc | Biaxially oriented polyester film |
-
1990
- 1990-01-08 JP JP2002085A patent/JP2666498B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63197643A (en) * | 1987-02-12 | 1988-08-16 | 帝人株式会社 | Composite polyester film |
JPS63271720A (en) * | 1987-04-30 | 1988-11-09 | Fuji Photo Film Co Ltd | Production of magnetic recording medium |
JPS63302019A (en) * | 1987-06-01 | 1988-12-08 | Toray Ind Inc | Biaxially oriented polyester film |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06187633A (en) * | 1992-12-15 | 1994-07-08 | Toray Ind Inc | Digital magnetic recording tape |
US5912063A (en) * | 1996-02-05 | 1999-06-15 | Teijin Limited | Biaxially oriented laminate films and magnetic recording media |
US5965233A (en) * | 1996-06-06 | 1999-10-12 | Teijin Limited | Laminate film and magnetic recording medium using the same |
US6124021A (en) * | 1997-05-20 | 2000-09-26 | Teijin Limited | Biaxially oriented laminate film of wholly aromatic polyamide and magnetic recording media |
US6344257B1 (en) | 1998-04-13 | 2002-02-05 | Teijin Limited | Aromatic polyamide film for high-density magnetic recording media |
Also Published As
Publication number | Publication date |
---|---|
JP2666498B2 (en) | 1997-10-22 |
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