JPH0359139B2 - - Google Patents

Info

Publication number
JPH0359139B2
JPH0359139B2 JP60128871A JP12887185A JPH0359139B2 JP H0359139 B2 JPH0359139 B2 JP H0359139B2 JP 60128871 A JP60128871 A JP 60128871A JP 12887185 A JP12887185 A JP 12887185A JP H0359139 B2 JPH0359139 B2 JP H0359139B2
Authority
JP
Japan
Prior art keywords
substrate
magnetic field
film
magnetic
magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60128871A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61288067A (ja
Inventor
Yoichi Ooshita
Tadashi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12887185A priority Critical patent/JPS61288067A/ja
Publication of JPS61288067A publication Critical patent/JPS61288067A/ja
Publication of JPH0359139B2 publication Critical patent/JPH0359139B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
JP12887185A 1985-06-13 1985-06-13 スパツタ装置 Granted JPS61288067A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12887185A JPS61288067A (ja) 1985-06-13 1985-06-13 スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12887185A JPS61288067A (ja) 1985-06-13 1985-06-13 スパツタ装置

Publications (2)

Publication Number Publication Date
JPS61288067A JPS61288067A (ja) 1986-12-18
JPH0359139B2 true JPH0359139B2 (de) 1991-09-09

Family

ID=14995422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12887185A Granted JPS61288067A (ja) 1985-06-13 1985-06-13 スパツタ装置

Country Status (1)

Country Link
JP (1) JPS61288067A (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3852430T2 (de) * 1987-06-16 1995-05-04 Hitachi Ltd Magnetron-Zerstäubungsgerät und Verfahren zur Anwendung desselben zur Schichtenherstellung.
US5026470A (en) * 1989-12-19 1991-06-25 International Business Machines Sputtering apparatus
US6491802B2 (en) 1992-10-28 2002-12-10 Hitachi, Ltd. Magnetic film forming system
US6290824B1 (en) * 1992-10-28 2001-09-18 Hitachi, Ltd. Magnetic film forming system
KR100550094B1 (ko) * 2003-05-28 2006-02-08 주식회사 솔고 바이오메디칼 3차원 구조물에 백금을 코팅하기 위해 사용되는 홀더
KR20180128889A (ko) * 2016-03-29 2018-12-04 가부시키가이샤 알박 성막 장치 및 성막 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5591975A (en) * 1978-12-28 1980-07-11 Seiko Epson Corp Thin film forming method
JPS5540597B2 (de) * 1975-02-10 1980-10-18

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5737473Y2 (de) * 1978-09-11 1982-08-18

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5540597B2 (de) * 1975-02-10 1980-10-18
JPS5591975A (en) * 1978-12-28 1980-07-11 Seiko Epson Corp Thin film forming method

Also Published As

Publication number Publication date
JPS61288067A (ja) 1986-12-18

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees