JPH0326377A - Production of thin film - Google Patents

Production of thin film

Info

Publication number
JPH0326377A
JPH0326377A JP16163189A JP16163189A JPH0326377A JP H0326377 A JPH0326377 A JP H0326377A JP 16163189 A JP16163189 A JP 16163189A JP 16163189 A JP16163189 A JP 16163189A JP H0326377 A JPH0326377 A JP H0326377A
Authority
JP
Japan
Prior art keywords
substrate
roll
roller
thin film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16163189A
Other languages
Japanese (ja)
Inventor
Kazuyoshi Honda
和義 本田
Ryuji Sugita
龍二 杉田
Kiyokazu Toma
清和 東間
Yasuhiro Kawawake
康博 川分
Tatsuro Ishida
達朗 石田
Isamu Inoue
勇 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16163189A priority Critical patent/JPH0326377A/en
Publication of JPH0326377A publication Critical patent/JPH0326377A/en
Pending legal-status Critical Current

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  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To prevent the wrinkling of a polymer substrate due to sudden thermal deformation by pressing both edges of the substrate against a heating roll at the outlet side of the roll when a thin layer is formed on the substrate and the substrate is travelled along the heating roll to produce a thin film. CONSTITUTION:When decorative packing paper obtd. by forming an Al layer on a polymer substrate, e.g. by vacuum deposition is annealed in an atmosphere having an oxygen content equal to or higher than that of the air, a nip roll 7 for pressing only both edges of a film against a heating roll 5 is used at the outlet side of the roll 5. Since the slipping of the substrate from the roll 5 is prevented, the substrate is held without reducing the mobility at the inlet side of the roll 5 and the tension of the substrate at the outlet side of the roll 5 is increased, so the wrinkling of the substrate at the outlet side of the roll 5 is prevented.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は薄膜を製造方法に関する。[Detailed description of the invention] Industrial applications The present invention relates to a method of manufacturing a thin film.

従来の技術 現代社会において薄膜技術の果たす役割は非常に多岐に
わたっている。薄膜基板材料は機械的特性から高分子フ
イルム等の可とう性基板及びガラス板等の非可とう性基
板に犬別でき、基板の機械特性に合った薄膜製造方法が
用いられている。高分子フィルムの様な可とう性基板を
用いる場合に(よ 薄膜の量産方法として連続巻取り方
式を用いることが出来る。これは巻出しロールから巻出
されたロール状の高分子基板が走行中にめっき法・スパ
ッタ法・真空蒸着法などによって基板上に薄膜を形威し
た後、巻取りロールに巻き取る方法℃大量生産に適した
方法とされている。こうして形或された薄膜は 装飾包
装用フィルム・磁気記録媒体をはじめとした広い分野で
用いられている。
Conventional Technology Thin film technology plays a wide variety of roles in modern society. Thin film substrate materials can be classified into flexible substrates such as polymer films and non-flexible substrates such as glass plates based on their mechanical properties, and thin film manufacturing methods that match the mechanical properties of the substrates are used. When using a flexible substrate such as a polymer film, a continuous winding method can be used as a mass production method for thin films. After forming a thin film on a substrate using a plating method, sputtering method, vacuum evaporation method, etc., it is wound onto a take-up roll.This method is considered suitable for mass production.The thin film formed in this way is used for decorative packaging. It is used in a wide range of fields including industrial films and magnetic recording media.

薄膜の形或法においては薄膜形或後の内部応力の緩和・
表面硬度の向上などを目的としたアニールと呼ばれる熱
処理が行われることがある。この処理Ui2図に示すよ
うに巻取り走行系を用いて例えば大気中で昇温ローラに
沿って薄膜形成済み高分子基板を走行させることによっ
て可能である。
In the thin film form or method, the internal stress relaxation and
A heat treatment called annealing is sometimes performed to improve surface hardness. This process Ui2 can be achieved by using a winding and running system to run the polymer substrate on which the thin film has been formed along a temperature rising roller in the atmosphere, for example.

発明が解決しようとする課題 ところが基板が薄い場合には昇温ローラでの基板の熱変
形によって皺が入りやす0。昇温ローラ入り側での皺を
防止するには昇温ローラ入り側での基板張力を比較的低
くしてフィルムの昇温熱変1 −2− 形時のローラ上での易動度を高める事が有効である。と
ころが昇温ローラ出側でのテンションが低いとフィルム
のローラからの剥がれ方がフイルム幅方向で均一になら
ないので第4図に示すような皺が入りやすl,X,昇温
ローラ出側での皺を防止するには昇温ローラ出側でのテ
ンションを比較的高くすることが有効である力( ロー
ラの両側でのフィルム張力が異なると、ローラとフィル
ムの間に滑りが生じてローラ入り側・出側での張力差を
維持することは難しく、同時にフィルムに摺動傷が入る
ので好ましくなL1  また ローラとフイルムの間の
滑りを防ぐために 例えば金属薄膜の場合にフィルムと
ローラの間に電圧をかけるなどして静電引力を発生させ
た場合にはローラ入り側でのフィルムの易動度が低下し
て皺が入りやす鶏本発明ζ上 このような従来技術の課
題を解決することを目的とする。
Problem to be Solved by the Invention However, when the substrate is thin, wrinkles tend to form due to thermal deformation of the substrate by the heating roller. To prevent wrinkles on the entry side of the heating roller, the substrate tension on the entry side of the heating roller should be relatively low to increase the mobility of the film on the roller during forming. is valid. However, if the tension at the exit side of the heating roller is low, the way the film is peeled off from the roller will not be uniform in the film width direction, so wrinkles as shown in Figure 4 will easily appear. In order to prevent wrinkles, it is effective to make the tension relatively high on the exit side of the heating roller. (If the film tension on both sides of the roller is different, slipping will occur between the roller and the film, causing the tension on the roller entry side.・It is difficult to maintain the tension difference on the exit side, and at the same time, sliding scratches may occur on the film, so L1 is preferable.Also, in order to prevent slippage between the roller and the film, for example, in the case of a metal thin film, voltage is applied between the film and the roller. When electrostatic attraction is generated by applying an electrostatic force, the mobility of the film on the roller entry side decreases and wrinkles are likely to occur. purpose.

課題を解決するための手段 本発明は高分子基板上に直接あるいは下地層を介して薄
膜層を形或した後に前記高分子基板を大気中または同等
以上の酸素を含む雰囲気中で昇温ローラに沿って走行さ
せる薄膜の製造方法において、前記昇温ローラ出側にお
いて前記高分子基板の両端を前記昇温ローラに押しつけ
る事を特徴とする薄膜の製造方法である。
Means for Solving the Problems The present invention involves forming a thin film layer on a polymer substrate directly or via an underlayer, and then applying the polymer substrate to a heating roller in the atmosphere or an atmosphere containing an equivalent or higher amount of oxygen. The thin film manufacturing method is characterized in that both ends of the polymer substrate are pressed against the temperature raising roller on the exit side of the temperature raising roller.

作用 本発明によれば昇温ローラと薄膜が形戊された高分子基
板との間のすべりを防止できるので、昇温ローラ入り側
でのフィルムの易動度を低下させることなく確保できる
と同時に昇温ローラ出側でのテンションを高くすること
ができるのでアニル処理時の高分子基板の急激な熱変形
に起因する皺を防止することが出来る。
According to the present invention, it is possible to prevent slippage between the temperature raising roller and the polymer substrate on which the thin film is formed, so it is possible to ensure the film's mobility on the entry side of the temperature raising roller without reducing it. Since the tension on the exit side of the temperature raising roller can be increased, it is possible to prevent wrinkles caused by rapid thermal deformation of the polymer substrate during annealing treatment.

実施例 以下に 本発明の実施例について図面を参照しながら説
明する。
EXAMPLES Below, examples of the present invention will be described with reference to the drawings.

第1図は本発明の実施例を示す図で、従来例を示す第2
図と異なる点は昇温ローラ5の出側をニップローラ7と
した事である。厚さ8μm1幅50cmのポリエチレン
テレフタレート基板上に真空蒸着法によって膜厚30n
mのAl層を設けた装飾包装紙の平坦化(カールの除去
)を目的としたアニール処理において、昇温ロ−ラの温
度90t、フィルム走行速度10m/分としtも  ニ
ップローラ7の無い場合には昇温ローラ入り側と出側で
の張力差を大きくとることが出来ず、昇温ローラ上でフ
ィルムに皺が発生した力交 ニップローラ7を用いるこ
とによってフィルムの皺を防止することが出来1,  
第3図は本発明に用いたニップローラ7の一例を示す図
である。一般に用いられているニップローラ7を用いる
とフィルムの全面を押さえつけることになるのでフィル
ムの表面性が低下したり、かえって皺が発生したりする
場合がある。そこで第3図に示すようなニップローラ7
を用いるとフィルムの両端部分だけが押さえつけられる
のでニップローラ7を用いることによる上述のような弊
害をフィルム両端のみに抑えることが出来る。
Fig. 1 shows an embodiment of the present invention, and Fig. 2 shows a conventional example.
The difference from the figure is that the exit side of the temperature raising roller 5 is a nip roller 7. A film with a thickness of 30 nm was deposited on a polyethylene terephthalate substrate with a thickness of 8 μm and a width of 50 cm using a vacuum evaporation method.
In an annealing treatment for the purpose of flattening (removal of curls) decorative wrapping paper provided with an Al layer of m, the temperature of the heating roller was 90 t, the film running speed was 10 m/min, and the nip roller 7 was not used. It is not possible to create a large tension difference between the entrance and exit sides of the temperature-raising roller, and wrinkles occur in the film on the temperature-raising roller.By using the nip roller 7, wrinkles in the film can be prevented. ,
FIG. 3 is a diagram showing an example of the nip roller 7 used in the present invention. If a commonly used nip roller 7 is used, the entire surface of the film is pressed down, which may reduce the surface properties of the film or even cause wrinkles. Therefore, a nip roller 7 as shown in FIG.
Since only both ends of the film are pressed when using the nip roller 7, the above-mentioned disadvantages caused by using the nip roller 7 can be suppressed to only both ends of the film.

また ローラ入り側・出側間のテンション差を得るだけ
であればニップローラ7の位置は昇温ローラ上のどこで
も良い力交 皺をなくするためには基板が低テンション
でできるだけ長く昇温ローラに接することによって皺な
く熱変形を終了することが必要なのでニップする位置は
昇温ローラの出側が最適である。厚さ10μ臥 幅20
cmのポリイミド基板上に真空蒸着法によって膜厚25
0nmのCoCr層を設けた垂直磁気記録媒体の表面酸
化を目的としたアニール処理において、昇温ロラの温度
320℃、フィルム走行速度lm/分とした場合にも同
様にニップローラ7を用いることによって昇温ローラ出
側での皺の発生を防止することが出来た 発明の効果 以上の様に本発明の薄膜の製造方法によればア壬一ル処
理時に発生する皺を効果的に防止する事が出来る。
Also, if you only want to obtain a tension difference between the roller entry and exit sides, the nip roller 7 can be positioned anywhere on the heating roller for good force transfer.In order to eliminate wrinkles, the substrate should be in contact with the heating roller for as long as possible with low tension. Since it is necessary to complete the thermal deformation without wrinkles, the optimum position for nipping is on the exit side of the heating roller. Thickness 10μ Width 20
A film with a thickness of 25 cm was deposited on a polyimide substrate with a thickness of 25 cm.
In the annealing treatment for the purpose of surface oxidation of a perpendicular magnetic recording medium provided with a CoCr layer of 0 nm, the temperature of the heating roller is 320°C and the film running speed is 1m/min. As described above, the thin film manufacturing method of the present invention can effectively prevent wrinkles that occur during aggregation processing. I can do it.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例にかかる薄膜の製造方法にお
けるアニール処理工程の一例を示す略示正面は 第2図
はアニール処理工程の従来例を示す正面は 第3図は本
発明の一実施例の薄膜の製造方法に用いるニップローラ
の一例を示す斜視飄第4図は昇温ローラ出側で発生する
皺を示す平面図である。 l・・・回転方晦 2・・・巻だしローノレ、 3・・
・薄膜が形戊された高分子基板、 4・・・ガイドロー
ラ、 5・・・昇温ローラ、 6・・・巻き取り口ーノ
k 7・・・ニップローラ、 8・・・敗
FIG. 1 is a schematic front view showing an example of an annealing process in a thin film manufacturing method according to an embodiment of the present invention. FIG. 2 is a front view showing a conventional example of an annealing process. FIG. 4, a perspective view showing an example of the nip roller used in the thin film manufacturing method of the embodiment, is a plan view showing wrinkles generated on the exit side of the temperature raising roller. l...Rotation direction 2...Rotation start, 3...
・Polymer substrate on which a thin film is formed, 4... Guide roller, 5... Temperature raising roller, 6... Winding opening nok 7... Nip roller, 8... Defeat

Claims (1)

【特許請求の範囲】[Claims] 高分子基板上に直接あるいは下地層を介して薄膜層を形
成した後に前記高分子基板を大気中または同等以上の酸
素を含む雰囲気中で昇温ローラに沿って走行させる薄膜
の製造方法において、前記昇温ローラ出側において前記
高分子基板の両端を前記昇温ローラに押しつける事を特
徴とする薄膜の製造方法。
In the method for producing a thin film, the thin film layer is formed directly or via a base layer on a polymer substrate, and then the polymer substrate is run along a temperature rising roller in the atmosphere or an atmosphere containing oxygen of equal or higher concentration. A method for producing a thin film, comprising pressing both ends of the polymer substrate against the temperature-raising roller on the exit side of the temperature-raising roller.
JP16163189A 1989-06-23 1989-06-23 Production of thin film Pending JPH0326377A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16163189A JPH0326377A (en) 1989-06-23 1989-06-23 Production of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16163189A JPH0326377A (en) 1989-06-23 1989-06-23 Production of thin film

Publications (1)

Publication Number Publication Date
JPH0326377A true JPH0326377A (en) 1991-02-04

Family

ID=15738859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16163189A Pending JPH0326377A (en) 1989-06-23 1989-06-23 Production of thin film

Country Status (1)

Country Link
JP (1) JPH0326377A (en)

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