JPH032385A - Continuous coloring method - Google Patents
Continuous coloring methodInfo
- Publication number
- JPH032385A JPH032385A JP13463289A JP13463289A JPH032385A JP H032385 A JPH032385 A JP H032385A JP 13463289 A JP13463289 A JP 13463289A JP 13463289 A JP13463289 A JP 13463289A JP H032385 A JPH032385 A JP H032385A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- substrate
- titanium
- deposition material
- oxidation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 18
- 238000004040 coloring Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims abstract description 30
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000010936 titanium Substances 0.000 claims abstract description 18
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 16
- 238000001704 evaporation Methods 0.000 claims abstract description 7
- 238000007738 vacuum evaporation Methods 0.000 claims abstract description 3
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 31
- 238000010438 heat treatment Methods 0.000 abstract description 19
- 230000003647 oxidation Effects 0.000 abstract description 15
- 238000007254 oxidation reaction Methods 0.000 abstract description 15
- 230000008020 evaporation Effects 0.000 abstract description 6
- 239000003086 colorant Substances 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract 2
- 230000001070 adhesive effect Effects 0.000 abstract 2
- 239000000463 material Substances 0.000 description 30
- 238000003860 storage Methods 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000005524 ceramic coating Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はステンレス鋼等の金属基板の表面に着色皮膜を
施す連続着色方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a continuous coloring method for applying a colored film to the surface of a metal substrate such as stainless steel.
従来、ステンレス鋼等の金属の基板の着色方法は、予め
コイル状に巻いた基板を真空容器内に装填し、真空容器
を充分排気した後、その基板を走行させながらＴｉＣ＋
ＴｉＮ等のセラミックス皮膜を蒸着するバッチ方式であ
り、１７′イル毎に真空引き、加熱・走行・蒸着、大気
開放を繰り返すバッチ作業を行なっていた。またチタン
あるいはステンレス本体に直接化学エツチングする方法
もあった。Conventionally, the method for coloring metal substrates such as stainless steel is to load a coiled substrate into a vacuum container, evacuate the vacuum container sufficiently, and then apply TiC+ while running the substrate.
This is a batch method for depositing a ceramic film such as TiN, and a batch operation is performed in which vacuuming, heating, running, vapor deposition, and opening to the atmosphere are repeated every 17' cycles. Another method was to chemically etch the titanium or stainless steel body directly.
ステンレス鋼等金属の表面に非金属的な性質のセラミッ
クを直接に蒸着することは、両者の性質が相違するので
親和性が乏しく、金属基材の表面とセラミックスのコー
ティング皮膜との密着強度は、イオンブレーティングの
ような密着強度が優れているといわれるコーティング方
法においても限界がある。また色彩もＴｉＮは黄金色、
ＴｉＣは黒色に限られる。Directly depositing a ceramic with non-metallic properties on the surface of a metal such as stainless steel has poor affinity because the properties of the two are different, and the adhesion strength between the surface of the metal base material and the ceramic coating film is Even coating methods that are said to have excellent adhesion strength, such as ion blating, have limitations. Also, the color of TiN is golden,
TiC is limited to black.
一方チタンあるいはステンレス本体に直接化学エツチン
グする方法があるが、均一なエツチングを施すためには
、安定状態で長時間保持する必要がある。またエツチン
グ液等の管理が必要のため、いづれもバッチ方式にたよ
っている０色彩は色々とできるが、エツチング処理なの
で、凹凸が有り輝きの無い色である。On the other hand, there is a method of chemically etching the titanium or stainless steel body directly, but in order to perform uniform etching, it is necessary to hold the material in a stable state for a long time. In addition, since it is necessary to manage the etching solution, etc., various colors can be produced using a batch method, but since it is an etching process, the colors are uneven and lack shine.
（課題を解決するための手段〕
本発明は、前記従来の課題を解決するために、連続真空
蒸着装置により基板表面にチタンを蒸着した後に連続し
て同チタン皮膜の表面を酸化処理することを特徴とする
連続着色方法を提案するものである。(Means for Solving the Problems) In order to solve the above-mentioned conventional problems, the present invention provides a method of continuously oxidizing the surface of the titanium film after depositing titanium on the surface of the substrate using a continuous vacuum evaporation device. This paper proposes a distinctive continuous coloring method.
ＴＩＮやＴｉＣのような皮膜と違い、チタン皮膜の一部
を酸化処理するので、密着力に優れ、また酸化処理深さ
を変化させることにより、任意の色に着色できる。Unlike films such as TIN and TiC, a part of the titanium film is oxidized, so it has excellent adhesion and can be colored in any color by changing the depth of the oxidation process.
第１図は本発明方法を実施する装置の一例を示す部分断
面側面図、第２図は第１図の■−■断面拡大図である。FIG. 1 is a partially sectional side view showing an example of an apparatus for carrying out the method of the present invention, and FIG. 2 is an enlarged sectional view taken along the line 1--2 in FIG.
第３図は本発明方法により着色された基板の一例を示す
断面拡大図である。FIG. 3 is an enlarged cross-sectional view showing an example of a substrate colored by the method of the present invention.
第１図および第２図中、１は走行基板、２は基板加熱・
蒸着室、３はデフレクタロール、４はロール、５は基板
加熱装置、６は蒸着材、７は蒸着材収納容器、８は蒸着
装置、９はエツジマスク。In Figures 1 and 2, 1 is a running board, 2 is a board heating
A vapor deposition chamber, 3 is a deflector roll, 4 is a roll, 5 is a substrate heating device, 6 is a vapor deposition material, 7 is a vapor deposition material storage container, 8 is a vapor deposition device, and 9 is an edge mask.
１０ａ、 １０ｂ、 １０ｃはシールロール、 １１ａ
、１１ｂ、１１ｃは減圧室、 １２はチャンネル、１３
は蒸着材投入口、１４はせき、１５は定量供給機、１６
は受入ホッパ、 １７は供給ホッパ、１８はバルブ、１
９は真空ポンプ、２０は排気ポンプユニット、２１は酸
化加熱装置、２２はシール装置１２３は酸素供給口、２
４は電熱ヒータをそれぞれ示す。10a, 10b, 10c are seal rolls, 11a
, 11b, 11c are decompression chambers, 12 is a channel, 13
is a deposition material inlet, 14 is a weir, 15 is a quantitative feeder, 16
is the receiving hopper, 17 is the supply hopper, 18 is the valve, 1
9 is a vacuum pump, 20 is an exhaust pump unit, 21 is an oxidation heating device, 22 is a sealing device 123 is an oxygen supply port, 2
4 indicates an electric heater.
第１図において、基板１は図示していないアンコイラの
１対のリールの一方に取り付けられ、デフレクタロール
３を介してシール装置２２に送られる。同シール装置２
２は、３木１＆ＩＩ（図示例では最上段のみ２本１！［
）のシールロール１０ａ、 １０ｂ、 １０ｃ。In FIG. 1, a substrate 1 is attached to one of a pair of reels of an uncoiler (not shown), and is sent to a sealing device 22 via a deflector roll 3. The same sealing device 2
2 is 3 trees 1 & II (in the illustrated example, only the top row has 2 trees 1! [
) seal rolls 10a, 10b, 10c.
・・・が複数組間隔を置いて配設されることによって仕
切られた減圧室１．１ａ、 ｌｌｂ、 ｌｌｃ、・・・
を有し、排気ポンプユニット２０によって同減圧室１１
ａ、 ｌｌｂ、 ｌｌｃ、・・・が段階的に減圧され、
基板加熱・蒸着室２が所定の真空度に保たれている。走
行基板は、上記シールロール１０ａ、 １０ｂ、 １０
ｃ、・・・の組のうち片側２本のロールの隙間を次々と
通過して基板加熱・蒸着室２内に入り、ここで基板加熱
装置５によって３５０°Ｃ〜５００″Ｃに加熱され、ロ
ール４上で蒸着装置８によって酸素と親和性の良い金属
チタンが蒸着される。その後走行基板１は、再びシール
ロール１０ｃ、 １０ｂ、の３本ロールのうち反対側２
本のロール間隙間を逆に走行して酸化加熱装置２１に送
られる。Decompression chambers 1.1a, llb, llc, . . . are partitioned by multiple sets of .
The vacuum chamber 11 is operated by the exhaust pump unit 20.
a, llb, llc, ... are depressurized in stages,
A substrate heating/evaporation chamber 2 is maintained at a predetermined degree of vacuum. The running substrate includes the seal rolls 10a, 10b, 10
The substrate passes through the gap between the two rolls on one side one after another among the sets c, . Metal titanium, which has good affinity for oxygen, is vapor-deposited on the roll 4 by the vapor deposition device 8. Thereafter, the running substrate 1 is again deposited on the opposite side 2 of the three seal rolls 10c and 10b.
The book travels in the opposite direction through the gap between the book rolls and is sent to the oxidation heating device 21.
そしてそこで電熱ヒータ２４で任意の色彩に加熱着色さ
れた後、大気中に送り出され、図示していないコイラの
１対のリールの一方に巻き取られる。Then, after being heated and colored in an arbitrary color by an electric heater 24, it is sent out into the atmosphere and wound onto one of a pair of reels of a coiler (not shown).
走行基板を連続して払出し、巻取るため、新しい基板が
アンコイラの他のリールに取り付けられ、他の駆動装置
により走行している基板１と同調された後、押付ロール
の作動により走行基板１に押し付けられ、新しい基板が
スポット溶接により接着される。接着されると同時に切
断機が古い基板を切断し、新基板のみが通板される。ま
た巻取りも同様で、コイラの他のリールに押付ロールに
より走行基板ｌと同調された後スポット溶接により接着
し、接着と同時に切断機で古い走行基板を切断すること
により、新リールに巻取り始める。In order to continuously unload and wind up the traveling substrate, a new substrate is attached to the other reel of the uncoiler, and after being synchronized with the traveling substrate 1 by another drive device, it is rolled onto the traveling substrate 1 by the operation of the pressing roll. It is pressed and the new board is glued by spot welding. A cutting machine cuts off the old board at the same time as it is bonded, and only the new board is passed through. The same goes for winding. After being synchronized with the running board l by a pressing roll on the other reel of the coiler, it is bonded by spot welding, and at the same time as the adhesion, the old running board is cut with a cutting machine, and then wound onto a new reel. start.
一方蒸着は次のように行なわれる。第２図に示されるよ
うに、蒸着材収納容器７内の蒸着材６が蒸発し、その蒸
気が上方のチャンネル１２内を通って、基板ｌに蒸着さ
れる。その際、エツジマスク９によって、基板幅方向の
広がりが制限される。On the other hand, vapor deposition is performed as follows. As shown in FIG. 2, the vapor deposition material 6 in the vapor deposition material storage container 7 is evaporated, and the vapor passes through the upper channel 12 and is deposited on the substrate l. At this time, the edge mask 9 limits the spread in the width direction of the substrate.
蒸着材６の蒸気はエツジマスク９やチャンネル１２内面
にもトラップされるが、それぞれ内面が蒸着材収納容器
７の輻射熱によって蒸着材融点以上に保持されているの
で、液となって蒸着材収納容器７内へ還流される。The vapor of the vapor deposition material 6 is also trapped inside the edge mask 9 and the channel 12, but since the inner surfaces of the vapor deposition material 6 are kept at a temperature higher than the melting point of the vapor deposition material by the radiant heat of the vapor deposition material storage container 7, it turns into a liquid and flows into the vapor deposition material storage container 7. It is refluxed into the inside.
クリユーフィーダ等の定量供給１！１５から成る蒸着材
投入装置により供給される。すなわち、先づ一定量の蒸
着材を受入れホッパ１６内に投入し、同受入れホッパ１
６内を真空ポンプ１９で所定の真空度まで減圧する。そ
うしておいてパルプ１８を開き、受入ホッパ１６内の蒸
着材を供給ホッパ１７へ移動させる。移動後バルブ１８
を閉めて真空ポンプ１９を停止し、供給ホッパ１７内の
蒸着材が下限量になった時点で再び上記作業を繰返す、
この間、定量供給機１５は連続して蒸着材を搬送してい
るので、蒸着材収納容器７内の蒸着材６は、常に一定量
確保されている。The vapor deposition material is supplied by a vapor deposition material feeding device consisting of 1 to 15 fixed quantity feeders such as a cream feeder. That is, first, a certain amount of vapor deposition material is put into the receiving hopper 16, and then
The inside of 6 is depressurized to a predetermined degree of vacuum using a vacuum pump 19. Then, the pulp 18 is opened and the vapor deposition material in the receiving hopper 16 is moved to the supply hopper 17. Valve 18 after movement
, the vacuum pump 19 is stopped, and the above operation is repeated again when the amount of vapor deposition material in the supply hopper 17 reaches the lower limit amount.
During this time, the quantitative feeder 15 is continuously transporting the vapor deposition material, so that a constant amount of the vapor deposition material 6 in the vapor deposition material storage container 7 is always secured.
なお、新規に投入される蒸着材には微少ながら酸化物等
の不純物が含まれているので、これが収納容器内で蓄積
されると、蒸発レートが低下する。Note that the newly introduced evaporation material contains a small amount of impurities such as oxides, so if these impurities accumulate in the storage container, the evaporation rate will decrease.
そこで、収納容器の一端にせき１４を設け、このせき１
４の外側に設けた蒸着材投入口１３から蒸着材６を投入
することにより、不ｍ７き１４の外側に蓄積させ、高純
度の蒸着材のみがせき１４の下方を通過するようにして
いる。Therefore, a weir 14 is provided at one end of the storage container, and this weir 1
By introducing the vapor deposition material 6 from the vapor deposition material inlet 13 provided on the outside of the weir 4, the vapor deposition material 6 is accumulated on the outside of the impurity m7 14, and only high-purity vapor deposition material passes below the weir 14.
上記のようにして蒸着された金属チタンの皮膜は、酸素
との親和性がよいので、次段の酸化加熱装置２１におい
て酸素の存在下で加熱されると、酸化して着色される。The metallic titanium film deposited as described above has good affinity with oxygen, so when it is heated in the presence of oxygen in the next stage oxidation heating device 21, it oxidizes and becomes colored.
このとき、温度を変化させることによって酸化皮膜の厚
さが変り、それに応じて種々の色彩が得られる。第３図
は、このようにして着色された基板の断面拡大図であっ
て、図中３１は基材、３２はチタン皮膜、３３はチタン
酸化皮膜をそれぞれ示す、なお第１図中には電熱ヒータ
２４が例示されているが、酸化加熱装置２１の加熱方法
としては、誘導加熱や輻射加熱等でもよい。At this time, the thickness of the oxide film changes by changing the temperature, and various colors can be obtained accordingly. FIG. 3 is an enlarged cross-sectional view of the substrate colored in this way, in which 31 indicates the base material, 32 indicates the titanium film, and 33 indicates the titanium oxide film. Although the heater 24 is illustrated, the heating method of the oxidation heating device 21 may be induction heating, radiation heating, or the like.
次に、実際に上記の方法によりステンレス鋼の基板に着
色を施した実験例を述べる。圧力１０−’Ｔｏｒｒ台の
基板加熱・蒸着室２内で温度３５０”Ｃの基板にチタン
を蒸着し、これを圧力１５０Ｔｏｒｒの酸化加熱装置２
１で加熱した。その結果、酸化加熱装置内温度４５０°
Ｃで金色、６００°Ｃで青色、 ７００’Ｃで緑白色の
酸化皮膜がそれぞれ得られた。Next, an experimental example in which a stainless steel substrate was actually colored using the above method will be described. Titanium is evaporated onto a substrate at a temperature of 350''C in a substrate heating/evaporation chamber 2 with a pressure of 10-' Torr, and then transferred to an oxidation heating device 2 with a pressure of 150 Torr.
It was heated at 1. As a result, the temperature inside the oxidation heating device was 450°.
A golden oxide film was obtained at C, a blue oxide film at 600°C, and a greenish-white oxide film at 700'C.
本発明によれば、従来バッチ方式でしか行なわれなかっ
たステンレス鋼の着色が連続して実施できるので、稼動
率が大幅に向上して生産コストが従来の２ないし１八に
低減する。また、酸化加熱装置の温度を変化させること
により、任意の色彩に着色できる。According to the present invention, coloring of stainless steel, which was conventionally carried out only in a batch manner, can be carried out continuously, so the operating rate is greatly improved and the production cost is reduced to 2 to 18 times compared to the conventional method. Furthermore, by changing the temperature of the oxidation heating device, it can be colored in any desired color.
更に本発明によれば任意の幅の基板に対し連続して接続
着色ができるため、稼動率の一層の向上が期待できると
ともに生産スケジュールの自由度が高まる。加えて、大
気中で巻取るので、計器類が容易に設置できて品質管理
が容易である等、操作性やメンテナンス性も向上する。Furthermore, according to the present invention, it is possible to connect and color substrates of arbitrary widths continuously, so it is possible to expect a further improvement in the operating rate and to increase the degree of freedom in production schedules. In addition, since winding is performed in the atmosphere, operability and maintainability are improved, such as ease of instrumentation and quality control.
第１図は本発明方法を実施する装置の一例を示す部分断
面側面図、第２図は第１図の■−■断面拡大図である。
第３図は本発明方法により着色された基板の一例を示す
断面拡大図である。
ｌ・・・走行基板、 ２・・・基板加熱・蒸着
室。
３・・・デフレフクロール、４・・・ロール５・・・基
板加熱装置、 ６・・・蒸着材。
７・・・蒸着材収納容器、 ８・・・蒸着装置。
９・・・エツジマスク。
１０ａ、 １０ｂ、 １０ｃｍシールロール１１ａ、
ｌｌｂ、 Ｈｃ−−−減圧室、 １２・・・チャンネル
。
１３・・・蒸着材投入０．１４・・・せき。
１５・・・定量供給機、１６・・・受入ホッパ１７・・
・供給ホッパ、 １８・・・バルブ。
１９・・・真空ポンプ、２０・・・排気ポンプユニット
２１・・・酸化加熱装置、２２・・・シール装置。
２３・・・酸素供給口、２４・・・電熱ヒータ３１・・
・基材、３２・・・チタン皮１１Ｌ３３・・・チタン酸
化皮膜。FIG. 1 is a partially sectional side view showing an example of an apparatus for carrying out the method of the present invention, and FIG. 2 is an enlarged sectional view taken along the line 1--2 in FIG. FIG. 3 is an enlarged cross-sectional view showing an example of a substrate colored by the method of the present invention. l... Traveling substrate, 2... Substrate heating/evaporation chamber. 3... Deflation crawl, 4... Roll 5... Substrate heating device, 6... Vapor deposition material. 7... Vapor deposition material storage container, 8... Vapor deposition device. 9... Etsuji Mask. 10a, 10b, 10cm seal roll 11a,
llb, Hc---decompression chamber, 12...channel. 13...Vapor deposition material input 0.14...Weir. 15...Quantitative feeder, 16...Receiving hopper 17...
- Supply hopper, 18...valve. 19... Vacuum pump, 20... Exhaust pump unit 21... Oxidation heating device, 22... Sealing device. 23...Oxygen supply port, 24...Electric heater 31...
- Base material, 32...Titanium skin 11L33...Titanium oxide film.
Claims (1)
後に連続して同チタン皮膜の表面を酸化処理することを
特徴とする連続着色方法。A continuous coloring method characterized by evaporating titanium onto the surface of a substrate using a continuous vacuum evaporation device and then continuously oxidizing the surface of the titanium film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13463289A JPH032385A (en) | 1989-05-30 | 1989-05-30 | Continuous coloring method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13463289A JPH032385A (en) | 1989-05-30 | 1989-05-30 | Continuous coloring method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH032385A true JPH032385A (en) | 1991-01-08 |
Family
ID=15132913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13463289A Pending JPH032385A (en) | 1989-05-30 | 1989-05-30 | Continuous coloring method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH032385A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6020417A (en) * | 1997-01-24 | 2000-02-01 | Ntn Corporation | Sheet feed members for image forming devices |
| WO2006013115A1 (en) * | 2004-08-06 | 2006-02-09 | Politecnico Di Milano | Method for the protection/selective colouring of an endproduct |
| WO2007028178A1 (en) * | 2005-09-09 | 2007-03-15 | Boehlerit Gmbh & Co. Kg. | Method for producing cutting tip with a colored surface |
| JP2010533790A (en) * | 2007-07-19 | 2010-10-28 | アプライド マテリアルズ インコーポレイテッド | Vacuum deposition equipment for solid materials |
| JP2012516363A (en) * | 2009-01-28 | 2012-07-19 | エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツング | PVD metallic effect pigment having a gradient with respect to nanoscale metal particles, process for its production and use thereof |
| CN102732829A (en) * | 2011-04-13 | 2012-10-17 | 鸿富锦精密工业（深圳）有限公司 | Coated article and its preparation method |
| DE102012107130A1 (en) * | 2012-08-03 | 2014-02-06 | Walter Ag | Cutting tool with wear detection layer |
-
1989
- 1989-05-30 JP JP13463289A patent/JPH032385A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6020417A (en) * | 1997-01-24 | 2000-02-01 | Ntn Corporation | Sheet feed members for image forming devices |
| WO2006013115A1 (en) * | 2004-08-06 | 2006-02-09 | Politecnico Di Milano | Method for the protection/selective colouring of an endproduct |
| WO2007028178A1 (en) * | 2005-09-09 | 2007-03-15 | Boehlerit Gmbh & Co. Kg. | Method for producing cutting tip with a colored surface |
| JP2010533790A (en) * | 2007-07-19 | 2010-10-28 | アプライド マテリアルズ インコーポレイテッド | Vacuum deposition equipment for solid materials |
| JP2012516363A (en) * | 2009-01-28 | 2012-07-19 | エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツング | PVD metallic effect pigment having a gradient with respect to nanoscale metal particles, process for its production and use thereof |
| US8864899B2 (en) | 2009-01-28 | 2014-10-21 | Eckart Gmbh | PVD metal effect pigment having gradient on nanoscale metal particles, method for the production thereof and use thereof |
| JP2016027158A (en) * | 2009-01-28 | 2016-02-18 | エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツングＥｃｋａｒｔ ＧｍｂＨ | Pvd metal effect pigment having gradient on nanoscale metal particles, method for production thereof and use thereof |
| CN102732829A (en) * | 2011-04-13 | 2012-10-17 | 鸿富锦精密工业（深圳）有限公司 | Coated article and its preparation method |
| DE102012107130A1 (en) * | 2012-08-03 | 2014-02-06 | Walter Ag | Cutting tool with wear detection layer |
| US9464354B2 (en) | 2012-08-03 | 2016-10-11 | Walter Ag | Cutting tool with wear-recognition layer |
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