JPH0331721B2 - - Google Patents

Info

Publication number
JPH0331721B2
JPH0331721B2 JP26632884A JP26632884A JPH0331721B2 JP H0331721 B2 JPH0331721 B2 JP H0331721B2 JP 26632884 A JP26632884 A JP 26632884A JP 26632884 A JP26632884 A JP 26632884A JP H0331721 B2 JPH0331721 B2 JP H0331721B2
Authority
JP
Japan
Prior art keywords
chloro
film
methylacridone
weight
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP26632884A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61145203A (ja
Inventor
Yoichi Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP26632884A priority Critical patent/JPS61145203A/ja
Publication of JPS61145203A publication Critical patent/JPS61145203A/ja
Publication of JPH0331721B2 publication Critical patent/JPH0331721B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Other In-Based Heterocyclic Compounds (AREA)
JP26632884A 1984-12-19 1984-12-19 光増感剤 Granted JPS61145203A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26632884A JPS61145203A (ja) 1984-12-19 1984-12-19 光増感剤

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26632884A JPS61145203A (ja) 1984-12-19 1984-12-19 光増感剤

Publications (2)

Publication Number Publication Date
JPS61145203A JPS61145203A (ja) 1986-07-02
JPH0331721B2 true JPH0331721B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-05-08

Family

ID=17429398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26632884A Granted JPS61145203A (ja) 1984-12-19 1984-12-19 光増感剤

Country Status (1)

Country Link
JP (1) JPS61145203A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2835728B2 (ja) * 1988-08-19 1998-12-14 富士写真フイルム株式会社 感光性平版印刷版
JP2835732B2 (ja) * 1988-12-26 1998-12-14 富士写真フイルム株式会社 感光性組成物
JP2724624B2 (ja) * 1989-12-26 1998-03-09 日本化薬株式会社 紫外線硬化性樹脂組成物、インキ組成物及びそれらの硬化物
KR100599810B1 (ko) * 2004-11-30 2006-07-12 삼성에스디아이 주식회사 감광성 수지 조성물, 이의 제조방법 및 이를 포함하는드라이 필름 레지스트
JP4834997B2 (ja) * 2005-01-26 2011-12-14 東レ株式会社 感光性誘電体ペーストおよびそれを用いた電子回路部品の製造方法
JP2006216300A (ja) * 2005-02-02 2006-08-17 Toray Ind Inc 絶縁ペーストおよびそれを用いた電子回路部品の製造方法

Also Published As

Publication number Publication date
JPS61145203A (ja) 1986-07-02

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term