EP0022033A1 - Lithographic printing plates with hydrophilic surface matted with a thin chrome layer - Google Patents
Lithographic printing plates with hydrophilic surface matted with a thin chrome layer Download PDFInfo
- Publication number
- EP0022033A1 EP0022033A1 EP80400982A EP80400982A EP0022033A1 EP 0022033 A1 EP0022033 A1 EP 0022033A1 EP 80400982 A EP80400982 A EP 80400982A EP 80400982 A EP80400982 A EP 80400982A EP 0022033 A1 EP0022033 A1 EP 0022033A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- chromium
- layer
- hydrophilic surface
- micron
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 44
- 230000005660 hydrophilic surface Effects 0.000 title claims abstract description 13
- 238000007639 printing Methods 0.000 title abstract description 3
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 23
- 239000011651 chromium Substances 0.000 claims abstract description 23
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 239000010935 stainless steel Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 claims description 2
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 claims 1
- 229910000831 Steel Inorganic materials 0.000 abstract description 8
- 239000010959 steel Substances 0.000 abstract description 8
- 238000007645 offset printing Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 21
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 229910000669 Chrome steel Inorganic materials 0.000 description 1
- 241001080024 Telles Species 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 230000000384 rearing effect Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/10—Printing plates or foils; Materials therefor metallic for lithographic printing multiple
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
Definitions
- the present invention relates to new offset plates, the hydrophilic surface of which has been made "matt" by means of a thin layer of chromium.
- offset reproduction methods use plates having a surface of hydrophilic nature. This same surface should advantageously be matt, this mattness being advantageous on the one hand, to facilitate the control work at the time of printing and on the other hand, to facilitate the attachment, on this surface, of a photosensitive layer .
- This mattness can be obtained by treating the support of the plate or the surface in a material of hydrophilic nature by methods which call for an attack on said surface, either mechanically, chemically or electrochemically.
- chromium has been widely described for producing the hydrophilic surface of an offset plate.
- the chrome layers employed have notable advantages with regard to their hardness, their hydrophilicity and possibly their appearance. Indeed, these chromium layers can have a mat surface.
- Two methods are known for electrochemically obtaining a layer of chromium with a mat surface, one consisting in using an electrolytic bath at low temperature (5 to 8 ° C. for example) and the other consisting in using an electrolytic bath at temperature below normal (25 to 35 ° C) but by performing an interruption of the electric current while carrying out said deposit. But in all known cases the chromium layer (with a shiny or mat surface) which must play the role of aquaphile layer of the offset plates must have a notable thickness (clearly greater than 1 micron and generally from 1.5 to 2.8 microns ).
- hydrophilic chromium layers with a thickness of less than 1 micron could possibly be deposited on supports. But taking into account the examples provided, the specialists are well aware that the very thin layers recommended cannot play their role of hard aquaphile layers because they are scratched too easily and are often porous thus leaving appear an underlying surface with the properties unacceptable in offset reproduction. .
- the invention therefore consists in depositing on a surface having hydrophilic properties which can be used in the sense of offset, a very thin layer of matt chromium, the relative porosity and brittleness of which will be accepted precisely because the underlying surface is hydrophilic and encrophobic, but which one will use to make "mat" the surface of the final material.
- hydrophilic surfaces which can be made "matt" using the invention are all the surfaces which, to date, have been considered as hydrophilic surfaces usable in offset plates.
- a 35/100 thick stainless steel plate with a shiny surface is used.
- This plate is degreased in anode, rinsed and then immersed in a conventional chromium bath (250 g / 1 of chromic anhydride and 2.5 g of sulfuric acid per liter-temperature 28 °).
- the plate is connected to the cathode; the current (15A dcm2) is switched on 15 seconds after immersion of the plate and is maintained until the chromium deposit has reached 0.3 micron in thickness with a power cut 15 seconds after the start of the deposit of chrome.
- a matte appearance plate is obtained.
- the plate is covered with a layer (approximately 1.8 microns thick) of photosensitive commercial printer (PCAS). After drying (3 min at 45 ° C and 5 min at 85 ° C) the plate is ready.
- PCAS photosensitive commercial printer
- the plate is then used as known in offset processes: insolation, rearing of soluble parts, exfoliation, etc.
- the plate is thus covered with a smooth, hard and shiny layer of chromium which will provide it with good protection during handling.
- This plate is then immersed in an electrolytic chromium bath with a composition identical to that of the bath described above, but it is operated at a temperature of 28 ° C. and is deposited, under 30 A by square decimetre, on only one of the faces of the plate a thickness of matt chrome of 0.4 micron.
- a plate is thus obtained protected on all its faces by a layer of smooth chrome and which comprises, on one of its faces, a surface of matt chrome usable in offset.
- a photosensitive printer layer is then deposited on the mat surface and a ready-made offset plate is obtained.
- a chromed steel plate sold by the company SOLLAC is used as the starting plate.
- the plate After hot degreasing (65 ° C) in a sodium carbonate bath (100 g / l), the plate being cathode, the plate is introduced into a chromium bath in order to achieve, on one of its faces, the deposit of a thin layer (0.3 micron for example) of matt chrome.
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Cell Electrode Carriers And Collectors (AREA)
- Laminated Bodies (AREA)
Abstract
Description
La présente invention concerne de nouvelles plaques offset dont la surface hydrophile a été rendue "mate" grâce à.une couche mince de chrome.The present invention relates to new offset plates, the hydrophilic surface of which has been made "matt" by means of a thin layer of chromium.
On sait que les procédés de reproduction offset utilisent des plaques présentant une surface de nature hydrophile. Cette même surface doit avantageusement être mate, cette matité étant intéressante d'une part, pour faciliter le travail de contrôle au moment de l'impression et d'autre part, pour faciliter l'accrochage, sur cette surface, d'une couche photosensible.It is known that offset reproduction methods use plates having a surface of hydrophilic nature. This same surface should advantageously be matt, this mattness being advantageous on the one hand, to facilitate the control work at the time of printing and on the other hand, to facilitate the attachment, on this surface, of a photosensitive layer .
Cette matité peut s'obtenir en traitant le supportde la plaque ou la surface en un matériau de nature hydrophile par des procédés qui font appel à une attaque de ladite surface,soit mécaniquement, soit chimiquement, soit électrochimiquement.This mattness can be obtained by treating the support of the plate or the surface in a material of hydrophilic nature by methods which call for an attack on said surface, either mechanically, chemically or electrochemically.
On a de plus largement décrit l'utilisation du chrome pour la réalisation de la surface hydrophile d'une plaque offset. Les couches de chromes employées présentent des avantages notables en ce qui concerne leur dureté, leur hydrophilie et éventuellement leur aspect. En effet ces couches de chrome peuvent présenter une surface mate. Pour obtenir électrochimiquement une couche de chrome à surface mate on connaît deux procédés , l'un consistant à utiliser un bain électrolytique à basse température (5 à 8°C par exemple) et l'autre consistant à utiliser un bain électrolytique à température inférieure à la normale (25 é 35 °C) mais en réalisant une interruption du courant électrique pendant que l'on effectue ledit dépot. Mais dans tous les cas connus la couche de chrome (à surface brillante ou mate) qui doit jouer le rôle de couche aquaphile des plaques offset doit avoir une épaisseur notable (nettement supérieure à 1 micron et généralement de 1,5 à 2,8 microns).In addition, the use of chromium has been widely described for producing the hydrophilic surface of an offset plate. The chrome layers employed have notable advantages with regard to their hardness, their hydrophilicity and possibly their appearance. Indeed, these chromium layers can have a mat surface. Two methods are known for electrochemically obtaining a layer of chromium with a mat surface, one consisting in using an electrolytic bath at low temperature (5 to 8 ° C. for example) and the other consisting in using an electrolytic bath at temperature below normal (25 to 35 ° C) but by performing an interruption of the electric current while carrying out said deposit. But in all known cases the chromium layer (with a shiny or mat surface) which must play the role of aquaphile layer of the offset plates must have a notable thickness (clearly greater than 1 micron and generally from 1.5 to 2.8 microns ).
On a déjà suggéré que l'on pourrait éventuellement déposer sur des supports, des couches hydrophiles de chrome d'épaisseur inférieure à 1 micron. Mais compte tenu des exemples fournis, les spécialistes savent bien que les couches très minces préconisées ne peuvent jouer leur rôle de couches dures aquaphiles car elles se rayent trop facilement et sont souvent poreuses laissant ainsi apparaitre une surface sous jacente aux propriétés inacceptables dans la reproduction offset.It has already been suggested that hydrophilic chromium layers with a thickness of less than 1 micron could possibly be deposited on supports. But taking into account the examples provided, the specialists are well aware that the very thin layers recommended cannot play their role of hard aquaphile layers because they are scratched too easily and are often porous thus leaving appear an underlying surface with the properties unacceptable in offset reproduction. .
Il a été trouvé, et c'est là l'objet de la présente invention; qu'il est possible de rendre mate la surface d'un matériau hydrophile brillant, utilisable comme surface hydrophile d'une plaque offset, en déposant sur cette surface une couche d'épaisseur inférieure à 1 micron et de préférence inférieure à 0,5 micron de chrome mat et poreux.It has been found, and this is the object of the present invention; that it is possible to matt the surface of a hydrophilic glossy material, usable as hydrophilic surface of an offset plate, by depositing on this surface a layer of thickness less than 1 micron and preferably less than 0.5 micron of matt and porous chrome.
L'invention consiste donc à déposer sur une surface présentant des propriétés hydrophiles utilisables au sens de l'offset, une très mince couche de chrome mat, dont on acceptera la porosité et la fragilité relatives précisément parce que la surface sous-jacente est hydrophile et encrophobe, mais que l'on utilisera pour rendre "mate" la surface du matériau final.The invention therefore consists in depositing on a surface having hydrophilic properties which can be used in the sense of offset, a very thin layer of matt chromium, the relative porosity and brittleness of which will be accepted precisely because the underlying surface is hydrophilic and encrophobic, but which one will use to make "mat" the surface of the final material.
Les surfaces hydrophiles que l'on peut rendre "mate" en utilisant l'invention sont toutes les surfaces qui, à ce jour, ont été considéréescomme des surfaces hydrophiles utilisables dans les plaques offset.The hydrophilic surfaces which can be made "matt" using the invention are all the surfaces which, to date, have been considered as hydrophilic surfaces usable in offset plates.
Ainsi on peut "mater" à l'aide d'une couche mince de chrome des surfaces brillantes ou semi-brillantes de matériaux durs tels que l'acier inoxydable, l'étain-nickel, le chrome lui-même, les surfaces chrome-oxyde de chrome (dont on revêt l'acier pour certaines boites de conserves), le nickel-phosphore, les alliages d'étain et les alliages de nickel.So we can "matt" with a thin layer of chrome shiny or semi-shiny surfaces of hard materials such as stainless steel, tin-nickel, chromium itself, chrome surfaces chromium oxide (which is coated with steel for certain cans), nickel-phosphorus, tin alloys and nickel alloys.
On peut aussi éventuellement "mater" des surfaces de matériaux brillants plus mous tels que le zinc ou l'étain cependant étant donné le caractère "mou" de ces métaux (notamment de l'étain) il est alors souhaitable de ne mater que la surface de couches d'étain minces (c'est-à-dire d'épaisseur nettement inférieure à 1 micron) qui sont déposées sur une surface dure.One can also optionally "mat" surfaces of softer shiny materials such as zinc or tin however, given the "soft" nature of these metals (especially tin) it is then desirable to mat only the surface layers of thin tin (that is to say a thickness clearly less than 1 micron) which are deposited on a hard surface.
Pour obtenir un dépôt mat de chrome selon l'invention on utilise les techniques électrochimiques connues impliquant soit l'emploi d'un bain froid soit l'emploi d'une coupure de courant lors du dépôt. Cependant on a noté que l'on pouvait obtenir directement le dépôt de chrome mat en utilisant pour les bains une température inférieure à la normale (25-35°C) et sans coupure de courant, lorsque le dépôt de chrome est réalisé sur une surface de chrome ou d'étain.In order to obtain a matt deposit of chromium according to the invention, known electrochemical techniques are used, involving either the use of a cold bath or the use of a power cut during deposition. However, it was noted that the deposit of matt chromium could be obtained directly by using for the baths a temperature below normal (25-35 ° C) and without power cut, when the chromium deposit is carried out on a surface. of chrome or tin.
Les exemples non limitatifs suivants illustrent l'invention.The following nonlimiting examples illustrate the invention.
On utilise une plaque en acier inoxydable d'épaisseur 35/100 présentant une surface brillante. Cette plaque est dégraissée en anode, rincée puis immergée dans un bain de chrome classique (250 g/1 d'anhydride chromique et 2,5 g d'acide sulfurique par litre-température 28°). La plaque est reliée à la cathode ; le courant (15A dcm2) est mis 15 secondes après l'immersion de la plaque et est maintenu jusqu'à ce que le dépôt de chrome ait atteint 0,3 micron d'épaisseur avec une coupure de courant 15 secondes après le début du dépôt de chrome.A 35/100 thick stainless steel plate with a shiny surface is used. This plate is degreased in anode, rinsed and then immersed in a conventional chromium bath (250 g / 1 of chromic anhydride and 2.5 g of sulfuric acid per liter-temperature 28 °). The plate is connected to the cathode; the current (15A dcm2) is switched on 15 seconds after immersion of the plate and is maintained until the chromium deposit has reached 0.3 micron in thickness with a power cut 15 seconds after the start of the deposit of chrome.
On obtient une plaque d'aspect mate. La plaque est recouverte d'une couche (épaisseur environ 1,8 microns)photosensible imprimante du commerce (PCAS). Après séchage (3 mn à 45°C et 5 mn à 85°C) la plaque est prête.A matte appearance plate is obtained. The plate is covered with a layer (approximately 1.8 microns thick) of photosensitive commercial printer (PCAS). After drying (3 min at 45 ° C and 5 min at 85 ° C) the plate is ready.
La plaque est ensuite utilisée comme connu dans les procédés offset : insolation, enlevage des parties solubles, gommage etc...The plate is then used as known in offset processes: insolation, rearing of soluble parts, exfoliation, etc.
La plaque est alors utilisée sur machine offset.. On a constaté :
- - que la couche imprimante est parfaitement accrochée sur la surface de chrome mat,
- - que les parties hydrophiles mises à nues sont bien encrophobes.
- - that the printer layer is perfectly attached to the matt chrome surface,
- - that the hydrophilic parts exposed are clearly encrophobic.
Au bout de 60.000 feuilles tirées on a constaté que le chrome mat avait été rayé par un objet dur contenu dans le papier ; cette rayure laissait apparaitre l'acier inoxydable mais le tirage n'en n'a pas été affecté.After 60,000 sheets drawn, it was found that the matt chrome had been scratched by a hard object contained in the paper; this scratch revealed stainless steel but the draft was not affected.
On prend une plaque en acier qualité offset de la Société USINOR épaisseur 35/100.We take a steel plate offset quality from the company USINOR thickness 35/100.
Après dégraissage, rinçage,..décapage rinçage on dépose sur les deux côtés de la plaque une épaisseur de O micron 6 de. chrome brillant et dur dans un bain composé ainsi :
- 250 gr/1 anhydride chromique, 2 g/1 d'acide sulphurique, To - 450
- densité - 15A dcm 2 .
- 250 gr / 1 chromic anhydride, 2 g / 1 sulfuric acid, T o - 45 0
- density - 15A d c m 2 .
Sur ces deux faces la plaque est ainsi recouverte d'une couche lisse, dure et brillante de chrome qui lui fournira une bonne protection durant les manipulations.On these two faces the plate is thus covered with a smooth, hard and shiny layer of chromium which will provide it with good protection during handling.
On immerge alors cette plaque dans un bain électrolytique de chrome de composition identique à celle du bain décrit ci-dessus mais on opère à une température de 28°C et on dépose, sous 30 A par décimètre carré, sur une seule des faces de la plaque une épaisseur de chrome mat de 0,4 micron.This plate is then immersed in an electrolytic chromium bath with a composition identical to that of the bath described above, but it is operated at a temperature of 28 ° C. and is deposited, under 30 A by square decimetre, on only one of the faces of the plate a thickness of matt chrome of 0.4 micron.
On obtient ainsi une plaque protégée sur toutes ses faces par une couche de chrome lisse et qui comporte, sur une de ses faces, une surface de chrome mat utilisable en offset. On dépose ensuite sur la surface mat une couche photosensible imprimante et on obtient une plaque offset prête à l'emploi.A plate is thus obtained protected on all its faces by a layer of smooth chrome and which comprises, on one of its faces, a surface of matt chrome usable in offset. A photosensitive printer layer is then deposited on the mat surface and a ready-made offset plate is obtained.
On utilise comme plaque de départ une plaque en acier chromé commercialisée par la Société SOLLAC.A chromed steel plate sold by the company SOLLAC is used as the starting plate.
Après dégraissage à chaud (65°C) dans un bain de carbonate de sodium (100 g/l), la plaque étant en cathode, la plaque est introduite dans un bain de chrome en vue de réaliser, sur une de ses faces, le dépôt d'une couche mince (0,3 micron par exemple) de chrome mat.After hot degreasing (65 ° C) in a sodium carbonate bath (100 g / l), the plate being cathode, the plate is introduced into a chromium bath in order to achieve, on one of its faces, the deposit of a thin layer (0.3 micron for example) of matt chrome.
On a réalisé des essais analogues en utilisant comme produit de départ :
- - une plaque en acier (35/100 d'épaisseur) de la Société USINOR sur laquelle on a déposé au préalable une couche de 0,9 micron d'alliage étain-nickel,
- - une plaque en acier étamé (épaisseur 35/100, reférence El commercialisée par la Société de FER BLANC) ayant 2,8 g d'étain au mètre carré sur chacune de ses faces.
- - une plaque en acier de 35/100 dont la surface a été sablée ; sur une telle plaque le dépôt de chrome mat selon l'invention (épaisseur inférieure à 1 micron) peut être réalisé sans utilisation d'une coupure de courant pendant l'électrolyse.
- - une plaque en acier (35/100 d'épaisseur) de la société USINOR sur laquelle on a déposé des deux côtés de la plaque un chrome 0,6 micron du type micro-cracké fourni par les établissements WALBERG référence W.S.A. 2300 et travaillant à 42°. Ce type de chrome a une excellente résistance à la corrosion.
- - une plaque en acier (35/100 d'épaisseur) de la société USINOR sur laquelle on a déposé des deux côtés de la plaque un chrome crack-free 0,6 micron d'épaisseur des établissements WALBERG référence W.S.A. 2650 et travaillant à 65°. Ce type de chrome a une excellente résistance à la corrosion.
- - a steel plate (35/100 thick) from the company USINOR on which a layer of 0.9 micron of tin-nickel alloy has been previously deposited,
- - a tinned steel plate (thickness 35/100, reference El marketed by the Company of FER BLANC) having 2.8 g of tin per square meter on each of its faces.
- - a 35/100 steel plate whose surface has been sanded; on such a plate, the deposit of matt chromium according to the invention (thickness less than 1 micron) can be carried out without using a power cut during the electrolysis.
- - a steel plate (35/100 thick) from the company USINOR on which a 0.6 micron chromium of the micro-cracked type, supplied by WALBERG establishments, reference WSA 2300, is deposited on both sides of the plate. 42 °. This type of chromium has excellent resistance to corrosion.
- - a steel plate (35/100 thick) from the company USINOR on which was deposited on both sides of the plate a crack-free chrome 0.6 micron thick from WALBERG establishments, reference WSA 2650 and working at 65 °. This type of chromium has excellent resistance to corrosion.
Toutes les plaques ainsi préparées se sont révélées de bonnes plaques offset aptes, sans cuisson de la couche photodurcie, à réaliser plus de 40 000 tirages.All the plates thus prepared have proved to be good offset plates capable, without baking the photocured layer, of producing more than 40,000 prints.
Claims (3)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7917153 | 1979-07-02 | ||
FR7917153A FR2460211A1 (en) | 1979-07-02 | 1979-07-02 | NEW OFFSET PLATE WITH SURFACE MATT CHROMED |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0022033A1 true EP0022033A1 (en) | 1981-01-07 |
EP0022033B1 EP0022033B1 (en) | 1984-09-05 |
Family
ID=9227397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19800400982 Expired EP0022033B1 (en) | 1979-07-02 | 1980-06-30 | Lithographic printing plates with hydrophilic surface matted with a thin chrome layer |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0022033B1 (en) |
JP (1) | JPS5637192A (en) |
BR (1) | BR8004111A (en) |
CA (1) | CA1133755A (en) |
DE (1) | DE3069101D1 (en) |
ES (1) | ES492985A0 (en) |
FR (1) | FR2460211A1 (en) |
MX (1) | MX156999A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3115201A1 (en) * | 1980-04-16 | 1982-01-28 | Jean-Marie 75008 Paris Nouel | "STEEL OFFSET PRINT PLATE AS BASE PLATE" |
EP0098776A2 (en) * | 1982-07-02 | 1984-01-18 | INNOLITH, société anonyme | Steel lithographic printing plate having multiple chromium layers |
WO1990002044A2 (en) * | 1988-08-19 | 1990-03-08 | Presstek, Inc. | Lithography plates and method and means for imaging them |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6131355A (en) * | 1984-07-20 | 1986-02-13 | 工業技術院長 | Graphite-boron carbide sliding member |
JPH02131992A (en) * | 1989-06-14 | 1990-05-21 | Konica Corp | Support for lithographic printing plate |
Citations (7)
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---|---|---|---|---|
GB475902A (en) * | 1936-05-29 | 1937-11-29 | Arthur Ronald Trist | Improvements in and relating to printing plates for lithography |
GB640470A (en) * | 1947-09-04 | 1950-07-19 | Coates Brothers & Co | Improvements in the manufacture of lithographic printing plates |
DE806315C (en) * | 1949-10-18 | 1951-06-14 | Roman Freundorfer | Offset printing plate and method of making the same |
FR82759E (en) * | 1962-09-27 | 1964-04-17 | Le Quadrimetal Offset Sa Pour | Offset printing process and resulting industrial products |
GB1172517A (en) * | 1965-12-02 | 1969-12-03 | Rotaprint Ltd | Photochemical Production of Plates for Offset Lithography |
BE779229A (en) * | 1972-02-10 | 1972-05-30 | Centre Rech Metallurgique | Offset printing plates - have a steel support with a chromium layer and a radiation sensitive layer,prodn |
EP0012066A1 (en) * | 1978-11-29 | 1980-06-11 | Jean-Marie Nouel | Hydrophilic layer for offset printing plates and obtained plates |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5131507A (en) * | 1974-09-11 | 1976-03-17 | Fuji Photo Film Co Ltd | OFUSETSUTOINSATSUBANYOSHIJITAI |
-
1979
- 1979-07-02 FR FR7917153A patent/FR2460211A1/en active Granted
-
1980
- 1980-06-26 CA CA354,878A patent/CA1133755A/en not_active Expired
- 1980-06-30 EP EP19800400982 patent/EP0022033B1/en not_active Expired
- 1980-06-30 BR BR8004111A patent/BR8004111A/en not_active IP Right Cessation
- 1980-06-30 DE DE8080400982T patent/DE3069101D1/en not_active Expired
- 1980-07-01 ES ES492985A patent/ES492985A0/en active Granted
- 1980-07-01 JP JP8858780A patent/JPS5637192A/en active Granted
- 1980-07-01 MX MX18298980A patent/MX156999A/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB475902A (en) * | 1936-05-29 | 1937-11-29 | Arthur Ronald Trist | Improvements in and relating to printing plates for lithography |
GB640470A (en) * | 1947-09-04 | 1950-07-19 | Coates Brothers & Co | Improvements in the manufacture of lithographic printing plates |
DE806315C (en) * | 1949-10-18 | 1951-06-14 | Roman Freundorfer | Offset printing plate and method of making the same |
FR82759E (en) * | 1962-09-27 | 1964-04-17 | Le Quadrimetal Offset Sa Pour | Offset printing process and resulting industrial products |
GB1172517A (en) * | 1965-12-02 | 1969-12-03 | Rotaprint Ltd | Photochemical Production of Plates for Offset Lithography |
BE779229A (en) * | 1972-02-10 | 1972-05-30 | Centre Rech Metallurgique | Offset printing plates - have a steel support with a chromium layer and a radiation sensitive layer,prodn |
EP0012066A1 (en) * | 1978-11-29 | 1980-06-11 | Jean-Marie Nouel | Hydrophilic layer for offset printing plates and obtained plates |
Non-Patent Citations (1)
Title |
---|
CHEMICAL ABSTRACTS, vol. 78, no. 10, 12 mars 1973, page 490, réf. 65302e, Columbus, Ohio, US, & BE-A-779 229 (CENTRE NATIONAL DE RECHERCHES METALLURGIQUES)(30-05-1972) * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3115201A1 (en) * | 1980-04-16 | 1982-01-28 | Jean-Marie 75008 Paris Nouel | "STEEL OFFSET PRINT PLATE AS BASE PLATE" |
EP0098776A2 (en) * | 1982-07-02 | 1984-01-18 | INNOLITH, société anonyme | Steel lithographic printing plate having multiple chromium layers |
EP0098776A3 (en) * | 1982-07-02 | 1985-04-10 | Jean-Marie Nouel | Steel lithographic printing plate having multiple chromium layers |
WO1990002044A2 (en) * | 1988-08-19 | 1990-03-08 | Presstek, Inc. | Lithography plates and method and means for imaging them |
WO1990002044A3 (en) * | 1988-08-19 | 1990-08-23 | Presstek Inc | Lithography plates and method and means for imaging them |
Also Published As
Publication number | Publication date |
---|---|
ES8200273A1 (en) | 1981-10-16 |
JPH0322314B2 (en) | 1991-03-26 |
FR2460211A1 (en) | 1981-01-23 |
FR2460211B1 (en) | 1984-07-06 |
JPS5637192A (en) | 1981-04-10 |
MX156999A (en) | 1988-10-19 |
EP0022033B1 (en) | 1984-09-05 |
ES492985A0 (en) | 1981-10-16 |
DE3069101D1 (en) | 1984-10-11 |
CA1133755A (en) | 1982-10-19 |
BR8004111A (en) | 1981-01-21 |
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