JPH036650B2 - - Google Patents

Info

Publication number
JPH036650B2
JPH036650B2 JP59196645A JP19664584A JPH036650B2 JP H036650 B2 JPH036650 B2 JP H036650B2 JP 59196645 A JP59196645 A JP 59196645A JP 19664584 A JP19664584 A JP 19664584A JP H036650 B2 JPH036650 B2 JP H036650B2
Authority
JP
Japan
Prior art keywords
alignment
mask
wafer
pattern
reduction projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59196645A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6175522A (ja
Inventor
Yoshitada Oshida
Masataka Shiba
Naoto Nakajima
Toshihiko Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59196645A priority Critical patent/JPS6175522A/ja
Priority to US06/762,329 priority patent/US4701050A/en
Publication of JPS6175522A publication Critical patent/JPS6175522A/ja
Publication of JPH036650B2 publication Critical patent/JPH036650B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59196645A 1984-08-10 1984-09-21 縮小投影式アライメント装置 Granted JPS6175522A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59196645A JPS6175522A (ja) 1984-09-21 1984-09-21 縮小投影式アライメント装置
US06/762,329 US4701050A (en) 1984-08-10 1985-08-05 Semiconductor exposure apparatus and alignment method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59196645A JPS6175522A (ja) 1984-09-21 1984-09-21 縮小投影式アライメント装置

Publications (2)

Publication Number Publication Date
JPS6175522A JPS6175522A (ja) 1986-04-17
JPH036650B2 true JPH036650B2 (Direct) 1991-01-30

Family

ID=16361216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59196645A Granted JPS6175522A (ja) 1984-08-10 1984-09-21 縮小投影式アライメント装置

Country Status (1)

Country Link
JP (1) JPS6175522A (Direct)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2574460B2 (ja) * 1989-05-08 1997-01-22 松下電子工業株式会社 マスクならびにマスクとウエーハとの位置合わせ方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置
FR2523323A1 (fr) * 1982-03-09 1983-09-16 Euromask Dispositif d'alignement pour machines de fabrication de circuits integres
JPS58162039A (ja) * 1982-03-23 1983-09-26 Nippon Kogaku Kk <Nikon> 投影型露光装置
JPS58162954A (ja) * 1982-03-24 1983-09-27 Nippon Kogaku Kk <Nikon> 投影型露光装置

Also Published As

Publication number Publication date
JPS6175522A (ja) 1986-04-17

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term