JPH0368376B2 - - Google Patents

Info

Publication number
JPH0368376B2
JPH0368376B2 JP57217996A JP21799682A JPH0368376B2 JP H0368376 B2 JPH0368376 B2 JP H0368376B2 JP 57217996 A JP57217996 A JP 57217996A JP 21799682 A JP21799682 A JP 21799682A JP H0368376 B2 JPH0368376 B2 JP H0368376B2
Authority
JP
Japan
Prior art keywords
weight
parts
photosensitive
film
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57217996A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59107344A (ja
Inventor
Masanori Murata
Kazutaka Masaoka
Eiji Fujita
Hajime Kakumaru
Takashi Yamadera
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP21799682A priority Critical patent/JPS59107344A/ja
Publication of JPS59107344A publication Critical patent/JPS59107344A/ja
Publication of JPH0368376B2 publication Critical patent/JPH0368376B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP21799682A 1982-12-13 1982-12-13 感光性樹脂組成物 Granted JPS59107344A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21799682A JPS59107344A (ja) 1982-12-13 1982-12-13 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21799682A JPS59107344A (ja) 1982-12-13 1982-12-13 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS59107344A JPS59107344A (ja) 1984-06-21
JPH0368376B2 true JPH0368376B2 (ref) 1991-10-28

Family

ID=16712985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21799682A Granted JPS59107344A (ja) 1982-12-13 1982-12-13 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS59107344A (ref)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3602215A1 (de) * 1986-01-25 1987-07-30 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
JP2700391B2 (ja) * 1988-04-07 1998-01-21 日本合成化学工業株式会社 感光性組成物
JP4396443B2 (ja) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 感光性平版印刷版の製造方法及び使用方法
EP1826005A4 (en) 2004-12-09 2010-11-03 Konica Minolta Med & Graphic IMAGE FORMING METHOD, PHOTOPOLYMERIZABLE INK JET PRINTING DEVICE, INK ASSEMBLY, AND INK JET PRINTING METHOD
JP4549891B2 (ja) * 2005-03-04 2010-09-22 富士フイルム株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
WO2007052470A1 (ja) 2005-11-01 2007-05-10 Konica Minolta Medical & Graphic, Inc. 平版印刷版材料、平版印刷版、平版印刷版の作製方法及び平版印刷版の印刷方法
US8764170B2 (en) 2007-02-09 2014-07-01 Konica Minolta Medical & Graphic, Inc. Ink-jet head, ink-jet printer, and ink-jet recording method
US8454152B2 (en) 2008-06-23 2013-06-04 Konica Minolta Holdings, Inc. Ink jet recording device and ink jet recording method
US8888262B2 (en) 2008-11-07 2014-11-18 Konica Minolta Holdings, Inc. Actinic energy radiation curable inkjet ink and inkjet recording method
JP2010115791A (ja) 2008-11-11 2010-05-27 Konica Minolta Ij Technologies Inc 画像形成装置
EP2607433B1 (en) 2010-08-19 2020-11-11 Konica Minolta Holdings, Inc. Active ray-curable ink and active ray-curable inkjet recording method
JP5761202B2 (ja) 2010-12-10 2015-08-12 コニカミノルタ株式会社 インクジェット記録装置
CN103459469B (zh) 2011-03-30 2015-09-09 旭化成化学株式会社 有机聚硅氧烷、其制造方法和含有有机聚硅氧烷的固化性树脂组合物
EP2703173A4 (en) 2011-04-27 2014-10-01 Konica Minolta Inc INK JET PRINTING DEVICE
CN104144788B (zh) 2012-03-01 2016-06-29 柯尼卡美能达株式会社 喷墨记录方法
CN104284779B (zh) 2012-05-01 2016-03-09 柯尼卡美能达株式会社 图像形成装置
US9457569B2 (en) 2013-03-29 2016-10-04 Konica Minolta, Inc. Image formation device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57192946A (en) * 1981-05-11 1982-11-27 Hitachi Chem Co Ltd Photosensitive resin composition

Also Published As

Publication number Publication date
JPS59107344A (ja) 1984-06-21

Similar Documents

Publication Publication Date Title
JPH0368376B2 (ref)
JPS5928323B2 (ja) 光重合性組成物
JP5344034B2 (ja) 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
US4741987A (en) Photopolymerizable composition including benzotriazole carboxylic acid
US4657942A (en) Photopolymerizable composition
EP0071789A1 (de) Für die Herstellung von Photoresistschichten geeignetes Schichtübertragungsmaterial
DE3503115A1 (de) Photopolymerisierbare zusammensetzungen
JP2769589B2 (ja) 感光性樹脂組成物
KR101040475B1 (ko) 감광성 수지 조성물, 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 인쇄 배선판의 제조 방법
EP0566353A1 (en) Photopolymerizable composition
KR102882782B1 (ko) 감광성 수지 적층체
DE3601997A1 (de) Photopolymerisierbare zusammensetzung
JPH06236031A (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
KR20120139790A (ko) 감광성 수지 조성물 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 인쇄 배선판의 제조 방법
JPH0635190A (ja) 感光性樹脂組成物及びこれを用いた積層体
JP2877615B2 (ja) 感光性樹脂組成物
JP2677916B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JP2000003035A (ja) ネガ型光画像形成性組成物
JP2017191171A (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
DE2816774A1 (de) Photopolymerisierbares material
JP3487294B2 (ja) 感光性樹脂組成物とその利用
JP3100039B2 (ja) テンティング用ドライフィルムレジスト
JPH0334056B2 (ref)
JP2533369B2 (ja) 光重合性組成物
JP2004294553A (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法