JPH0363808B2 - - Google Patents
Info
- Publication number
- JPH0363808B2 JPH0363808B2 JP59020995A JP2099584A JPH0363808B2 JP H0363808 B2 JPH0363808 B2 JP H0363808B2 JP 59020995 A JP59020995 A JP 59020995A JP 2099584 A JP2099584 A JP 2099584A JP H0363808 B2 JPH0363808 B2 JP H0363808B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- light
- etching
- etched
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59020995A JPS60165725A (ja) | 1984-02-08 | 1984-02-08 | ドライエツチング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59020995A JPS60165725A (ja) | 1984-02-08 | 1984-02-08 | ドライエツチング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60165725A JPS60165725A (ja) | 1985-08-28 |
| JPH0363808B2 true JPH0363808B2 (https=) | 1991-10-02 |
Family
ID=12042699
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59020995A Granted JPS60165725A (ja) | 1984-02-08 | 1984-02-08 | ドライエツチング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60165725A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6489519A (en) * | 1987-09-30 | 1989-04-04 | Toshiba Corp | Dry etching |
| JP3128231B2 (ja) * | 1990-07-24 | 2001-01-29 | ソニー株式会社 | 銅系材料のパターニング方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6059302B2 (ja) * | 1981-05-26 | 1985-12-24 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 多量の酸素を用いた反応性イオン食刻法 |
| JPS58100683A (ja) * | 1981-12-12 | 1983-06-15 | Nippon Telegr & Teleph Corp <Ntt> | プラズマエツチング方法 |
-
1984
- 1984-02-08 JP JP59020995A patent/JPS60165725A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60165725A (ja) | 1985-08-28 |
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