JPH0322314B2 - - Google Patents

Info

Publication number
JPH0322314B2
JPH0322314B2 JP55088587A JP8858780A JPH0322314B2 JP H0322314 B2 JPH0322314 B2 JP H0322314B2 JP 55088587 A JP55088587 A JP 55088587A JP 8858780 A JP8858780 A JP 8858780A JP H0322314 B2 JPH0322314 B2 JP H0322314B2
Authority
JP
Japan
Prior art keywords
chromium
matte
steel plate
offset
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55088587A
Other languages
Japanese (ja)
Other versions
JPS5637192A (en
Inventor
Noeru Jannmari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9227397&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPH0322314(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Individual filed Critical Individual
Publication of JPS5637192A publication Critical patent/JPS5637192A/en
Publication of JPH0322314B2 publication Critical patent/JPH0322314B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/04Printing plates or foils; Materials therefor metallic
    • B41N1/08Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/10Printing plates or foils; Materials therefor metallic for lithographic printing multiple
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/04Printing plates or foils; Materials therefor metallic
    • B41N1/08Printing plates or foils; Materials therefor metallic for lithographic printing

Landscapes

  • Printing Plates And Materials Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Laminated Bodies (AREA)

Description

【発明の詳細な説明】 本発明はクロム薄層によつて艶消しとした親水
性表面を有するオフセツト版に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an offset plate having a hydrophilic surface made matte by a thin layer of chrome.

親水性表面を呈する版を利用してオフセツトを
複製する方法は既知である。この親水性表面は、
艶消しとするのが好適で、この艶消しは、一方に
おいては、印刷に際し制御作用を容易とし、他方
においてこの表面上に感光層を被着し易くする利
点がある。
Methods of replicating offsets using plates exhibiting hydrophilic surfaces are known. This hydrophilic surface is
A matt finish is preferred, which has the advantage, on the one hand, of facilitating control during printing and, on the other hand, of facilitating the application of the photosensitive layer on this surface.

この艶消しは、親水性材料表面を機械的、化学
的または電気化学的に処理して得ることができ
る。
This mattness can be obtained by mechanically, chemically or electrochemically treating the surface of the hydrophilic material.

オフセツト版の親水性表面を具現するためにク
ロムを利用することは既知である。この場合に用
いるクロム層は、その耐久性親水性に優れ、場合
によつては外観が美しい利点がある。実際上、斯
るクロム層表面は艶消しとすることができる。艶
消し表面を有するクロム層を電気化学的に得るた
めに、電解浴を低温(例えば5℃ないし8℃)で
利用する方法と、電解浴を常温(25℃ないし35
℃)よりは低い温度で利用し、クロムの堆積中に
電流を断続する方法との2通りの方法が既知であ
る。しかし既知の何れの方法でも、クロム層(輝
表面または艶消し表面を有するもの)で、オフセ
ツト版の親水性層の役割を果すものは、その厚さ
が厚い必要がある(1ミクロン以上、一般に1.5
ミクロンないし2.8ミクロン) 厚さが1ミクロン以下のクロム親水性層を、場
合によつては支持体上に堆積することは提案され
ている。しかし斯る極めて薄いクロム親水性層
は、耐久性に富む親水性層としての役目を果さな
い。その理由は極めて薄いクロム親水性層は甚だ
傷つき易く、且つ多孔質なため、オフセツト複製
にあたり許容できない性質の表面を呈するためで
ある。
It is known to utilize chromium to implement hydrophilic surfaces of offset plates. The chromium layer used in this case has the advantage of being excellent in durability and hydrophilicity, and in some cases having a beautiful appearance. In practice, the surface of such a chromium layer can be matte. In order to electrochemically obtain a chromium layer with a matte surface, there are two methods: using an electrolytic bath at a low temperature (for example, 5°C to 8°C), and using an electrolytic bath at room temperature (25°C to 35°C).
Two methods are known: a method using a temperature lower than 0.degree. C.) and a method in which the current is interrupted during the chromium deposition. However, in all known methods, the chromium layer (with bright or matte surface), which serves as the hydrophilic layer of the offset plate, must be thick (more than 1 micron, generally 1.5
It has been proposed to optionally deposit a chromium hydrophilic layer with a thickness of 1 micron or less on the support. However, such a very thin chromium hydrophilic layer does not serve as a durable hydrophilic layer. This is because the extremely thin chromium hydrophilic layer is highly sensitive and porous, presenting a surface with unacceptable properties for offset replication.

本発明の目的は耐久性に富み、オフセツト複製
に好適なオフセツト版を提供せんとするにある。
An object of the present invention is to provide an offset plate that is highly durable and suitable for offset duplication.

本発明オフセツト版は、その親水性表面として
利用しうる既知の輝親水性表面を具え、その少な
く共1部分に艶消し多孔性クロム層を被覆し、該
クロム層の厚さは1ミクロンよりも薄く、好まし
くは0.5ミクロンよりも薄いことを特徴とする。
The offset plate of the present invention comprises a known bright hydrophilic surface which can be used as its hydrophilic surface and is coated in at least one portion with a matt porous chromium layer, the chromium layer having a thickness of less than 1 micron. Characterized by being thin, preferably thinner than 0.5 micron.

即ち本発明で、オフセツトに利用しうる親水性
表面上に、極めて薄い艶消しクロム層を堆積する
と、その相対多孔性及び脆弱性が許容しうるもの
となる。その理由は、その下側表面は、親水性で
はあるが最終材料表面を艶消しとするために利用
できるためである。
That is, the present invention deposits a very thin layer of matte chrome on a hydrophilic surface that can be used for offset, so that its relative porosity and brittleness are acceptable. The reason is that its lower surface, although hydrophilic, can be used to make the final material surface matte.

本発明を利用して艶消しとなしうる親水性表面
は、現在オフセツト版に利用しうる親水性表面と
して認められている表面全部である。
Hydrophilic surfaces that can be made matte using the present invention are all surfaces that are currently recognized as hydrophilic surfaces that can be used in offset plates.

これがため、非酸化性鋼、錫・ニツケル合金、
クロム夫自体、クロムの酸化クロム表面(或る貯
蔵箱用として鋼を被覆)ニツケル・燐・錫合金及
びニツケル合金の如き硬質材料の輝または半輝表
面を、クロム薄層によつて艶消しとすることがで
きる。
This is why non-oxidizing steel, tin/nickel alloys,
The chromium itself can be used to mattify the bright or semi-bright surfaces of hard materials such as chromium oxide surfaces (coating steel for certain storage boxes), nickel-phosphorus-tin alloys, and nickel alloys with a thin layer of chromium. can do.

場合によつては、亜鉛または錫の如き軟質、輝
材料表面を艶消しとすることができる。しかし斯
る金属(特に錫)の場合には、硬質表面上に堆積
した錫薄層表面(即ち1ミクロン以下の厚さ)の
みを艶消しとするだけである。
In some cases, the surface of soft, bright materials such as zinc or tin can be matte. However, in the case of such metals (especially tin), only the surface of a thin layer of tin (ie less than 1 micron thick) deposited on a hard surface becomes matte.

本発明によりクロムを艶消し堆積するために
は、既知の電気化学技術を立用し、冷浴を用いる
か、堆積の際、電流を遮断する。しかしクロムま
たは錫表面上にクロムを堆積する際に、常温(25
℃ないし35℃)よりも低い温度で浴を利用し、電
流を遮断することなく艶消しクロムを直接に堆積
することができる。
To deposit chromium in a matt manner according to the present invention, known electrochemical techniques are utilized, either using a cold bath or by interrupting the electrical current during deposition. However, when depositing chromium on chromium or tin surfaces, room temperature (25
Matte chrome can be deposited directly using a bath at temperatures lower than 35°C (35°C to 35°C) without interrupting the electrical current.

本発明を実施例について説明する。 The present invention will be described with reference to examples.

例 1 厚さが35/100で、輝表面を呈する非酸化性鋼板
を利用した。この鋼板を陽極として脱脂し、水洗
し、次いで既知のクロム浴(無水クロム250g/
と、硫酸2.5g/、温度28℃)中に浸した。
鋼板を陰極に接続し、クロム浴中に浸した後、15
秒間電流(15A/dcm2)を通し、クロム堆積後15
秒で電流を遮断すると、堆積クロムの厚さが0.3
ミクロンとなつた。
Example 1 A non-oxidizing steel plate with a thickness of 35/100 and a bright surface was used. This steel plate was used as an anode to degrease it, wash it with water, and then use a known chromium bath (anhydrous chromium 250g/
and 2.5 g of sulfuric acid at a temperature of 28°C).
After connecting the steel plate to the cathode and immersing it in a chrome bath, 15
Pass current (15A/dcm 2 ) for 15 seconds after chromium deposition.
When the current is interrupted in seconds, the thickness of the deposited chromium is 0.3
It became a micron.

斯くして艶消し板を得ることができた。この板
に市販の印刷可能な感光層(PCAS)(厚さは約
1.8ミクロン)を被覆した。乾燥(45℃で3分間
次いで85℃で5分間)後、板が完成した。
In this way, a matte board could be obtained. This board is coated with a commercially available printable photosensitive layer (PCAS) (thickness approx.
1.8 microns). After drying (3 minutes at 45°C and 5 minutes at 85°C) the board was completed.

次いでこの板を、オフセツト法で、既知の様に
利用した。すなわち日光焼付、可溶部分除去、ゴ
ム引等を行つた。
This plate was then utilized in a known manner in the offset method. That is, sunlight baking, removal of soluble parts, rubberization, etc. were performed.

この板は、オフセツト機に利用することができ
た。この場合以下の事実を確めた。
This board could be used in an offset machine. In this case, the following facts were confirmed.

−印刷層は、艶消しクロム表面上に完全に被着さ
れていた。
- The printing layer was completely deposited on the matte chrome surface.

−親水性部分はその作用が良好であつた。-The action of the hydrophilic part was good.

60000枚印刷後、艶消しクロムには紙中に含有
されている成分によつて縞が現われ、この縞は非
酸化鋼に生ずるも、印刷には影響の無いことを確
めた。
After printing 60,000 sheets, stripes appeared on the matte chrome due to the components contained in the paper, and although these stripes occur on non-oxidized steel, it was confirmed that they did not affect the printing.

例 2 厚さが35/100のUSINOR社のオフセツト性鋼
板を利用した。
Example 2 A USINOR offset steel plate with a thickness of 35/100 was used.

脱脂、水洗、酸洗い後、鋼板を、 無水クロム 250g/ 硫 酸 2g/ 温 度 45℃ 電流密度 15A/dcm2 のクロム浴中に浸し、鋼板の両側に、硬質輝クロ
ムを0.6ミクロンの厚さに堆積した。
After degreasing, washing with water, and pickling, the steel plate is immersed in a chromium bath with 250g of anhydrous chromium/2g of sulfuric acid/temperature: 45℃ and current density of 15A/ dcm2 , and hard bright chromium is applied to a thickness of 0.6 microns on both sides of the steel plate. was deposited on.

斯くして鋼板の両面に、平滑、硬質な輝クロム
層を被覆し、取扱中良好な保護を達成できた。
In this way, both sides of the steel plate were coated with a smooth, hard bright chromium layer, achieving good protection during handling.

この鋼板を上述した所と同様の成分のクロム電
解浴中に浸し、28℃の温度とし、密度30A/dcm2
の電流を流し、鋼板片側の艶消しクロムの厚さを
0.4ミクロンとすることができた。
This steel plate was immersed in a chromium electrolytic bath with the same composition as described above, at a temperature of 28°C, and at a density of 30A/dcm 2 .
The thickness of the matte chrome on one side of the steel plate is
It was possible to make it 0.4 micron.

斯くして両側に平滑クロム層を被覆し、片側に
オフセツトに利用し得る艶消しクロム表面を被覆
した保護板を得ることができた。次いで艶消し面
上に印刷感光層を堆積し、オフセツト版を完成し
た。
In this way, it was possible to obtain a protective plate coated with smooth chrome layers on both sides and with a matte chrome surface coated on one side that can be used for offset. A printed photosensitive layer was then deposited on the matte surface to complete the offset plate.

例 3 出発板として、SOLLAC社で市販のクロム鋼
板を利用した。
Example 3 A commercially available chrome steel plate from SOLLAC was used as the starting plate.

炭酸ナトリウム(100g/)の浴中で熱間
(65℃)脱脂した後、鋼板を陰極とし、鋼板をク
ロム浴中に浸し、その片面に艶消し薄層(例えば
厚さ0.3ミクロン)を堆積させた。
After hot (65°C) degreasing in a bath of sodium carbonate (100 g/), a thin matte layer (e.g. 0.3 microns thick) is deposited on one side of the steel plate by immersing it in a chromium bath with the steel plate as the cathode. Ta.

出発板として以下の鋼板を利用して同様の実験
を行つた。
Similar experiments were conducted using the following steel plates as starting plates.

−USINOR社の鋼板(厚さ35/100)上に、錫・
ニツケル合金の厚さ0.9ミクロンの層を堆積し
た。
−On top of USINOR steel plate (thickness 35/100), tin
A 0.9 micron thick layer of nickel alloy was deposited.

−錫鋼板(厚さ35/100、FER BLANC社で市販
のEI鋼板)で、各側のm2に付2.8gの錫を含有
するものを用いた。
- A tin steel plate (thickness 35/100, EI steel plate available from FER BLANC) containing 2.8 g of tin per m 2 on each side was used.

−厚さ35/100の鋼板で、その表面に砂を吹付けた
ものを用いた。この鋼板上に、電解中電流を遮
断することなく艶消しクロム(厚さ1ミクロン
以下)を堆積した。
- A 35/100 thick steel plate with sand sprayed on its surface was used. Matte chrome (less than 1 micron thick) was deposited on this steel plate without interrupting the current during electrolysis.

−USINOR社の鋼板(厚さ35/100)の両側上に、
WALBERG社よりW.S.A.2300として市販の微
小亀裂型クロム板を42℃で0.6ミクロンだけ堆
積した。この型のクロムは耐腐蝕抵抗が優れて
いた。
−On both sides of USINOR steel plate (thickness 35/100),
A microcracked chrome plate commercially available as WSA2300 from WALBERG was deposited at 42°C to a thickness of 0.6 microns. This type of chromium had excellent corrosion resistance.

−USINOR社の鋼板(厚さ35/100)の両側上に、
WALBERG社でW.S.A.2650なる商品名で市販
の無亀裂クロムを厚さ0.6ミクロンだけ65℃で
堆積した。この型のクロムは耐腐蝕抵抗が優れ
ていた。
−On both sides of USINOR steel plate (thickness 35/100),
Crack-free chromium, commercially available from WALBERG under the trade name WSA2650, was deposited to a thickness of 0.6 microns at 65°C. This type of chromium had excellent corrosion resistance.

斯く製造した板は何れも、オフセツト版として
良好で、光硬化処理を施こす必要なく、40000枚
を印刷することができた。
All of the plates thus produced were good as offset plates, and 40,000 plates could be printed without the need for photocuring.

Claims (1)

【特許請求の範囲】 1 オフセツト版の親水性表面として利用しうる
既知の輝親水性表面を具え、その少なくとも1部
分に、艶消し多孔性クロム層を被覆し、該クロム
層の厚さは1ミクロンよりも薄いことを特徴とす
るオフセツト版。 2 上記クロム層の厚さが0.5ミクロンよりも薄
い特許請求の範囲第1項記載のオフセツト版。
[Scope of Claims] 1. A plate comprising a known bright hydrophilic surface that can be used as a hydrophilic surface for an offset plate, at least a portion of which is coated with a matte porous chromium layer, the chromium layer having a thickness of 1 An offset version that is thinner than a micron. 2. An offset plate according to claim 1, wherein the chromium layer has a thickness of less than 0.5 microns.
JP8858780A 1979-07-02 1980-07-01 Offset block Granted JPS5637192A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7917153A FR2460211A1 (en) 1979-07-02 1979-07-02 NEW OFFSET PLATE WITH SURFACE MATT CHROMED

Publications (2)

Publication Number Publication Date
JPS5637192A JPS5637192A (en) 1981-04-10
JPH0322314B2 true JPH0322314B2 (en) 1991-03-26

Family

ID=9227397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8858780A Granted JPS5637192A (en) 1979-07-02 1980-07-01 Offset block

Country Status (8)

Country Link
EP (1) EP0022033B1 (en)
JP (1) JPS5637192A (en)
BR (1) BR8004111A (en)
CA (1) CA1133755A (en)
DE (1) DE3069101D1 (en)
ES (1) ES492985A0 (en)
FR (1) FR2460211A1 (en)
MX (1) MX156999A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2480676A1 (en) * 1980-04-16 1981-10-23 Nouel Jean Marie NEW OFFSET STEEL PLATES USING CHROME OXIDE SURFACES
FR2529511A1 (en) * 1982-07-02 1984-01-06 Nouel Jean Marie OFFSET PLATES BASED STEEL AND CHROME MULTILAYER
JPS6131355A (en) * 1984-07-20 1986-02-13 工業技術院長 Graphite-boron carbide sliding member
US4911075A (en) * 1988-08-19 1990-03-27 Presstek, Inc. Lithographic plates made by spark discharges
JPH02131992A (en) * 1989-06-14 1990-05-21 Konica Corp Support for lithographic printing plate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5131507A (en) * 1974-09-11 1976-03-17 Fuji Photo Film Co Ltd OFUSETSUTOINSATSUBANYOSHIJITAI

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB475902A (en) * 1936-05-29 1937-11-29 Arthur Ronald Trist Improvements in and relating to printing plates for lithography
GB640470A (en) * 1947-09-04 1950-07-19 Coates Brothers & Co Improvements in the manufacture of lithographic printing plates
DE806315C (en) * 1949-10-18 1951-06-14 Roman Freundorfer Offset printing plate and method of making the same
FR82759E (en) * 1962-09-27 1964-04-17 Le Quadrimetal Offset Sa Pour Offset printing process and resulting industrial products
GB1172517A (en) * 1965-12-02 1969-12-03 Rotaprint Ltd Photochemical Production of Plates for Offset Lithography
BE779229A (en) * 1972-02-10 1972-05-30 Centre Rech Metallurgique Offset printing plates - have a steel support with a chromium layer and a radiation sensitive layer,prodn
FR2442722A1 (en) * 1978-11-29 1980-06-27 Nouel Jean Marie NEW AQUAPHILE LAYER FOR OFFSET PRINTING PLATES AND OBTAINED PLATES

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5131507A (en) * 1974-09-11 1976-03-17 Fuji Photo Film Co Ltd OFUSETSUTOINSATSUBANYOSHIJITAI

Also Published As

Publication number Publication date
ES8200273A1 (en) 1981-10-16
BR8004111A (en) 1981-01-21
JPS5637192A (en) 1981-04-10
FR2460211B1 (en) 1984-07-06
DE3069101D1 (en) 1984-10-11
ES492985A0 (en) 1981-10-16
MX156999A (en) 1988-10-19
CA1133755A (en) 1982-10-19
FR2460211A1 (en) 1981-01-23
EP0022033B1 (en) 1984-09-05
EP0022033A1 (en) 1981-01-07

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