JPH0372711B2 - - Google Patents

Info

Publication number
JPH0372711B2
JPH0372711B2 JP62229385A JP22938587A JPH0372711B2 JP H0372711 B2 JPH0372711 B2 JP H0372711B2 JP 62229385 A JP62229385 A JP 62229385A JP 22938587 A JP22938587 A JP 22938587A JP H0372711 B2 JPH0372711 B2 JP H0372711B2
Authority
JP
Japan
Prior art keywords
carbon
film
present
silicon
wear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62229385A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63145776A (ja
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP22938587A priority Critical patent/JPS63145776A/ja
Publication of JPS63145776A publication Critical patent/JPS63145776A/ja
Publication of JPH0372711B2 publication Critical patent/JPH0372711B2/ja
Granted legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
JP22938587A 1987-09-12 1987-09-12 被膜作成方法 Granted JPS63145776A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22938587A JPS63145776A (ja) 1987-09-12 1987-09-12 被膜作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22938587A JPS63145776A (ja) 1987-09-12 1987-09-12 被膜作成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56140653A Division JPS5842472A (ja) 1981-09-07 1981-09-07 サ−マルヘツド

Publications (2)

Publication Number Publication Date
JPS63145776A JPS63145776A (ja) 1988-06-17
JPH0372711B2 true JPH0372711B2 (enExample) 1991-11-19

Family

ID=16891358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22938587A Granted JPS63145776A (ja) 1987-09-12 1987-09-12 被膜作成方法

Country Status (1)

Country Link
JP (1) JPS63145776A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7633085B2 (en) 1999-03-29 2009-12-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0649645A (ja) * 1992-07-31 1994-02-22 Yoshida Kogyo Kk <Ykk> 硬質多層膜形成体およびその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4943078A (enExample) * 1972-08-30 1974-04-23
GB1582231A (en) * 1976-08-13 1981-01-07 Nat Res Dev Application of a layer of carbonaceous material to a surface
DE2926080A1 (de) * 1979-06-28 1981-01-08 Philips Patentverwaltung Mittel zur trockenschmierung
EP0048542B2 (en) * 1980-08-21 1993-03-31 National Research Development Corporation Coating infra red transparent semiconductor material
JPS6153955A (ja) * 1984-08-24 1986-03-18 松下電工株式会社 エア−コレクタの取付構造

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7633085B2 (en) 1999-03-29 2009-12-15 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof

Also Published As

Publication number Publication date
JPS63145776A (ja) 1988-06-17

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