JPH03219070A - Method and device for vacuum deposition - Google Patents
Method and device for vacuum depositionInfo
- Publication number
- JPH03219070A JPH03219070A JP1192790A JP1192790A JPH03219070A JP H03219070 A JPH03219070 A JP H03219070A JP 1192790 A JP1192790 A JP 1192790A JP 1192790 A JP1192790 A JP 1192790A JP H03219070 A JPH03219070 A JP H03219070A
- Authority
- JP
- Japan
- Prior art keywords
- deflector roll
- vapor
- strip
- zinc
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 6
- 238000001771 vacuum deposition Methods 0.000 title claims description 4
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000007740 vapor deposition Methods 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 20
- 238000000151 deposition Methods 0.000 claims abstract description 10
- 238000001704 evaporation Methods 0.000 claims description 21
- 230000008020 evaporation Effects 0.000 claims description 21
- 238000007738 vacuum evaporation Methods 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000004804 winding Methods 0.000 claims description 3
- 229910000831 Steel Inorganic materials 0.000 abstract description 36
- 239000010959 steel Substances 0.000 abstract description 36
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract description 33
- 229910052725 zinc Inorganic materials 0.000 abstract description 31
- 239000011701 zinc Substances 0.000 abstract description 31
- 239000013078 crystal Substances 0.000 abstract description 24
- 239000011248 coating agent Substances 0.000 abstract description 12
- 238000000576 coating method Methods 0.000 abstract description 12
- 238000010586 diagram Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 6
- 229910001335 Galvanized steel Inorganic materials 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 3
- 239000008397 galvanized steel Substances 0.000 description 3
- 238000005246 galvanizing Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、金属等の帯状基板に金属等、特に多面結晶方
位を持つ金属を蒸着する真空蒸着装置および方法に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum evaporation apparatus and method for depositing a metal or the like, particularly a metal having a polyhedral crystal orientation, onto a strip-shaped substrate such as a metal or the like.
第３図は従来の真空蒸着装置の例として真空蒸着亜鉛め
っき設備の一例を示す概略図である。FIG. 3 is a schematic diagram showing an example of vacuum evaporation galvanizing equipment as an example of a conventional vacuum evaporation apparatus.
帯鋼（１）はシール装置（３）を経て、図示しない真空
ポンプで排気された真空容器（２）内に送給され、加熱
型デフレクタロール（４）に巻き掛けられながら連続的
に通板される。一方るつぼ（５）内に収容された溶融亜
鉛（６ａ）は図示しない加熱源により加熱されて蒸気を
発生する。その亜鉛蒸気（６ａ）はチャンネル（７）に
導かれて、上記加熱型デフレクタロール（４）に巻掛け
られた帯１ｉＩ（１）の上記チャンネル（７）に囲まれ
た部分に達し、同帯鋼（１）の片面に蒸着される。The steel strip (1) passes through a sealing device (3), is fed into a vacuum container (2) that is evacuated by a vacuum pump (not shown), and is continuously threaded while being wound around a heated deflector roll (4). be done. On the other hand, molten zinc (6a) contained in the crucible (5) is heated by a heating source (not shown) to generate steam. The zinc vapor (6a) is led to the channel (7) and reaches the part of the band 1iI (1) wrapped around the heated deflector roll (4) surrounded by the channel (7). Deposited on one side of the steel (1).
なお（８）は亜鉛蒸気（６ａ）の量を制御するシャッタ
である。Note that (8) is a shutter that controls the amount of zinc vapor (6a).
第４図は、従来の真空蒸着設備の他の例として、蒸着装
置を２基設け、帯ｍ（＋１の表面と裏面の両面にそれぞ
れ所定膜厚の亜鉛蒸着を施す設備を示す。FIG. 4 shows, as another example of conventional vacuum evaporation equipment, an equipment that is equipped with two evaporation devices and performs zinc evaporation to a predetermined thickness on both the front and back surfaces of band m(+1).
前記従来の真空蒸着亜鉛めっき設備によれば、蒸着亜鉛
めっき完了後の帯鋼（＋）表面の光沢が、部分的に微妙
に異なっていた。その原因は次のように考えられる。According to the conventional vacuum evaporation galvanizing equipment, the gloss of the steel strip (+) surface after completion of the evaporation galvanizing differs slightly in some parts. The reason for this is thought to be as follows.
従来の設備においては、帯鋼（１）は亜鉛が蒸着される
前に加熱型デフレクタロール（４）に接触し、第３図に
示す角度θだけ巻掛けられる。その時帯鋼・ロール間の
接触圧力や帯鋼とロールの各表面粗度または表面密度が
不均一だと、帯鋼（１）の表面と加熱型デフレクタロー
ル（４）の表面との接触状態が部分的に異なるから、約
５００°Ｃに加熱されたデフレクタロール（４）から約
２００°Ｃ以上に加熱された帯鋼（１）への熱の伝達量
も部分的に異なってくる。そうすると基若開始前の帯鋼
（１）の表面温度が、長手方向あるいは幅方向に不均一
となる。In conventional installations, the steel strip (1) contacts a heated deflector roll (4) before being deposited with zinc and is wound through the angle θ shown in FIG. At that time, if the contact pressure between the steel strip and the rolls or the surface roughness or surface density of the steel strip and the rolls are uneven, the contact state between the surface of the steel strip (1) and the surface of the heated deflector roll (4) may be affected. Since they are partially different, the amount of heat transferred from the deflector roll (4) heated to about 500°C to the steel strip (1) heated to about 200°C or higher is also partially different. In this case, the surface temperature of the steel strip (1) before the start of aging becomes non-uniform in the longitudinal direction or the width direction.
本発明の発明者らの研究によれば、帯鋼表面に初期に蒸
着される亜鉛の結晶方位は帯鋼の表面温度に依存するこ
とが分っている。また、その後蒸着される亜鉛の結晶方
位は、すでに蒸着されている亜鉛の結晶方位と同じにな
る。したがって、帯鋼表面温度が帯鋼の板幅方向あるい
は長手方向に異なる場合には、初期に蒸着される亜鉛の
結晶方位が部分的に異なり、その後に蒸着される亜鉛の
結晶方位も部分的に異なる。その結果、蒸着完了後の蒸
着亜鉛めっき鋼板の表面光沢が部分的に異なって、商品
価値を左右することになる。According to research conducted by the inventors of the present invention, it has been found that the crystal orientation of zinc initially deposited on the surface of the steel strip depends on the surface temperature of the steel strip. Further, the crystal orientation of the zinc that is subsequently deposited is the same as the crystal orientation of the zinc that has already been deposited. Therefore, if the steel strip surface temperature differs in the width direction or longitudinal direction of the steel strip, the crystal orientation of the initially deposited zinc will partially differ, and the crystal orientation of the zinc deposited subsequently will also partially differ. different. As a result, the surface gloss of the vapor-deposited galvanized steel sheet after completion of vapor deposition differs locally, which affects its commercial value.
本発明は、前記従来の課題を解決するために、真空容器
と、同真空容器の中に配された加熱型デフレクタロール
と、同加熱型デフレクタロールに帯状基板を巻掛けて走
行させる手段と、上記加熱型デフレクタロールに巻掛け
られた上記帯状基板の面の一部を囲むチャンネルと、同
チャンネルの中に蒸着材の蒸気を供給する手段とを備え
たものにおいて、上記加熱型デフレクタロールに巻掛け
られる前の上記帯状基板の面の一部を囲むフラッシュコ
ート蒸着口と、同フラッシュコート蒸着口に上記蒸着材
の蒸気を供給する手段とを備えたことを特徴とする真空
蒸着装置； 真空容器と、同真空容器の中に配された加
熱型デフレクタロールと、同加熱型デフレクタロールに
帯状基板を巻掛けて走行させる手段と、上記加熱型デフ
レクタロールに巻掛けられた上記帯状基板の面の一部を
囲むチャンネルと、同チャンネルの中に蒸着材の蒸気を
供給する手段とを備えたものにおいて、上記加熱型デフ
レクタロールに巻掛けられる前の上記帯状基板の面の一
部を囲むフラッシュコート蒸着口と、同フラッシュコー
ト蒸着口と上記チャンネルとを連通ずるフードとを備え
たことを特徴とする真空蒸着装置； ならびに真空容器
内で帯状基板を加熱型デフレクタロールに巻掛けて走行
させながら蒸着材を上記帯状基板に蒸着する方法におい
て、上記加熱型デフレクタロールに巻付けられる前の上
記帯状基板に、あらかじめ上記蒸着材を微量蒸着させて
おくことを特徴とする真空蒸着方法を提案するものであ
る。In order to solve the above-mentioned conventional problems, the present invention includes a vacuum container, a heated deflector roll disposed in the vacuum container, a means for wrapping a strip substrate around the heating deflector roll and causing it to run. A device comprising: a channel surrounding a part of the surface of the strip substrate wound around the heated deflector roll; and means for supplying vapor of a vapor deposition material into the channel; A vacuum evaporation apparatus comprising: a flash coat evaporation port that surrounds a part of the surface of the strip-shaped substrate before it is hung; and means for supplying vapor of the evaporation material to the flash coat evaporation port; a heated deflector roll arranged in the vacuum container; a means for winding and running a strip substrate around the heating deflector roll; and a surface of the strip substrate wrapped around the heating deflector roll. A flash coat that surrounds a part of the surface of the strip-shaped substrate before being wound around the heated deflector roll, comprising a channel surrounding a part of the substrate and a means for supplying vapor of a vapor deposition material into the channel. A vacuum evaporation apparatus comprising a evaporation port and a hood that communicates the flash coat evaporation port with the channel; and a vacuum evaporation device that performs evaporation while running a strip-shaped substrate wrapped around a heated deflector roll in a vacuum container. The present invention proposes a vacuum evaporation method characterized in that a small amount of the evaporation material is vapor-deposited in advance on the band-shaped substrate before it is wound around the heated deflector roll. be.
〔作用］
本発明は前記のとおり構成されており、帯状基板が加熱
型デフレクタロールに巻掛けられる前の基板温度が均一
な時に、あらかじめ蒸着材と同じ物質を薄く微量蒸着（
フラッシュコートさせる。[Function] The present invention is configured as described above, and when the substrate temperature is uniform before the strip substrate is wound around the heated deflector roll, the same substance as the evaporation material is deposited in a small amount in advance (
Apply a flash coat.
基板温度が均一な時にフラッシュコートされた蒸着材は
、温度が結晶方位が均一になる。したがってその後の蒸
着時に、たとえ加熱型デフレクタロールと帯状基板との
接触不均一によって帯状基板の温度が不均一になっても
、その温度に関係なく、蒸着材の結晶方位は均一となる
。A vapor deposition material flash-coated when the substrate temperature is uniform has a uniform temperature and crystal orientation. Therefore, during subsequent vapor deposition, even if the temperature of the strip substrate becomes non-uniform due to non-uniform contact between the heated deflector roll and the strip substrate, the crystal orientation of the vapor deposition material will be uniform regardless of the temperature.
第１図は本発明の第１実施例を示す概略図である。この
図において、前記第３図および第４図により説明した従
来のものと同様な部分については、冗長になるのを避け
るため、同一の符号を付は詳しい説明を省く。FIG. 1 is a schematic diagram showing a first embodiment of the present invention. In this figure, in order to avoid redundancy, the same reference numerals are given to the same parts as those of the conventional apparatus explained with reference to FIGS. 3 and 4, and detailed explanation thereof will be omitted.
本実施例においては、加熱型デフレクタロール（４）の
手前の真空容Ｈ（２ａ）内に、フラッシュコート装置が
配置されている。このフラッシュコート装置は、帯状基
板（１）の一部の両面を囲むフラッシュコート蒸着口（
９ａ）と、溶融亜鉛（６ａ）を収容するるつぼ（５ａ）
と、亜鉛蒸気（６ｂ）を上記フラッシュコート蒸着口（
９ａ）まで導くフード（ｌｏａ）を具えている。In this embodiment, a flash coating device is arranged in the vacuum volume H (2a) in front of the heated deflector roll (4). This flash coat device has flash coat deposition ports (
9a) and a crucible (5a) containing molten zinc (6a)
Then, apply zinc vapor (6b) to the flash coat deposition port (
9a).
シール装置（３）を経て送られてくる帯鋼（１）は、図
示しない温度調整装置によって、板幅方向および長手方
向に２５０°〜２６０℃の範囲の均一な温度分布にあら
かじめ調整されている。その帯鋼（＋）はフラッシュコ
ート装置で１００Å以上の膜厚に亜鉛蒸気をフラノツユ
コートされる。そして、帯鋼両表面に蒸着された亜鉛の
結晶方位を均一に揃えた後、加熱型デフレクタロール（
４）に巻掛けられて走行しながら、片側の面に所定の膜
厚の亜鉛蒸着が繕される。この場合、フラッシュコート
装置でフラッシュコートされる時には帯鋼（＋１の温度
が均一であるから、フラッシュコートされた亜鉛膜の結
晶方位は均一な同一結晶方位となる。続いて加熱型デフ
レクタロール（４）に角度θだけ巻付きながら進入して
来た時に帯鋼の表面温度が不均一になっていてもここで
蒸着される亜鉛の結晶方位は、フラッシュコート時の亜
鉛の結晶方位と同一結晶方位で蒸着されるので、蒸着完
了後の亜鉛めっき鋼板表面の光沢も均一となり、表面光
沢むらが生じない。The steel strip (1) sent through the sealing device (3) is pre-adjusted to have a uniform temperature distribution in the range of 250° to 260° C. in the width direction and longitudinal direction by a temperature adjustment device (not shown). . The steel strip (+) is coated with zinc vapor to a thickness of 100 Å or more using a flash coater. After uniformly aligning the crystal orientation of the zinc deposited on both surfaces of the steel strip, the heated deflector roll (
4) While running while being wrapped around the wire, a predetermined thickness of zinc evaporation is applied to one surface. In this case, since the temperature of the strip steel (+1) is uniform when it is flash coated with a flash coater, the crystal orientation of the flash coated zinc film is uniform and the same crystal orientation.Subsequently, the heated deflector roll (4 ), the crystal orientation of the zinc deposited here is the same as the crystal orientation of the zinc during flash coating, even if the surface temperature of the steel strip is uneven when it enters the strip while being wrapped at an angle θ. Since the coating is vapor-deposited, the gloss of the surface of the galvanized steel sheet after the completion of vapor deposition is uniform, and uneven surface gloss does not occur.
なお上記フラッシュコート装置では、帯鋼（１）の表面
と裏面の両面にフラッシュコートが施される。In addition, in the said flash coating apparatus, flash coating is applied to both the front and back surfaces of the steel strip (1).
したがって、２基の蒸着装置を有する前記第４図の蒸着
設備に本実施例を適用すれば、最初の蒸着装置で片面に
、次の基若装置でもう一方の面に、それぞれ所定の膜厚
の亜鉛蒸着が施され、それら両面に蒸着された亜鉛の結
晶方位は、あらかじめフラッシュコートされた亜鉛の結
晶方位と同一であるから、帯鋼（１）両面の光沢は、帯
鋼の板幅方向および長手方向の全面にわたって均一とな
る。Therefore, if this embodiment is applied to the vapor deposition equipment shown in FIG. 4 which has two vapor deposition devices, the first vapor deposition device will provide a predetermined film thickness on one side, and the second vapor deposition device will provide a predetermined film thickness on the other surface. Since the crystal orientation of the zinc deposited on both sides is the same as the crystal orientation of the flash-coated zinc, the gloss on both sides of the steel strip (1) varies in the width direction of the steel strip. and uniform over the entire longitudinal direction.
次に本実施例の効果を確認するため行なった試験につい
て記す。Next, a test conducted to confirm the effects of this example will be described.
原着条件は、 帯鋼：厚さ０．５ｍｓ、幅９１４ｍ、 表面温度２５０℃±！℃、通板速度１４０ｍ／ｓｉｎ。The original dyeing conditions are Steel band: 0.5ms thick, 914m wide, Surface temperature 250℃±! °C, threading speed 140 m/sin.
真空度：２×１Ｏ−１ＴＯｒｒ
フラノシュコート二５０００人×２面
蒸着膜厚：５．６，１／ｌＸ２面
蒸着後の亜鉛の結晶方位は、０００２面が帯鋼表面に対
して平行に配列していた。表面光沢は均一な銀白色の美
麗な表面性状を呈し、従来の展着方法で見られた部分的
な光沢むらは全くなかった。Vacuum degree: 2 x 1 O-1 TOrr Furanosh coat 2 5000 people x 2 sides evaporation film thickness: 5.6, 1/l Was. The surface exhibited a beautiful, uniform silvery-white surface, and there was no local unevenness in the gloss that was observed with conventional spreading methods.
次に第２図は本発明の第２実施例を示す概略図である。Next, FIG. 2 is a schematic diagram showing a second embodiment of the present invention.
この図においても、前記と同様な部分については、同一
の符号を付は詳しい説明を省く。In this figure as well, parts similar to those described above are given the same reference numerals and detailed explanations will be omitted.
本実施例では、加熱型デフレクタロール（４）の手前の
真空容器（２）内に、帯鋼（＋）の面の一部を囲んでフ
ランジユニ１−ト蒸着口（９ｂ）が設けられており、そ
のフラッシュコート蒸着口（９ｂ）は、真空蒸着装置の
亜鉛蒸気（６ｂ）を案内するチャンネル（７）に、フー
ド（１０ｂ）によって連通している。こうしてフラッシ
ュコートＮ着口（９ｂ）とフード（１０ｂ）とでフラノ
ツユコート装置を形成している。In this embodiment, a flange unit vapor deposition port (9b) is provided in the vacuum container (2) in front of the heated deflector roll (4), surrounding a part of the surface of the steel strip (+). The flash coat deposition port (9b) communicates with a channel (7) for guiding zinc vapor (6b) of the vacuum deposition apparatus by means of a hood (10b). In this way, the flash coat N opening (9b) and the hood (10b) form a flannel coat device.
帯鋼（１）は、加熱型デフレクタロール（４）の手前の
フラッシュコート装置において、チャンネル（７）から
分岐してフード（１０ｂ）内を通って来た亜鉛蒸気（６
ｂ）により、あらかじめ１００Å以上の膜厚にフラッシ
ュコートされる。帯ｉｇ（１）の表面温度は、フラノツ
ユコート装置に帯鋼が到達する前に長手方向板幅方向に
均一に図示しない温度調整装置で調整されているので、
フラノツユコートされた時の亜鉛結晶方位は均一になっ
ている。したがってデフレクタロール（４）に角度θだ
け巻掛けられながら進入して来た帯鋼の表面温度がすで
に不均一になっていでも、チャンネル（７）に案内され
て来た亜鉛奈気（６ｂ）はフラッシュコート時の亜鉛の
結晶方位と同一結晶方位を以て蒸着されるので、蒸着完
了後の亜鉛めっき鋼板表面の光沢は均一なものが得られ
る。In the flash coater before the heated deflector roll (4), the strip steel (1) is coated with zinc vapor (6
In b), flash coating is performed in advance to a film thickness of 100 Å or more. The surface temperature of the strip ig (1) is adjusted uniformly in the longitudinal direction and width direction by a temperature adjustment device (not shown) before the steel strip reaches the Furanotsuyu coating device.
When coated with furanotsuyu, the zinc crystal orientation is uniform. Therefore, even if the surface temperature of the steel strip that enters the deflector roll (4) while being wound at an angle θ is already uneven, the zinc oxide (6b) that has been guided into the channel (7) will Since the zinc is deposited with the same crystal orientation as that of zinc during flash coating, the surface of the galvanized steel sheet after the deposition is completed has a uniform gloss.
次に本実施例の効果を＆′１１認した試験について述べ
る。Next, a test will be described in which the effects of this example were confirmed.
蒸着条件は、
帯鋼：厚さ０．８ｍｍ、幅９１４關、
表面温度２５０°Ｃ士ビＣ１通板速度１００ｍ／ｓｉｎ
。The deposition conditions are as follows: Steel strip: thickness 0.8mm, width 91mm, surface temperature 250°C, steel plate C1 threading speed 100m/sin
.
真空度： ２ Ｘｌ０−’Ｔｏｒｒ
フラッシュコート膜厚： ４０００人×２面蒸着膜厚ニ
ア／７１Ｘ２面
蒸着後の亜鉛の結晶方位は、０００２面が帯鋼表面に対
し平行に配列していた。また表面光沢は均一な銀白色の
美麗な表面性状を呈し、従来の原着方法で見られた部分
的な光沢むらは全く見られなかった。Vacuum degree: 2 Xl0-'Torr Flash coat film thickness: 4000 persons x 2-sided evaporation film thickness Near/71 In addition, the surface exhibited a beautiful, uniform silvery-white surface, and there were no local unevenness in gloss that was observed in conventional doping methods.
以上実施例によって説明したように、所定の膜厚の蒸着
物質を蒸着させる過程で、基板温度が不均一になる前、
すなわち温度が均一な状態の基板に、１００Å以上のフ
ラッシュコートを施して芸着物質の結晶方位を均一に揃
えておく。そうすると、続いて所定の膜厚の蒸着物質を
基板温度が不均一な状！専の基板に蒸着しても、この時
にはフラッシュコート時の結晶方位と同一の結晶方位が
基板全面にわたって現われ、蒸着めっきされた基板の表
面光沢が均一になる。また基板温度のレベルを変えるこ
とにより、基板全面にわたって結晶方位が全く異なる蒸
着膜を作ることができ、機械的、電気的、物理的または
化学的性能が異なる皮膜を得ることもできる。As explained above with reference to the embodiments, in the process of depositing a deposition material with a predetermined thickness, before the substrate temperature becomes non-uniform,
That is, a flash coat of 100 Å or more is applied to a substrate at a uniform temperature to uniformly align the crystal orientation of the material. Then, the material to be deposited to a predetermined thickness is deposited on the substrate at an uneven temperature! Even if the vapor is deposited on a special substrate, the same crystal orientation as that during flash coating appears over the entire surface of the substrate, and the surface gloss of the vapor-deposited substrate becomes uniform. Furthermore, by changing the substrate temperature level, it is possible to create deposited films with completely different crystal orientations over the entire surface of the substrate, and it is also possible to obtain films with different mechanical, electrical, physical, or chemical properties.
なお、フラッシュコートは、蒸着を必要とする基板面の
みでよく、片面原着の場合にはその片面のみに施せばよ
い。Note that flash coating may be applied only to the surface of the substrate that requires vapor deposition, and in the case of single-sided sputtering, it may be applied only to that one side.
本発明においては、真空蒸着装置の加熱型デフレクタロ
ールに巻掛けられる前の温度が均一な（１シ状基板に、
あらかじめ原着物質を薄く蒸着（フラッシュコート）さ
−υるようにしたので、加熱型デフレクタロールで帯状
基板の温度が不均一であっても、フラッシュコートさせ
たときの蒸着物質の結晶方位で蒸着できるので、蒸着さ
れた表面の光沢が均一な、美麗な製品を生産することが
できる。In the present invention, the temperature of the substrate is uniform before it is wrapped around the heated deflector roll of the vacuum evaporation apparatus (one sheet-like substrate is
Since the pre-deposited material is thinly vapor-deposited (flash coated) in advance, even if the temperature of the strip-shaped substrate is uneven with the heated deflector roll, the crystal orientation of the vapor-deposited material at the time of flash coating is maintained. As a result, it is possible to produce beautiful products with uniform gloss on the deposited surface.
第１図は本発明の第１実施例を示す概略図、第２図は本
発明の第２実施例を示す概略図、第３図は従来の真空蒸
着設備の一例を示す概略図、第４図は同じく他の例を示
す概略図である。
（１）・・・帯鋼、 （２）、（２ａ）・・・
真空容器、（３）・・・シール装置、（４）・・・加熱
型デフレクタロール、（５）、（５ａ）・・・るつぼ、
（６ａ）・・・溶融亜鉛、（６ｂ）・・・亜鉛蒸気
、 （７）・・・チャンネル、（８）・・・シャッタ
、
（９ａ） 、 （９ｂ）・・・フラッシュコート蒸着口
、（１０ａ） 、 （１０ｂ）−フード。
￥１図 Ｙ
１〜１帯翔Fig. 1 is a schematic diagram showing a first embodiment of the present invention, Fig. 2 is a schematic diagram showing a second embodiment of the invention, Fig. 3 is a schematic diagram showing an example of conventional vacuum evaporation equipment, and Fig. 4 is a schematic diagram showing an example of conventional vacuum evaporation equipment. The figure is a schematic diagram showing another example as well. (1)...Strip steel, (2), (2a)...
Vacuum container, (3)... Sealing device, (4)... Heated deflector roll, (5), (5a)... Crucible,
(6a)... Molten zinc, (6b)... Zinc vapor, (7)... Channel, (8)... Shutter, (9a), (9b)... Flash coat vapor deposition port, ( 10a), (10b) - Hood. ¥1 figure Y 1-1 Obi Sho
Claims (1)
レクタロールと、同加熱型デフレクタロールに帯状基板
を巻掛けて走行させる手段と、上記加熱型デフレクタロ
ールに巻掛けられた上記帯状基板の面の一部を囲むチャ
ンネルと、同チャンネルの中に蒸着材の蒸気を供給する
手段とを備えたものにおいて、上記加熱型デフレクタロ
ールに巻掛けられる前の上記帯状基板の面の一部を囲む
フラッシュコート蒸着口と、同フラッシュコート蒸着口
に上記蒸着材の蒸気を供給する手段とを備えたことを特
徴とする真空蒸着装置。 ２）真空容器と、同真空容器の中に配された加熱型デフ
レクタロールと、同加熱型デフレクタロールに帯状基板
を巻掛けて走行させる手段と、上記加熱型デフレクタロ
ールに巻掛けられた上記帯状基板の面の一部を囲むチャ
ンネルと、同チャンネルの中に蒸着材の蒸気を供給する
手段とを備えたものにおいて、上記加熱型デフレクタロ
ールに巻掛けられる前の上記帯状基板の面の一部を囲む
フラッシュコート蒸着口と、同フラッシュコート蒸着口
と上記チャンネルとを連通するフードとを備えたことを
特徴とする真空蒸着装置。 ３）真空容器内で帯状基板を加熱型デフレクタロールに
巻掛けて走行させながら蒸着材を上記帯状基板に蒸着す
る方法において、上記加熱型デフレクタロールに巻付け
られる前の上記帯状基板に、あらかじめ上記蒸着材を微
量蒸着させておくことを特徴とする真空蒸着方法。[Scope of Claims] 1) A vacuum container, a heated deflector roll disposed in the vacuum container, a means for winding and running a belt-shaped substrate around the heated deflector roll, and a heating deflector roll arranged in the heated deflector roll. A device comprising a channel surrounding a part of the surface of the band-shaped substrate wrapped around the substrate, and a means for supplying vapor of a vapor deposition material into the channel, the band-shaped substrate before being wound around the heated deflector roll. 1. A vacuum evaporation apparatus comprising: a flash coat evaporation port surrounding a part of the surface of a substrate; and means for supplying vapor of the evaporation material to the flash coat evaporation port. 2) a vacuum container, a heated deflector roll disposed in the vacuum container, a means for winding and running a strip-like substrate around the heating deflector roll, and the strip-shaped substrate wrapped around the heating deflector roll. A part of the surface of the strip-shaped substrate before being wound around the heated deflector roll, in a device comprising a channel surrounding a part of the surface of the substrate and a means for supplying vapor of a vapor deposition material into the channel. A vacuum evaporation apparatus comprising: a flash coat evaporation port surrounding the evaporation port; and a hood communicating the flash coat evaporation port and the channel. 3) In a method in which a vapor deposition material is deposited on the strip-shaped substrate while the strip-shaped substrate is wound around a heated deflector roll and run in a vacuum container, the above-mentioned vapor deposition material is preliminarily applied to the strip-shaped substrate before being wound around the heated deflector roll. A vacuum evaporation method characterized by depositing a small amount of evaporation material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011927A JPH0765160B2 (en) | 1990-01-23 | 1990-01-23 | Vacuum deposition apparatus and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011927A JPH0765160B2 (en) | 1990-01-23 | 1990-01-23 | Vacuum deposition apparatus and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03219070A true JPH03219070A (en) | 1991-09-26 |
| JPH0765160B2 JPH0765160B2 (en) | 1995-07-12 |
Family
ID=11791313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011927A Expired - Fee Related JPH0765160B2 (en) | 1990-01-23 | 1990-01-23 | Vacuum deposition apparatus and method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0765160B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010121204A (en) * | 2008-10-22 | 2010-06-03 | Fujikura Ltd | Film deposition method and film deposition apparatus |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0211767A (en) * | 1988-06-29 | 1990-01-16 | Kawasaki Steel Corp | Continuous dry plating apparatus for long material |
-
1990
- 1990-01-23 JP JP2011927A patent/JPH0765160B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0211767A (en) * | 1988-06-29 | 1990-01-16 | Kawasaki Steel Corp | Continuous dry plating apparatus for long material |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010121204A (en) * | 2008-10-22 | 2010-06-03 | Fujikura Ltd | Film deposition method and film deposition apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0765160B2 (en) | 1995-07-12 |
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