JPH0368744A - Thin magnetic film - Google Patents

Thin magnetic film

Info

Publication number
JPH0368744A
JPH0368744A JP20245189A JP20245189A JPH0368744A JP H0368744 A JPH0368744 A JP H0368744A JP 20245189 A JP20245189 A JP 20245189A JP 20245189 A JP20245189 A JP 20245189A JP H0368744 A JPH0368744 A JP H0368744A
Authority
JP
Japan
Prior art keywords
elements
ni
fe
nb
total
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20245189A
Inventor
Terunobu Miyazaki
Ken Takahashi
Minoru Takahashi
Original Assignee
Tohoku Tokushuko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohoku Tokushuko Kk filed Critical Tohoku Tokushuko Kk
Priority to JP20245189A priority Critical patent/JPH0368744A/en
Publication of JPH0368744A publication Critical patent/JPH0368744A/en
Application status is Pending legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/08Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183Sputtering targets therefor

Abstract

PURPOSE: To produce a thin magnetic film having high magnetic permeability and saturation magnetic flux density in a high-frequency region by forming a thin film by a sputtering method by using an Fe-Ni-Co alloy with a specific composition as a target.
CONSTITUTION: High-purity Ni, Fe, Nb, Ta, and Co are blended in the prescribed proportion, which is melted and cast in vacuum. The resulting Fe-Ni-Co-Nb-Ta alloy is worked into a target, and a thin film having a composition consisting of, by weight, <2% Co, 44-55% (Ni+Co), 0.5-5.5%, in total, of Nb and/or Ta, and the balance Fe is formed on a glass substrate in a reduced-pressure Ar-gas atmosphere, e.g., by a sputtering method. If necessary, 0.1-2%, in total, of one or more elements among Mo, V, Cr, W, and Cu for improving magnetic properties, 0.001-0.5% of one or more elements among Ti, Zr, and Hf as grain-refining elements, or 0.001-2%, in total, of one or more elements among Ag, Au, Ru, Rh, Pd, and Pt as corrosion resistance-improving elements can be incorporated to the above thin film.
COPYRIGHT: (C)1991,JPO&Japio
JP20245189A 1989-08-04 1989-08-04 Thin magnetic film Pending JPH0368744A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20245189A JPH0368744A (en) 1989-08-04 1989-08-04 Thin magnetic film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20245189A JPH0368744A (en) 1989-08-04 1989-08-04 Thin magnetic film

Publications (1)

Publication Number Publication Date
JPH0368744A true JPH0368744A (en) 1991-03-25

Family

ID=16457745

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20245189A Pending JPH0368744A (en) 1989-08-04 1989-08-04 Thin magnetic film

Country Status (1)

Country Link
JP (1) JPH0368744A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8032960B2 (en) 2006-09-14 2011-10-11 Martin B Rawls-Meehan Methods and systems of an adjustable bed
US9295338B2 (en) 2006-09-14 2016-03-29 Martin B. Rawls-Meehan Adjustable bed position control
US9730525B2 (en) 2006-09-14 2017-08-15 Martin B. Rawls-Meehan Adjustable bed position control
US9737155B2 (en) 2007-09-14 2017-08-22 Martin B. Rawls-Meehan System for tandem bed communication
US10064784B2 (en) 2006-09-14 2018-09-04 Martin B. Rawls-Meehan System and method of an adjustable bed with a vibration motor

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9149126B2 (en) 2006-08-29 2015-10-06 Martin B Rawls-Meehan Methods and systems of an adjustable bed
US9161633B2 (en) 2006-08-29 2015-10-20 Martin B. Rawls-Meehan System of memory positions for an adjustable bed
US9700149B2 (en) 2006-08-29 2017-07-11 Martin B. Rawls-Meehan Methods and systems of an adjustable bed
US9717344B2 (en) 2006-08-29 2017-08-01 Martin B. Rawls-Meehan Methods and systems of an adjustable bed
US9737150B2 (en) 2006-08-29 2017-08-22 Martin B. Rawls-Meehan Adjustable bed with an actuator safety slot
US8032960B2 (en) 2006-09-14 2011-10-11 Martin B Rawls-Meehan Methods and systems of an adjustable bed
US9295338B2 (en) 2006-09-14 2016-03-29 Martin B. Rawls-Meehan Adjustable bed position control
US9730525B2 (en) 2006-09-14 2017-08-15 Martin B. Rawls-Meehan Adjustable bed position control
US9867478B2 (en) 2006-09-14 2018-01-16 Martin B. Rawls-Meehan Closed feedback loop to verify a position of an adjustable bed
US10064784B2 (en) 2006-09-14 2018-09-04 Martin B. Rawls-Meehan System and method of an adjustable bed with a vibration motor
US9737155B2 (en) 2007-09-14 2017-08-22 Martin B. Rawls-Meehan System for tandem bed communication

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