JPH0350459Y2 - - Google Patents
Info
- Publication number
- JPH0350459Y2 JPH0350459Y2 JP1981062039U JP6203981U JPH0350459Y2 JP H0350459 Y2 JPH0350459 Y2 JP H0350459Y2 JP 1981062039 U JP1981062039 U JP 1981062039U JP 6203981 U JP6203981 U JP 6203981U JP H0350459 Y2 JPH0350459 Y2 JP H0350459Y2
- Authority
- JP
- Japan
- Prior art keywords
- display
- tidal
- current
- tidal current
- depths
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Indicating Or Recording The Presence, Absence, Or Direction Of Movement (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1981062039U JPH0350459Y2 (enEXAMPLES) | 1981-04-29 | 1981-04-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1981062039U JPH0350459Y2 (enEXAMPLES) | 1981-04-29 | 1981-04-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57175063U JPS57175063U (enEXAMPLES) | 1982-11-05 |
| JPH0350459Y2 true JPH0350459Y2 (enEXAMPLES) | 1991-10-28 |
Family
ID=29858243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1981062039U Expired JPH0350459Y2 (enEXAMPLES) | 1981-04-29 | 1981-04-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0350459Y2 (enEXAMPLES) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US9069133B2 (en) | 1999-06-10 | 2015-06-30 | Honeywell International Inc. | Anti-reflective coating for photolithography and methods of preparation thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5652471Y2 (enEXAMPLES) * | 1975-10-15 | 1981-12-07 |
-
1981
- 1981-04-29 JP JP1981062039U patent/JPH0350459Y2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9069133B2 (en) | 1999-06-10 | 2015-06-30 | Honeywell International Inc. | Anti-reflective coating for photolithography and methods of preparation thereof |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57175063U (enEXAMPLES) | 1982-11-05 |
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