JPH0336217B2 - - Google Patents

Info

Publication number
JPH0336217B2
JPH0336217B2 JP56175800A JP17580081A JPH0336217B2 JP H0336217 B2 JPH0336217 B2 JP H0336217B2 JP 56175800 A JP56175800 A JP 56175800A JP 17580081 A JP17580081 A JP 17580081A JP H0336217 B2 JPH0336217 B2 JP H0336217B2
Authority
JP
Japan
Prior art keywords
layer
metal
photosensitive
image
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56175800A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5878149A (ja
Inventor
Nobumasa Sasa
Yuzuru Sato
Tatsuo Oota
Masanari Shindo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP56175800A priority Critical patent/JPS5878149A/ja
Priority to EP82305716A priority patent/EP0082588A3/en
Publication of JPS5878149A publication Critical patent/JPS5878149A/ja
Priority to US06/688,743 priority patent/US4591544A/en
Publication of JPH0336217B2 publication Critical patent/JPH0336217B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56175800A 1981-11-02 1981-11-04 金属画像形成材料 Granted JPS5878149A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56175800A JPS5878149A (ja) 1981-11-04 1981-11-04 金属画像形成材料
EP82305716A EP0082588A3 (en) 1981-11-02 1982-10-27 Photolithographic elements for the production of metal images
US06/688,743 US4591544A (en) 1981-11-02 1985-01-02 Metal image forming materials with light sensitive resin layer and oblique angle deposited metal underlayer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56175800A JPS5878149A (ja) 1981-11-04 1981-11-04 金属画像形成材料

Publications (2)

Publication Number Publication Date
JPS5878149A JPS5878149A (ja) 1983-05-11
JPH0336217B2 true JPH0336217B2 (enrdf_load_stackoverflow) 1991-05-30

Family

ID=16002464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56175800A Granted JPS5878149A (ja) 1981-11-02 1981-11-04 金属画像形成材料

Country Status (1)

Country Link
JP (1) JPS5878149A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821257B2 (ja) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ
JPS5931063B2 (ja) * 1974-11-12 1984-07-31 凸版印刷株式会社 フオトマスク用ブランク板の製造方法

Also Published As

Publication number Publication date
JPS5878149A (ja) 1983-05-11

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