JPH034023Y2 - - Google Patents
Info
- Publication number
- JPH034023Y2 JPH034023Y2 JP19651185U JP19651185U JPH034023Y2 JP H034023 Y2 JPH034023 Y2 JP H034023Y2 JP 19651185 U JP19651185 U JP 19651185U JP 19651185 U JP19651185 U JP 19651185U JP H034023 Y2 JPH034023 Y2 JP H034023Y2
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet
- ozone
- resistant
- seal
- treatment device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 27
- 238000011282 treatment Methods 0.000 claims description 21
- 238000012856 packing Methods 0.000 claims description 20
- 238000007789 sealing Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 7
- 239000004809 Teflon Substances 0.000 claims description 4
- 229920006362 Teflon® Polymers 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 description 5
- 239000000356 contaminant Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229920002449 FKM Polymers 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Apparatus For Disinfection Or Sterilisation (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19651185U JPH034023Y2 (enrdf_load_stackoverflow) | 1985-12-23 | 1985-12-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19651185U JPH034023Y2 (enrdf_load_stackoverflow) | 1985-12-23 | 1985-12-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62108946U JPS62108946U (enrdf_load_stackoverflow) | 1987-07-11 |
| JPH034023Y2 true JPH034023Y2 (enrdf_load_stackoverflow) | 1991-02-01 |
Family
ID=31155400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19651185U Expired JPH034023Y2 (enrdf_load_stackoverflow) | 1985-12-23 | 1985-12-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH034023Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3121302B2 (ja) * | 1997-11-04 | 2000-12-25 | 三共電気株式会社 | 照射型殺菌装置 |
| JP2011210831A (ja) * | 2010-03-29 | 2011-10-20 | Kyocera Kinseki Corp | 封止装置 |
-
1985
- 1985-12-23 JP JP19651185U patent/JPH034023Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62108946U (enrdf_load_stackoverflow) | 1987-07-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3576162B2 (ja) | 物品を容器間で移動させる装置 | |
| JP2960540B2 (ja) | ラッチ機構を備えたシール可能且つ輸送可能な容器 | |
| US6619903B2 (en) | System and method for reticle protection and transport | |
| US4427378A (en) | Closure and seal construction for high-pressure oxidation furnace and the like | |
| US9458538B2 (en) | Method and apparatus for sealing an opening of a processing chamber | |
| KR100299487B1 (ko) | 차폐식기판지지부 | |
| JPH034023Y2 (enrdf_load_stackoverflow) | ||
| US4806456A (en) | Dry development method for a resist film and an apparatus therefor | |
| EP0597103B1 (en) | Apparatus for neutralizing charged body | |
| US6849233B2 (en) | Vacuum sterilized sealing of passthrough light treatment devices | |
| JP3644556B2 (ja) | 成膜装置 | |
| JP2005063986A (ja) | 処理装置およびプラズマ装置 | |
| JPS6041970Y2 (ja) | 紫外線洗浄装置の開閉扉 | |
| JP3163675B2 (ja) | 機械式インターフェース装置 | |
| JP7675831B2 (ja) | デュアル真空シール | |
| JP2001004039A (ja) | バルブ用シール | |
| JPS6032315A (ja) | ウェハ保管箱 | |
| KR20030006899A (ko) | Ｕｖ 세정장치에 있어서의 반송용 롤러 | |
| JPH0479347A (ja) | ウェハキャリア | |
| KR100847890B1 (ko) | 챔버 라이너를 포함하는 밀폐형 반도체 공정 시스템 및그것을 이용한 웨이퍼 가공 방법 | |
| JP2978896B1 (ja) | 半導体製造用真空装置とそのパーティクルの低減方法 | |
| JP3472765B2 (ja) | 半導体製造装置の弁構造 | |
| US7850819B2 (en) | Plasma reactor with high productivity | |
| JP3615380B2 (ja) | 密閉容器 | |
| JPH0615160A (ja) | 真空容器 |