JPH0366656B2 - - Google Patents

Info

Publication number
JPH0366656B2
JPH0366656B2 JP59061372A JP6137284A JPH0366656B2 JP H0366656 B2 JPH0366656 B2 JP H0366656B2 JP 59061372 A JP59061372 A JP 59061372A JP 6137284 A JP6137284 A JP 6137284A JP H0366656 B2 JPH0366656 B2 JP H0366656B2
Authority
JP
Japan
Prior art keywords
film
mask
etching
glass substrate
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59061372A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60202441A (ja
Inventor
Yaichiro Watakabe
Hiroaki Morimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59061372A priority Critical patent/JPS60202441A/ja
Publication of JPS60202441A publication Critical patent/JPS60202441A/ja
Publication of JPH0366656B2 publication Critical patent/JPH0366656B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59061372A 1984-03-27 1984-03-27 半導体装置用パタ−ン形成マスク Granted JPS60202441A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59061372A JPS60202441A (ja) 1984-03-27 1984-03-27 半導体装置用パタ−ン形成マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59061372A JPS60202441A (ja) 1984-03-27 1984-03-27 半導体装置用パタ−ン形成マスク

Publications (2)

Publication Number Publication Date
JPS60202441A JPS60202441A (ja) 1985-10-12
JPH0366656B2 true JPH0366656B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-10-18

Family

ID=13169271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59061372A Granted JPS60202441A (ja) 1984-03-27 1984-03-27 半導体装置用パタ−ン形成マスク

Country Status (1)

Country Link
JP (1) JPS60202441A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62153957A (ja) * 1985-12-27 1987-07-08 Hoya Corp フォトマスクブランクとフォトマスク
JPH0650387B2 (ja) * 1986-03-31 1994-06-29 アルバツク成膜株式会社 フオトマスクおよびその製造方法
JPH0650388B2 (ja) * 1986-04-04 1994-06-29 アルバツク成膜株式会社 フオトマスクおよびその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57157247A (en) * 1981-03-23 1982-09-28 Nec Corp Optical exposure mask

Also Published As

Publication number Publication date
JPS60202441A (ja) 1985-10-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term