JPH0328515B2 - - Google Patents
Info
- Publication number
- JPH0328515B2 JPH0328515B2 JP61111947A JP11194786A JPH0328515B2 JP H0328515 B2 JPH0328515 B2 JP H0328515B2 JP 61111947 A JP61111947 A JP 61111947A JP 11194786 A JP11194786 A JP 11194786A JP H0328515 B2 JPH0328515 B2 JP H0328515B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- oxide film
- aluminum layer
- purity aluminum
- purity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11194786A JPS62267482A (ja) | 1986-05-15 | 1986-05-15 | 真空用金属部品 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11194786A JPS62267482A (ja) | 1986-05-15 | 1986-05-15 | 真空用金属部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62267482A JPS62267482A (ja) | 1987-11-20 |
JPH0328515B2 true JPH0328515B2 (enrdf_load_html_response) | 1991-04-19 |
Family
ID=14574134
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11194786A Granted JPS62267482A (ja) | 1986-05-15 | 1986-05-15 | 真空用金属部品 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62267482A (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8642187B2 (en) | 2006-12-28 | 2014-02-04 | National University Corporation Tohoku University | Structural member to be used in apparatus for manufacturing semiconductor or flat display, and method for producing the same |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6156277A (ja) * | 1984-08-27 | 1986-03-20 | Hitachi Ltd | 成膜装置 |
-
1986
- 1986-05-15 JP JP11194786A patent/JPS62267482A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62267482A (ja) | 1987-11-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR20020084175A (ko) | 2개의 알루미늄 함유 물체의 상호접합방법과,배킹플레이트물질에 물리적 증착 타겟물질을 접합하는방법 및, 알루미늄을 함유한 물리적 증착타겟과배킹플레이트를 포함하는 구조물 | |
EP0146115B1 (en) | Process for producing aluminum material for use in vacuum | |
JPH0328515B2 (enrdf_load_html_response) | ||
US3354538A (en) | Beryllium foil fabrication | |
JPH09184094A (ja) | 表面処理アルミニウム材及びその製造方法 | |
JPH0461069B2 (enrdf_load_html_response) | ||
JPS6140747B2 (enrdf_load_html_response) | ||
JPS6140748B2 (enrdf_load_html_response) | ||
JP2001192814A (ja) | Mg蒸発材料の加工方法 | |
JPH04322491A (ja) | セラミックス回路基板の製造法 | |
JPS62267462A (ja) | 真空用アルミニウム材の製造方法 | |
JPS60174863A (ja) | 薄膜形成用アルミニウム基材の表面処理方法 | |
US5919379A (en) | Copper-foil having a protective layer and copper-clad laminates using same | |
CN109750264B (zh) | 一种多孔金银自支撑膜及其制备方法 | |
JPH02101157A (ja) | 真空蒸着用銅基材の製造方法 | |
JPH07235750A (ja) | 回路基板の製造方法 | |
JPS59150427A (ja) | 半導体装置およびその製造方法 | |
JP4556312B2 (ja) | セラミック積層電子部品およびその製造方法 | |
JP3297840B2 (ja) | 電解コンデンサ電極用アルミニウム箔 | |
JPH10152763A (ja) | 電解コンデンサ用アルミニウム箔コイルの製造方法 | |
JPS63100711A (ja) | 電解コンデンサ用電極材料の製造方法 | |
JPH0289590A (ja) | ろう材及びろう付方法 | |
JPS60152666A (ja) | 真空用アルミニウム材の製造法 | |
JPS60174865A (ja) | 薄膜形成用アルミニウム基材の表面処理方法 | |
JPH01129960A (ja) | 水素吸蔵合金薄膜の製造方法 |