JPH0340497B2 - - Google Patents

Info

Publication number
JPH0340497B2
JPH0340497B2 JP61008228A JP822886A JPH0340497B2 JP H0340497 B2 JPH0340497 B2 JP H0340497B2 JP 61008228 A JP61008228 A JP 61008228A JP 822886 A JP822886 A JP 822886A JP H0340497 B2 JPH0340497 B2 JP H0340497B2
Authority
JP
Japan
Prior art keywords
alignment
beam splitter
lens
optical system
reduction projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61008228A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62165917A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP61008228A priority Critical patent/JPS62165917A/ja
Priority to US07/004,133 priority patent/US4724466A/en
Publication of JPS62165917A publication Critical patent/JPS62165917A/ja
Priority to US07/104,041 priority patent/US4805000A/en
Publication of JPH0340497B2 publication Critical patent/JPH0340497B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61008228A 1986-01-17 1986-01-17 露光装置 Granted JPS62165917A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61008228A JPS62165917A (ja) 1986-01-17 1986-01-17 露光装置
US07/004,133 US4724466A (en) 1986-01-17 1987-01-16 Exposure apparatus
US07/104,041 US4805000A (en) 1986-01-17 1987-10-02 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61008228A JPS62165917A (ja) 1986-01-17 1986-01-17 露光装置

Publications (2)

Publication Number Publication Date
JPS62165917A JPS62165917A (ja) 1987-07-22
JPH0340497B2 true JPH0340497B2 (enExample) 1991-06-19

Family

ID=11687300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61008228A Granted JPS62165917A (ja) 1986-01-17 1986-01-17 露光装置

Country Status (1)

Country Link
JP (1) JPS62165917A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996037326A1 (en) * 1995-05-26 1996-11-28 Tetsuro Tagami Chuck for cutting tool

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996037326A1 (en) * 1995-05-26 1996-11-28 Tetsuro Tagami Chuck for cutting tool

Also Published As

Publication number Publication date
JPS62165917A (ja) 1987-07-22

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