JPH0356045Y2 - - Google Patents
Info
- Publication number
- JPH0356045Y2 JPH0356045Y2 JP15137483U JP15137483U JPH0356045Y2 JP H0356045 Y2 JPH0356045 Y2 JP H0356045Y2 JP 15137483 U JP15137483 U JP 15137483U JP 15137483 U JP15137483 U JP 15137483U JP H0356045 Y2 JPH0356045 Y2 JP H0356045Y2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- mirror
- light emitting
- ultraviolet
- lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001816 cooling Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 235000012431 wafers Nutrition 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15137483U JPS6061721U (ja) | 1983-10-01 | 1983-10-01 | 紫外線照射装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15137483U JPS6061721U (ja) | 1983-10-01 | 1983-10-01 | 紫外線照射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6061721U JPS6061721U (ja) | 1985-04-30 |
JPH0356045Y2 true JPH0356045Y2 (enrdf_load_stackoverflow) | 1991-12-16 |
Family
ID=30335462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15137483U Granted JPS6061721U (ja) | 1983-10-01 | 1983-10-01 | 紫外線照射装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6061721U (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2564538B2 (ja) * | 1987-03-27 | 1996-12-18 | 株式会社 半導体エネルギ−研究所 | 半導体処理装置 |
-
1983
- 1983-10-01 JP JP15137483U patent/JPS6061721U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6061721U (ja) | 1985-04-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3266156B2 (ja) | 照明用光源装置および露光装置 | |
US4535228A (en) | Heater assembly and a heat-treatment method of semiconductor wafer using the same | |
JP5401551B2 (ja) | 冷却ガス用の孔を有する紫外線リフレクタおよび方法 | |
JPS5939031A (ja) | フオスフオシリケ−トガラスをリフロ−するための方法 | |
JPH0356045Y2 (enrdf_load_stackoverflow) | ||
JP4256038B2 (ja) | 熱処理方法 | |
JPS6114724A (ja) | 半導体ウエハ−への紫外線照射方法 | |
JP3653980B2 (ja) | 紫外線照射装置 | |
JPS6129124A (ja) | 半導体ウエハ−の処理方法 | |
JP2000068222A (ja) | 基板熱処理装置 | |
JPS59178718A (ja) | 半導体基体の処理装置 | |
JP2012151389A (ja) | 基板処理装置及び半導体装置の製造方法 | |
US4841342A (en) | Apparatus for treating photoresists | |
JPH07283096A (ja) | 半導体基板の処理方法及び装置 | |
US4888271A (en) | Method of treating photoresists | |
TW546679B (en) | Heating method | |
JPH0130138B2 (enrdf_load_stackoverflow) | ||
JPH09270390A (ja) | 基板の光照射式熱処理装置 | |
JPS6076116A (ja) | 半導体ウエハ−用紫外線照射装置 | |
JP2003264157A (ja) | ウェハー加熱装置 | |
JP2001044130A (ja) | 加熱方法 | |
KR102298085B1 (ko) | 반도체 기판 및 기판 열처리 방법 | |
JP2519187Y2 (ja) | 光照射型熱処理装置 | |
JPH03207861A (ja) | 加熱装置 | |
JPS6373627A (ja) | ドライプロセス装置 |