JPH036615B2 - - Google Patents

Info

Publication number
JPH036615B2
JPH036615B2 JP56030266A JP3026681A JPH036615B2 JP H036615 B2 JPH036615 B2 JP H036615B2 JP 56030266 A JP56030266 A JP 56030266A JP 3026681 A JP3026681 A JP 3026681A JP H036615 B2 JPH036615 B2 JP H036615B2
Authority
JP
Japan
Prior art keywords
sample
hole
center point
objective lens
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56030266A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57145259A (en
Inventor
Shigetomo Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akashi Seisakusho KK
Original Assignee
Akashi Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akashi Seisakusho KK filed Critical Akashi Seisakusho KK
Priority to JP56030266A priority Critical patent/JPS57145259A/ja
Priority to US06/347,863 priority patent/US4437009A/en
Publication of JPS57145259A publication Critical patent/JPS57145259A/ja
Publication of JPH036615B2 publication Critical patent/JPH036615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP56030266A 1981-03-03 1981-03-03 Scanning type electron microscope and its similar device Granted JPS57145259A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56030266A JPS57145259A (en) 1981-03-03 1981-03-03 Scanning type electron microscope and its similar device
US06/347,863 US4437009A (en) 1981-03-03 1982-02-11 Scanning electron microscope or similar equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56030266A JPS57145259A (en) 1981-03-03 1981-03-03 Scanning type electron microscope and its similar device

Publications (2)

Publication Number Publication Date
JPS57145259A JPS57145259A (en) 1982-09-08
JPH036615B2 true JPH036615B2 (US20100223739A1-20100909-C00005.png) 1991-01-30

Family

ID=12298894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56030266A Granted JPS57145259A (en) 1981-03-03 1981-03-03 Scanning type electron microscope and its similar device

Country Status (2)

Country Link
US (1) US4437009A (US20100223739A1-20100909-C00005.png)
JP (1) JPS57145259A (US20100223739A1-20100909-C00005.png)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978434A (ja) * 1982-10-26 1984-05-07 Akashi Seisakusho Co Ltd 電磁式対物レンズ
JPS60155162U (ja) * 1984-03-26 1985-10-16 日本電子株式会社 走査電子顕微鏡用対物レンズ
US4864228A (en) * 1985-03-15 1989-09-05 Fairchild Camera And Instrument Corporation Electron beam test probe for integrated circuit testing
US4912405A (en) * 1985-08-16 1990-03-27 Schlumberger Technology Corporation Magnetic lens and electron beam deflection system
JPH0530279Y2 (US20100223739A1-20100909-C00005.png) * 1987-04-17 1993-08-03
KR920000941B1 (ko) * 1988-02-16 1992-01-31 후지쓰 가부시끼가이샤 전자빔 노광장치
JPH077654B2 (ja) * 1988-04-01 1995-01-30 株式会社日立製作所 走査型電子顕微鏡
US5079428A (en) * 1989-08-31 1992-01-07 Bell Communications Research, Inc. Electron microscope with an asymmetrical immersion lens
JP2875940B2 (ja) * 1993-08-26 1999-03-31 株式会社日立製作所 試料の高さ計測手段を備えた電子ビーム装置
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
JP5350123B2 (ja) 2009-08-10 2013-11-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び画像表示方法
US8389962B2 (en) * 2011-05-31 2013-03-05 Applied Materials Israel, Ltd. System and method for compensating for magnetic noise

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4851578A (US20100223739A1-20100909-C00005.png) * 1971-10-29 1973-07-19
JPS54935A (en) * 1977-06-06 1979-01-06 Hitachi Ltd Pattern detector
JPS5532298U (US20100223739A1-20100909-C00005.png) * 1978-08-24 1980-03-01
JPS55115247A (en) * 1979-02-28 1980-09-05 Jeol Ltd Scale factor controller for scanning electron microscope

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5758689Y2 (US20100223739A1-20100909-C00005.png) * 1977-02-08 1982-12-15
JPS5841642Y2 (ja) * 1979-01-08 1983-09-20 株式会社島津製作所 電子線照射分析装置の試料ホルダ−

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4851578A (US20100223739A1-20100909-C00005.png) * 1971-10-29 1973-07-19
JPS54935A (en) * 1977-06-06 1979-01-06 Hitachi Ltd Pattern detector
JPS5532298U (US20100223739A1-20100909-C00005.png) * 1978-08-24 1980-03-01
JPS55115247A (en) * 1979-02-28 1980-09-05 Jeol Ltd Scale factor controller for scanning electron microscope

Also Published As

Publication number Publication date
JPS57145259A (en) 1982-09-08
US4437009A (en) 1984-03-13

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