JPH0327544A - Capillary of wire bonding apparatus - Google Patents

Capillary of wire bonding apparatus

Info

Publication number
JPH0327544A
JPH0327544A JP1162007A JP16200789A JPH0327544A JP H0327544 A JPH0327544 A JP H0327544A JP 1162007 A JP1162007 A JP 1162007A JP 16200789 A JP16200789 A JP 16200789A JP H0327544 A JPH0327544 A JP H0327544A
Authority
JP
Japan
Prior art keywords
capillary
wire
bonding
semiconductor element
oscillation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1162007A
Other languages
Japanese (ja)
Inventor
Takasane Urasaki
貴実 浦崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1162007A priority Critical patent/JPH0327544A/en
Publication of JPH0327544A publication Critical patent/JPH0327544A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/78Apparatus for connecting with wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/7825Means for applying energy, e.g. heating means
    • H01L2224/783Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301Capillary
    • H01L2224/78302Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85205Ultrasonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]

Abstract

PURPOSE:To improve separation between a wire and a capillary at the time of wire bonding and improve transmission efficiency of supersonic oscillation by making an inner wall at the tip of a cone tiered. CONSTITUTION:When a wire 2 is pushed against a semiconductor device 3 via a capillary 1, if vertical displacement occurs on the capillary 1 due to the impact, or if vertical displacement occurs on the device 3, the oscillation can be received at shoulder height (d) with supersonic oscillation (c) applied to the capillary 1, if a resulted slit (b) is equal to or shorter than a wire holding part 1a. Thus oscillation can be efficiently transmitted to a junction face 4 with the device 3, Therefore constantly stable and highly reliable bonding is possible.

Description

【発明の詳細な説明】[Detailed description of the invention] 【産業上の利用分野】[Industrial application field]

この発明は、基板と該基板上に接着された半導体素子と
をワイヤで接合するワイヤボンディング装置のキャビラ
リに関するものである。
The present invention relates to a cavity for a wire bonding device for bonding a substrate and a semiconductor element bonded onto the substrate using a wire.

【従来の技術】[Conventional technology]

第6図は、従来のキャピラリを用いて半導体素子とワイ
ヤとを接合したときの断面図であり、図において、1は
例えば、ルビー等を加工して形威したキャピラリ、2は
半導体端子を外部に取出すためのワイヤ、3は半導体素
子、4は前記ワイヤ2と半導体素子3とを超音波振動を
与えて互いにこすり合い界面に合金層を形成した接合面
である。 次に動作について説明する。まず、第6図に示す様に、
キャピラリ1は図示の如き断面形状をしており半導体素
子3上に熔融させたワイヤ2を加圧し該キャピラリ1に
超音波振動Cを印加する。 するとワイヤ2の接合面はワイヤ保持部1bを介して超
音波振動Cを受けるので、その時の摩擦抵抗により接合
面4の温度が上昇して、ついには界面に合金層が形威さ
れ接合が完了する。 また、第7図は従来のワイヤボンディングにおける超音
波振動伝達のメカニズムを図示したもので、キャピラリ
1を介しワイヤ2を半導体素子3上に押し付けネールヘ
ンドボンディングを実行しようとするとその時の衝撃等
によりキャピラリ1に上下方向の変化が発生したり、も
しくは半導体素子3に上下方向の変位が発生して、間隙
aが生し、この間隙aにより水平方向に間隙bが生ずる
。 従って接合面4に伝達される超音波振動の振幅は■ c−bとなって振動の伝達効率が減衰することになり安
定した条件でのボンディングができなくなってワイヤボ
ンディングの歩留り低下を招く。また、同様の理由から
第8図に示す様に間隙aが生ずるとワイヤ2においてキ
ャピラリ1のワイヤ保持部(円すい部)lbによって保
持されている部分だけが振動してしまい、キャピラリ1
が円すい部で滑るためヘッドの形状が変形し接合面から
ワイヤ2を引剥してしまうこともある。
FIG. 6 is a cross-sectional view when a semiconductor element and a wire are bonded using a conventional capillary. 3 is a semiconductor element; 4 is a joint surface where the wire 2 and semiconductor element 3 are rubbed against each other by applying ultrasonic vibration to form an alloy layer at the interface. Next, the operation will be explained. First, as shown in Figure 6,
The capillary 1 has a cross-sectional shape as shown in the figure, and a wire 2 melted on a semiconductor element 3 is pressed, and an ultrasonic vibration C is applied to the capillary 1. Then, the bonding surface of the wire 2 receives ultrasonic vibration C via the wire holding part 1b, and the temperature of the bonding surface 4 rises due to the frictional resistance at that time, and finally an alloy layer is formed at the interface and the bonding is completed. do. Moreover, FIG. 7 illustrates the mechanism of ultrasonic vibration transmission in conventional wire bonding, and when attempting to perform nail-hand bonding by pressing the wire 2 onto the semiconductor element 3 through the capillary 1, the shock etc. When a vertical change occurs in the capillary 1 or a vertical displacement occurs in the semiconductor element 3, a gap a is created, and this gap a creates a horizontal gap b. Therefore, the amplitude of the ultrasonic vibrations transmitted to the bonding surface 4 becomes 1c-b, and the vibration transmission efficiency is attenuated, making it impossible to perform bonding under stable conditions, resulting in a decrease in the yield of wire bonding. Furthermore, for the same reason, if a gap a is created as shown in FIG.
Since the wire slips on the conical portion, the shape of the head is deformed and the wire 2 may be pulled off from the joint surface.

【発明が解決しようとする課題】[Problem to be solved by the invention]

従来のワイヤボンディング装置のキャピラリは以上のよ
うに構成されているので、キャピラリ1によってワイヤ
2を半導体素子3上に押し付けた時の衝撃によるキャピ
ラリ1の僅かな上下方向の変位に対しても超音波振動の
伝達力が減衰されてホンディング不良を助長する原因と
なったり、又ワイヤ保持部1bの断面形状が円すい状で
あるため、上下方向の変位はキャピラリ1の滑りを発生
させ、半導体素子3へのワイヤ2の接合を不安定なもの
にする等の課題があった。 この発明は上記のような課題を解消するためになされた
もので、キャピラリと半導体素子との間に間隙が発生し
た場合でも常に安定した超音波振動を接合面に伝達する
ことができるワイヤボンディング装置のキャピラリを得
ることを目的とする。
Since the capillary of the conventional wire bonding device is constructed as described above, ultrasonic waves are generated even when the capillary 1 is slightly displaced in the vertical direction due to the impact when the wire 2 is pressed onto the semiconductor element 3 by the capillary 1. The transmission force of the vibration is attenuated, which may promote bad bonding, and since the cross-sectional shape of the wire holding portion 1b is conical, displacement in the vertical direction may cause the capillary 1 to slip, causing the semiconductor element 3 to slip. There were problems such as making the bonding of the wire 2 to the wire unstable. This invention was made to solve the above problems, and provides a wire bonding device that can always transmit stable ultrasonic vibration to the bonding surface even if a gap occurs between the capillary and the semiconductor element. The aim is to obtain a capillary of

【課題を解決するための手段】[Means to solve the problem]

この発明におけるワイヤボンディング装置のキャピラリ
はワイヤを半導体素子上に加圧接触させるキャビラリの
先端部内壁のワイヤ保持部形状を円すい部と円筒部とを
組合せた多段形状にしたものである。
In the capillary of the wire bonding apparatus according to the present invention, the shape of the wire holding portion on the inner wall of the tip portion of the capillary for pressurizing the wire onto the semiconductor element is formed into a multi-stage shape combining a conical portion and a cylindrical portion.

【作用】[Effect]

この発明におけるキャピラリは超音波振動をワイヤに与
え半導体素子と接合する振動伝達効率を高めるためにキ
ャビラリの先端内部のワイヤ保持部形状を円すい部と円
筒部とを組合せた多段形状とすることによりキャピラリ
接合時の衝撃によるキーl・ピラリ上下変位に対しても
効率よく超音波振動をワイヤに伝達する。
The capillary according to the present invention has a wire holding part inside the tip of the capillary having a multi-stage shape that combines a conical part and a cylindrical part in order to increase the vibration transmission efficiency of applying ultrasonic vibration to the wire and bonding it to the semiconductor element. Ultrasonic vibrations are efficiently transmitted to the wire even when the key l/pillar is vertically displaced due to impact during bonding.

【発明の実施例】[Embodiments of the invention]

以下、この発明の一実施例を図について説明する。 図中、第6図と同一の部分は同一の符号をもって図示し
た第1図において1aはワイヤ保持部(円筒部)、1b
は同様にワイヤ保持部(円すい部)である。 次に動作について説明する。まず、第1図は従来の作用
と同様の原理で正常な状態で接合される場合である。 第2図は、本発明が効果を奏する場合の状熊断面図で、
キャピラリ1を介してワイヤ2を半導体素子3上に押し
付けた際にその衝撃によりキャピラリ1に上下方向の変
位が発生した場合、もしくは半導体素子3に上下方向の
変位が発生した場合、間隙bが生ずる。この間隙bがワ
イヤ保持部(円筒部)la以下であれば、キャピラリ1
に超音波振動Cを印加した際にその振動を肩の高さdで
受けることになり半導体素子3との接合面4に効率良く
振動を伝達することができ常に安定した信頼性の高いボ
ンディングを行うことができる。 なお、上記実施例ではワイヤ保持部1aが円筒状の場合
について説明したが第3図に示す様にワイヤ2とキャピ
ラリ1の分離性を向上させるために抜き勾配1cを設け
てもよい。 また、上記実施例ではキャピラリlをルビーの棒材を削
り出して成形する例について示したが粉末を焼結させて
成形するセラξツクキャピラリであってもよく上記実施
例と同様の効果を奏する。 また、第4図または第5図に示す様にワイヤ2とキャピ
ラリ1の分離性をより向上させるために、直径の異なる
円筒や、傾斜の異なる円錐、つまり抜き勾配1c,ld
等を、階段状に多段に設けてもよく上記実施例と同様の
効果を奏する。
An embodiment of the present invention will be described below with reference to the drawings. In the figure, the same parts as in FIG. 6 are indicated by the same reference numerals. In FIG.
Similarly, is a wire holding part (conical part). Next, the operation will be explained. First, FIG. 1 shows a case in which they are joined in a normal state based on the same principle as the conventional operation. FIG. 2 is a cross-sectional view of the bear in which the present invention is effective.
When the wire 2 is pressed onto the semiconductor element 3 through the capillary 1 and the impact causes a vertical displacement in the capillary 1, or when a vertical displacement occurs in the semiconductor element 3, a gap b is created. . If this gap b is less than the wire holding part (cylindrical part) la, the capillary 1
When ultrasonic vibrations C are applied to the semiconductor element 3, the vibrations are received at the shoulder height d, and the vibrations can be efficiently transmitted to the bonding surface 4 with the semiconductor element 3, ensuring stable and reliable bonding at all times. It can be carried out. In the above embodiment, the case where the wire holding part 1a is cylindrical is explained, but as shown in FIG. 3, a draft angle 1c may be provided to improve the separability of the wire 2 and the capillary 1. Further, in the above embodiment, an example was shown in which the capillary l was formed by cutting out a ruby bar material, but it may also be a ceramic capillary formed by sintering powder, and the same effect as in the above embodiment can be obtained. . In addition, as shown in FIG. 4 or FIG. 5, in order to further improve the separation between the wire 2 and the capillary 1, cylinders with different diameters and cones with different inclinations, that is, draft angles 1c, ld
etc. may be provided in multiple stages in a stepwise manner, and the same effect as in the above embodiment can be obtained.

【発明の効果】【Effect of the invention】

以上のように、この発明によれば、キャピラリの先端内
部の形状を円すいと円筒とを組み合わせた多段の構造に
したので、ワイヤボンディング時のワイヤとキャピラリ
との分離性が向上し、また超音波振動の伝達効率が向上
して半導体素子との接合の信頼性が増大ずる効果がある
。 5 6
As described above, according to the present invention, the inside shape of the tip of the capillary is made into a multi-stage structure combining a cone and a cylinder, so that the separation between the wire and the capillary during wire bonding is improved, and the ultrasonic This has the effect of improving the vibration transmission efficiency and increasing the reliability of bonding with the semiconductor element. 5 6

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明の−・実施例によるワイヤボンディ
ング装置のキャピラリを用いた通常状態の断面図、第2
図は、この発明が効果を発揮する際の状態断面図、第3
図ないし第5図はこの発明の他の実施例を示す同様断面
図、第6図は従来のキャピラリを用いたときの通常状態
の断面図、第7図及び第8図は従来のキャビラリで接合
不良を発生する際の状態断面図である。 図において、1はキャピラリ、2はワイヤ、3は半導体
素子である。 なお、図中、同一符号は同一、又は相当部分を示す。
FIG. 1 is a sectional view of a wire bonding apparatus according to an embodiment of the present invention in a normal state using a capillary;
The figure is a cross-sectional view of the state when this invention exerts its effects.
5 through 5 are similar sectional views showing other embodiments of the present invention, FIG. 6 is a sectional view in a normal state when a conventional capillary is used, and FIGS. 7 and 8 are joined by a conventional capillary. FIG. 3 is a cross-sectional view of the state when a defect occurs. In the figure, 1 is a capillary, 2 is a wire, and 3 is a semiconductor element. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] ワイヤを先端部に引出し溶融させて半導体素子上に加圧
接触し、超音波振動を施して該ワイヤを接合するワイヤ
ボンディング装置のキャピラリにおいて、前記キャピラ
リの円すい形状の先端部内壁を階段状の円すい形状とし
たことを特徴とするワイヤボンディング装置のキャピラ
リ。
In a capillary of a wire bonding device, in which a wire is pulled out to the tip, melted, pressed into contact with a semiconductor element, and bonded by applying ultrasonic vibration, the inner wall of the conical tip of the capillary is formed into a stepped cone. A capillary for a wire bonding device characterized by a shape.
JP1162007A 1989-06-23 1989-06-23 Capillary of wire bonding apparatus Pending JPH0327544A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1162007A JPH0327544A (en) 1989-06-23 1989-06-23 Capillary of wire bonding apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1162007A JPH0327544A (en) 1989-06-23 1989-06-23 Capillary of wire bonding apparatus

Publications (1)

Publication Number Publication Date
JPH0327544A true JPH0327544A (en) 1991-02-05

Family

ID=15746274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1162007A Pending JPH0327544A (en) 1989-06-23 1989-06-23 Capillary of wire bonding apparatus

Country Status (1)

Country Link
JP (1) JPH0327544A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5938105A (en) * 1997-01-15 1999-08-17 National Semiconductor Corporation Encapsulated ball bonding apparatus and method
US6065667A (en) * 1997-01-15 2000-05-23 National Semiconductor Corporation Method and apparatus for fine pitch wire bonding
US6165888A (en) * 1997-10-02 2000-12-26 Motorola, Inc. Two step wire bond process
US6213378B1 (en) 1997-01-15 2001-04-10 National Semiconductor Corporation Method and apparatus for ultra-fine pitch wire bonding
US6499648B2 (en) * 2001-05-31 2002-12-31 Orient Semiconductor Electronics Limited Method and device for making a metal bump with an increased height
JP2007263532A (en) * 2006-03-30 2007-10-11 Dainippon Printing Co Ltd Wind speed distribution adjusting device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5938105A (en) * 1997-01-15 1999-08-17 National Semiconductor Corporation Encapsulated ball bonding apparatus and method
US6065667A (en) * 1997-01-15 2000-05-23 National Semiconductor Corporation Method and apparatus for fine pitch wire bonding
US6213378B1 (en) 1997-01-15 2001-04-10 National Semiconductor Corporation Method and apparatus for ultra-fine pitch wire bonding
US6165888A (en) * 1997-10-02 2000-12-26 Motorola, Inc. Two step wire bond process
US6461898B1 (en) 1997-10-02 2002-10-08 Motorola, Inc. Two step wire bond process
US6499648B2 (en) * 2001-05-31 2002-12-31 Orient Semiconductor Electronics Limited Method and device for making a metal bump with an increased height
JP2007263532A (en) * 2006-03-30 2007-10-11 Dainippon Printing Co Ltd Wind speed distribution adjusting device

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