JPH0366153A - Manufacture of lead frame for semiconductor device use - Google Patents

Manufacture of lead frame for semiconductor device use

Info

Publication number
JPH0366153A
JPH0366153A JP20358789A JP20358789A JPH0366153A JP H0366153 A JPH0366153 A JP H0366153A JP 20358789 A JP20358789 A JP 20358789A JP 20358789 A JP20358789 A JP 20358789A JP H0366153 A JPH0366153 A JP H0366153A
Authority
JP
Japan
Prior art keywords
lead frame
lead
stage
tip
shaped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20358789A
Other languages
Japanese (ja)
Other versions
JP2520482B2 (en
Inventor
Isamu Omi
近江 勇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui High Tec Inc
Original Assignee
Mitsui High Tec Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui High Tec Inc filed Critical Mitsui High Tec Inc
Priority to JP1203587A priority Critical patent/JP2520482B2/en
Publication of JPH0366153A publication Critical patent/JPH0366153A/en
Application granted granted Critical
Publication of JP2520482B2 publication Critical patent/JP2520482B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To give a lead frame a mechanical strength which is resistant to a tensile force and an added tension during an annealing process by a method wherein an intermediate piece is provided at the tip of an inner lead and the inner lead is united to a periphery of a semiconductor-element mounting stage. CONSTITUTION:Inner leads 2 are extended and stamped so as to form intermediate pieces 4 at tips 8 of the inner leads 2; they are connected and united to a stage part 3 via the intermediate pieces 4. In addition, a coining operation to form thin parts of a wire bonding area having a prescribed shape is executed on the tip parts of the inner leads 2; a continuous body of a belt-shaped lead frame is formed. While a uniform tension is being exerted on the belt-shaped lead frame, the lead frame is conveyed continuously to an annealing treatment furnace and is heated, annealed and cooled gradually one after another to remove an internal residual stress. Then, the belt-shaped lead frame in this state is conveyed to a plating apparatus; a required treatment is executed; the inner leads 2 are fixed by using an insulating resin tape or a resin in a state that the tips of the leads are held; after that, the stage part 3 and cavity parts are formed in required sizes; the intermediate pieces 4 are removed to obtain a desired lead frame.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体装置用リードフレームの製造方法に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a lead frame for a semiconductor device.

〔従来の技術〕[Conventional technology]

半導体装置用リードフレームの製造方法は、プレス加工
によるものが良く知られている。このプレス加工法は、
通常良く知られた順送り金型を用いて、圧延した金属薄
板材料の不要部分を順次打抜き、所定形状のリードフレ
ームを連続体または短冊状に形成するものである。
A well-known method for manufacturing lead frames for semiconductor devices is press processing. This pressing method is
A well-known progressive die is used to sequentially punch out unnecessary parts of a rolled thin metal plate material, thereby forming a lead frame of a predetermined shape into a continuous body or strip.

近来、リードフレームを用いた半導体装置の機能の多様
化、多ピン化傾向に伴って、リードフレームのインナー
リードの先端部が微細化され、リード幅や間隔が一層狭
くなる傾向にある。しかしながら、プレスによる加工は
、打抜き刃物の強度の点から微細なリード間の打抜きは
離間して行っている。すなわち、リードの両側のリード
間を別々の工程で打抜きする処理を行っている。このた
め、インナーリードに捩じりが生じリードフレームの内
部に加工応力が残る。この内部応力が半導体装置の組立
て工程における加熱によって解放されリード先端の寄り
1重なり及び浮き沈み等を生じ、半導体装置の組立て工
程におけるワイヤボンディングの接続不良1回路の短絡
を招く等リードフレームの品質を低下させる要因となっ
ていた。
In recent years, as the functions of semiconductor devices using lead frames have become more diversified and the number of pins has increased, the tips of inner leads of lead frames have become finer, and lead widths and intervals have become narrower. However, when working with a press, the punching between fine leads is performed at a distance from the viewpoint of the strength of the punching blade. That is, the process of punching out the space between the leads on both sides of the lead is performed in separate steps. As a result, the inner lead is twisted and machining stress remains inside the lead frame. This internal stress is released by heating during the semiconductor device assembly process, causing the lead tips to overlap, rise and fall, and deteriorate the quality of the lead frame, such as poor wire bonding connections and short circuits during the semiconductor device assembly process. This was a contributing factor.

このような要因を防止する従来技術として、リード先端
を連結する連結片を設け、各リードの先端を連結した状
態でテープや樹脂等によって各リードリードの先端を固
定保持するものが知られている。更に他の公知技術とし
て、リードフレームが帯有する内部応力を除去する焼鈍
を施した後、リードの先端を形成した短冊状リードフレ
ーム又はリードフレームの連続体を熱処理する方法が提
案されている。
As a conventional technique for preventing such factors, it is known to provide a connecting piece that connects the ends of the leads, and to fix and hold the ends of each lead with tape, resin, etc. while the ends of each lead are connected. . As another known technique, a method has been proposed in which a lead frame is annealed to remove internal stress, and then a strip-shaped lead frame or a continuous body of lead frames, in which lead tips are formed, is heat treated.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかし、上記技術においては、短冊状リードフレームを
熱処理用治具に配列する際に手作業となり、作業性に欠
け、工程が増加する。更に、真空装置等の付帯設備が高
コストとなる欠点がある。
However, in the above technique, arranging the strip-shaped lead frames on a heat treatment jig requires manual work, which lacks workability and increases the number of steps. Furthermore, there is a drawback that the cost of ancillary equipment such as a vacuum device is high.

更に、リードフレームの連続体を焼鈍する技術において
は、加熱、徐冷による形状の変形及び位置決め用基準孔
の変形並びに基準孔ピッチの寸法が変化して後工程の半
導体位置決めが不安定となり、トラブルの原因となる欠
点があった。
Furthermore, in the technology of annealing a continuous lead frame, heating and slow cooling cause deformation of the shape, deformation of the positioning reference holes, and changes in the pitch of the reference holes, making semiconductor positioning in the subsequent process unstable and causing problems. There was a drawback that caused this.

更に、リード先端を細い連結片で接続しているため、リ
ードフレームの連続体を連続又は間欠搬送して焼鈍処理
を施す場合、引っ張り力によるリード先端部分の変形又
はコイニングの余肉による変形が生じる等の欠点もあっ
た。
Furthermore, since the lead tips are connected with thin connecting pieces, when a continuous lead frame is continuously or intermittently conveyed and annealed, the lead tips may be deformed due to tensile force or deformation due to excess coining. There were also other drawbacks.

本発明は、上記欠点を取り除き、インナーリード先端部
のワイヤボンディングエリアを正確に所要形状に創成す
ること、及び焼鈍を施す際に付加するテンションに耐え
得る程度の機械的強度を付与すること、並びにインナー
リード先端部を正確な位置に配列保持してテープ固定す
ることを目的とする。更に、作業性が良く、且つ高品質
で所要の機能条件を有するリードフレームを得る製造方
法を提供することにある。
The present invention eliminates the above-mentioned drawbacks, creates a wire bonding area at the tip of an inner lead accurately in a desired shape, provides mechanical strength sufficient to withstand the tension applied during annealing, and The purpose is to align and hold the tips of the inner leads in accurate positions and fix them with tape. Furthermore, it is an object of the present invention to provide a manufacturing method for obtaining a lead frame that is easy to work with, has high quality, and has the required functional conditions.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、上記目的を達成するために、各インナーリー
ドの先端部に中間片を備え、この中間片を介して各イン
ナーリードをステージ部の周辺に連結してインナーリー
ドとステージとを一体に形威し、且つ中間片を備えた先
端部にワイヤボンディングエリアを有する薄肉部を正確
に形成加工して帯状リードフレームを構成する。そして
、この帯状リードフレームに所要のテンションを均一に
付加して焼鈍の連続処理を該帯状リードフレームの製造
工程の中間に介在させて構成し、所要の構成機能を有す
るリードフレームを得ることを特徴とする。
In order to achieve the above object, the present invention includes an intermediate piece at the tip of each inner lead, connects each inner lead to the periphery of the stage part via this intermediate piece, and integrates the inner lead and the stage. A strip-shaped lead frame is constructed by accurately forming and processing a thin part having a shape and having a wire bonding area at the tip with an intermediate piece. Then, a required tension is uniformly applied to this strip-shaped lead frame, and a continuous process of annealing is interposed in the middle of the manufacturing process of the strip-shaped lead frame, thereby obtaining a lead frame having the required structural function. shall be.

〔作用〕[Effect]

本発明の方法では、各インナーリードの先端に中間片を
備え、この中間片を介してインナーリードをステージ部
の周辺に連結して一体形成し、リードフレームに搬送・
の引っ張り力及びテンションに耐え得るように機械的強
度を与える。更に、この中間片によって先端部にワイヤ
ボンディングエリアを有する薄肉部を正確に成形加工す
る際の余肉の逃げ部分を構成することにより、インナー
リードの変形を最小にとどめて帯状のリードフレームを
加工する。
In the method of the present invention, an intermediate piece is provided at the tip of each inner lead, the inner lead is connected to the periphery of the stage part via this intermediate piece, and is integrally formed.
Provides mechanical strength to withstand tensile force and tension. In addition, this intermediate piece forms a relief part for excess thickness when accurately molding a thin part with a wire bonding area at the tip, making it possible to process a strip-shaped lead frame while minimizing deformation of the inner lead. do.

この後、帯状リードフレームに所定のテンションを均一
に付加し、該フレームを連続又は所要の長さ間欠搬送し
て、予熱、焼鈍、及び徐冷を順次行って内部の残留応力
を除去する焼鈍を連続して行う。そして、リードフレー
ムの所定の範囲にめっきを施し、その後インナーリード
を所定の位置に固定するテーピング又は樹脂固定等のリ
ードフレーム所要の処理加工を施する。そして更に、素
子搭載ステージ及びキャビテーを所定の形状に形威し、
中間片を除去して所要のリードフレームを得る。
After this, a predetermined tension is uniformly applied to the strip-shaped lead frame, and the frame is continuously or intermittently conveyed for a required length, and preheating, annealing, and slow cooling are performed sequentially to remove internal residual stress. Do it continuously. Then, plating is applied to a predetermined area of the lead frame, and then the lead frame is subjected to necessary processing such as taping or resin fixing to fix the inner leads in a predetermined position. Furthermore, the element mounting stage and cavity are shaped into a predetermined shape,
The intermediate piece is removed to obtain the required lead frame.

〔実施例〕〔Example〕

以下、図面に示す実施例により本発明の特徴を具体的に
説明する。
Hereinafter, features of the present invention will be specifically explained with reference to embodiments shown in the drawings.

第1図は本発明の方法によって製造するリードフレーム
の中間工程での状況を示す平面図、第2図(a)及びら
)は素子搭載ステージの詳細を示す拡大平面図(第1図
の円Aで囲んだ部分)及び拡大断面図である。また、第
3図は本発明の方法によって得られたリードフレームの
最終製品を示す平面図である。
FIG. 1 is a plan view showing the situation in an intermediate process of a lead frame manufactured by the method of the present invention, and FIG. FIG. 3 is a portion surrounded by A) and an enlarged cross-sectional view. Moreover, FIG. 3 is a plan view showing the final product of the lead frame obtained by the method of the present invention.

第1図及び第2図に示すように、所定の寸法幅にスリッ
トされた42ALLOY (Fe−Ni 系合金)の帯
状をなす金属薄板材料を順送り金型を用いて順次不要部
分を打抜き除去してアウターリード1.インナーリード
2及び半導体素子搭載用のステージ部3と、このステー
ジ部3を支持するサポートパー6を形成する。
As shown in Figures 1 and 2, a metal thin plate material in the form of a band of 42ALLOY (Fe-Ni alloy), which has been slit to a predetermined width, is punched out and removed in sequence using a progressive die. Outer lead 1. A stage part 3 for mounting the inner lead 2 and the semiconductor element, and a support par 6 for supporting the stage part 3 are formed.

インナーリード2の成形工程においては、第2図に示す
ように、インナーリード2の先端8に図中の斜線で示す
領域の中間片4を設けるようにインナーリード2を延長
して打抜き、中間片4を介してステージ部3と連結して
一体化する。更に、インナーリード2の先端部に所定の
形状を有するワイヤボンディングエリア5の薄肉部を形
成するコイニングを施して、第1図のように帯状のリー
ドフレームの連続体を形成する。
In the forming process of the inner lead 2, as shown in FIG. 2, the inner lead 2 is extended and punched so that the intermediate piece 4 in the area shown by diagonal lines in the figure is provided at the tip 8 of the inner lead 2. 4 and is connected to the stage section 3 and integrated. Furthermore, coining is applied to the tip of the inner lead 2 to form a thin part of the wire bonding area 5 having a predetermined shape, thereby forming a continuous band-shaped lead frame as shown in FIG.

上記は、アウターリード1.インナーリード2を形成し
たが、リードピン数が増加してリード幅が狭くなる場合
には、リードフレームに搬送の弓っ張り力及びテンショ
ンに耐え得るように機械的強度を与えるため、第4図及
び第5図に示すように、アウターリード1を除いて帯状
のリードフレームの連続体を形成してもよい。但し、ア
ウターリード1は、次工程の焼鈍処理を施した後、打抜
き除去する。なお、第5図(a)は第4図の円Aで囲ん
だ部分の拡大平面図、第5図(b)は拡大縦断面図であ
る。
The above is outer lead 1. Although the inner lead 2 has been formed, if the number of lead pins increases and the lead width becomes narrower, in order to give the lead frame mechanical strength to withstand the bending force and tension of conveyance, it is necessary to As shown in FIG. 5, a continuous band-shaped lead frame may be formed by excluding the outer lead 1. However, the outer lead 1 is punched out and removed after being subjected to the next annealing process. Note that FIG. 5(a) is an enlarged plan view of the portion surrounded by circle A in FIG. 4, and FIG. 5(b) is an enlarged longitudinal sectional view.

次に、上記工程で形成した帯状リードフレームに均一な
テンションを付加しながら連続して焼鈍処理炉に搬送す
る。焼鈍処理炉では、帯状リードフレームに対し予熱、
焼鈍及び徐冷を順次施し、更に帯状のリードフレームの
内部残留応力を除去する焼鈍を施す。焼鈍温度は変態点
以下の400〜500 ℃が好ましい。しかし、リード
フレームの所要条件又はリードピン数9幅等の形状及び
材質によっては、低温焼鈍による内部応力の低減程度に
とどめる処理であってもよい。また、炉内の雰囲気条件
は、酸化防止を考慮して中性雰囲気の光輝焼鈍を行うと
よい。更に、テンション付加は一般的なテンション付加
装置を用いて行い、適当な位置にテンション検出センサ
を配置して自動的に均一なテンションを与えるように制
御する。
Next, the belt-shaped lead frame formed in the above process is continuously conveyed to an annealing treatment furnace while applying uniform tension. In the annealing furnace, the strip lead frame is preheated and
Annealing and slow cooling are sequentially performed, and further annealing is performed to remove internal residual stress in the band-shaped lead frame. The annealing temperature is preferably 400 to 500°C below the transformation point. However, depending on the required conditions of the lead frame, the shape and material such as the number and width of the lead pins, the process may be limited to reducing the internal stress by low-temperature annealing. In addition, bright annealing is preferably performed in a neutral atmosphere in consideration of oxidation prevention. Further, tension is applied using a general tension applying device, and a tension detection sensor is placed at an appropriate position to automatically apply uniform tension.

次に、帯状リードフレームの状態でめっき装置に搬送し
て所要の処理を施し、ワイヤボンディングエリア5及び
ステージ部3に貴金属めっきを施す。更に、リード先端
を保持した状態でインナーリード2を絶縁樹脂テープ又
は樹脂で固定した後ステージ部3とキャビチ一部10を
所要の寸法に形成して中間片4を除去して第3図に示す
所望のリードフレームを得ることができる。
Next, the belt-shaped lead frame is transported to a plating apparatus and subjected to necessary processing, and the wire bonding area 5 and the stage section 3 are plated with a precious metal. Furthermore, after fixing the inner lead 2 with an insulating resin tape or resin while holding the lead tip, the stage part 3 and the cavity part 10 are formed to the required dimensions, and the intermediate piece 4 is removed, as shown in FIG. A desired lead frame can be obtained.

〔発明の効果〕〔Effect of the invention〕

以上のように、本発明によれば、インナーリードの先端
に中間片を備えて半導体草子搭載ステージ部の周辺にイ
ンナーリードリードを一体化した製造方法なので、焼鈍
工程における引っ張り力及び付加テンションに耐える機
械的強度をリードフレームに与えることができる。この
ため、焼鈍工程の変形、切断及びピッチ寸法等の変化が
なく、高精度の製品が得られる。
As described above, according to the present invention, since the manufacturing method includes an intermediate piece at the tip of the inner lead and integrates the inner lead around the stage portion on which the semiconductor tray is mounted, it can withstand tensile force and additional tension in the annealing process. Mechanical strength can be imparted to the lead frame. Therefore, there is no deformation in the annealing process, no change in cutting or pitch dimensions, etc., and a highly accurate product can be obtained.

また、中間片は、リード先端薄肉部を正確な形状に形成
する際のミスマツチの逃げ及び余肉の逃げに利用でき、
更に一層精度が高くなる。
In addition, the intermediate piece can be used to escape mismatches and excess thickness when forming the thin part of the lead tip into an accurate shape.
The accuracy is even higher.

更に、帯状リードフレームとしてラインをパスさせる連
続処理ができ、短冊状リードフレームのように手作業に
よる熱処理治具への積層を必要とせず、呼吸、汗等によ
る発錆を防ぎ、作業性が良くなる。また、位置精度が高
い状態でインナーリードを樹脂テーブル又は樹脂固定し
てステージ及ヒキャビテーを形成するので、ワイヤボン
ディングが安定する。
Furthermore, it can be processed continuously by passing the line as a strip-shaped lead frame, does not require manual lamination on a heat treatment jig unlike strip-shaped lead frames, prevents rusting due to breathing, sweat, etc., and has good workability. Become. Furthermore, since the stage and hiccup are formed by fixing the inner lead to a resin table or resin with high positional accuracy, wire bonding becomes stable.

そして更に、内部応力が低減されえるので、半導体装置
組立て工程の加熱工程を経てもインナーリード先端の位
置変化がなく、高品質のリードフレームを提供すること
ができる。
Moreover, since the internal stress can be reduced, the position of the inner lead tip does not change even after the heating process in the semiconductor device assembly process, and a high-quality lead frame can be provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の方法によって製造するリードフレーム
の中間工程での状況を示す平面図、第2図(a)は素子
搭載ステージ部の詳細を示す平面図、第2図(b)はそ
の縦断面図、第3図は本発明の方法によって得られたリ
ードフレームの平面図、第4図は他の例を示す中間工程
でのリードフレームの平面図、第5図(a)及び(ロ)
は要部の拡大平面図及び拡大縦断面図である。 l:アウターリード 2:インナーリード3:ステージ
部   4:中間片 5:ワイヤボンディングエリア
FIG. 1 is a plan view showing the intermediate process of a lead frame manufactured by the method of the present invention, FIG. 2(a) is a plan view showing details of the element mounting stage, and FIG. 3 is a plan view of a lead frame obtained by the method of the present invention, FIG. 4 is a plan view of a lead frame in an intermediate process showing another example, and FIGS. )
are an enlarged plan view and an enlarged longitudinal cross-sectional view of main parts. l: Outer lead 2: Inner lead 3: Stage section 4: Intermediate piece 5: Wire bonding area

Claims (1)

【特許請求の範囲】[Claims] 1、帯状をなす金属薄板材の不要部分を順次除去して、
半導体素子搭載ステージと該ステージから放射状に配列
した複数のインナーリード及びアウターリードを形成す
る半導体装置用リードフレームの製造工程の中間で熱処
理を施して所要のリードフレームを形成する製造方法に
おいて、中間片を備えた各インナーリードの先端部が、
この中間片を介して前記ステージ部の周辺に連結して一
体に形成されており、且つ該先端部にワイヤボンディン
グエリアを有する薄肉部を成形加工して帯状リードフレ
ームを構成し、該帯状リードフレームに所定のテンショ
ンを均一に付加し、該帯状リードフレームを連続又は所
要の長さ間欠搬送して予熱、焼鈍及び徐冷を順次行って
内部の残留応力を除去する焼鈍を連続して行った後、め
っき、テーピング等のリードフレーム所要の処理加工を
施して、前記素子搭載ステージ及びキャビテーを所定の
形状に形成することを特徴とする半導体装置用リードフ
レームの製造方法。
1. Sequentially remove unnecessary parts of the strip-shaped metal sheet material,
In a manufacturing method in which a lead frame for a semiconductor device is formed with a stage on which a semiconductor element is mounted and a plurality of inner leads and outer leads arranged radially from the stage, heat treatment is performed to form a required lead frame in the middle of the manufacturing process. The tip of each inner lead with
A thin-walled part that is integrally connected to the periphery of the stage part via this intermediate piece and has a wire bonding area at the tip thereof is molded to form a band-shaped lead frame, and the band-shaped lead frame After uniformly applying a predetermined tension to the lead frame, the strip lead frame is continuously or intermittently conveyed for the required length, and preheating, annealing, and slow cooling are performed sequentially to remove internal residual stress. 1. A method for manufacturing a lead frame for a semiconductor device, characterized in that the element mounting stage and cavity are formed into a predetermined shape by subjecting the lead frame to necessary processing such as plating, taping, etc.
JP1203587A 1989-08-04 1989-08-04 Method for manufacturing lead frame for semiconductor device Expired - Fee Related JP2520482B2 (en)

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JP4889169B2 (en) * 2001-08-30 2012-03-07 ローム株式会社 Semiconductor device and manufacturing method thereof
JP5410465B2 (en) * 2011-02-24 2014-02-05 ローム株式会社 Semiconductor device and manufacturing method of semiconductor device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5972754A (en) * 1982-10-19 1984-04-24 Shinko Electric Ind Co Ltd Manufacture of lead frame
JPS61125161A (en) * 1984-11-22 1986-06-12 Mitsui Haitetsuku:Kk Manufacture of lead frame
JPS61216353A (en) * 1985-03-20 1986-09-26 Shinko Electric Ind Co Ltd Manufacture of lead frame
JPS6224656A (en) * 1985-07-24 1987-02-02 Shinko Electric Ind Co Ltd Manufacture of lead frame

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5972754A (en) * 1982-10-19 1984-04-24 Shinko Electric Ind Co Ltd Manufacture of lead frame
JPS61125161A (en) * 1984-11-22 1986-06-12 Mitsui Haitetsuku:Kk Manufacture of lead frame
JPS61216353A (en) * 1985-03-20 1986-09-26 Shinko Electric Ind Co Ltd Manufacture of lead frame
JPS6224656A (en) * 1985-07-24 1987-02-02 Shinko Electric Ind Co Ltd Manufacture of lead frame

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