JPH0325009B2 - - Google Patents

Info

Publication number
JPH0325009B2
JPH0325009B2 JP59170850A JP17085084A JPH0325009B2 JP H0325009 B2 JPH0325009 B2 JP H0325009B2 JP 59170850 A JP59170850 A JP 59170850A JP 17085084 A JP17085084 A JP 17085084A JP H0325009 B2 JPH0325009 B2 JP H0325009B2
Authority
JP
Japan
Prior art keywords
exposure
wafer
exposed
point
focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59170850A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6148923A (ja
Inventor
Kunio Morioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP59170850A priority Critical patent/JPS6148923A/ja
Publication of JPS6148923A publication Critical patent/JPS6148923A/ja
Publication of JPH0325009B2 publication Critical patent/JPH0325009B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59170850A 1984-08-16 1984-08-16 投影式目合せ露光装置における露光方法 Granted JPS6148923A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59170850A JPS6148923A (ja) 1984-08-16 1984-08-16 投影式目合せ露光装置における露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59170850A JPS6148923A (ja) 1984-08-16 1984-08-16 投影式目合せ露光装置における露光方法

Publications (2)

Publication Number Publication Date
JPS6148923A JPS6148923A (ja) 1986-03-10
JPH0325009B2 true JPH0325009B2 (ko) 1991-04-04

Family

ID=15912477

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59170850A Granted JPS6148923A (ja) 1984-08-16 1984-08-16 投影式目合せ露光装置における露光方法

Country Status (1)

Country Link
JP (1) JPS6148923A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4794886A (en) * 1987-04-01 1989-01-03 Toyota Jidosha Kabushiki Kaisha Intake device of an internal combustion engine
US5361122A (en) * 1990-09-06 1994-11-01 Canon Kabushiki Kaisha Autofocusing device and projection exposure apparatus with the same
JP3634068B2 (ja) 1995-07-13 2005-03-30 株式会社ニコン 露光方法及び装置
JP2003172349A (ja) 2001-12-04 2003-06-20 Aisan Ind Co Ltd シャフトの軸受構造
JP6157093B2 (ja) * 2012-11-15 2017-07-05 キヤノン株式会社 露光装置、露光方法及びデバイスの製造方法

Also Published As

Publication number Publication date
JPS6148923A (ja) 1986-03-10

Similar Documents

Publication Publication Date Title
JP4953923B2 (ja) 露光装置及びデバイス製造方法
US6586160B2 (en) Method for patterning resist
JPS61196532A (ja) 露光装置
JPH06216004A (ja) ベストフォーカス位置の算出方法
JP4323608B2 (ja) 露光装置およびデバイス製造方法
US5928822A (en) Method for confirming optimum focus of stepper
US4786166A (en) Determination of focal plane for a scanning projection aligner
JPH0325009B2 (ko)
TWI649643B (zh) 判定度量衡系統之最佳操作參數設定之方法與設備及判定基板柵格之方法
US4561773A (en) Projection exposure apparatus
EP0116940B1 (en) Pattern transfer device and method
KR100644066B1 (ko) 얼라인먼트 레이저를 이용한 웨이퍼의 포커스 결정 방법
JP3109631B2 (ja) ホトリソグラフィーのパターン検証方法
KR20010014751A (ko) 노광 방법 및 그 장치
KR20020048096A (ko) 반도체 장치에서 단차 측정 방법 및 이를 수행하기 위한장치
KR100330482B1 (ko) 반도체 제조 공정에서의 포커스 조절 방법
US6064475A (en) Real time local defocus monitor system using maximum and mean angles of focus correction
KR101977182B1 (ko) 근접형 노광장치 및 이를 이용한 노광방법
JPH0618168B2 (ja) 原画パターンを半導体ウエハ上面に露光する露光方法
JP2637412B2 (ja) 位置あわせ方法
JP2605644B2 (ja) 露光装置および露光方法
JPH0219956Y2 (ko)
CN116643465A (zh) 光刻机的监控方法及监控系统
JPH0529130B2 (ko)
KR20010048755A (ko) 오토 포커스 시스템을 갖는 노광 장치의 포커싱 방법