JPH03248440A - High output gaas field effect transistor - Google Patents
High output gaas field effect transistorInfo
- Publication number
- JPH03248440A JPH03248440A JP2045071A JP4507190A JPH03248440A JP H03248440 A JPH03248440 A JP H03248440A JP 2045071 A JP2045071 A JP 2045071A JP 4507190 A JP4507190 A JP 4507190A JP H03248440 A JPH03248440 A JP H03248440A
- Authority
- JP
- Japan
- Prior art keywords
- cells
- electrode
- cell
- high output
- active layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005669 field effect Effects 0.000 title claims description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims abstract description 10
- BTYUGHWCEFRRRF-UHFFFAOYSA-N [As].[K] Chemical compound [As].[K] BTYUGHWCEFRRRF-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
Landscapes
- Junction Field-Effect Transistors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は高出力カリウム・ヒ素電界効果トランジスタ(
GaAsFET)の構造に間し、特に多数セル間の位相
が同相で動作するFETの構造に間する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a high power potassium arsenic field effect transistor (
(GaAsFET) structure, especially FET structure in which a large number of cells operate in the same phase.
[従来の技術]
従来の高出力GaAsFETは第2図に示すように単位
FETを、例えば4単位まとめたセル11を複数個(図
では2個)並列に並べて構成し、ゲート横幅を増して高
出力化を図っており、これらのセル間の動作位相を同相
にするためゲート電極G、ドレイン電極りおよびソース
電極Sをセル間で一体的に形成している。[Prior Art] As shown in FIG. 2, a conventional high-output GaAsFET is constructed by arranging a unit FET, for example, a plurality of four cells 11 (two in the figure) in parallel, and increasing the gate width to increase the height. The gate electrode G, drain electrode, and source electrode S are integrally formed between the cells in order to make the operating phase of these cells the same.
[発明が解決しようとする課題]
この従来の高出力GaAsFETては、周波数を高くし
たり、あるいは高出力化のため多数のセルを並列にする
と電極横幅と使用周波数の波長(λ)の1/2(入/2
)が同レベルになり、FETの両側のセルで位相が極端
な場合はπずれて、出力を合成したときに打ち消し合う
状況になる。その結果、セル数を多くしても出力がセル
数に比例して大きくならないという問題があった。[Problem to be solved by the invention] In this conventional high-power GaAsFET, when increasing the frequency or connecting a large number of cells in parallel to increase the output, the width of the electrode and the wavelength (λ) of the frequency used are 1/1/2. 2 (in/2
) become the same level, and if the phases of cells on both sides of the FET are extreme, they will be shifted by π, resulting in a situation where the outputs cancel each other out when combined. As a result, there was a problem in that even if the number of cells was increased, the output did not increase in proportion to the number of cells.
[課題を解決するための手段]
本発明に係る高出力GaAsFETは、複数のセルを並
列に接続した高出力GaAs電界効果トランジスタにお
いて、各セル間で分割されたドレイン電極およびゲート
電極にそれぞれオーミック電極を設け、該ドレイン電極
およびゲート電極を該オーミック電極に接続したGaA
s活性層からなる抵抗体を介してそれぞれ接続したこと
を特徴とする。[Means for Solving the Problems] A high-power GaAsFET according to the present invention is a high-power GaAs field effect transistor in which a plurality of cells are connected in parallel, and an ohmic electrode is provided on a drain electrode and a gate electrode divided between each cell. and the drain electrode and the gate electrode are connected to the ohmic electrode.
s are characterized in that they are connected to each other via a resistor consisting of an active layer.
[実施例コ 次に、本発明について図面を参照して説明する。[Example code] Next, the present invention will be explained with reference to the drawings.
第1図は本発明の一実施例に係る高出力GaAsFET
を示す平面図である。FIG. 1 shows a high-power GaAsFET according to an embodiment of the present invention.
FIG.
図示のように、ドレイン電極りおよびゲート電極Gはセ
ル間で分割されて形成されている。各セルのドレイン電
極りにはオーミック電極4が設けられ、これらオーミッ
ク電極4に接続されたGaAs活性層からなる抵抗層3
により各セルのドレイン電極りは互いに接続されている
。また各セルのゲート電極にはオーミック電極1が設け
られ、これらオーミック電極1に接続されたGaAs活
性層からなる抵抗層2により各セルのゲート電極Gは互
いに接続されている。尚、ソース電極Sは通常アース面
にインダクタンスをはとんと介さずショートされるので
通常同相となるため、一体的に形成した同一電極として
おくだけでよい。また、GaAS活性N2,4に電極G
、 Dを直接接続するとショットキー接触となってし
まうので、活性層2,4と電極G、 Dとの間にオー
ミック電極1,4を介在させている。尚、ドレイン電極
は、FET動作をする活性層領域5てはオーミック電極
を通常形成するので、ドレイン電極に全領域のオーミッ
ク電極を設け、オーミック電極4としてもよい。As shown in the figure, the drain electrode and the gate electrode G are divided and formed between cells. Ohmic electrodes 4 are provided on the drain electrodes of each cell, and a resistance layer 3 made of a GaAs active layer is connected to these ohmic electrodes 4.
The drain electrodes of each cell are connected to each other. Further, an ohmic electrode 1 is provided on the gate electrode of each cell, and the gate electrodes G of each cell are connected to each other by a resistance layer 2 made of a GaAs active layer connected to these ohmic electrodes 1. Note that the source electrodes S are normally short-circuited to the ground plane without any inductance, so they are usually in the same phase, so it is only necessary to use the same electrodes formed integrally. In addition, the electrode G is connected to the GaAS active N2,4.
, D would result in a Schottky contact if they were directly connected, so ohmic electrodes 1, 4 are interposed between the active layers 2, 4 and the electrodes G, D. Incidentally, since an ohmic electrode is usually formed in the active layer region 5 that performs FET operation, the drain electrode may be provided with an ohmic electrode over the entire region to form the ohmic electrode 4.
上記のように、本実施例のFETはセル間を抵抗層2,
4を介して並列接続して構成されており、これら抵抗層
2,4は電極幅や使用周波数等に応して並列に接続され
た各セルの動作が同位相あるいは同位相に近くなるよう
な値に設定しである。As mentioned above, the FET of this example has a resistive layer 2 between the cells,
These resistance layers 2 and 4 are arranged in such a way that each cell connected in parallel operates in the same phase or close to the same phase, depending on the electrode width, frequency used, etc. Set to value.
上記構成に依れば、並列に接続された各セルは同相ある
いは同相にきわめて近い位相で動作し、各セルの出力の
位相が揃うことにより、セル数に応した高出力が得られ
る。According to the above configuration, each cell connected in parallel operates in the same phase or in a phase very close to the same phase, and by aligning the output phases of each cell, a high output corresponding to the number of cells can be obtained.
[発明の効果]
以上説明したように、本発明はセル間が抵抗で接続され
て各セル間での位相ずれが補正されいるので、並列接続
したセル数に応じた高出力を得ることができる。[Effects of the Invention] As explained above, in the present invention, the cells are connected by resistors and the phase shift between each cell is corrected, so it is possible to obtain a high output corresponding to the number of cells connected in parallel. .
第1図は本発明の一実施例を示す平面図、図は従来例を
示す平面図である。
D・・・・・・・・ドレイン電極、
S・・・・・・・・ソース電極、
G・・・・・・・・ゲート電極、
1.4・・・・・・オーミック接合電極、2.3・・・
・・・GaAs活性層、
5・・・・・・・・活性層。
第2FIG. 1 is a plan view showing an embodiment of the present invention, and the figure is a plan view showing a conventional example. D...Drain electrode, S...Source electrode, G...Gate electrode, 1.4...Ohmic junction electrode, 2 .3...
...GaAs active layer, 5... Active layer. Second
Claims (1)
ランジスタにおいて、各セル間で分割されたドレイン電
極およびゲート電極にそれぞれオーミック電極を設け、
該ドレイン電極およびゲート電極を該オーミック電極に
接続したGaAs活性層からなる抵抗体を介してそれぞ
れ接続したことを特徴とする高出力GaAs電界効果ト
ランジスタ。In a high-power GaAs field effect transistor in which multiple cells are connected in parallel, ohmic electrodes are provided on the drain electrode and gate electrode divided between each cell, respectively.
A high power GaAs field effect transistor characterized in that the drain electrode and the gate electrode are connected to the ohmic electrode through a resistor made of a GaAs active layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2045071A JPH03248440A (en) | 1990-02-26 | 1990-02-26 | High output gaas field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2045071A JPH03248440A (en) | 1990-02-26 | 1990-02-26 | High output gaas field effect transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03248440A true JPH03248440A (en) | 1991-11-06 |
Family
ID=12709112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2045071A Pending JPH03248440A (en) | 1990-02-26 | 1990-02-26 | High output gaas field effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03248440A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04365330A (en) * | 1991-06-13 | 1992-12-17 | Nec Yamagata Ltd | Semiconductor device |
JPH07111271A (en) * | 1993-10-08 | 1995-04-25 | Nec Corp | High power field-effect transistor |
WO1999052129A2 (en) * | 1998-04-03 | 1999-10-14 | Ericsson Inc. | Resistive interconnect of transistor cells |
JP2010080815A (en) * | 2008-09-29 | 2010-04-08 | Toshiba Corp | Semiconductor device |
JP2011124365A (en) * | 2009-12-10 | 2011-06-23 | Toshiba Corp | Method for manufacturing semiconductor device, and semiconductor device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60200547A (en) * | 1984-03-23 | 1985-10-11 | Fujitsu Ltd | Semiconductor device |
JPS63127575A (en) * | 1986-11-17 | 1988-05-31 | Nec Corp | Multi-cell type microwave field-effect transistor |
JPH01181574A (en) * | 1988-01-12 | 1989-07-19 | Fujitsu Ltd | Semiconductor device |
-
1990
- 1990-02-26 JP JP2045071A patent/JPH03248440A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60200547A (en) * | 1984-03-23 | 1985-10-11 | Fujitsu Ltd | Semiconductor device |
JPS63127575A (en) * | 1986-11-17 | 1988-05-31 | Nec Corp | Multi-cell type microwave field-effect transistor |
JPH01181574A (en) * | 1988-01-12 | 1989-07-19 | Fujitsu Ltd | Semiconductor device |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04365330A (en) * | 1991-06-13 | 1992-12-17 | Nec Yamagata Ltd | Semiconductor device |
JPH07111271A (en) * | 1993-10-08 | 1995-04-25 | Nec Corp | High power field-effect transistor |
WO1999052129A2 (en) * | 1998-04-03 | 1999-10-14 | Ericsson Inc. | Resistive interconnect of transistor cells |
WO1999052129A3 (en) * | 1998-04-03 | 2000-04-27 | Ericsson Inc | Resistive interconnect of transistor cells |
JP2010080815A (en) * | 2008-09-29 | 2010-04-08 | Toshiba Corp | Semiconductor device |
JP2011124365A (en) * | 2009-12-10 | 2011-06-23 | Toshiba Corp | Method for manufacturing semiconductor device, and semiconductor device |
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