JPH0449887B2 - - Google Patents

Info

Publication number
JPH0449887B2
JPH0449887B2 JP60065466A JP6546685A JPH0449887B2 JP H0449887 B2 JPH0449887 B2 JP H0449887B2 JP 60065466 A JP60065466 A JP 60065466A JP 6546685 A JP6546685 A JP 6546685A JP H0449887 B2 JPH0449887 B2 JP H0449887B2
Authority
JP
Japan
Prior art keywords
light
ring
mask
wafer
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60065466A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61223604A (ja
Inventor
Akio Atsuta
Yoshibumi Nishimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60065466A priority Critical patent/JPS61223604A/ja
Priority to FR8515821A priority patent/FR2572515B1/fr
Priority to DE3538062A priority patent/DE3538062C2/de
Priority to GB08526374A priority patent/GB2167262B/en
Publication of JPS61223604A publication Critical patent/JPS61223604A/ja
Priority to US07/218,447 priority patent/US4830498A/en
Publication of JPH0449887B2 publication Critical patent/JPH0449887B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C3/00—Measuring distances in line of sight; Optical rangefinders
    • G01C3/32—Measuring distances in line of sight; Optical rangefinders by focusing the object, e.g. on a ground glass screen
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
    • G01S17/06—Systems determining position data of a target
    • G01S17/08—Systems determining position data of a target for measuring distance only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/30—Systems for automatic generation of focusing signals using parallactic triangle with a base line
    • G02B7/32—Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Optics & Photonics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Optical Distance (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60065466A 1984-10-25 1985-03-29 ギヤツプ測定装置 Granted JPS61223604A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP60065466A JPS61223604A (ja) 1985-03-29 1985-03-29 ギヤツプ測定装置
FR8515821A FR2572515B1 (fr) 1984-10-25 1985-10-24 Dispositif de detection de position
DE3538062A DE3538062C2 (de) 1984-10-25 1985-10-25 Positionserfassungsgerät
GB08526374A GB2167262B (en) 1984-10-25 1985-10-25 A position detecting device
US07/218,447 US4830498A (en) 1984-10-25 1988-07-12 Position detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60065466A JPS61223604A (ja) 1985-03-29 1985-03-29 ギヤツプ測定装置

Publications (2)

Publication Number Publication Date
JPS61223604A JPS61223604A (ja) 1986-10-04
JPH0449887B2 true JPH0449887B2 (fr) 1992-08-12

Family

ID=13287922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60065466A Granted JPS61223604A (ja) 1984-10-25 1985-03-29 ギヤツプ測定装置

Country Status (1)

Country Link
JP (1) JPS61223604A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06120107A (ja) * 1992-09-30 1994-04-28 Ushio Inc 共焦点検出器による距離測定方法及びプロキシミティ露光装置におけるマスクとワークの距離測定方法。
CN102175153B (zh) * 2011-03-08 2013-09-11 东莞宏威数码机械有限公司 激光光束聚焦焦斑检测系统
WO2016121081A1 (fr) * 2015-01-30 2016-08-04 株式会社 日立ハイテクノロジーズ Dispositif d'inspection de semi-conducteurs
WO2021004724A1 (fr) * 2019-07-11 2021-01-14 Asml Netherlands B.V. Appareil et procédé de mesure de hauteur de substrat

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948262U (ja) * 1982-09-24 1984-03-30 大野　剛一 家具転倒防止金具
JPS59131369U (ja) * 1983-02-23 1984-09-03 マツダ株式会社 ラツクピニオン型ステアリング装置

Also Published As

Publication number Publication date
JPS61223604A (ja) 1986-10-04

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