JPH03200217A - Production of liquid crystal display element - Google Patents

Production of liquid crystal display element

Info

Publication number
JPH03200217A
JPH03200217A JP34124889A JP34124889A JPH03200217A JP H03200217 A JPH03200217 A JP H03200217A JP 34124889 A JP34124889 A JP 34124889A JP 34124889 A JP34124889 A JP 34124889A JP H03200217 A JPH03200217 A JP H03200217A
Authority
JP
Japan
Prior art keywords
protective film
film
liquid crystal
films
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34124889A
Other languages
Japanese (ja)
Inventor
Toshiaki Niitsu
新津 俊明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Casio Computer Co Ltd
Original Assignee
Casio Computer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Casio Computer Co Ltd filed Critical Casio Computer Co Ltd
Priority to JP34124889A priority Critical patent/JPH03200217A/en
Priority to US07/556,910 priority patent/US5194976A/en
Priority to EP90114173A priority patent/EP0410387B2/en
Priority to DE69018721T priority patent/DE69018721T3/en
Publication of JPH03200217A publication Critical patent/JPH03200217A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain flat films which are free from undulations on the surface by applying materials for films wet on wet plural times on a transparent substrate, then drying the coatings to form the films. CONSTITUTION:The material for the protective films is immediately applied wet on wet twice by a printing method on the transparent substrate 1 to obtain the protective film 21' of the 1st layer in a semi-liquid state. The film is in succession rested at room temp. in this state to obtain the protective film 21'' having the flattened surface. The material for the protective films is immediately applied wet on wet twice by the similar printing method on the protective film 21 of the 1st layer after curing by predrying, thereby the 2nd layer in a semi-liquid state is obtd. The films are rested in this state at room temp., by which the protective film 22'' having the flattened surface is obtd. The protective film 22'' is thereafter predried to be cured, by which the solid protective film 22 of the 2nd layer is obtd. The protective film 20s of the two-layered structure having excellent flatness are obtd. in this way.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、液晶テレビ等に使用される液晶表示素子の製
造方法に係り、特にはその液晶表示素子を構成する透明
基板の内面に配向膜、絶縁膜、保護膜等の膜を形成する
方法の改良に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a liquid crystal display element used in a liquid crystal television or the like, and in particular, an alignment film is formed on the inner surface of a transparent substrate constituting the liquid crystal display element. , relates to improvements in methods for forming films such as insulating films and protective films.

〔従 来 の 技 術〕[Traditional techniques]

カラー液晶表示素子は、−Mには第3図に示すように、
一対の透明基板1.2がシール材3を介して所定間隔で
対向配置され、この透明基板1.2及びシール材3によ
って形成された密封空間内に液晶4が封入されている。
The color liquid crystal display element has -M as shown in FIG.
A pair of transparent substrates 1.2 are arranged facing each other at a predetermined interval with a sealing material 3 in between, and a liquid crystal 4 is sealed in a sealed space formed by the transparent substrates 1.2 and the sealing material 3.

そして、一方の透明基板1の内面には、一方向(第3図
では、紙面に平行な左右方向)に長く延びる赤色、緑色
、青色等の複数のカラーフィルタ5が、その方向とは直
交する方向(第3図では、紙面に垂直な方向)に交互に
配設されている。これらカラーフィルタ5上の全面は、
ポリイミド等の樹脂からなる保護膜6で覆われ、その上
にはカラーフィルタ5と同一方向に長く延びるITO膜
等からなる複数本の透明電極7がその方向とは直交する
方向に一定間隔で配設されている。更に、その上は配向
膜8で覆われており、この配向膜8が液晶4に直接接触
している。
On the inner surface of one transparent substrate 1, there are a plurality of color filters 5 of red, green, blue, etc. extending in one direction (in FIG. 3, the horizontal direction parallel to the plane of the paper) and perpendicular to that direction. They are arranged alternately in the direction (in FIG. 3, the direction perpendicular to the plane of the paper). The entire surface of these color filters 5 is
It is covered with a protective film 6 made of resin such as polyimide, on which a plurality of transparent electrodes 7 made of an ITO film or the like extending in the same direction as the color filter 5 are arranged at regular intervals in a direction perpendicular to that direction. It is set up. Furthermore, the top thereof is covered with an alignment film 8, and this alignment film 8 is in direct contact with the liquid crystal 4.

また、もう一方の透明基板2の内面には、上記透明電極
7と直交する方向に延びるITO膜等からなる複数本の
透明電極9が一定間隔で配設され、この透明電極9と上
記の透明電極7との互いに対向する領域が画素領域を形
成している。透明電極9上は配向膜10で覆われており
、この配向膜10が液晶4に直接接触している。
Further, on the inner surface of the other transparent substrate 2, a plurality of transparent electrodes 9 made of ITO film or the like extending in a direction perpendicular to the transparent electrode 7 are arranged at regular intervals. A region facing the electrode 7 forms a pixel region. The transparent electrode 9 is covered with an alignment film 10, and this alignment film 10 is in direct contact with the liquid crystal 4.

上記構成からなるカラー液晶表示素子は透明基板1.2
の内面に保護膜6や配向膜8.10等の膜が形成されて
いる。これらの膜形成方法の一例として、カラーフィル
タ用の保護膜6の形成工程について以下に述べる。
The color liquid crystal display element having the above structure has a transparent substrate 1.2.
Films such as a protective film 6 and alignment films 8 and 10 are formed on the inner surface of the substrate. As an example of a method for forming these films, a process for forming a protective film 6 for a color filter will be described below.

まず、カラーフィルタ5の形成された一方の透明基板1
上に、通常の印刷法により、保護膜6となる材料を塗布
する。上記印刷法は、例えば第4図に示すように、ノズ
ル11から滴下された液体状の保護膜用材料12を複数
のローラ13で薄く均一に引き延ばしながら搬送し、こ
れを最後のローラ14の周面に設けられた印刷用凸版1
5の表面に付着させて、これを、移動してくるステージ
16上に載置された透明基板1のカラーフィルタ5上に
印刷することにより行う。このようにしてカラーフィル
タ5上に保護膜用材料が塗布されたら、これを予備乾燥
して硬化させることにより、最終的には固形の保護膜6
を得ることができる。
First, one transparent substrate 1 on which a color filter 5 is formed
A material that will become the protective film 6 is applied thereon by a normal printing method. In the above printing method, for example, as shown in FIG. Letterpress printing plate 1 provided on the surface
This is done by attaching it to the surface of the transparent substrate 1 and printing it on the color filter 5 of the transparent substrate 1 placed on the moving stage 16. Once the protective film material is applied onto the color filter 5 in this way, it is pre-dried and cured to form a solid protective film 6.
can be obtained.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の液晶表示素子の製造方法では、保護膜用
材料として粘度の高い材料を使用した場合、透明基板I
上に保護膜用材料を印刷した際に膜表面に第6図に示す
ような膜厚のうねりが生じるため、このうねりにより透
明基板1上には第5図に示すような縞17ができる。そ
の後、このような縞17のできた膜を予備乾燥して硬化
させることにより保護膜6ができた時点においても上記
の縞はそのまま残るので、最終的に完成した液晶表示素
子を点灯させた場合に、上記の縞が液晶層厚の不均一と
なり、この液晶層厚の違いが透過光強度の差となって、
現れるため、前記膜が肉眼でそのまま見えてしまうとい
う問題があった。
In the conventional method for manufacturing a liquid crystal display element described above, when a material with high viscosity is used as the material for the protective film, the transparent substrate I
When the protective film material is printed on the protective film material, undulations in film thickness as shown in FIG. 6 occur on the surface of the film, and these undulations form stripes 17 as shown in FIG. 5 on the transparent substrate 1. Thereafter, even when the protective film 6 is formed by pre-drying and curing the film with such stripes 17, the above-mentioned stripes remain as they are, so when the finally completed liquid crystal display element is turned on, , the above stripes result from non-uniform liquid crystal layer thickness, and this difference in liquid crystal layer thickness results in a difference in transmitted light intensity.
Therefore, there was a problem in that the film was visible to the naked eye as it was.

このような問題は、上述した保護膜6のみならず、液晶
表示素子の透明基板内面に形成される絶縁膜や配向膜等
の各種の膜に生じていた。
Such problems occur not only in the above-mentioned protective film 6 but also in various films such as insulating films and alignment films formed on the inner surface of the transparent substrate of the liquid crystal display element.

本発明は、上記従来の問題点に鑑みてなされたものであ
り、その目的は、表面にうねりのない平坦な膜を得るこ
とのできる液晶表示素子の製造方法を提供することにあ
る。
The present invention has been made in view of the above-mentioned conventional problems, and an object thereof is to provide a method for manufacturing a liquid crystal display element that can obtain a flat film without waviness on the surface.

(課題を解決するための手段〕 本発明は、液晶表示素子を構成する透明基板の内面に膜
を形成する工程を有する液晶表示素子の製造方法におい
て、前記透明基板上に膜用材料を複数回重ねて塗布した
後に乾燥させることにより前記膜を形成することを特徴
とするものである。
(Means for Solving the Problems) The present invention provides a method for manufacturing a liquid crystal display element that includes a step of forming a film on the inner surface of a transparent substrate constituting the liquid crystal display element, in which a film material is applied multiple times on the transparent substrate. The film is characterized in that the film is formed by applying multiple layers and then drying them.

また、前記透明基板上に膜用材料を複数回重ねて塗布し
た後に室温で放置し、その後に乾燥させることにより前
記膜を形成することを特徴とするものである。
Further, the method is characterized in that the film is formed by coating the film material on the transparent substrate multiple times, leaving it at room temperature, and then drying it.

また、前記透明基板上で前記の膜形成工程を複数回重ね
て行うことにより複数層からなる膜を形成することを特
徴とするものである。
Further, the method is characterized in that a film consisting of multiple layers is formed by performing the film forming step multiple times on the transparent substrate.

〔作   用〕[For production]

膜用材料を乾燥しないうちに複数回重ねて塗布した場合
、単に一回だけ塗布した場合と比べ、その塗布された膜
の表面の平坦性が良くなり、その後の乾燥で硬化して得
られた膜の表面も、平坦性が向上する。
When the film material is applied multiple times before drying, the surface flatness of the applied film becomes better than when it is applied only once, and the resulting film hardens during subsequent drying. The surface of the film also has improved flatness.

膜用材料を複数回重ねて塗布した後に室温で放置した場
合は、膜が硬化する前の未だ流動性がある状態で放置さ
れるため、膜の高い部分が低い部分に向けて流れだし、
よって表面のうねりの高低の差が小さくなり、上記の場
合よりも一層平坦な膜が得られる。
If the film material is left at room temperature after being applied multiple times, the film will be left in a fluid state before it hardens, so the high parts of the film will flow towards the low parts.
Therefore, the difference in the height of the surface waviness becomes smaller, and a film that is flatter than the above case can be obtained.

上記の塗布及び乾燥(或いは、塗布、室温放置及び乾燥
)の工程を複数回繰り返した場合にも、同様にうねりの
少ない平坦な膜が得られ、しかもその繰り返す回数を調
整することにより任意の膜厚が得られる。
Even if the above coating and drying process (or coating, leaving at room temperature, and drying) is repeated multiple times, a flat film with little waviness can be obtained, and by adjusting the number of repetitions, any desired film can be obtained. Thickness can be obtained.

〔実  施  例〕〔Example〕

以下、本発明の実施例について、図面を参照しながら説
明する。
Embodiments of the present invention will be described below with reference to the drawings.

第1図(a)〜(f)は、本発明の一実施例の製造工程
の主要部であるカラーフィルタ用の保護膜の形成工程を
示す断面図である。
FIGS. 1(a) to 1(f) are cross-sectional views showing the process of forming a protective film for a color filter, which is the main part of the manufacturing process of an embodiment of the present invention.

本実施例では、まず第1図(a)に示すように、表面に
赤色、緑色、青色等のカラーフィルタ(不図示)の形成
された、ガラス等からなる透明基板1上に、第4図に示
したような印刷法により保護膜用材料を即座に2回重ね
て塗布し、半液体状の第1層目の保護膜21′を得る。
In this embodiment, as shown in FIG. 1(a), first, as shown in FIG. The protective film material is immediately coated twice using the printing method shown in Figure 3 to obtain a semi-liquid first layer protective film 21'.

このように保護膜用材料を乾燥しないうちに2回重ねて
塗布したので、従来のように単に1回だけ塗布した場合
と比べて、膜の表面がより平坦になる。
Since the protective film material is applied twice before it dries, the surface of the film becomes flatter compared to the conventional case where it is applied only once.

続いて、この状態のまま室温で例えば5分以上放置する
ことにより、第1図(b)に示すように更に表面の平坦
化された保護膜21“を得る。このように膜表面が平坦
化されるのは、膜が半液体状のまま室温で放置されるた
め、膜表面のうねりの高い部分が低い部分に向けて流れ
だし、表面のうねりの高低の差が小さくなるためである
。このような作用を考えれば、保護膜用材料としては、
流れだしやすいもの、具体的には例えばカルピトール系
やセロソルブ系溶剤のような表面張力の小さな材料が望
ましく、また、粘度のあまり大きくない材料、例えば2
0〜1000cp程度の粘度を有するものが望ましい。
Next, by leaving this state at room temperature for, for example, 5 minutes or more, a protective film 21" whose surface is further flattened as shown in FIG. 1(b) is obtained. In this way, the surface of the film is flattened. This is because the membrane is left in a semi-liquid state at room temperature, so the higher undulations on the membrane surface begin to flow towards the lower undulations, reducing the difference in height between the undulations on the surface. Considering these effects, as a material for protective film,
Materials that flow easily, specifically materials with low surface tension such as calpitol-based and cellosolve-based solvents, are desirable, and materials that do not have a very high viscosity, such as 2
It is desirable to have a viscosity of about 0 to 1000 cp.

その後、上記の保護膜21“を予備乾燥して硬化させる
ことにより、第1図(C)に示すように固形の第1層目
の保護膜21を得る。この保護膜21の膜厚は、硬化前
の保護膜21″の膜厚と比べて2〜3割程度減少してお
り、膜表面の平坦性は更に向上している。なお、上記の
予備乾燥は、40〜150°C程度で、1〜30分程度
行うことが望ましい。
Thereafter, the protective film 21'' is pre-dried and cured to obtain a solid first layer protective film 21 as shown in FIG. 1(C).The thickness of this protective film 21 is as follows: The thickness is reduced by about 20 to 30% compared to the thickness of the protective film 21'' before curing, and the flatness of the film surface is further improved. Note that the above-mentioned preliminary drying is desirably carried out at about 40 to 150°C for about 1 to 30 minutes.

次に、上記第1層目の保護膜21上に、この第1層目の
保護膜21の形成方法と同一の方法を重ねて施すことに
より、第2層目の保護膜を形成する。すなわち、まず第
1図(d)に示すように、硬化して得られた第1層目の
保護膜21上に、上記と同様な印刷法により保護膜用材
料を即座に2回重ねて塗布することにより、まだ半液体
状の第2層目の保護膜22′を得る。続いて、この状態
のまま室温で放置することにより、第1図(e)に示す
ように更に表面の平坦化された保護膜22″を得る。
Next, a second protective film is formed on the first protective film 21 by applying the same method as the method for forming the first protective film 21. That is, first, as shown in FIG. 1(d), a protective film material is immediately coated twice on the cured first layer protective film 21 by the same printing method as above. By doing so, a second protective film 22' which is still in a semi-liquid state is obtained. Subsequently, by leaving this state at room temperature, a protective film 22'' whose surface is further flattened is obtained as shown in FIG. 1(e).

その後、保護膜22#を予備乾燥して硬化させることに
より、第1図(f)に示すように固形の第2層目の保護
膜22を得る。
Thereafter, the protective film 22# is pre-dried and cured to obtain a solid second-layer protective film 22 as shown in FIG. 1(f).

以上の工程により、第1層目の保護膜21及び第2層目
の保護膜22の2層構造からなる保護膜20が形成され
る。
Through the above steps, the protective film 20 having a two-layer structure of the first protective film 21 and the second protective film 22 is formed.

本実施例によれば、上述したように保護膜用材料を即座
に2回重ねて塗布することに加えて、これを硬化しない
うちに室温で放置するようにし、更にこれらの工程を2
回繰り返して行うようにしたので、非常に平坦性に優れ
た2層構造の保護膜20を得ることができる。本実施例
で得られた保護膜20の表面のうねり(膜厚変動)を膜
厚計で測定しようとしても、その測定が不可能なほど平
坦であった。具体的に、従来のように単に1回だけ塗布
する場合と、本実施例のように即座に2回重ねて塗布す
る場合とで、その表面状態を比較してみると、第1表に
明らかなように、「ばらつき」と「うねり幅」は共に本
実施例の方が優れていることがわかった。特に、本実施
例の場合、うねり幅は100〜200人と非常に小さな
値まで抑えることができた。なお、「うねり幅」とは、
うねりの最も高い山の部分と最も低い谷の部分との高さ
の差のことを言い、また、「ばらつき」とは面内膜厚の
ばらつきであり、うねり幅をX、膜厚分布の標準偏差を
σとした場合に(3σ/x)Xioo〔%〕で示される
According to this embodiment, in addition to immediately applying the protective film material twice as described above, the material is allowed to stand at room temperature before it hardens, and these steps are repeated twice.
Since the process is repeated several times, it is possible to obtain a protective film 20 having a two-layer structure with excellent flatness. Even if an attempt was made to measure the surface waviness (film thickness variation) of the protective film 20 obtained in this example using a film thickness meter, the surface was so flat that measurement was impossible. Specifically, Table 1 shows that when comparing the surface conditions between the conventional case where the coating is applied only once and the case where the coating is applied twice immediately as in this example, the results are clearly shown in Table 1. As shown, it was found that the present example was superior in both "dispersion" and "waviness width". In particular, in the case of this example, the undulation width could be suppressed to a very small value of 100 to 200 people. In addition, "undulation width" is
It refers to the difference in height between the highest peak and the lowest valley of the waviness, and "variation" refers to the variation in in-plane film thickness, where the waviness width is X and the standard of film thickness distribution. When the deviation is σ, it is expressed as (3σ/x)Xioo [%].

第1表 次に、第2図は、本発明の他の実施例によって得られた
保護膜の構造を示す断面図である。
Table 1 Next, FIG. 2 is a sectional view showing the structure of a protective film obtained according to another embodiment of the present invention.

前記実施例は保護膜用材料の2回連続塗布、室温放置及
び乾燥からなる工程を2回繰り返して行うようにしたも
のであるが、本実施例は、前記実施例と同様な保護膜用
材料の2回連続塗布、室温放置及び乾燥からなる工程を
n回(n≧3)繰り返して行うようにしたものである。
In the above example, the process consisting of two consecutive applications of the protective film material, standing at room temperature, and drying was repeated twice, but in this example, the same protective film material as in the above example was used. The process consisting of two consecutive coatings, standing at room temperature, and drying is repeated n times (n≧3).

本実施例では、最終的に、第1層目の保護膜31、第2
層目の保8I膜32、・・・・・、第n層目の保護膜3
nからなるn層構造の保護膜30が得られる。
In this embodiment, the first protective film 31, the second
Protective layer 8I film 32,..., protective film 3 for nth layer
A protective film 30 having an n-layer structure made of n is obtained.

本実施例によれば、より一層平坦性に優れた保護膜を得
ることができ、しかも、上記の塗布、室温放置及び乾燥
からなる工程を繰り返す回数を適宜設定することにより
、任意の膜厚を得ることができる。
According to this example, a protective film with even better flatness can be obtained, and by appropriately setting the number of times the above steps of coating, leaving at room temperature, and drying can be repeated, any film thickness can be obtained. Obtainable.

なお、上記の各実施例では、保護膜用材料を連続して塗
布する回数を2回にしたが、3回以上行ってもよく、こ
のように回数を増やすに応じて平坦性も向上する。
In each of the above embodiments, the protective film material was applied two times in succession, but it may be applied three or more times, and the flatness improves as the number of times increases.

また、本発明は、第3図に示した構造のカラー液晶表示
素子におけるカラーフィルタ用の保護膜を形成する際の
みならず、液晶表示素子に使用される配向膜や絶縁膜等
の各種の膜の形成に適用できる。
Furthermore, the present invention is applicable not only to the formation of a protective film for a color filter in a color liquid crystal display element having the structure shown in FIG. It can be applied to the formation of

〔発明の効果〕〔Effect of the invention〕

本発明によれば、膜用の材料を未硬化のままで複数回重
ねて塗布し、その後に乾燥させるようにしたので、極め
て平坦性に優れた膜を形成することができる。
According to the present invention, since the material for the film is applied multiple times in an uncured state and then dried, it is possible to form a film with extremely excellent flatness.

更に、複数回連続して塗布した後に、未硬化のままで室
温放置するようにすれば、より一層平坦性を向上させる
ことができる。
Furthermore, if the coating is applied several times in succession and then left uncured at room temperature, the flatness can be further improved.

また、上記の連続塗布及び乾燥(或いは、連続塗布、室
温放置及び乾燥)からなる工程を複数回繰り返して行う
ことにより、更に優れた平坦性を得ることができ、しか
もその回数を調整することにより任意の膜厚を得ること
もできる。
In addition, even better flatness can be obtained by repeating the process of continuous coating and drying (or continuous coating, leaving at room temperature, and drying) several times, and by adjusting the number of times. It is also possible to obtain any film thickness.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(f)は本発明の一実施例の製造工程の
主要部であるカラーフィルタ用の保護膜の形成工程を示
す断面図、 第2図は本発明の他の実施例によって得られた保護膜の
構造を示す断面図、 第3図は一般的なカラー液晶表示素子の構造を示す断面
図、 第4図は印刷法による保護膜の塗布工程を示す図、 第5図は従来の保護膜の形成方法によって得られた基板
表面の縞を示す平面図、 第6図は膜表面のうねりを示す第4図のA−A拡大断面
図である。 1・・・透明基板、 20・・・2層構造の保護膜、 21・・・第1層目の保護膜、 22・・・第2層目の保護膜、 30・・・n層構造の保護膜、 31・・・第1層目の保護膜、 32・・・第2層目の保護膜、 33・・・第3層目の保護膜、 3n・・・第n層目の保護膜。
FIGS. 1(a) to (f) are cross-sectional views showing the process of forming a protective film for a color filter, which is the main part of the manufacturing process of one embodiment of the present invention. FIG. 2 is another embodiment of the present invention. Figure 3 is a cross-sectional view showing the structure of a general color liquid crystal display element, Figure 4 is a diagram showing the process of applying a protective film using a printing method, Figure 5 is a cross-sectional view showing the structure of the protective film obtained by 6 is a plan view showing stripes on the substrate surface obtained by the conventional method of forming a protective film, and FIG. 6 is an enlarged sectional view taken along the line AA in FIG. 4 showing undulations on the film surface. DESCRIPTION OF SYMBOLS 1... Transparent substrate, 20... Protective film with two-layer structure, 21... First-layer protective film, 22... Second-layer protective film, 30... N-layer structure Protective film, 31... First layer protective film, 32... Second layer protective film, 33... Third layer protective film, 3n... Nth layer protective film .

Claims (3)

【特許請求の範囲】[Claims] (1)液晶表示素子を構成する透明基板の内面に膜を形
成する工程を有する液晶表示素子の製造方法において、 前記透明基板上に膜用材料を複数回重ねて塗布した後に
乾燥させることにより前記膜を形成することを特徴とす
る液晶表示素子の製造方法。
(1) In a method for manufacturing a liquid crystal display element, which includes a step of forming a film on the inner surface of a transparent substrate constituting the liquid crystal display element, the film material is coated multiple times on the transparent substrate and then dried. A method for manufacturing a liquid crystal display element, the method comprising forming a film.
(2)液晶表示素子を構成する透明基板の内面に膜を形
成する工程を有する液晶表示素子の製造方法において、 前記透明基板上に膜用材料を複数回重ねて塗布した後に
室温で放置し、その後に乾燥させることにより前記膜を
形成することを特徴とする液晶表示素子の製造方法。
(2) A method for manufacturing a liquid crystal display element, which includes a step of forming a film on the inner surface of a transparent substrate constituting the liquid crystal display element, wherein a film material is coated on the transparent substrate multiple times and then left at room temperature; A method for manufacturing a liquid crystal display element, characterized in that the film is formed by subsequent drying.
(3)請求項1又は2記載の膜形成工程を複数回重ねて
行うことにより複数層からなる膜を形成することを特徴
とする液晶表示素子の製造方法。
(3) A method for manufacturing a liquid crystal display element, characterized in that a film consisting of multiple layers is formed by repeating the film forming step according to claim 1 or 2 a plurality of times.
JP34124889A 1989-07-25 1989-12-28 Production of liquid crystal display element Pending JPH03200217A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP34124889A JPH03200217A (en) 1989-12-28 1989-12-28 Production of liquid crystal display element
US07/556,910 US5194976A (en) 1989-07-25 1990-07-23 Liquid crystal display device and method of manufacturing the same
EP90114173A EP0410387B2 (en) 1989-07-25 1990-07-24 Liquid crystal display device and method of manufacturing the same
DE69018721T DE69018721T3 (en) 1989-07-25 1990-07-24 Liquid crystal display device and its manufacturing method.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34124889A JPH03200217A (en) 1989-12-28 1989-12-28 Production of liquid crystal display element

Publications (1)

Publication Number Publication Date
JPH03200217A true JPH03200217A (en) 1991-09-02

Family

ID=18344556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34124889A Pending JPH03200217A (en) 1989-07-25 1989-12-28 Production of liquid crystal display element

Country Status (1)

Country Link
JP (1) JPH03200217A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7515225B2 (en) 2003-12-23 2009-04-07 Lg Display Co., Ltd. Substrate for a liquid crystal display and a fabricating method thereof
JP2010060797A (en) * 2008-09-03 2010-03-18 Dnp Fine Chemicals Co Ltd Resin composition for color filter protective film and color filter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7515225B2 (en) 2003-12-23 2009-04-07 Lg Display Co., Ltd. Substrate for a liquid crystal display and a fabricating method thereof
US7764347B2 (en) 2003-12-23 2010-07-27 Lg Display Co., Ltd. Substrate for a liquid crystal display and a fabricating method thereof
JP2010060797A (en) * 2008-09-03 2010-03-18 Dnp Fine Chemicals Co Ltd Resin composition for color filter protective film and color filter

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