JPH0352172B2 - - Google Patents

Info

Publication number
JPH0352172B2
JPH0352172B2 JP56061383A JP6138381A JPH0352172B2 JP H0352172 B2 JPH0352172 B2 JP H0352172B2 JP 56061383 A JP56061383 A JP 56061383A JP 6138381 A JP6138381 A JP 6138381A JP H0352172 B2 JPH0352172 B2 JP H0352172B2
Authority
JP
Japan
Prior art keywords
etching
electron beam
shadow mask
beam passage
passage hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56061383A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57176648A (en
Inventor
Yasuhisa Ootake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP6138381A priority Critical patent/JPS57176648A/ja
Publication of JPS57176648A publication Critical patent/JPS57176648A/ja
Publication of JPH0352172B2 publication Critical patent/JPH0352172B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/80—Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching
    • H01J29/81—Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching using shadow masks

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)
JP6138381A 1981-04-24 1981-04-24 Shadow mask electrode for color picture tube Granted JPS57176648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6138381A JPS57176648A (en) 1981-04-24 1981-04-24 Shadow mask electrode for color picture tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6138381A JPS57176648A (en) 1981-04-24 1981-04-24 Shadow mask electrode for color picture tube

Publications (2)

Publication Number Publication Date
JPS57176648A JPS57176648A (en) 1982-10-30
JPH0352172B2 true JPH0352172B2 (cg-RX-API-DMAC7.html) 1991-08-09

Family

ID=13169590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6138381A Granted JPS57176648A (en) 1981-04-24 1981-04-24 Shadow mask electrode for color picture tube

Country Status (1)

Country Link
JP (1) JPS57176648A (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6160889A (ja) * 1984-08-30 1986-03-28 Toshiba Corp シヤドウマスクの製造方法
US6268697B1 (en) * 1997-12-16 2001-07-31 Fuji Photo Film Co., Ltd. Flash discharge tube having exterior trigger electrode

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2971117A (en) * 1956-03-01 1961-02-07 Rca Corp Color-kinescopes, etc.
JPS5423554A (en) * 1977-07-22 1979-02-22 Fuji Photo Optical Co Ltd Image stabilizing optical device

Also Published As

Publication number Publication date
JPS57176648A (en) 1982-10-30

Similar Documents

Publication Publication Date Title
US20080003916A1 (en) Field emission device
JP3961037B2 (ja) 解像度の強化されたシャドーマスクを有する表示装置及びその製造方法
US6027388A (en) Lithographic structure and method for making field emitters
JPS6223421B2 (cg-RX-API-DMAC7.html)
US4341591A (en) Method of fabricating a color-selection structure for a CRT
JP4350724B2 (ja) プラズマディスプレイパネル
JPH01194232A (ja) シャドウマスクの製造方法
JP4225800B2 (ja) プラズマディスプレイパネルの電極形成方法
JPH0519250B2 (cg-RX-API-DMAC7.html)
JP2001084908A (ja) プラズマディスプレイパネルの電極
JP3304645B2 (ja) 電界放出型装置の製造方法
KR100337871B1 (ko) 칼라음극선관용섀도우마스크
JP4379997B2 (ja) 露光装置
KR100416084B1 (ko) 플라즈마 디스플레이 패널과 이의 제조방법
JP2001052605A (ja) 高精細シャドウマスク及びその製造方法
KR100415619B1 (ko) 플라즈마 디스플레이 패널의 격벽 제조방법
JP2000260309A (ja) ガス放電パネルの製造方法
JPS6150891B2 (cg-RX-API-DMAC7.html)
KR820002373B1 (ko) 컬러 표시관
JPH02106861A (ja) 蛍光表示管
KR100370252B1 (ko) 전계 방출형 표시 소자의 스페이서 전극 형성 방법
JP2944114B2 (ja) シャドウマスク用素材板
KR100393040B1 (ko) 플라즈마표시소자의제조방법
KR20000076078A (ko) 도전 코팅을 한 블랙 매트릭스
JPH10289656A (ja) プラズマディスプレイパネルの隔壁形成方法及びそれに用いられる隔壁形成用部材の製造方法