JPH0358529B2 - - Google Patents

Info

Publication number
JPH0358529B2
JPH0358529B2 JP59075843A JP7584384A JPH0358529B2 JP H0358529 B2 JPH0358529 B2 JP H0358529B2 JP 59075843 A JP59075843 A JP 59075843A JP 7584384 A JP7584384 A JP 7584384A JP H0358529 B2 JPH0358529 B2 JP H0358529B2
Authority
JP
Japan
Prior art keywords
light
mirror
light receiving
wafer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59075843A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60220348A (ja
Inventor
Yoichi Kuroki
Ryozo Hiraga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59075843A priority Critical patent/JPS60220348A/ja
Publication of JPS60220348A publication Critical patent/JPS60220348A/ja
Publication of JPH0358529B2 publication Critical patent/JPH0358529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59075843A 1984-04-17 1984-04-17 位置合せ装置 Granted JPS60220348A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59075843A JPS60220348A (ja) 1984-04-17 1984-04-17 位置合せ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59075843A JPS60220348A (ja) 1984-04-17 1984-04-17 位置合せ装置

Publications (2)

Publication Number Publication Date
JPS60220348A JPS60220348A (ja) 1985-11-05
JPH0358529B2 true JPH0358529B2 (fr) 1991-09-05

Family

ID=13587887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59075843A Granted JPS60220348A (ja) 1984-04-17 1984-04-17 位置合せ装置

Country Status (1)

Country Link
JP (1) JPS60220348A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS636840A (ja) * 1986-06-26 1988-01-12 Nikon Corp アライメント装置
US5477057A (en) * 1994-08-17 1995-12-19 Svg Lithography Systems, Inc. Off axis alignment system for scanning photolithography

Also Published As

Publication number Publication date
JPS60220348A (ja) 1985-11-05

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