JPH0324115A - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JPH0324115A JPH0324115A JP1158224A JP15822489A JPH0324115A JP H0324115 A JPH0324115 A JP H0324115A JP 1158224 A JP1158224 A JP 1158224A JP 15822489 A JP15822489 A JP 15822489A JP H0324115 A JPH0324115 A JP H0324115A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- present
- phenol
- weight ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 37
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 37
- 239000000203 mixture Substances 0.000 title claims abstract description 35
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229920003986 novolac Polymers 0.000 claims abstract description 19
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 8
- 239000011256 inorganic filler Substances 0.000 claims abstract description 6
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 6
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 abstract description 22
- 239000003795 chemical substances by application Substances 0.000 abstract description 12
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 abstract description 7
- 239000004593 Epoxy Substances 0.000 abstract description 5
- 238000002156 mixing Methods 0.000 abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 239000007788 liquid Substances 0.000 abstract description 3
- 238000007789 sealing Methods 0.000 abstract description 3
- 239000004841 bisphenol A epoxy resin Substances 0.000 abstract description 2
- 230000001351 cycling effect Effects 0.000 abstract 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 230000000704 physical effect Effects 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UUODQIKUTGWMPT-UHFFFAOYSA-N 2-fluoro-5-(trifluoromethyl)pyridine Chemical compound FC1=CC=C(C(F)(F)F)C=N1 UUODQIKUTGWMPT-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- -1 CTBN) Polymers 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- HJEORQYOUWYAMR-UHFFFAOYSA-N 2-[(2-butylphenoxy)methyl]oxirane Chemical compound CCCCC1=CC=CC=C1OCC1OC1 HJEORQYOUWYAMR-UHFFFAOYSA-N 0.000 description 1
- QCBSYPYHCJMQGB-UHFFFAOYSA-N 2-ethyl-1,3,5-triazine Chemical compound CCC1=NC=NC=N1 QCBSYPYHCJMQGB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- XYXBMCIMPXOBLB-UHFFFAOYSA-N 3,4,5-tris(dimethylamino)-2-methylphenol Chemical compound CN(C)C1=CC(O)=C(C)C(N(C)C)=C1N(C)C XYXBMCIMPXOBLB-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 235000002595 Solanum tuberosum Nutrition 0.000 description 1
- 244000061456 Solanum tuberosum Species 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は樹脂組成物に関する。更に詳しくは殊に半導体
の封止用として有用な液状のエボキシ樹脂組或物に関す
る。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to resin compositions. More specifically, the present invention relates to a liquid epoxy resin composition particularly useful for encapsulating semiconductors.
従来の技術
近年ハイブリッドIC等の発展によりペアチップを直接
基板に搭載する方式が増えている。2. Description of the Related Art In recent years, with the development of hybrid ICs and the like, the number of systems in which paired chips are directly mounted on a substrate has increased.
このベアチップの封正に液状のエボキシ樹脂組或物が使
用されているのは周知の通りである。It is well known that a liquid epoxy resin composition is used to seal this bare chip.
しかしながら従来使用されている液状のエボキシ樹脂組
成物は品質的に満足できるものではなく種々の問題を残
している。その中でも特に問題となっているのは半田処
理時における耐熱性に優れかつ耐湿性及び耐ヒートサイ
クル性に十分対応出来ないということである。However, the liquid epoxy resin compositions conventionally used are not satisfactory in terms of quality and have various problems. Among these, a particular problem is that it has excellent heat resistance during soldering processing and does not have sufficient moisture resistance and heat cycle resistance.
一般に半田時の酎熱性を向上させるために、ガラス転移
温度の高いエボキシ樹脂を用いることが行われているが
、その場合硬化物の架橋密度が高くなり、堅くて脆い性
質を示すようになりまた内部応力も大きくたり急激1.
熱変化によりクノックを生じ配線の断線が起こり易くた
る。Generally, epoxy resins with a high glass transition temperature are used to improve the heat resistance during soldering, but in this case, the crosslinking density of the cured product increases, making it hard and brittle. Internal stress is also large or sudden 1.
Due to thermal changes, knocking occurs and the wiring is likely to break.
、二のため可撓性を付与する物質例えば末端にカルボキ
シル基を有するアクリロニトリノレーブタジエンゴム(
CTBN)、シリコンH脂,ウvpン樹脂等のゴム状樹
脂を添加I一でクラツクの発生を防止l2ている。しか
しこの場合耐薬品性や耐湿性が劣化する傾向にあるため
好まl〜く紅い。, a substance that imparts flexibility for example acrylonitrinolebutadiene rubber (which has a carboxyl group at the end)
The occurrence of cracks can be prevented by adding rubber-like resins such as CTBN), silicone resin, and UVP resin. However, in this case, the chemical resistance and moisture resistance tend to deteriorate, so it is preferable that the color be red.
発明が解決しようとする課題
前記したように半田時の耐熱性に優れかつ耐湿性及び耐
ヒートサイクル性に優れた半導体封止用のエボキシ樹脂
組成物の開発が望まれてL・る。Problems to be Solved by the Invention As mentioned above, there is a desire to develop an epoxy resin composition for semiconductor encapsulation that has excellent heat resistance during soldering, moisture resistance, and heat cycle resistance.
課題を解決するための手段
我々は前記したようk課題を解決すKく鋭意研究を重ね
た結果本発明に到達した。即ち本発明は
a)エボキシ樹脂
b)酸無水物50〜90%(重量比)と、下記記一般式
(1)で示される成分の含有量が20%以」二(重量比
)でありかつ下記一般式(2)で示される成分との和が
35%以上(重量比)であるフェノールノボラック樹脂
10〜50%(重量比)
(式(1)、(2)ニおいてRは水素またはメチル基を
示す)
とからなる硬化剤
C)無機ノイラー
から々ることを特徴どするエボキシ樹脂絹成物を提供す
る。Means for Solving the Problems We have arrived at the present invention as a result of extensive research into solving the above-mentioned problems. That is, the present invention is characterized in that the content of a) an epoxy resin b) an acid anhydride of 50 to 90% (weight ratio) and a component represented by the following general formula (1) is 20% or more (weight ratio), and 10 to 50% (weight ratio) of a phenol novolac resin whose sum with the components represented by the following general formula (2) is 35% or more (weight ratio) (In formulas (1) and (2), R is hydrogen or An epoxy resin silk composition is provided, characterized in that the curing agent is C) an inorganic noiler.
本発明で使用するエボキシ樹脂としては10℃
気以上で液状であるエボキシ樹脂が好まL <、その具
体例としてはビスフェノールA型エボキシ樹脂、ビスフ
ェノールF型エボキシ樹脂、レゾルシノールジグリシジ
ルエーテル樹脂、フエ二一ルクリシジルエーテル樹脂、
夕−7ヤリープチルフエニールグリシジルエーテル樹脂
等の一種または一種以上からなるエボキシ樹脂が挙げら
れる。また更にこれらの液状エボキシ樹脂に常温で固体
のフユノールノボラツク樹脂、あるいはクレゾールノボ
ラック樹脂を一部溶解し2て用いてもよい。本発明で用
いるエボキシ樹脂としてはエボキシ当量が120〜25
0のものが好ましい。The epoxy resin used in the present invention is preferably an epoxy resin that is liquid at a temperature of 10° C. or higher.Specific examples include bisphenol A epoxy resin, bisphenol F epoxy resin, resorcinol diglycidyl ether resin, and lucidyl ether resin,
Examples include epoxy resins comprising one or more types of butyl phenyl glycidyl ether resins. Further, a fluor novolac resin or a cresol novolak resin, which is solid at room temperature, may be partially dissolved in these liquid epoxy resins and used. The epoxy resin used in the present invention has an epoxy equivalent of 120 to 25.
0 is preferred.
つぎに本発明で用いられる硬化剤について説明する。Next, the curing agent used in the present invention will be explained.
本発明で用いられる硬化剤は、酸無水物と特定のフェノ
ールノボラック樹脂との混合物であり、酸無水物の具体
例としてはへキサヒドロ無水フタル酸、メチルへキサヒ
ド口無水フタノレ酸、メチルテl・ラヒドロ無水フタル
酸、メチル無水ハイミック酸等が挙げられる。またフ皿
ノールノボラック樹脂としては、従来エボキシ樹脂の硬
化剤として使われる、通常のフェノールノボラクク樹脂
と異なり、一般式(1)で示される2核体(1分子中に
7エニール核2個を含むいわゆる2核体)、一般式(2
)で示される3核体を多量に含有スるフェノールノボラ
ック樹脂との混合物である。これ以外のフェノールノボ
ラック樹脂を、硬化剤として用いたエボキシ樹脂の硬化
物が堅くて脆い性質を示すのに対し、本発明で使用スる
フェノールノボラノク樹脂を用いたエボキシ樹脂の硬化
物は、可撓性がすぐれている。The curing agent used in the present invention is a mixture of an acid anhydride and a specific phenol novolac resin, and specific examples of acid anhydrides include hexahydrophthalic anhydride, methyl hexahydro-phthalic anhydride, and methyl tel-a-hydro. Examples include phthalic anhydride and methyl hymic anhydride. In addition, unlike ordinary phenol novolak resins, which are conventionally used as curing agents for epoxy resins, phenol novolac resins are dinuclear bodies (two 7-enyl nuclei in one molecule) represented by the general formula (1). (so-called dinuclear body containing), general formula (2
) It is a mixture with a phenol novolak resin containing a large amount of trinuclear bodies shown in (). While the cured products of epoxy resins using other phenol novolac resins as curing agents are hard and brittle, the cured products of epoxy resins using the phenol novolak resin used in the present invention are Excellent flexibility.
ちなみに、通常エボキシ樹脂の硬化剤に使用されている
フェノールノボラック樹脂は、一般式(1)で示される
2核体の含有量は、多くともセいぜい15%以下で、一
般式(2)で示される3核体との和は25%以下であり
、3核体以上の高分子量の成分を多量に含有にている。By the way, in the phenol novolac resin that is usually used as a curing agent for epoxy resin, the content of the dinuclear substance represented by the general formula (1) is at most 15% or less, and the content of the dinuclear substance represented by the general formula (2) is at most 15% or less. The sum of the trinuclear bodies represented by is 25% or less, and it contains a large amount of high molecular weight components of trinuclear bodies or more.
本発明で吏用するフェノールノボラック樹脂は、過剰の
フェノールとフォルマリンを酸触媒の存在下反応させた
後、未反応のフェノールを回収することによって製造す
ることができ、一般式(1)及び(2)で示される成分
の和が35〜80%の含有率を有するものが得られる。The phenol novolac resin used in the present invention can be produced by reacting excess phenol and formalin in the presence of an acid catalyst and then recovering unreacted phenol, and is produced by formula (1) and ( A product having a total content of 35 to 80% of the components shown in 2) is obtained.
酸無水物と本発明で用いるフェノールノポラック樹脂の
配合比率は、酸無水物50%〜90%(重量比)、フェ
ノールノボラック樹脂10〜50%(重量比)の範囲で
ある。The blending ratio of the acid anhydride and the phenol novolac resin used in the present invention is in the range of 50% to 90% (weight ratio) of the acid anhydride and 10 to 50% (weight ratio) of the phenol novolak resin.
酸無水物の使用量が90%(重量比)以上の場合はヒー
トサイクルに於けるクラックの発生が多く々りまた50
%(重量比)以下の場合エボキシ樹脂組成物の粘度が高
くなり過ぎまた耐熱性の低下が起こり好ましくむい。When the amount of acid anhydride used is more than 90% (weight ratio), cracks often occur during heat cycles.
% (weight ratio) or less, the viscosity of the epoxy resin composition becomes too high and the heat resistance decreases, which is undesirable.
本発明の硬化剤の使用量は、エボキシ樹脂l本発明の硬
化剤を用いたエボキシ樹脂の硬化物は、優れた半田時の
耐熱性を示しかつ耐湿性、耐クラック性が優れていた。The amount of the curing agent of the present invention used was epoxy resin.The cured product of the epoxy resin using the curing agent of the present invention exhibited excellent heat resistance during soldering, and was also excellent in moisture resistance and crack resistance.
次に本発明で使用する無機フィラーの具体例としては例
えばシリカ、炭酸カルシウム、水酸化アルミ等が挙げら
れその使用量は任意であるが、通常エボキシ樹脂100
重量部に対し200〜600重量部好ましくは300〜
500重量部である。使用する無機フィラーの粒径は特
に制限はないが通常3〜50ミクロンのものを用いるの
が好ましい。Next, specific examples of the inorganic filler used in the present invention include silica, calcium carbonate, aluminum hydroxide, etc. The amount used is arbitrary, but usually 100% of the epoxy resin is used.
200 to 600 parts by weight, preferably 300 to 600 parts by weight
It is 500 parts by weight. The particle size of the inorganic filler used is not particularly limited, but it is usually preferable to use a particle size of 3 to 50 microns.
本発明のエボキシ樹脂組或物は通常促進剤を用いて硬化
する。用いうる促進剤としては通常のエボキシ樹脂の硬
化に用いられる促進剤を使用することができ、その例と
してたとえばトリスジメチルアミノメチルフェノール、
イミダゾール類、1.8−ジアザーピシクロ(5,4.
0)ウンデセン−7 (DBU),}リフエニールフォ
スフィン等が挙げられ、その使用量は任意であるが、通
常0.05〜5重量部用いられる。また本発明Qエボキ
シ樹脂組成物は、必要であれば着色剤、流動調節剤、カ
ップリング剤等を所望の量用いてもよい。The epoxy resin compositions of the present invention are typically cured using accelerators. As the accelerator that can be used, those used for curing ordinary epoxy resins can be used, such as trisdimethylaminomethylphenol,
imidazoles, 1,8-diazapicyclo(5,4.
0) undecene-7 (DBU), }rifenylphosphine, etc., and the amount used is arbitrary, but is usually used in an amount of 0.05 to 5 parts by weight. Furthermore, the Q epoxy resin composition of the present invention may contain a desired amount of a coloring agent, a flow control agent, a coupling agent, etc., if necessary.
本発明のエボキシ樹脂組或物は前記したエボキシ樹脂、
硬化剤、無機フィラー及び必要によりその他の添加物を
真空二−ダで均一に混合することによって容易に製造す
ることができる。The epoxy resin composition of the present invention includes the above-mentioned epoxy resin,
It can be easily manufactured by uniformly mixing a curing agent, an inorganic filler, and other additives as necessary in a vacuum incubator.
本発明のエボキシ樹脂組成物の硬化は通常80〜190
℃で、20分〜8時間で硬化される。The curing of the epoxy resin composition of the present invention is usually 80 to 190
Cure for 20 minutes to 8 hours.
実施例 以下に実施例を挙げて本発明を更に詳しく説明する。Example The present invention will be explained in more detail with reference to Examples below.
実施例1.
ビスフェノールA型エボキシ樹脂(日本化薬社製;25
℃の粘度1 2 0 0 0 cps,エボキシ当量1
80)1 0 0 g.メチルへキサヒドロ無水フタル
酸(リカシッドMH−700,新日本理化社製) 3
3 g.前記一般式(1)で示される化合物( R=H
’)の含有量が50.5重量%、一般式(2)で示さ
れる成分(R=H)との和が77重量%であるフェノー
ルノポラツク樹脂(日本化薬社製;軟化点、室温で半固
形)33gを加え60℃に加熱撹拌して均一にした後室
温に冷却し、ついで2.4−ジアミノー6 [ 2’
−ウンデシルイミダゾール(l)]一エチル−S一トリ
アジン2g、シリカ粉末(ヒューズレククスrtD−8
、龍森社製;平均粒径25μ)310g、さらに着色剤
としてカーボンプラック0.2gカップリング剤として
γ−グリシドキシプロビルトリメトキシシランIgを加
え真空二−ダで均一に混合し,て液状の本発明のエポキ
シ樹脂組成物479.2gを得た。Example 1. Bisphenol A type epoxy resin (manufactured by Nippon Kayaku Co., Ltd.; 25
℃ viscosity 12000 cps, epoxy equivalent 1
80) 100 g. Methylhexahydrophthalic anhydride (Rikacid MH-700, manufactured by Shin Nihon Rika Co., Ltd.) 3
3 g. The compound represented by the general formula (1) (R=H
') content is 50.5% by weight, and the sum of the components represented by the general formula (2) (R=H) is 77% by weight (manufactured by Nippon Kayaku Co., Ltd.; softening point, room temperature Add 33 g of 2.4-diamino-6 [ 2'
-undecylimidazole (l)] monoethyl-S-triazine 2 g, silica powder (Fuse Rex rtD-8
, manufactured by Tatsumori Co., Ltd.; average particle size 25μ), and further added 0.2 g of carbon plaque as a coloring agent and γ-glycidoxypropyl trimethoxysilane Ig as a coupling agent, and mixed uniformly in a vacuum incubator. 479.2 g of a liquid epoxy resin composition of the present invention was obtained.
得られたエボキシ樹脂組成物の粘度及び硬(ヒ物の物性
と耐久テストの結果を表1に示した。The viscosity, hardness, and durability test results of the obtained epoxy resin composition are shown in Table 1.
実施例2.
実施例1で使用したビスフェノールA型エボキシ樹脂l
OOgの代わりにビスフェノールF型エボキシ樹脂(日
本化薬社製:25℃の粘度4100cps、エボキシ当
量170)95gを、2.4−ジアミノ−6[2′−ウ
ンデシルイミダゾール(1) ]−エチルーS − ト
リアジン2gの代わりに2.4−ジアソ
ミノー6{2−メチルイミダゾもルー(1)}エチルー
S − トリアジン・イソシアヌール酸付加物3gを用
いた以外は実施例lと同様にして本発明の液状のエボキ
シ樹脂組成物475、2gを得た。Example 2. Bisphenol A type epoxy resin used in Example 1
Instead of OOg, 95 g of bisphenol F type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., viscosity at 25°C 4100 cps, epoxy equivalent 170) was added to 2,4-diamino-6[2'-undecylimidazole (1)]-ethyl-S - The liquid of the present invention was prepared in the same manner as in Example 1, except that 2,4-diasomino 6 {2-methylimidazo also ru(1)} ethyl-S - triazine/isocyanuric acid adduct 3 g was used instead of 2 g of triazine. 475.2 g of an epoxy resin composition was obtained.
得られた液状エボキシ樹脂組成物の粘度及び硬化物の物
性と耐久テストの結果を表1に示し,た。Table 1 shows the viscosity of the obtained liquid epoxy resin composition, the physical properties of the cured product, and the results of the durability test.
実施例3.
実施例1で使用したビスフユノールA型エボキシ樹脂1
00gの代わりに、実施例1で使用E7たビスフェノー
ルA型エボキシ樹脂3 0 g,レゾルシノー・ルジグ
リシジルエーテル樹脂(日本化薬社製;25℃の粘度4
10CpS,エボキシ当量121)47gを用い、また
2,4−ジアミノー6〔2−ウンデシルイミダゾール(
1’) ]一エチルーs−}Uアジン2gの代わりに
2,4・−ジアミノ−6{2一メチルイミダゾリルー(
l)}エチルーS − }リアジン・イソシアヌール酸
付加物3gを用いる他は実施例1と同様にI一で本発明
の液状のエボキシ樹脂組成物4 6 7. 2 gを得
た。Example 3. Bisfunol A type epoxy resin used in Example 1
In place of 00 g, 30 g of bisphenol A type epoxy resin used in Example 1, resorcinol diglycidyl ether resin (manufactured by Nippon Kayaku Co., Ltd.; viscosity at 25°C: 4
10CpS, epoxy equivalent 121) was used, and 2,4-diamino-6[2-undecylimidazole (
1') ]-ethyl-s-}U Instead of 2 g of azine, 2,4-diamino-6{2-methylimidazolyl(
l)}Ethyl-S-}Liquid epoxy resin composition of the present invention 4 in the same manner as in Example 1 except that 3 g of riazine-isocyanuric acid adduct was used. 2 g was obtained.
得られた液状エボキシ樹脂組成物の粘度及び硬化物の物
性と耐久テストの結果を表1に示した。Table 1 shows the viscosity of the obtained liquid epoxy resin composition, the physical properties of the cured product, and the results of the durability test.
実施例4.
実施例1で使用したフスノールノボラック樹脂33gの
代わりに前記一般式(1)で示される化合物(R.=H
)の含有量が22重g1−%、一般式(2)で示される
成分(R=H)との和が38重量%であるフエノールノ
ボラック樹脂(日本化薬社製;軟化点、72℃、33g
)33gを用いる他は実施例1と同様にして本発明の液
状のエボキシ樹脂絹成物479。2gを得た。Example 4. In place of 33 g of Fusnol novolac resin used in Example 1, a compound represented by the general formula (1) (R.=H
) is 22 weight 1-%, and the sum of the components represented by the general formula (2) (R=H) is 38 weight % (manufactured by Nippon Kayaku Co., Ltd.; softening point, 72°C, 33g
) 479.2 g of the liquid epoxy resin silk composition of the present invention was obtained in the same manner as in Example 1, except that 33 g of the liquid epoxy resin silk composition of the present invention was used.
得られた液状エボキシ樹脂組成物の粘度及び硬化物の物
性と耐久テストの結果を表1に示{7た。The viscosity of the obtained liquid epoxy resin composition, the physical properties of the cured product, and the results of the durability test are shown in Table 1.
実施例5.
実施例1で使用したビスフェ7ノールA型エボキシ樹脂
22.5g,実施例3で使用し7たレゾルシノールジグ
リシジルエーテル樹脂52.5g,また実施例1で使用
したメチルへキザヒドロ無水フタル酸62.2g,実施
例1で使用したフェノールノボラック樹脂27gを用い
る他は実施例1ど同様に1〜で本発明の液状のエボキシ
樹脂組成物478.0gを得た。Example 5. 22.5 g of bisphenol A type epoxy resin used in Example 1, 52.5 g of resorcinol diglycidyl ether resin used in Example 3, and 62.2 g of methylhexahydrophthalic anhydride used in Example 1. , 478.0 g of the liquid epoxy resin composition of the present invention was obtained in the same manner as in Example 1 except that 27 g of the phenol novolak resin used in Example 1 was used.
得られた液状エボキシ樹脂組戊物の粘度及び硬化物の物
性と耐久テストの結果を表1に示し2た。The viscosity of the obtained liquid epoxy resin composition, the physical properties of the cured product, and the results of the durability test are shown in Table 1.
実施例6
実施例1で使用したメチルへキサヒドロ無水フタル酸3
3gの代わりに、メチル無水ハイミック酸35.6gを
用いた他は実施例1と同様にして液状のエボキシ樹脂組
成物481.8gを得た。Example 6 Methylhexahydrophthalic anhydride 3 used in Example 1
481.8 g of a liquid epoxy resin composition was obtained in the same manner as in Example 1 except that 35.6 g of methyl hymic anhydride was used instead of 3 g.
得られた液状エボキシ樹脂組成物の粘度及び硬化物の物
性と耐久テストの結果を表1に示した。Table 1 shows the viscosity of the obtained liquid epoxy resin composition, the physical properties of the cured product, and the results of the durability test.
実施例7。Example 7.
実施例5で用いたメチルへキサヒドロ無水フタル酸62
.2gの代わりにメチルテトラヒドロ無水フタル酸62
gを用いる他は実施例5と同様にして液状のエボキシ樹
脂組成物4 7 7. 8 gを得た。Methylhexahydrophthalic anhydride 62 used in Example 5
.. Methyltetrahydrophthalic anhydride 62 instead of 2g
A liquid epoxy resin composition was prepared in the same manner as in Example 5 except that g was used. 8 g was obtained.
得られた液状エボキシ樹脂組成物の粘度及び硬化物の物
性と耐久テストの結果を表1に示した。Table 1 shows the viscosity of the obtained liquid epoxy resin composition, the physical properties of the cured product, and the results of the durability test.
比較例1.
実施例1で用いたメチルへキサヒド口無水フタル酸33
g及びフェノールノボラック樹脂33gの代わりに、メ
チルへキザヒドロ無水フタル酸83gを用いる他は実施
例1と同様にして液状のエボキシ樹脂組成物496.2
gを得た。Comparative example 1. Methyl hexahydride phthalic anhydride 33 used in Example 1
A liquid epoxy resin composition of 496.2 g was prepared in the same manner as in Example 1, except that 83 g of methylhexahydrophthalic anhydride was used instead of 33 g of the phenol novolak resin.
I got g.
得られた液状エボキシ樹脂絹成物の粘度及び硬化物の物
性と耐久テストの結果を表1に示l〜た。The viscosity of the obtained liquid epoxy resin silk composition, the physical properties of the cured product, and the results of the durability test are shown in Table 1.
なお耐湿試験及び耐ヒートサイクル試験は以下の条件で
行った。Note that the moisture resistance test and heat cycle resistance test were conducted under the following conditions.
耐湿試験
゛アルミナセラミック基板上に、アルミ配線幅4μ、厚
さ03μ、配線間隔4μにプリント配線されたシリコン
チップを搭載し、25μlの金線でワイヤボンディング
したテスト用基板に、ディスペンサーを用いて本発明の
エボキシ樹脂なト′ロツビイングして160℃で3時間
硬化した後、温度120℃、湿度85%の条件でPCT
(プレッシャークッカーテスト)を行った。Moisture resistance test: A silicon chip printed with an aluminum wiring width of 4μ, thickness of 03μ, and wiring spacing of 4μ is mounted on an alumina ceramic substrate, and a test board is wire-bonded with 25μl of gold wire using a dispenser. After trotting the epoxy resin of the invention and curing it at 160°C for 3 hours, PCT was applied at a temperature of 120°C and a humidity of 85%.
(pressure cooker test).
耐ヒートサイクル試験
耐湿試験と同様の試験片を用い耐湿試験と同様にして封
止、硬化した後−40〜85℃の温度幅でト芋サイクル
テストを行いクラックによる金線の断線状況を見た。Heat cycle test After sealing and curing using the same test piece as in the humidity test, a potato cycle test was performed at a temperature range of -40 to 85°C to check for breakage of the gold wire due to cracks. .
発明の効果
耐熱、耐湿及び耐ヒートサイクル性に優れた液状のエボ
キシ樹脂組或物の提供が可能と九りこの液状のエポキシ
樹脂組戊物を用いることにり電気、
電子部品の信頼准が向上した。Effects of the Invention It is possible to provide a liquid epoxy resin composition with excellent heat resistance, moisture resistance, and heat cycle resistance.Using this liquid epoxy resin composition improves the reliability of electrical and electronic parts. did.
Claims (1)
1)で示される成分の含有量が20%(重量比)以上で
ありかつ下記一般式(2)で示される成分との和が35
%以上(重量比)で あるフェノールノボラック樹脂10〜50 %(重量比) ▲数式、化学式、表等があります▼(1) ▲数式、化学式、表等があります▼(2) (式(1)、(2)においてRは水素またはメチル基を
示す) とからなる硬化剤 c)無機フィラー からなることを特徴とするエポキシ樹脂組成物[Claims] 1. a) epoxy resin b) 50 to 90% (weight ratio) of acid anhydride and the following general formula (
The content of the component represented by 1) is 20% (weight ratio) or more, and the sum of the content of the component represented by the following general formula (2) is 35%
% (weight ratio) or more (weight ratio) Phenol novolak resin 10-50% (weight ratio) , (2) in which R represents hydrogen or a methyl group); c) an epoxy resin composition comprising an inorganic filler;
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1158224A JP2885289B2 (en) | 1989-06-22 | 1989-06-22 | Epoxy resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1158224A JP2885289B2 (en) | 1989-06-22 | 1989-06-22 | Epoxy resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0324115A true JPH0324115A (en) | 1991-02-01 |
JP2885289B2 JP2885289B2 (en) | 1999-04-19 |
Family
ID=15666994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1158224A Expired - Fee Related JP2885289B2 (en) | 1989-06-22 | 1989-06-22 | Epoxy resin composition |
Country Status (1)
Country | Link |
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JP (1) | JP2885289B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04185632A (en) * | 1990-11-21 | 1992-07-02 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for electrical insulation |
US5395915A (en) * | 1992-02-27 | 1995-03-07 | Mitsui Toatsu Chemicals, Inc. | Method for simultaneous preparation of bisphenol F and novolak phenol resins |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60190418A (en) * | 1984-03-12 | 1985-09-27 | Mitsubishi Electric Corp | Liquid epoxy resin composition for sealing semiconductors |
JPS6250325A (en) * | 1985-08-29 | 1987-03-05 | Hitachi Chem Co Ltd | Epoxy molding material for sealing electronic component |
JPS6250324A (en) * | 1985-08-29 | 1987-03-05 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing electronic component |
JPS62174223A (en) * | 1986-01-27 | 1987-07-31 | Matsushita Electric Works Ltd | One-component epoxy resin composition |
JPS62218412A (en) * | 1986-02-14 | 1987-09-25 | ザ ダウ ケミカル カンパニ− | Advanced epoxy resin manufactured from triglycidyl ether anddihydric phenol |
JPS62290720A (en) * | 1986-06-11 | 1987-12-17 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing electronic component |
JPS6383035A (en) * | 1986-09-29 | 1988-04-13 | Mitsui Petrochem Ind Ltd | Production of trinuclear substituted phenol and composition containing glycidyl ether derivative of trinuclear substituted phenol |
-
1989
- 1989-06-22 JP JP1158224A patent/JP2885289B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60190418A (en) * | 1984-03-12 | 1985-09-27 | Mitsubishi Electric Corp | Liquid epoxy resin composition for sealing semiconductors |
JPS6250325A (en) * | 1985-08-29 | 1987-03-05 | Hitachi Chem Co Ltd | Epoxy molding material for sealing electronic component |
JPS6250324A (en) * | 1985-08-29 | 1987-03-05 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing electronic component |
JPS62174223A (en) * | 1986-01-27 | 1987-07-31 | Matsushita Electric Works Ltd | One-component epoxy resin composition |
JPS62218412A (en) * | 1986-02-14 | 1987-09-25 | ザ ダウ ケミカル カンパニ− | Advanced epoxy resin manufactured from triglycidyl ether anddihydric phenol |
JPS62290720A (en) * | 1986-06-11 | 1987-12-17 | Hitachi Chem Co Ltd | Epoxy resin molding material for sealing electronic component |
JPS6383035A (en) * | 1986-09-29 | 1988-04-13 | Mitsui Petrochem Ind Ltd | Production of trinuclear substituted phenol and composition containing glycidyl ether derivative of trinuclear substituted phenol |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04185632A (en) * | 1990-11-21 | 1992-07-02 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for electrical insulation |
US5395915A (en) * | 1992-02-27 | 1995-03-07 | Mitsui Toatsu Chemicals, Inc. | Method for simultaneous preparation of bisphenol F and novolak phenol resins |
Also Published As
Publication number | Publication date |
---|---|
JP2885289B2 (en) | 1999-04-19 |
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