JPH0362513B2 - - Google Patents

Info

Publication number
JPH0362513B2
JPH0362513B2 JP57125628A JP12562882A JPH0362513B2 JP H0362513 B2 JPH0362513 B2 JP H0362513B2 JP 57125628 A JP57125628 A JP 57125628A JP 12562882 A JP12562882 A JP 12562882A JP H0362513 B2 JPH0362513 B2 JP H0362513B2
Authority
JP
Japan
Prior art keywords
laser
processing
detection means
amount
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57125628A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5916691A (ja
Inventor
Takeoki Myauchi
Mikio Ppongo
Hiroshi Yamaguchi
Katsuro Mizukoshi
Takao Kawanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57125628A priority Critical patent/JPS5916691A/ja
Publication of JPS5916691A publication Critical patent/JPS5916691A/ja
Publication of JPH0362513B2 publication Critical patent/JPH0362513B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
JP57125628A 1982-07-21 1982-07-21 レ−ザ加工装置 Granted JPS5916691A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57125628A JPS5916691A (ja) 1982-07-21 1982-07-21 レ−ザ加工装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57125628A JPS5916691A (ja) 1982-07-21 1982-07-21 レ−ザ加工装置

Publications (2)

Publication Number Publication Date
JPS5916691A JPS5916691A (ja) 1984-01-27
JPH0362513B2 true JPH0362513B2 (enrdf_load_stackoverflow) 1991-09-26

Family

ID=14914755

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57125628A Granted JPS5916691A (ja) 1982-07-21 1982-07-21 レ−ザ加工装置

Country Status (1)

Country Link
JP (1) JPS5916691A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6257787A (ja) * 1985-07-05 1987-03-13 フラウンホッファー―ゲゼルシャフト ツァフェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ. レ−ザ−加工装置
JP2804027B2 (ja) * 1987-07-13 1998-09-24 ファナック 株式会社 レーザ出力補正方式
JPH0616952B2 (ja) * 1988-08-05 1994-03-09 日本電気株式会社 レーザ光エネルギー管理方法
JP2599439B2 (ja) * 1988-08-25 1997-04-09 松下電器産業株式会社 レーザトリミング装置およびトリミング方法
JPH05261577A (ja) * 1992-03-18 1993-10-12 Sumitomo Heavy Ind Ltd レーザ加工装置
US5427733A (en) * 1993-10-20 1995-06-27 United Technologies Corporation Method for performing temperature-controlled laser sintering
US5529951A (en) * 1993-11-02 1996-06-25 Sony Corporation Method of forming polycrystalline silicon layer on substrate by large area excimer laser irradiation
JP6998149B2 (ja) * 2017-08-08 2022-01-18 株式会社ディスコ レーザー加工方法

Also Published As

Publication number Publication date
JPS5916691A (ja) 1984-01-27

Similar Documents

Publication Publication Date Title
CA1139441A (en) Optical imaging system provided with an opto-electronic detection system for determining a deviation between the image plane of the imaging system and a second plane on which an image is to be formed
US4984894A (en) Method of and apparatus for measuring film thickness
US5074669A (en) Method and apparatus for evaluating ion implant dosage levels in semiconductors
US4826321A (en) Thin dielectric film measuring system
JPH0362513B2 (enrdf_load_stackoverflow)
JPH0122977B2 (enrdf_load_stackoverflow)
JPH0423202B2 (enrdf_load_stackoverflow)
JPH0324409A (ja) 表面の位置決定方法及び装置
EP0115184A1 (en) An automatic focus control device
JP2001165628A (ja) 膜厚測定装置
JPH115185A (ja) レーザ加工装置
JPH10253892A (ja) 位相干渉顕微鏡
JPS62203335A (ja) エツチングモニタ−装置
JPS5948928A (ja) 弱吸収性の薄膜の厚みの調節デバイス
JPH058062A (ja) レーザ加工装置
JPS5940526A (ja) レ−ザ処理方法およびその装置
JP2946381B2 (ja) 表面粗さ測定方法及び装置
JP2971003B2 (ja) レーザリペア装置のレンズの汚れを検出する装置
KR102573086B1 (ko) 레이저빔 평가장치
JPS61223604A (ja) ギヤツプ測定装置
JPS6245036B2 (enrdf_load_stackoverflow)
JP2970020B2 (ja) コーティング薄膜の形成方法
JPS5752807A (en) Device for measuring film thickness
JPH06331320A (ja) 膜厚測定装置
JPH0231635B2 (enrdf_load_stackoverflow)