JPH0360649B2 - - Google Patents

Info

Publication number
JPH0360649B2
JPH0360649B2 JP5310882A JP5310882A JPH0360649B2 JP H0360649 B2 JPH0360649 B2 JP H0360649B2 JP 5310882 A JP5310882 A JP 5310882A JP 5310882 A JP5310882 A JP 5310882A JP H0360649 B2 JPH0360649 B2 JP H0360649B2
Authority
JP
Japan
Prior art keywords
mold
plastic
molding device
heating furnace
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5310882A
Other languages
Japanese (ja)
Other versions
JPS58168511A (en
Inventor
Yoji Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5310882A priority Critical patent/JPS58168511A/en
Publication of JPS58168511A publication Critical patent/JPS58168511A/en
Publication of JPH0360649B2 publication Critical patent/JPH0360649B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 (1) 発明の技術分野 本発明はプラスチツクモールド形成方法、詳し
くはモールド金型に近接して加熱炉を配置し、プ
ラスチツク材を金型内で短時間の加熱の後前記加
熱炉内で引続き加熱硬化するモールド形成方法に
関する。
[Detailed Description of the Invention] (1) Technical Field of the Invention The present invention relates to a method for forming a plastic mold, and more specifically, a method for forming a plastic mold, in which a heating furnace is disposed close to the mold, and the plastic material is heated in the mold for a short period of time. The present invention relates to a mold forming method in which the mold is subsequently hardened by heating in the heating furnace.

(2) 技術の背景 第1図の平面図に示す如きリードフレームを用
いる半導体集積回路ICが多用されている。なお
これらの図において、1はプラスチツクモール
ド、2は半導体チツプ(この半導体チツプはモー
ルド1に覆われて外からは見えない)、3はリー
ド、4は送り用のクレードルを示す。なお半導体
チツプ2の所定の部分は図示しないボンデイング
ワイヤによりリード3のそれぞれに接続されてい
る。
(2) Background of the Technology Semiconductor integrated circuit ICs using a lead frame as shown in the plan view of FIG. 1 are widely used. In these figures, 1 is a plastic mold, 2 is a semiconductor chip (this semiconductor chip is covered by the mold 1 and cannot be seen from the outside), 3 is a lead, and 4 is a feeding cradle. Note that predetermined portions of the semiconductor chip 2 are connected to respective leads 3 by bonding wires (not shown).

かかる半導体ICを製造する工程においてモー
ルド1の形成のためにモールド装置を用いる。第
2図には摸式的にかかるモールド装置金型の下型
11が平面図で示され、同図において、12はプ
ラスチツクが注入されるカル、13は溶融プラス
チツクが流れる流路に当るランナを示し、半導体
ICはランナ13の両側に対になつて配置される。
実際の使用においてはより多くのランナが形成さ
れ、より多くの半導体ICに樹脂封止がされるの
であるが、図においてこれらは簡略化して示し
た。
A molding device is used to form the mold 1 in the process of manufacturing such a semiconductor IC. FIG. 2 schematically shows the lower mold 11 of the molding device in a plan view. In the same figure, 12 is a cull into which plastic is injected, and 13 is a runner which is a channel through which molten plastic flows. indicates, semiconductor
The ICs are arranged in pairs on both sides of the runner 13.
In actual use, more runners are formed and more semiconductor ICs are sealed with resin, but these are shown in a simplified manner in the figure.

操作においては、モールド装置を摸式的に断面
図で示す第3図を参照すると、半導体ICを第2
図図示の如く配置し、金型加圧用プレス14で加
圧した後プラスチツクを注入シリンダ15から注
入し、プラスチツクが半ば硬化した後製品を取り
出し、恒温槽にて完全にキユアする。なお第3図
において11Aは上型を示す。
In operation, referring to FIG. 3, which schematically shows a cross-sectional view of the molding device, the semiconductor IC is placed in the second
The molds are arranged as shown in the figure, and after being pressurized by the mold press 14, the plastic is injected from the injection cylinder 15, and after the plastic is semi-hardened, the product is taken out and completely cured in a constant temperature bath. In addition, in FIG. 3, 11A indicates the upper mold.

(3) 従来技術と問題点 前記したプラスチツクは注入時の温度が70〜80
℃であり、これが160〜180℃に加熱された金型内
に1〜2分間程度おかれると半ば硬化する。とい
うことは、モールド金型と加圧用プレスを含むモ
ールド装置は、プラスチツク注入後は単にプラス
チツクを硬化させる加熱のためにのみ用いられ、
そのとき1〜2分の時間が浪費される。これは、
モールド装置が非常に高価であることを計算にい
れると、設備のための投資が十分に活用されてい
ないことを意味する。また作業効率の見地からも
1〜2分の加熱時間はなんら活用されていないこ
とになる。
(3) Conventional technology and problems The above-mentioned plastic has a temperature of 70 to 80°C during injection.
℃, and when placed in a mold heated to 160 to 180 degrees Celsius for about 1 to 2 minutes, it becomes semi-cured. This means that after the plastic is injected, the molding equipment, including the mold die and pressure press, is used only to heat the plastic to harden it.
Then 1-2 minutes of time is wasted. this is,
Taking into account that molding equipment is very expensive, this means that the investment in equipment is underutilized. Also, from the standpoint of work efficiency, the heating time of 1 to 2 minutes is not utilized at all.

(4) 発明の目的 本発明は上記従来の問題点に鑑み、高価な設備
の稼働率を高めると同時に、プラスチツクの完全
硬化を、一定室温におく工程を経ることなく実施
し得るモールド形成方法を提供するにある。
(4) Purpose of the Invention In view of the above-mentioned conventional problems, the present invention provides a mold forming method that can increase the operating rate of expensive equipment and at the same time completely cure the plastic without going through the process of keeping it at a constant room temperature. It is on offer.

(5) 発明の構成 そしてこの目的は本発明によれば、モールド金
型とプレスを含むモールド装置は本来のプラスチ
ツク注入作業にのみ使用し、プラスチツクが金型
内で取り扱い可能な程度に、すなわちモールドが
変形しない程度に硬化した後、プラスチツクの温
度を下げることなく金型に近接して設けられた加
熱炉に投入してプラスチツク硬化を実施するモー
ルド形成方法によつて達成される。
(5) Structure of the Invention According to the present invention, a molding device including a mold die and a press is used only for the original plastic injection work, and the plastic is only used to the extent that the plastic can be handled within the mold, that is, the mold This is achieved by a mold forming method in which the plastic is hardened to such an extent that it does not deform, and then the plastic is placed in a heating furnace provided close to the mold without lowering its temperature to harden the plastic.

(6) 発明の実施例 以下本発明実施例を図面によつて詳述する。(6) Examples of the invention Embodiments of the present invention will be described in detail below with reference to the drawings.

第4図には本発明の方法を実施するために用い
るモールド装置が摸式的に断面図で示され、同図
において既に図示したものと同じ部分は同じ符号
を付して示す。
FIG. 4 schematically shows a molding apparatus used for carrying out the method of the present invention in cross-section, and the same parts as those already shown in the figure are designated by the same reference numerals.

プラスチツク注入シリンダ13から従来技術の
場合と同様にプラスチツクを注入する。このとき
のプラスチツク材の温度は前記した如く70〜80℃
である。他方、金型すなわち下型11と上型11
Aとは160〜180℃に加熱されている。このような
条件において、プラスチツクは例えば10〜20秒で
取り扱い可能な程度に、すなわちモールドが変形
しない程度に硬化する。
Plastic is injected from the plastic injection cylinder 13 as in the prior art. The temperature of the plastic material at this time is 70 to 80℃ as mentioned above.
It is. On the other hand, the molds, namely the lower mold 11 and the upper mold 11
A is heated to 160-180℃. Under these conditions, the plastic hardens in, for example, 10 to 20 seconds to the extent that it can be handled, ie, to the extent that the mold does not deform.

従来技術においては、前記したプラスチツクの
硬化に例えば60〜90秒要し、その間中モールド金
型とプレスを含むモールド装置はただプラスチツ
クの硬化のための用しかなさなかつたものであ
る。本願の発明者は、第5図の線図に示される溶
融プラスチツクの硬度の経時変化の特徴に着目し
た。すなわち、図のグラフのボートの底またはU
字の底の如き領域Aにおいて、プラスチツク硬度
は時間が経過してもほとんど変化しない。そして
従来技術においては、プラスチツク硬度がこの状
態にあるとき60〜90秒もの間金型内に放置された
のである。モールド装置は現在千万円台の高価な
ものであつて、そのような高価な装置が場合によ
つては2分も遊んだままで放置されることは無駄
が多い。
In the prior art, it takes, for example, 60 to 90 seconds to cure the plastic, during which time the molding device including the mold die and the press is used only for the purpose of curing the plastic. The inventor of the present application focused on the characteristics of the change in hardness of molten plastic over time, which is shown in the diagram of FIG. i.e. the bottom of the boat or U in the graph of fig.
In region A, such as the bottom of the letter, the plastic hardness changes little over time. In the prior art, the plastic was left in the mold for 60 to 90 seconds at this hardness. Mold equipment is currently expensive, costing around 10,000,000 yen, and it is wasteful to leave such expensive equipment unused for up to two minutes in some cases.

本願の発明者は更に、プラスチツクが160〜180
℃に加熱された金型内に10〜20秒置かれると、取
り扱い可能な程度に硬化することに着目した。そ
して本発明の方法においては、プラスチツク注入
後、10〜20秒経過しプラスチツクモールドが変形
しない程度の硬さになつたところで、プラスチツ
クモールドを金型から取り出し、室温にて放置す
ることなくモールド装置の直ぐ近くに配置された
加熱炉16に移す。この加熱炉16はプラスチツ
クを注入したときの金型温度(160〜180℃)と同
程度に加熱しておき、この加熱炉内で従来金型内
で進行したと同様のプラスチツクの硬化を進める
のである。
The inventor of the present application further states that the plastic is 160 to 180
They noticed that when placed in a mold heated to ℃ for 10 to 20 seconds, it hardened to the extent that it could be handled. In the method of the present invention, after 10 to 20 seconds have elapsed after plastic injection and the plastic mold has become hard enough not to be deformed, the plastic mold is removed from the mold, and the molding device is turned on without leaving it at room temperature. It is transferred to a heating furnace 16 located nearby. This heating furnace 16 is heated to the same temperature as the mold temperature (160 to 180°C) when the plastic is injected, and the plastic is hardened in the same way as conventionally in the mold. be.

かかる加熱炉16は第4図には摸式的に示され
るが、その内部は160〜180℃に加熱されれば足り
るから公知の技術で容易に作成し得る。また半導
体ICの移動は、例えば図示しないチヤツク手段
でそれをコンベヤ17上にのせ、このコンベヤに
よつて加熱炉16内に移す。加熱炉16内に例え
ば90秒おいてプラスチツクが十分に硬化した後半
導体ICは従来と同様恒温槽に移す。かくして、
本発明の方法における経時関係は次式で要約され
得るが、この式において左辺は本発明の方法によ
る場合、右辺は従来技術による場合である。(金
型内時間)+(加熱炉内時間)=(従来の金型内時
間) (7) 発明の効果 以上、詳細に説明したように、本発明の方法に
よる半導体ICのモールド形成においては、モー
ルドがモールド装置の金型内に留まる時間が大幅
に短縮されるので、高価な装置の稼動率を高めつ
つプラスチツクの完全硬化が実現され、半導体
IC製造の歩留りの向上に硬化大である。
Such a heating furnace 16 is schematically shown in FIG. 4, but since it is sufficient to heat the inside of the furnace to 160 to 180 DEG C., it can be easily manufactured using known techniques. Further, the semiconductor IC is moved by placing it on a conveyor 17 using, for example, a chuck means (not shown), and transferring it into the heating furnace 16 by this conveyor. After the plastic is left in the heating furnace 16 for, for example, 90 seconds to sufficiently harden, the semiconductor IC is transferred to a constant temperature bath as in the conventional case. Thus,
The temporal relationship in the method of the present invention can be summarized by the following equation, where the left side is for the method of the present invention and the right side is for the prior art. (Time in the mold) + (Time in the heating furnace) = (Time in the conventional mold) (7) Effects of the Invention As explained above in detail, in molding a semiconductor IC by the method of the present invention, The time the mold remains in the mold of the molding equipment is greatly reduced, increasing the availability of expensive equipment while achieving complete curing of the plastic and improving semiconductor production.
Hardening is very important in improving the yield of IC manufacturing.

なお上記の説明においては半導体ICを例にと
つたが、本発明の適用範囲はその場合に限られる
ものでなく、プラスチツクモールド形成のその他
のあらゆる場合にも適用可能である。
In the above description, a semiconductor IC was taken as an example, but the scope of application of the present invention is not limited to that case, but is also applicable to all other cases of plastic mold formation.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は半導体ICの平面図、第2図はモール
ド装置金型の下型の摸式的平面図、第3図は従来
のモールド装置の摸式図断面図、第4図は本発明
の方法を実施するために用いるモールド装置と加
熱炉の結合システムの摸式的断面図、第5図は溶
融プラスチツクの硬度と時間との関係を示す線図
である。 1……プラスチツクモールド、11……下型、
11A……上型、12……カル、13……ラン
ナ、14……金型加圧用プレス、15……プラス
チツク注入シリンダ、16……加熱炉、17……
コンベヤ。
Fig. 1 is a plan view of a semiconductor IC, Fig. 2 is a schematic plan view of the lower mold of a molding device, Fig. 3 is a schematic cross-sectional view of a conventional molding device, and Fig. 4 is a schematic cross-sectional view of a conventional molding device. FIG. 5 is a diagram showing the relationship between the hardness of the molten plastic and the time. 1...Plastic mold, 11...Lower mold,
11A...Upper mold, 12...Cull, 13...Runner, 14...Mold pressure press, 15...Plastic injection cylinder, 16...Heating furnace, 17...
conveyor.

Claims (1)

【特許請求の範囲】[Claims] 1 モールド金型と金型加圧用プレスとから成る
モールド装置を用いてプラスチツクモールドを形
成する方法において、前記モールド装置に近接し
て加熱炉を設け、該モールド装置に注入したプラ
スチツク材が変形しない程度に硬化するまで前記
金型内に留め、しかる後当該プラスチツク材を前
記金型とほぼ同じ温度に加熱した加熱炉に移して
硬化せしめることを特徴とするプラスチツクモー
ルド形成方法。
1. In a method of forming a plastic mold using a molding device consisting of a mold die and a press for pressurizing the mold, a heating furnace is provided in close proximity to the molding device to the extent that the plastic material injected into the molding device is not deformed. 1. A method of forming a plastic mold, which comprises keeping the plastic material in the mold until the plastic material is hardened, and then transferring the plastic material to a heating furnace heated to approximately the same temperature as the mold and hardening it.
JP5310882A 1982-03-31 1982-03-31 Molding method of plastic mold Granted JPS58168511A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5310882A JPS58168511A (en) 1982-03-31 1982-03-31 Molding method of plastic mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5310882A JPS58168511A (en) 1982-03-31 1982-03-31 Molding method of plastic mold

Publications (2)

Publication Number Publication Date
JPS58168511A JPS58168511A (en) 1983-10-04
JPH0360649B2 true JPH0360649B2 (en) 1991-09-17

Family

ID=12933592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5310882A Granted JPS58168511A (en) 1982-03-31 1982-03-31 Molding method of plastic mold

Country Status (1)

Country Link
JP (1) JPS58168511A (en)

Also Published As

Publication number Publication date
JPS58168511A (en) 1983-10-04

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