JPH0326378A - Production of thin film - Google Patents
Production of thin filmInfo
- Publication number
- JPH0326378A JPH0326378A JP16163489A JP16163489A JPH0326378A JP H0326378 A JPH0326378 A JP H0326378A JP 16163489 A JP16163489 A JP 16163489A JP 16163489 A JP16163489 A JP 16163489A JP H0326378 A JPH0326378 A JP H0326378A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- roller
- substrate
- thin film
- polymer substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000010438 heat treatment Methods 0.000 claims abstract description 20
- 229920000307 polymer substrate Polymers 0.000 claims abstract description 19
- 239000007789 gas Substances 0.000 claims abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 3
- 239000001301 oxygen Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 8
- 238000003825 pressing Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 18
- 238000007664 blowing Methods 0.000 abstract description 2
- 238000012856 packing Methods 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 18
- 238000000137 annealing Methods 0.000 description 8
- 230000037303 wrinkles Effects 0.000 description 7
- 238000010301 surface-oxidation reaction Methods 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical class OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229920006280 packaging film Polymers 0.000 description 1
- 239000012785 packaging film Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は優れた薄膜を皺なく形戊するための薄膜の製造
方法に関する
従来の技術
現代社会において薄膜技術の果たす役割は非常に多岐に
わたっていも 薄膜基板材料は機械的特性から高分子フ
イルム等の可とう性基板及びガラス板等の非可とう性基
板に犬別でき、基板の機械特性に合った薄膜製造方法が
用いられている。高分子フィルムの様な可とう性基板を
用いる場合には 薄膜の量産方法として連続巻取り方式
を用いることか出来る。これは巻出しロールから巻出さ
れたロール状の高分子基板が走行中にめっき法・スパッ
タ法・真空蒸着法などによって基板上に薄膜を形威した
後、巻取りロールに巻き取る方法玄大量生産に適した方
法とされている。こうして形威された薄膜(よ 装飾包
装用フィルム・磁気記録媒体をはじめとした広い分野に
用いられている。[Detailed Description of the Invention] Industrial Application Field The present invention relates to a conventional technology relating to a thin film manufacturing method for forming an excellent thin film without wrinkles.In modern society, thin film technology plays a wide variety of roles.Thin film substrates Materials can be classified into flexible substrates such as polymer films and non-flexible substrates such as glass plates based on their mechanical properties, and thin film manufacturing methods are used that match the mechanical properties of the substrates. When using a flexible substrate such as a polymer film, a continuous winding method can be used for mass production of thin films. This is a method in which a roll-shaped polymer substrate is unwound from an unwinding roll, and while it is running, a thin film is formed on the substrate by plating, sputtering, vacuum evaporation, etc., and then the film is wound onto a take-up roll. This method is considered suitable for production. Thin films formed in this way are used in a wide range of fields, including decorative packaging films and magnetic recording media.
薄膜の形戒法においては薄膜形成後の内部応力の緩和・
表面硬度の向上などを目的としたアニールと呼ばれる熱
処理が行われることがある。この処理1よ 第3図に示
すように巻取り走行系を用いて例えば大気中で昇温ロー
ラ5に沿って薄膜形成済み高分子基板3を走行させるこ
とによって可能であも
発明が解決しようとする課題
ところが基板3が薄い場合には昇温ローラ5での基板3
の熱変形によって皺が入りやす賎 この皺を防止するに
は例えば昇温ローラ5入り側での基板張力を比較的低く
してフィルムの昇温熱変形時のローラ5上での易動度を
高めると共に昇温ローラ5出側では逆に基板張力を比較
的高くしてフィルムのローラ5からの剥がれ方をフィル
ム幅方向で均一にすることが有効である。しかしながら
ローラ5の両側でのフィルム張力が異なると、ローラ5
とフィルムの間に滑りが生じてローラ5入り側・出側で
の張力差を維持゛することは難しく、同時にフィルムに
摺動傷が入るので好ましくなt.%また ローラ5とフ
ィルムの間の滑りを防ぐために 例えば金属薄膜の場合
にはフィルムとローラ5の間に電圧をかけるなどして静
電引力を発生させた場合にはローラ入り側でのフィルム
の易動度が低下して皺が入りやすしも
本発明{よ このような従来技術の課題を解・決するこ
とを目的とする。In the thin film form precepts, the internal stress relaxation and
A heat treatment called annealing is sometimes performed to improve surface hardness. Although it is possible to solve this process 1 by running the polymer substrate 3 on which a thin film has been formed along the temperature raising roller 5 in the atmosphere using a winding system as shown in FIG. However, when the substrate 3 is thin, the heating roller 5
In order to prevent wrinkles, for example, the tension of the substrate on the entry side of the heating roller 5 should be relatively low to increase the mobility of the film on the roller 5 during heating and thermal deformation. At the same time, it is effective to make the substrate tension relatively high on the exit side of the temperature raising roller 5 so that the film is peeled off from the roller 5 uniformly in the film width direction. However, if the film tensions on both sides of the roller 5 are different, the roller 5
It is difficult to maintain the tension difference between the entrance and exit sides of the roller 5 due to slipping between the film and the roller 5, and at the same time, the film is scratched by sliding, which is not desirable. % Also, in order to prevent slippage between the roller 5 and the film, for example, in the case of a metal thin film, if electrostatic attraction is generated by applying a voltage between the film and the roller 5, However, the present invention aims to solve the problems of the prior art.
課題を解決するための手段
本発明ζ上 高分子基板上に直接あるいは下地層を介し
て薄膜層を形戒した後に前記高分子基板を大気中または
同等以上の酸素を含む雰囲気中で昇温ローラに沿って走
行させる薄膜の製造方法において、前記昇温ローラ入り
側及び出側の張力が異なり、前記高分子基板が前記昇温
ローラに沿っているときに気体流を前記昇温ローラ周面
の外側から吹き付けることを特徴とする薄膜の製造方法
であも
作用
本発明によれば昇温ローラと薄膜が形成された高分子基
板との間のすべりを防止できるとともに昇温ローラ入り
側でのフィルムの易動度を低下させることなく確保でき
るのでアニール処理時の高分子基板の急激な熱変形に起
因する皺を防止することが出来る。Means for Solving the Problems According to the present invention ζ After forming a thin film layer on a polymer substrate directly or via an underlayer, the polymer substrate is heated with a heating roller in the atmosphere or an atmosphere containing oxygen of equal or higher concentration. In the method for producing a thin film, the tension is different between the entrance and exit sides of the temperature-raising roller, and when the polymer substrate is along the temperature-raising roller, the gas flow is caused to run along the circumferential surface of the temperature-raising roller. According to the present invention, it is possible to prevent slippage between the heating roller and the polymer substrate on which the thin film is formed, and also to prevent the film from entering the heating roller. Since this can be ensured without reducing the mobility of the polymer substrate, it is possible to prevent wrinkles caused by rapid thermal deformation of the polymer substrate during annealing.
実施例
以下に 本発明の実施例について図面を参照しながら説
明する。EXAMPLES Below, examples of the present invention will be described with reference to the drawings.
第1図は本発明の一実施例を示す図で、従来例を示す第
2図と異なる点は昇温ローラ5の側面にノズル7を設け
た事である。厚さ8μm1幅50cmのポリエチレンテ
レフタレート基板上に真空蒸着法によって膜厚30nm
のA’1層を設けた装飾包装紙の平坦化(カール戻し)
を目的としたアニール処理において、昇温ローラ5の温
度90℃、フィルム走行速度10m/分とした ノズル
7からの気流は圧縮機を用いて発生させた空気流とした
ノズル7からの気流の無い場合には昇温ローラ5入り
側と出側での張力差を大きくとることが出来すミ 昇温
ローラ5上でフィルムに皺が発生したパ ノズルを用い
ることによってフィルムの皺を防止することが出来た
第2図は本発明の別の実施例を示す図玄 第1図と異な
る点は過熱装置8を用いることによってノズル7からの
気流を過熱気流とすることが出来るようにしたことにあ
る。昇温ローラ5の温度が高いにもかかわら哄 ノズル
7からの気流が低温の場合は 気流を吹き付けることに
よって実質的にアニール温度が低下してしまう。その様
な場合にはノズル気流を加熱された気流とするとよ賎厚
さ10μm、幅20cmのポリイミド基板上に真空蒸着
法によって膜厚2’50nmのCoCr層を設けた垂直
磁気記録媒体の表面酸化を目的としたアニール処理にお
いて、昇温ローラ5の温度300杖 フィルム走行速度
lm/分とした ノズル7のない場合に昇温ローラ5上
で発生した皺をノズル7を用いることによって防止する
ことが出来た力交 気流を加熱しない場合には表面酸化
層の厚みの低下ならびにそれに伴う膜表面硬度の低下が
認められた フィルム近傍で熱電対を用いて測定した加
熱気流の温度が160℃以上では表面酸化層の厚みの低
下も膜表面硬度の低下も認められなかった この時の室
温は20℃である。まタ150℃から400℃の範囲で
は他の昇温ローラ温度に対してk 加熱気流温度と室温
との差力t 昇温ローラ温度と室温との差の概ね172
以上であれば表面酸化層の厚みの低下も膜表面硬度の低
下も認められなかっtも また 気体流による昇温ロ
ーラ周面上への前記高分子基板の押さえつけ圧力P(k
g/cm”)を圧力ゲージによって測定したとこ水 昇
温ローラ入り側の張力T+ (g)及び出側の張力T+
(g>を維持するにζ友 おおむね5PLW≧lT+
−Talであることが必要なことがわかった ここでW
は高分子基板の幅(cm)、Lは高分子基板と昇温ロー
ラの接触長(cm)であも発明の効果
以上の様に本発明の薄膜の製造方法によればアニール処
理時に発生する皺を防止する事が出来る。FIG. 1 shows an embodiment of the present invention, which differs from FIG. 2 which shows a conventional example in that a nozzle 7 is provided on the side surface of the temperature raising roller 5. A film with a thickness of 30 nm was formed by vacuum evaporation on a polyethylene terephthalate substrate with a thickness of 8 μm and a width of 50 cm.
Flattening (uncurling) of decorative wrapping paper with A'1 layer
In the annealing treatment for the purpose of In some cases, it is possible to create a large tension difference between the entrance and exit sides of the heating roller 5.Wrinkles in the film can be prevented by using a nozzle that causes wrinkles in the film on the heating roller 5. The resulting Figure 2 shows another embodiment of the present invention.The difference from Figure 1 is that the airflow from the nozzle 7 can be made into a superheated airflow by using a superheating device 8. . If the temperature of the temperature rising roller 5 is high but the airflow from the nozzle 7 is low temperature, the annealing temperature will be substantially lowered by blowing the airflow. In such a case, the nozzle airflow should be a heated airflow.Surface oxidation of a perpendicular magnetic recording medium in which a CoCr layer with a thickness of 2'50 nm is provided by vacuum evaporation on a polyimide substrate with a thickness of 10 μm and a width of 20 cm. In the annealing treatment aimed at, the temperature of the heating roller 5 was set at 300 m/min, and the film running speed was set at lm/min. By using the nozzle 7, wrinkles that would occur on the heating roller 5 in the absence of the nozzle 7 can be prevented. When the air flow was not heated, a decrease in the thickness of the surface oxidation layer and an accompanying decrease in film surface hardness were observed.When the temperature of the heated air flow was 160℃ or higher, measured using a thermocouple near the film, the surface Neither a decrease in the thickness of the oxide layer nor a decrease in the film surface hardness was observed.The room temperature at this time was 20°C. In addition, in the range of 150°C to 400°C, k with respect to other heating roller temperatures Difference force between heating air flow temperature and room temperature t Approximately 172 of the difference between heating roller temperature and room temperature
If it is above, neither a decrease in the thickness of the surface oxidation layer nor a decrease in the film surface hardness is observed.
g/cm") was measured using a pressure gauge. Tension on the entry side of the temperature rising roller T+ (g) and tension on the exit side T+
(To maintain g>, ζ friend is approximately 5PLW≧lT+
I found out that it is necessary to be -Tal where W
is the width of the polymer substrate (cm), and L is the contact length between the polymer substrate and the heating roller (cm). It can prevent wrinkles.
第1図は本発明の一実施例にかかる薄膜の製造方法にお
けるアニール処理工程の一例を示す正面@ 第2図は本
発明の薄膜の製造方法におけるアニール処理工程の別の
例を示す正面は 第3図はアニール処理工程の従来例を
示す正面図である。
1・・・回転方匝 2・・・巻だしローノk 3・・・
薄膜が形戒された高分子基板、 4・・・ガイドローラ
、 5・・・昇温ローラ、 6・・・巻き取り口ー)L
,, 7・・・ノズノレ、 8・・・加熱装鳳Figure 1 is a front view showing an example of the annealing process in the thin film manufacturing method according to an embodiment of the present invention; Figure 2 is a front view showing another example of the annealing process in the thin film manufacturing method of the present invention; FIG. 3 is a front view showing a conventional example of an annealing process. 1... Rotating box 2... Rolling out rono k 3...
Polymer substrate on which a thin film is formed, 4... Guide roller, 5... Temperature raising roller, 6... Winding port-)L
,, 7...Nozzle, 8...Heat-setting
Claims (4)
層を形成した後、前記高分子基板を大気中または同等以
上の酸素を含む雰囲気中で昇温ローラに沿って走行させ
る薄膜の製造方法において、前記昇温ローラ入り側及び
出側の張力が異なり、前記高分子基板が前記昇温ローラ
に沿っているときに気体流を前記昇温ローラ周面の外側
から吹き付けることを特徴とする薄膜の製造方法。(1) Production of a thin film by forming a thin film layer directly or via an underlayer on a polymer substrate, and then running the polymer substrate along a heating roller in the atmosphere or an atmosphere containing an equivalent or higher amount of oxygen. The method is characterized in that the tensions on the entry and exit sides of the temperature-raising roller are different, and when the polymer substrate is along the temperature-raising roller, a gas flow is blown from the outside of the circumferential surface of the temperature-raising roller. Method for manufacturing thin films.
る請求項1記載の薄膜の製造方法。(2) The method for producing a thin film according to claim 1, wherein the gas flow comprises heated gas.
範囲にあり、かつ前記昇温ローラ周面近傍での前記気体
流温度と室温との差が、前記昇温ローラ温度と室温との
差の実質上1/2以上であることを特徴とする請求項2
記載の薄膜の製造方法。(3) The circumferential surface temperature of the temperature-raising roller is in the range of 150°C to 400°C, and the difference between the gas flow temperature near the circumferential surface of the temperature-raising roller and the room temperature is the same as the temperature of the temperature-raising roller and the room temperature. Claim 2 characterized in that the difference is substantially 1/2 or more.
Method of manufacturing the described thin film.
子基板の押さえつけ圧力P(kg/cm^2)と前記高
分子基板の幅W(cm)、前記高分子基板と前記昇温ロ
ーラの接触長L(cm)、並びに前記昇温ローラ入り側
及び出側の張力T_1(g)、T_2(g)の関係が5
PLW≧|T_1−T_2|であることを特徴とする請
求項1、2、または3記載の薄膜の製造方法(4) Pressure P (kg/cm^2) of pressing the polymer substrate onto the circumferential surface of the temperature raising roller by gas flow, width W (cm) of the polymer substrate, and the temperature increase between the polymer substrate and the temperature increasing roller. The relationship between the contact length L (cm) of the roller and the tensions T_1 (g) and T_2 (g) on the entry and exit sides of the heating roller is 5.
The method for producing a thin film according to claim 1, 2, or 3, wherein PLW≧|T_1−T_2|.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16163489A JPH0326378A (en) | 1989-06-23 | 1989-06-23 | Production of thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16163489A JPH0326378A (en) | 1989-06-23 | 1989-06-23 | Production of thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0326378A true JPH0326378A (en) | 1991-02-04 |
Family
ID=15738917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16163489A Pending JPH0326378A (en) | 1989-06-23 | 1989-06-23 | Production of thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0326378A (en) |
-
1989
- 1989-06-23 JP JP16163489A patent/JPH0326378A/en active Pending
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