JPH0325227U - - Google Patents
Info
- Publication number
- JPH0325227U JPH0325227U JP8506389U JP8506389U JPH0325227U JP H0325227 U JPH0325227 U JP H0325227U JP 8506389 U JP8506389 U JP 8506389U JP 8506389 U JP8506389 U JP 8506389U JP H0325227 U JPH0325227 U JP H0325227U
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- reduction projection
- projection exposure
- chip
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 1
Landscapes
- Projection-Type Copiers In General (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8506389U JPH0325227U (xx) | 1989-07-21 | 1989-07-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8506389U JPH0325227U (xx) | 1989-07-21 | 1989-07-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0325227U true JPH0325227U (xx) | 1991-03-15 |
Family
ID=31633963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8506389U Pending JPH0325227U (xx) | 1989-07-21 | 1989-07-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0325227U (xx) |
-
1989
- 1989-07-21 JP JP8506389U patent/JPH0325227U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR0128828B1 (ko) | 반도체 장치의 콘택홀 제조방법 | |
GB1461685A (en) | Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask | |
EP0810475A3 (en) | Pattern exposing method using phase shift and mask used therefor | |
JP2730861B2 (ja) | エネルギー節約型フォトマスク | |
JPH0496065A (ja) | レチクル | |
JPH0325227U (xx) | ||
GB9515230D0 (en) | Method of manufacturing a photo mask for manufacturing a semiconductor device | |
US6027865A (en) | Method for accurate patterning of photoresist during lithography process | |
JPH05243115A (ja) | 半導体装置の製造方法 | |
JPH0664337B2 (ja) | 半導体集積回路用ホトマスク | |
GB0129775D0 (en) | Exposure positioning in photolithography | |
JPS56116625A (en) | Exposure of fine pattern | |
JPH0322904Y2 (xx) | ||
JPS6473616A (en) | Manufacture of semiconductor device | |
KR960007293Y1 (ko) | 스텝퍼 | |
TW200300961A (en) | Multiple photolithographic exposures with different clear patterns | |
KR970010568B1 (ko) | 반도체 장치의 제조 방법 | |
JPS6155106B2 (xx) | ||
JPH0479358U (xx) | ||
JPS6258139B2 (xx) | ||
JPS6370425A (ja) | 微細パタ−ン形成方法 | |
KR200188671Y1 (ko) | 노광빛난반사방지용포토마스크 | |
JPS62265723A (ja) | レジスト露光方法 | |
JPS5456368A (en) | Sticking preventing method of photo masks | |
JPH04372110A (ja) | レジストパターン形成方法 |