JPH0337849B2 - - Google Patents

Info

Publication number

JPH0337849B2

JPH0337849B2 JP12552485A JP12552485A JPH0337849B2 JP H0337849 B2 JPH0337849 B2 JP H0337849B2 JP 12552485 A JP12552485 A JP 12552485A JP 12552485 A JP12552485 A JP 12552485A JP H0337849 B2 JPH0337849 B2 JP H0337849B2

Authority

JP

Japan

Prior art keywords

film

permalloy

voltage

magnetic

target voltage

Prior art date

1985-06-10

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• 229910000889 permalloy Inorganic materials 0.000 claims description 42
• 238000004544 sputter deposition Methods 0.000 claims description 29
• 239000000758 substrate Substances 0.000 claims description 17
• 239000011261 inert gas Substances 0.000 claims description 11
• 238000004519 manufacturing process Methods 0.000 claims description 10
• 239000010408 film Substances 0.000 description 50
• XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 38
• 239000007789 gas Substances 0.000 description 20
• 229910052786 argon Inorganic materials 0.000 description 19
• 238000000034 method Methods 0.000 description 9
• 238000010586 diagram Methods 0.000 description 5
• 239000010409 thin film Substances 0.000 description 5
• 238000005516 engineering process Methods 0.000 description 3
• 238000007747 plating Methods 0.000 description 3
• 229910045601 alloy Inorganic materials 0.000 description 2
• 239000000956 alloy Substances 0.000 description 2
• 239000004020 conductor Substances 0.000 description 2
• 230000007423 decrease Effects 0.000 description 2
• 230000000694 effects Effects 0.000 description 2
• 229910052742 iron Inorganic materials 0.000 description 2
• 239000000463 material Substances 0.000 description 2
• 229910052759 nickel Inorganic materials 0.000 description 2
• 238000004804 winding Methods 0.000 description 2
• 229910004298 SiO 2 Inorganic materials 0.000 description 1
• 239000000654 additive Substances 0.000 description 1
• 239000000872 buffer Substances 0.000 description 1
• 239000006172 buffering agent Substances 0.000 description 1
• 229910052804 chromium Inorganic materials 0.000 description 1
• 230000007547 defect Effects 0.000 description 1
• 230000010365 information processing Effects 0.000 description 1
• 239000012212 insulator Substances 0.000 description 1
• 229910052750 molybdenum Inorganic materials 0.000 description 1
• 230000005405 multipole Effects 0.000 description 1
• 229910052754 neon Inorganic materials 0.000 description 1
• GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
• 229910052758 niobium Inorganic materials 0.000 description 1
• 239000002245 particle Substances 0.000 description 1
• 238000000206 photolithography Methods 0.000 description 1
• 239000004065 semiconductor Substances 0.000 description 1
• 238000005477 sputtering target Methods 0.000 description 1
• 229910052719 titanium Inorganic materials 0.000 description 1
• 229910052720 vanadium Inorganic materials 0.000 description 1
• 238000007740 vapor deposition Methods 0.000 description 1