JPH0345954Y2 - - Google Patents
Info
- Publication number
- JPH0345954Y2 JPH0345954Y2 JP1985016709U JP1670985U JPH0345954Y2 JP H0345954 Y2 JPH0345954 Y2 JP H0345954Y2 JP 1985016709 U JP1985016709 U JP 1985016709U JP 1670985 U JP1670985 U JP 1670985U JP H0345954 Y2 JPH0345954 Y2 JP H0345954Y2
- Authority
- JP
- Japan
- Prior art keywords
- bell gear
- metal
- gear
- susceptor
- vapor phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985016709U JPH0345954Y2 (enExample) | 1985-02-08 | 1985-02-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985016709U JPH0345954Y2 (enExample) | 1985-02-08 | 1985-02-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61133572U JPS61133572U (enExample) | 1986-08-20 |
| JPH0345954Y2 true JPH0345954Y2 (enExample) | 1991-09-27 |
Family
ID=30503737
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985016709U Expired JPH0345954Y2 (enExample) | 1985-02-08 | 1985-02-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0345954Y2 (enExample) |
-
1985
- 1985-02-08 JP JP1985016709U patent/JPH0345954Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61133572U (enExample) | 1986-08-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4579080A (en) | Induction heated reactor system for chemical vapor deposition | |
| KR910007109B1 (ko) | 화학증기증착 반응기용 반사장치 | |
| JP3008192B2 (ja) | 化学気相蒸着の加熱装置 | |
| US5119761A (en) | Substrate heating apparatus for forming thin films on substrate surface | |
| JP2001522138A (ja) | 長寿命高温プロセスチャンバ | |
| EP0147967B1 (en) | Induction heated reactor system for chemical vapor deposition | |
| KR100375396B1 (ko) | 준고온벽을갖춘반응챔버 | |
| JP4374786B2 (ja) | Cvd装置および薄膜製造方法 | |
| JP2009071210A (ja) | サセプタおよびエピタキシャル成長装置 | |
| JP3167976B2 (ja) | 堆積装置のサセプタ | |
| JPS63307740A (ja) | 光化学反応処理装置 | |
| JPS5927755B2 (ja) | エピタキシヤル層の成長方法及びそのための化学気相析出反応器 | |
| JPH08203836A (ja) | 気相成長装置 | |
| JPH047189Y2 (enExample) | ||
| JPS5936927A (ja) | 半導体気相成長装置 | |
| JPS627685B2 (enExample) | ||
| JPH01256118A (ja) | 気相反応装置 | |
| CN102224277B (zh) | 外延反应器的反应室 | |
| KR100351043B1 (ko) | 코팅된 반사판을 구비한 히터 조립체 | |
| JPS6113562Y2 (enExample) | ||
| CN223752952U (zh) | 金属化学气相沉积设备及其反应腔室 | |
| JP2002006125A (ja) | 反射板 | |
| JPH02103928A (ja) | 気相成長装置 | |
| JPH0616922Y2 (ja) | Cvd装置 | |
| JPS6358926A (ja) | 気相表面処理反応装置 |