EP0022033A1 - Lithographic printing plates with hydrophilic surface matted with a thin chrome layer - Google Patents

Lithographic printing plates with hydrophilic surface matted with a thin chrome layer Download PDF

Info

Publication number
EP0022033A1
EP0022033A1 EP80400982A EP80400982A EP0022033A1 EP 0022033 A1 EP0022033 A1 EP 0022033A1 EP 80400982 A EP80400982 A EP 80400982A EP 80400982 A EP80400982 A EP 80400982A EP 0022033 A1 EP0022033 A1 EP 0022033A1
Authority
EP
European Patent Office
Prior art keywords
chromium
layer
hydrophilic surface
micron
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP80400982A
Other languages
German (de)
French (fr)
Other versions
EP0022033B1 (en
Inventor
Jean-Marie Nouel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Innolith Sa Te Villers-La-Montagne Frankrijk
Original Assignee
Nouel Jean-Marie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=9227397&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP0022033(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nouel Jean-Marie filed Critical Nouel Jean-Marie
Publication of EP0022033A1 publication Critical patent/EP0022033A1/en
Application granted granted Critical
Publication of EP0022033B1 publication Critical patent/EP0022033B1/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/04Printing plates or foils; Materials therefor metallic
    • B41N1/08Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/10Printing plates or foils; Materials therefor metallic for lithographic printing multiple
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/04Printing plates or foils; Materials therefor metallic
    • B41N1/08Printing plates or foils; Materials therefor metallic for lithographic printing

Definitions

  • the present invention relates to new offset plates, the hydrophilic surface of which has been made "matt" by means of a thin layer of chromium.
  • offset reproduction methods use plates having a surface of hydrophilic nature. This same surface should advantageously be matt, this mattness being advantageous on the one hand, to facilitate the control work at the time of printing and on the other hand, to facilitate the attachment, on this surface, of a photosensitive layer .
  • This mattness can be obtained by treating the support of the plate or the surface in a material of hydrophilic nature by methods which call for an attack on said surface, either mechanically, chemically or electrochemically.
  • chromium has been widely described for producing the hydrophilic surface of an offset plate.
  • the chrome layers employed have notable advantages with regard to their hardness, their hydrophilicity and possibly their appearance. Indeed, these chromium layers can have a mat surface.
  • Two methods are known for electrochemically obtaining a layer of chromium with a mat surface, one consisting in using an electrolytic bath at low temperature (5 to 8 ° C. for example) and the other consisting in using an electrolytic bath at temperature below normal (25 to 35 ° C) but by performing an interruption of the electric current while carrying out said deposit. But in all known cases the chromium layer (with a shiny or mat surface) which must play the role of aquaphile layer of the offset plates must have a notable thickness (clearly greater than 1 micron and generally from 1.5 to 2.8 microns ).
  • hydrophilic chromium layers with a thickness of less than 1 micron could possibly be deposited on supports. But taking into account the examples provided, the specialists are well aware that the very thin layers recommended cannot play their role of hard aquaphile layers because they are scratched too easily and are often porous thus leaving appear an underlying surface with the properties unacceptable in offset reproduction. .
  • the invention therefore consists in depositing on a surface having hydrophilic properties which can be used in the sense of offset, a very thin layer of matt chromium, the relative porosity and brittleness of which will be accepted precisely because the underlying surface is hydrophilic and encrophobic, but which one will use to make "mat" the surface of the final material.
  • hydrophilic surfaces which can be made "matt" using the invention are all the surfaces which, to date, have been considered as hydrophilic surfaces usable in offset plates.
  • a 35/100 thick stainless steel plate with a shiny surface is used.
  • This plate is degreased in anode, rinsed and then immersed in a conventional chromium bath (250 g / 1 of chromic anhydride and 2.5 g of sulfuric acid per liter-temperature 28 °).
  • the plate is connected to the cathode; the current (15A dcm2) is switched on 15 seconds after immersion of the plate and is maintained until the chromium deposit has reached 0.3 micron in thickness with a power cut 15 seconds after the start of the deposit of chrome.
  • a matte appearance plate is obtained.
  • the plate is covered with a layer (approximately 1.8 microns thick) of photosensitive commercial printer (PCAS). After drying (3 min at 45 ° C and 5 min at 85 ° C) the plate is ready.
  • PCAS photosensitive commercial printer
  • the plate is then used as known in offset processes: insolation, rearing of soluble parts, exfoliation, etc.
  • the plate is thus covered with a smooth, hard and shiny layer of chromium which will provide it with good protection during handling.
  • This plate is then immersed in an electrolytic chromium bath with a composition identical to that of the bath described above, but it is operated at a temperature of 28 ° C. and is deposited, under 30 A by square decimetre, on only one of the faces of the plate a thickness of matt chrome of 0.4 micron.
  • a plate is thus obtained protected on all its faces by a layer of smooth chrome and which comprises, on one of its faces, a surface of matt chrome usable in offset.
  • a photosensitive printer layer is then deposited on the mat surface and a ready-made offset plate is obtained.
  • a chromed steel plate sold by the company SOLLAC is used as the starting plate.
  • the plate After hot degreasing (65 ° C) in a sodium carbonate bath (100 g / l), the plate being cathode, the plate is introduced into a chromium bath in order to achieve, on one of its faces, the deposit of a thin layer (0.3 micron for example) of matt chrome.

Landscapes

  • Printing Plates And Materials Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Laminated Bodies (AREA)

Abstract

1. Offset printing plates with a metallic hydrophilic surface and an ink-accepting surfaces obtained from a photosensitive printing layer, comprising a steel support having a shiny and smooth hydrophilic surface, charactrized in that said shiny hydrophilic surface is at least partly coated with a dull and porous layer of chromium, said layer having a thickness less than one micrometer.

Description

La présente invention concerne de nouvelles plaques offset dont la surface hydrophile a été rendue "mate" grâce à.une couche mince de chrome.The present invention relates to new offset plates, the hydrophilic surface of which has been made "matt" by means of a thin layer of chromium.

On sait que les procédés de reproduction offset utilisent des plaques présentant une surface de nature hydrophile. Cette même surface doit avantageusement être mate, cette matité étant intéressante d'une part, pour faciliter le travail de contrôle au moment de l'impression et d'autre part, pour faciliter l'accrochage, sur cette surface, d'une couche photosensible.It is known that offset reproduction methods use plates having a surface of hydrophilic nature. This same surface should advantageously be matt, this mattness being advantageous on the one hand, to facilitate the control work at the time of printing and on the other hand, to facilitate the attachment, on this surface, of a photosensitive layer .

Cette matité peut s'obtenir en traitant le supportde la plaque ou la surface en un matériau de nature hydrophile par des procédés qui font appel à une attaque de ladite surface,soit mécaniquement, soit chimiquement, soit électrochimiquement.This mattness can be obtained by treating the support of the plate or the surface in a material of hydrophilic nature by methods which call for an attack on said surface, either mechanically, chemically or electrochemically.

On a de plus largement décrit l'utilisation du chrome pour la réalisation de la surface hydrophile d'une plaque offset. Les couches de chromes employées présentent des avantages notables en ce qui concerne leur dureté, leur hydrophilie et éventuellement leur aspect. En effet ces couches de chrome peuvent présenter une surface mate. Pour obtenir électrochimiquement une couche de chrome à surface mate on connaît deux procédés , l'un consistant à utiliser un bain électrolytique à basse température (5 à 8°C par exemple) et l'autre consistant à utiliser un bain électrolytique à température inférieure à la normale (25 é 35 °C) mais en réalisant une interruption du courant électrique pendant que l'on effectue ledit dépot. Mais dans tous les cas connus la couche de chrome (à surface brillante ou mate) qui doit jouer le rôle de couche aquaphile des plaques offset doit avoir une épaisseur notable (nettement supérieure à 1 micron et généralement de 1,5 à 2,8 microns).In addition, the use of chromium has been widely described for producing the hydrophilic surface of an offset plate. The chrome layers employed have notable advantages with regard to their hardness, their hydrophilicity and possibly their appearance. Indeed, these chromium layers can have a mat surface. Two methods are known for electrochemically obtaining a layer of chromium with a mat surface, one consisting in using an electrolytic bath at low temperature (5 to 8 ° C. for example) and the other consisting in using an electrolytic bath at temperature below normal (25 to 35 ° C) but by performing an interruption of the electric current while carrying out said deposit. But in all known cases the chromium layer (with a shiny or mat surface) which must play the role of aquaphile layer of the offset plates must have a notable thickness (clearly greater than 1 micron and generally from 1.5 to 2.8 microns ).

On a déjà suggéré que l'on pourrait éventuellement déposer sur des supports, des couches hydrophiles de chrome d'épaisseur inférieure à 1 micron. Mais compte tenu des exemples fournis, les spécialistes savent bien que les couches très minces préconisées ne peuvent jouer leur rôle de couches dures aquaphiles car elles se rayent trop facilement et sont souvent poreuses laissant ainsi apparaitre une surface sous jacente aux propriétés inacceptables dans la reproduction offset.It has already been suggested that hydrophilic chromium layers with a thickness of less than 1 micron could possibly be deposited on supports. But taking into account the examples provided, the specialists are well aware that the very thin layers recommended cannot play their role of hard aquaphile layers because they are scratched too easily and are often porous thus leaving appear an underlying surface with the properties unacceptable in offset reproduction. .

Il a été trouvé, et c'est là l'objet de la présente invention; qu'il est possible de rendre mate la surface d'un matériau hydrophile brillant, utilisable comme surface hydrophile d'une plaque offset, en déposant sur cette surface une couche d'épaisseur inférieure à 1 micron et de préférence inférieure à 0,5 micron de chrome mat et poreux.It has been found, and this is the object of the present invention; that it is possible to matt the surface of a hydrophilic glossy material, usable as hydrophilic surface of an offset plate, by depositing on this surface a layer of thickness less than 1 micron and preferably less than 0.5 micron of matt and porous chrome.

L'invention consiste donc à déposer sur une surface présentant des propriétés hydrophiles utilisables au sens de l'offset, une très mince couche de chrome mat, dont on acceptera la porosité et la fragilité relatives précisément parce que la surface sous-jacente est hydrophile et encrophobe, mais que l'on utilisera pour rendre "mate" la surface du matériau final.The invention therefore consists in depositing on a surface having hydrophilic properties which can be used in the sense of offset, a very thin layer of matt chromium, the relative porosity and brittleness of which will be accepted precisely because the underlying surface is hydrophilic and encrophobic, but which one will use to make "mat" the surface of the final material.

Les surfaces hydrophiles que l'on peut rendre "mate" en utilisant l'invention sont toutes les surfaces qui, à ce jour, ont été considéréescomme des surfaces hydrophiles utilisables dans les plaques offset.The hydrophilic surfaces which can be made "matt" using the invention are all the surfaces which, to date, have been considered as hydrophilic surfaces usable in offset plates.

Ainsi on peut "mater" à l'aide d'une couche mince de chrome des surfaces brillantes ou semi-brillantes de matériaux durs tels que l'acier inoxydable, l'étain-nickel, le chrome lui-même, les surfaces chrome-oxyde de chrome (dont on revêt l'acier pour certaines boites de conserves), le nickel-phosphore, les alliages d'étain et les alliages de nickel.So we can "matt" with a thin layer of chrome shiny or semi-shiny surfaces of hard materials such as stainless steel, tin-nickel, chromium itself, chrome surfaces chromium oxide (which is coated with steel for certain cans), nickel-phosphorus, tin alloys and nickel alloys.

On peut aussi éventuellement "mater" des surfaces de matériaux brillants plus mous tels que le zinc ou l'étain cependant étant donné le caractère "mou" de ces métaux (notamment de l'étain) il est alors souhaitable de ne mater que la surface de couches d'étain minces (c'est-à-dire d'épaisseur nettement inférieure à 1 micron) qui sont déposées sur une surface dure.One can also optionally "mat" surfaces of softer shiny materials such as zinc or tin however, given the "soft" nature of these metals (especially tin) it is then desirable to mat only the surface layers of thin tin (that is to say a thickness clearly less than 1 micron) which are deposited on a hard surface.

Pour obtenir un dépôt mat de chrome selon l'invention on utilise les techniques électrochimiques connues impliquant soit l'emploi d'un bain froid soit l'emploi d'une coupure de courant lors du dépôt. Cependant on a noté que l'on pouvait obtenir directement le dépôt de chrome mat en utilisant pour les bains une température inférieure à la normale (25-35°C) et sans coupure de courant, lorsque le dépôt de chrome est réalisé sur une surface de chrome ou d'étain.In order to obtain a matt deposit of chromium according to the invention, known electrochemical techniques are used, involving either the use of a cold bath or the use of a power cut during deposition. However, it was noted that the deposit of matt chromium could be obtained directly by using for the baths a temperature below normal (25-35 ° C) and without power cut, when the chromium deposit is carried out on a surface. of chrome or tin.

Les exemples non limitatifs suivants illustrent l'invention.The following nonlimiting examples illustrate the invention.

Exemple 1Example 1

On utilise une plaque en acier inoxydable d'épaisseur 35/100 présentant une surface brillante. Cette plaque est dégraissée en anode, rincée puis immergée dans un bain de chrome classique (250 g/1 d'anhydride chromique et 2,5 g d'acide sulfurique par litre-température 28°). La plaque est reliée à la cathode ; le courant (15A dcm2) est mis 15 secondes après l'immersion de la plaque et est maintenu jusqu'à ce que le dépôt de chrome ait atteint 0,3 micron d'épaisseur avec une coupure de courant 15 secondes après le début du dépôt de chrome.A 35/100 thick stainless steel plate with a shiny surface is used. This plate is degreased in anode, rinsed and then immersed in a conventional chromium bath (250 g / 1 of chromic anhydride and 2.5 g of sulfuric acid per liter-temperature 28 °). The plate is connected to the cathode; the current (15A dcm2) is switched on 15 seconds after immersion of the plate and is maintained until the chromium deposit has reached 0.3 micron in thickness with a power cut 15 seconds after the start of the deposit of chrome.

On obtient une plaque d'aspect mate. La plaque est recouverte d'une couche (épaisseur environ 1,8 microns)photosensible imprimante du commerce (PCAS). Après séchage (3 mn à 45°C et 5 mn à 85°C) la plaque est prête.A matte appearance plate is obtained. The plate is covered with a layer (approximately 1.8 microns thick) of photosensitive commercial printer (PCAS). After drying (3 min at 45 ° C and 5 min at 85 ° C) the plate is ready.

La plaque est ensuite utilisée comme connu dans les procédés offset : insolation, enlevage des parties solubles, gommage etc...The plate is then used as known in offset processes: insolation, rearing of soluble parts, exfoliation, etc.

La plaque est alors utilisée sur machine offset.. On a constaté :

  • - que la couche imprimante est parfaitement accrochée sur la surface de chrome mat,
  • - que les parties hydrophiles mises à nues sont bien encrophobes.
The plate is then used on an offset machine. We found:
  • - that the printer layer is perfectly attached to the matt chrome surface,
  • - that the hydrophilic parts exposed are clearly encrophobic.

Au bout de 60.000 feuilles tirées on a constaté que le chrome mat avait été rayé par un objet dur contenu dans le papier ; cette rayure laissait apparaitre l'acier inoxydable mais le tirage n'en n'a pas été affecté.After 60,000 sheets drawn, it was found that the matt chrome had been scratched by a hard object contained in the paper; this scratch revealed stainless steel but the draft was not affected.

Exemple 2Example 2

On prend une plaque en acier qualité offset de la Société USINOR épaisseur 35/100.We take a steel plate offset quality from the company USINOR thickness 35/100.

Après dégraissage, rinçage,..décapage rinçage on dépose sur les deux côtés de la plaque une épaisseur de O micron 6 de. chrome brillant et dur dans un bain composé ainsi :

  • 250 gr/1 anhydride chromique, 2 g/1 d'acide sulphurique, To - 450
  • densité - 15A dcm 2 .
After degreasing, rinsing, .. pickling rinsing, a thickness of O micron 6 of is deposited on both sides of the plate. shiny and hard chrome in a bath composed as follows:
  • 250 gr / 1 chromic anhydride, 2 g / 1 sulfuric acid, T o - 45 0
  • density - 15A d c m 2 .

Sur ces deux faces la plaque est ainsi recouverte d'une couche lisse, dure et brillante de chrome qui lui fournira une bonne protection durant les manipulations.On these two faces the plate is thus covered with a smooth, hard and shiny layer of chromium which will provide it with good protection during handling.

On immerge alors cette plaque dans un bain électrolytique de chrome de composition identique à celle du bain décrit ci-dessus mais on opère à une température de 28°C et on dépose, sous 30 A par décimètre carré, sur une seule des faces de la plaque une épaisseur de chrome mat de 0,4 micron.This plate is then immersed in an electrolytic chromium bath with a composition identical to that of the bath described above, but it is operated at a temperature of 28 ° C. and is deposited, under 30 A by square decimetre, on only one of the faces of the plate a thickness of matt chrome of 0.4 micron.

On obtient ainsi une plaque protégée sur toutes ses faces par une couche de chrome lisse et qui comporte, sur une de ses faces, une surface de chrome mat utilisable en offset. On dépose ensuite sur la surface mat une couche photosensible imprimante et on obtient une plaque offset prête à l'emploi.A plate is thus obtained protected on all its faces by a layer of smooth chrome and which comprises, on one of its faces, a surface of matt chrome usable in offset. A photosensitive printer layer is then deposited on the mat surface and a ready-made offset plate is obtained.

Exemple 3Example 3

On utilise comme plaque de départ une plaque en acier chromé commercialisée par la Société SOLLAC.A chromed steel plate sold by the company SOLLAC is used as the starting plate.

Après dégraissage à chaud (65°C) dans un bain de carbonate de sodium (100 g/l), la plaque étant en cathode, la plaque est introduite dans un bain de chrome en vue de réaliser, sur une de ses faces, le dépôt d'une couche mince (0,3 micron par exemple) de chrome mat.After hot degreasing (65 ° C) in a sodium carbonate bath (100 g / l), the plate being cathode, the plate is introduced into a chromium bath in order to achieve, on one of its faces, the deposit of a thin layer (0.3 micron for example) of matt chrome.

On a réalisé des essais analogues en utilisant comme produit de départ :

  • - une plaque en acier (35/100 d'épaisseur) de la Société USINOR sur laquelle on a déposé au préalable une couche de 0,9 micron d'alliage étain-nickel,
  • - une plaque en acier étamé (épaisseur 35/100, reférence El commercialisée par la Société de FER BLANC) ayant 2,8 g d'étain au mètre carré sur chacune de ses faces.
  • - une plaque en acier de 35/100 dont la surface a été sablée ; sur une telle plaque le dépôt de chrome mat selon l'invention (épaisseur inférieure à 1 micron) peut être réalisé sans utilisation d'une coupure de courant pendant l'électrolyse.
  • - une plaque en acier (35/100 d'épaisseur) de la société USINOR sur laquelle on a déposé des deux côtés de la plaque un chrome 0,6 micron du type micro-cracké fourni par les établissements WALBERG référence W.S.A. 2300 et travaillant à 42°. Ce type de chrome a une excellente résistance à la corrosion.
  • - une plaque en acier (35/100 d'épaisseur) de la société USINOR sur laquelle on a déposé des deux côtés de la plaque un chrome crack-free 0,6 micron d'épaisseur des établissements WALBERG référence W.S.A. 2650 et travaillant à 65°. Ce type de chrome a une excellente résistance à la corrosion.
Similar tests were carried out using as starting material:
  • - a steel plate (35/100 thick) from the company USINOR on which a layer of 0.9 micron of tin-nickel alloy has been previously deposited,
  • - a tinned steel plate (thickness 35/100, reference El marketed by the Company of FER BLANC) having 2.8 g of tin per square meter on each of its faces.
  • - a 35/100 steel plate whose surface has been sanded; on such a plate, the deposit of matt chromium according to the invention (thickness less than 1 micron) can be carried out without using a power cut during the electrolysis.
  • - a steel plate (35/100 thick) from the company USINOR on which a 0.6 micron chromium of the micro-cracked type, supplied by WALBERG establishments, reference WSA 2300, is deposited on both sides of the plate. 42 °. This type of chromium has excellent resistance to corrosion.
  • - a steel plate (35/100 thick) from the company USINOR on which was deposited on both sides of the plate a crack-free chrome 0.6 micron thick from WALBERG establishments, reference WSA 2650 and working at 65 °. This type of chromium has excellent resistance to corrosion.

Toutes les plaques ainsi préparées se sont révélées de bonnes plaques offset aptes, sans cuisson de la couche photodurcie, à réaliser plus de 40 000 tirages.All the plates thus prepared have proved to be good offset plates capable, without baking the photocured layer, of producing more than 40,000 prints.

Claims (3)

1. Nouvelles plaques offset caractérisées en ce qu'elles comportent une surface hydrophile brillante, connue en elle-même pour être utilisable comme surface hydrophile d'une plaque offset, ladite surface étant au moins partiellement recouverte d'une couche de chrome mat et poreux, ladite couche ayant une épaisseur inférieure à 1 micron et de préférence inférieure à 0,5 micron environ.1. New offset plates characterized in that they comprise a glossy hydrophilic surface, known in itself to be usable as the hydrophilic surface of an offset plate, said surface being at least partially covered with a layer of matt and porous chromium , said layer having a thickness less than 1 micron and preferably less than about 0.5 micron. 2. Nouvelles plaques selon la revendication 1, caractérisées en ce que ladite surface hydrophile brillante est de l'acier inoxydable, de l'étain-nickel, du chrome, le chrome-oxyde de chrome, le nickel phosphore, les alliages d'étain, les alliages de nickel.2. New plates according to claim 1, characterized in that said glossy hydrophilic surface is stainless steel, tin-nickel, chromium, chromium chromium oxide, nickel phosphorus, tin alloys , nickel alloys. 3. Nouvelles plaques selon la revendication 1, caractérisée en ce que ladite surface hydrophile brillante est une surface de zinc ou d'étain, l'épaisseur de la couche de zinc ou d'étain étant inférieure à environ 1 micron et ladite couche étant déposée sur une surface dure.3. New plates according to claim 1, characterized in that said glossy hydrophilic surface is a surface of zinc or tin, the thickness of the layer of zinc or tin being less than about 1 micron and said layer being deposited on a hard surface.
EP19800400982 1979-07-02 1980-06-30 Lithographic printing plates with hydrophilic surface matted with a thin chrome layer Expired EP0022033B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7917153 1979-07-02
FR7917153A FR2460211A1 (en) 1979-07-02 1979-07-02 NEW OFFSET PLATE WITH SURFACE MATT CHROMED

Publications (2)

Publication Number Publication Date
EP0022033A1 true EP0022033A1 (en) 1981-01-07
EP0022033B1 EP0022033B1 (en) 1984-09-05

Family

ID=9227397

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19800400982 Expired EP0022033B1 (en) 1979-07-02 1980-06-30 Lithographic printing plates with hydrophilic surface matted with a thin chrome layer

Country Status (8)

Country Link
EP (1) EP0022033B1 (en)
JP (1) JPS5637192A (en)
BR (1) BR8004111A (en)
CA (1) CA1133755A (en)
DE (1) DE3069101D1 (en)
ES (1) ES492985A0 (en)
FR (1) FR2460211A1 (en)
MX (1) MX156999A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3115201A1 (en) * 1980-04-16 1982-01-28 Jean-Marie 75008 Paris Nouel "STEEL OFFSET PRINT PLATE AS BASE PLATE"
EP0098776A2 (en) * 1982-07-02 1984-01-18 INNOLITH, société anonyme Steel lithographic printing plate having multiple chromium layers
WO1990002044A2 (en) * 1988-08-19 1990-03-08 Presstek, Inc. Lithography plates and method and means for imaging them

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6131355A (en) * 1984-07-20 1986-02-13 工業技術院長 Graphite-boron carbide sliding member
JPH02131992A (en) * 1989-06-14 1990-05-21 Konica Corp Support for lithographic printing plate

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB475902A (en) * 1936-05-29 1937-11-29 Arthur Ronald Trist Improvements in and relating to printing plates for lithography
GB640470A (en) * 1947-09-04 1950-07-19 Coates Brothers & Co Improvements in the manufacture of lithographic printing plates
DE806315C (en) * 1949-10-18 1951-06-14 Roman Freundorfer Offset printing plate and method of making the same
FR82759E (en) * 1962-09-27 1964-04-17 Le Quadrimetal Offset Sa Pour Offset printing process and resulting industrial products
GB1172517A (en) * 1965-12-02 1969-12-03 Rotaprint Ltd Photochemical Production of Plates for Offset Lithography
BE779229A (en) * 1972-02-10 1972-05-30 Centre Rech Metallurgique Offset printing plates - have a steel support with a chromium layer and a radiation sensitive layer,prodn
EP0012066A1 (en) * 1978-11-29 1980-06-11 Jean-Marie Nouel Hydrophilic layer for offset printing plates and obtained plates

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5131507A (en) * 1974-09-11 1976-03-17 Fuji Photo Film Co Ltd OFUSETSUTOINSATSUBANYOSHIJITAI

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB475902A (en) * 1936-05-29 1937-11-29 Arthur Ronald Trist Improvements in and relating to printing plates for lithography
GB640470A (en) * 1947-09-04 1950-07-19 Coates Brothers & Co Improvements in the manufacture of lithographic printing plates
DE806315C (en) * 1949-10-18 1951-06-14 Roman Freundorfer Offset printing plate and method of making the same
FR82759E (en) * 1962-09-27 1964-04-17 Le Quadrimetal Offset Sa Pour Offset printing process and resulting industrial products
GB1172517A (en) * 1965-12-02 1969-12-03 Rotaprint Ltd Photochemical Production of Plates for Offset Lithography
BE779229A (en) * 1972-02-10 1972-05-30 Centre Rech Metallurgique Offset printing plates - have a steel support with a chromium layer and a radiation sensitive layer,prodn
EP0012066A1 (en) * 1978-11-29 1980-06-11 Jean-Marie Nouel Hydrophilic layer for offset printing plates and obtained plates

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CHEMICAL ABSTRACTS, vol. 78, no. 10, 12 mars 1973, page 490, réf. 65302e, Columbus, Ohio, US, & BE-A-779 229 (CENTRE NATIONAL DE RECHERCHES METALLURGIQUES)(30-05-1972) *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3115201A1 (en) * 1980-04-16 1982-01-28 Jean-Marie 75008 Paris Nouel "STEEL OFFSET PRINT PLATE AS BASE PLATE"
EP0098776A2 (en) * 1982-07-02 1984-01-18 INNOLITH, société anonyme Steel lithographic printing plate having multiple chromium layers
EP0098776A3 (en) * 1982-07-02 1985-04-10 Jean-Marie Nouel Steel lithographic printing plate having multiple chromium layers
WO1990002044A2 (en) * 1988-08-19 1990-03-08 Presstek, Inc. Lithography plates and method and means for imaging them
WO1990002044A3 (en) * 1988-08-19 1990-08-23 Presstek Inc Lithography plates and method and means for imaging them

Also Published As

Publication number Publication date
ES8200273A1 (en) 1981-10-16
JPH0322314B2 (en) 1991-03-26
FR2460211A1 (en) 1981-01-23
FR2460211B1 (en) 1984-07-06
JPS5637192A (en) 1981-04-10
MX156999A (en) 1988-10-19
EP0022033B1 (en) 1984-09-05
ES492985A0 (en) 1981-10-16
DE3069101D1 (en) 1984-10-11
CA1133755A (en) 1982-10-19
BR8004111A (en) 1981-01-21

Similar Documents

Publication Publication Date Title
TWI717746B (en) Zn-Al-Mg HOT DIP PLATED STEEL SHEET AND THE MANUFACTURING METHOD THEREOF
FR2650601A1 (en) NICKEL-PLATED, FACABLE, SCRATCH RESISTANT AND CORROSION-RESISTANT STEEL SHEET, AND PROCESS FOR PRODUCTION THEREOF
TWI686516B (en) Surface treated copper foil and current collector, electrode and battery using the same
EP0022033B1 (en) Lithographic printing plates with hydrophilic surface matted with a thin chrome layer
US9540735B2 (en) Zincating aluminum
FR2692284A1 (en) Coated sheet and method of manufacturing the sheet.
FR2504421A1 (en) COPPER MOLDS FOR THE CONTINUOUS CASTING OF STEEL
KR100435250B1 (en) Surface-treated steel plate having low contact resistance and connection terminal member made of the steel plate
US4287288A (en) Lithographic plate of tin-plated steel and method of manufacture
WO2017170038A1 (en) Substrate for flexible devices and method for producing same
JP2007302935A (en) Ni plated steel sheet for positive electrode can of alkali battery and method of manufacturing the same
EP0098776B1 (en) Steel lithographic printing plate having multiple chromium layers
US4410620A (en) Offset plates in steel, using surfaces containing chromium oxide
FR2467087A1 (en) Offset printing plate having tin-copper alloy layer - giving high hardness, hydrophilicity and ink-repellency
US4857436A (en) Offset plates with two chromium layers
US12122678B1 (en) Water based solution for decoupling graphene from copper substrates by oxidation
US4996131A (en) Offset plate with thin chromium layer and method of making
JP5565191B2 (en) Fused Al-Zn plated steel sheet
EP0012673A1 (en) Offset printing plate to be used as monometallic plate comprising a printing surface and offset printing method using this plate
KR890002987B1 (en) Surface treated steel plates with a weldability and method therefor
Mathers et al. The Adherence of Thick Silver Plate on Steel
JPH0713308B2 (en) Galvanized steel sheet with excellent press formability, chemical conversion treatment and weldability
EP0028180A1 (en) Offset printing plates comprising a hydrophilic layer of a tin-copper alloy, especially of speculum
EP0012066A1 (en) Hydrophilic layer for offset printing plates and obtained plates
FR2532249A1 (en) Photogravure rollers.

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Designated state(s): BE CH DE GB IT LU NL SE

17P Request for examination filed

Effective date: 19810701

ITF It: translation for a ep patent filed
GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Designated state(s): BE CH DE GB IT LI LU NL SE

REF Corresponds to:

Ref document number: 3069101

Country of ref document: DE

Date of ref document: 19841011

PLBI Opposition filed

Free format text: ORIGINAL CODE: 0009260

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19850630

26 Opposition filed

Opponent name: RHONE-POULENC SYSTEMES

Effective date: 19850427

NLR1 Nl: opposition has been filed with the epo

Opponent name: RHONE-POULENC SYSTEMES

PLAB Opposition data, opponent's data or that of the opponent's representative modified

Free format text: ORIGINAL CODE: 0009299OPPO

R26 Opposition filed (corrected)

Opponent name: RHONE-POULENC SYSTEMES

Effective date: 19850427

PLAB Opposition data, opponent's data or that of the opponent's representative modified

Free format text: ORIGINAL CODE: 0009299OPPO

REG Reference to a national code

Ref country code: CH

Ref legal event code: PUE

Owner name: INNOLITH, SOCIETE ANONYME

REG Reference to a national code

Ref country code: GB

Ref legal event code: 732

R26 Opposition filed (corrected)

Opponent name: RHONE-POULENC MULTI-TECHNIQUES

Effective date: 19850427

NLXE Nl: other communications concerning ep-patents (part 3 heading xe)

Free format text: IN PAT.BUL.01/88,PAGE 117:CORR.:RHONE-POULENC MULTI-TECHNIQUES

ITPR It: changes in ownership of a european patent

Owner name: CESSIONE;INNOLITH SOCIETE' ANONYME

NLS Nl: assignments of ep-patents

Owner name: INNOLITH S.A. TE VILLERS-LA-MONTAGNE, FRANKRIJK.

BECA Be: change of holder's address

Free format text: 880526 *INNOLITH:ZONE INDUSTRIELLE, F-54920 VILLERS-LA-MONTAGNE

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: LU

Payment date: 19900605

Year of fee payment: 11

PLBN Opposition rejected

Free format text: ORIGINAL CODE: 0009273

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: OPPOSITION REJECTED

27O Opposition rejected

Effective date: 19901113

NLR2 Nl: decision of opposition
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 19920612

Year of fee payment: 13

ITTA It: last paid annual fee
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Effective date: 19930630

Ref country code: CH

Effective date: 19930630

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

EAL Se: european patent in force in sweden

Ref document number: 80400982.7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 19960529

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 19960619

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 19960625

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 19960627

Year of fee payment: 17

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 19960710

Year of fee payment: 17

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19970630

Ref country code: BE

Effective date: 19970630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Effective date: 19970701

BERE Be: lapsed

Owner name: INNOLITH

Effective date: 19970630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19980101

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 19970630

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee

Effective date: 19980101

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19980303

EUG Se: european patent has lapsed

Ref document number: 80400982.7

APAH Appeal reference modified

Free format text: ORIGINAL CODE: EPIDOSCREFNO